KR100194166B1 - 액체로부터 용존 가스를 제거하는 용존 가스 제거방법 - Google Patents

액체로부터 용존 가스를 제거하는 용존 가스 제거방법 Download PDF

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Publication number
KR100194166B1
KR100194166B1 KR1019980012516A KR19980012516A KR100194166B1 KR 100194166 B1 KR100194166 B1 KR 100194166B1 KR 1019980012516 A KR1019980012516 A KR 1019980012516A KR 19980012516 A KR19980012516 A KR 19980012516A KR 100194166 B1 KR100194166 B1 KR 100194166B1
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KR
South Korea
Prior art keywords
liquid
dissolved gas
removing dissolved
gas
dissolved
Prior art date
Application number
KR1019980012516A
Other languages
English (en)
Inventor
제이. 밴 슈라벤디크 바트
더블유. 버크하트 크리스토퍼
에이치. 산티아고 티토
이. 포머로이 챨스
더블유. 린드 제프리
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
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Publication of KR100194166B1 publication Critical patent/KR100194166B1/ko

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D99/00—Subject matter not provided for in other groups of this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402—Reduction of impurities in the source gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
KR1019980012516A 1992-11-16 1998-04-09 액체로부터 용존 가스를 제거하는 용존 가스 제거방법 KR100194166B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US97821692A 1992-11-16 1992-11-16

Publications (1)

Publication Number Publication Date
KR100194166B1 true KR100194166B1 (ko) 1999-06-15

Family

ID=25525865

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1019930024026A KR940011344A (ko) 1992-11-16 1993-11-12 액체로 부터 용해된 가스를 제거하기 위한 장치 및 그 제거방법
KR1019980012516A KR100194166B1 (ko) 1992-11-16 1998-04-09 액체로부터 용존 가스를 제거하는 용존 가스 제거방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1019930024026A KR940011344A (ko) 1992-11-16 1993-11-12 액체로 부터 용해된 가스를 제거하기 위한 장치 및 그 제거방법

Country Status (4)

Country Link
US (3) US5425803A (ko)
EP (1) EP0598424A3 (ko)
JP (1) JPH06220640A (ko)
KR (2) KR940011344A (ko)

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Also Published As

Publication number Publication date
KR940011344A (ko) 1994-06-21
US5645625A (en) 1997-07-08
JPH06220640A (ja) 1994-08-09
US5772736A (en) 1998-06-30
EP0598424A3 (en) 1996-05-15
US5425803A (en) 1995-06-20
EP0598424A2 (en) 1994-05-25

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