JPWO2025182054A1 - - Google Patents

Info

Publication number
JPWO2025182054A1
JPWO2025182054A1 JP2025514414A JP2025514414A JPWO2025182054A1 JP WO2025182054 A1 JPWO2025182054 A1 JP WO2025182054A1 JP 2025514414 A JP2025514414 A JP 2025514414A JP 2025514414 A JP2025514414 A JP 2025514414A JP WO2025182054 A1 JPWO2025182054 A1 JP WO2025182054A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025514414A
Other languages
Japanese (ja)
Other versions
JPWO2025182054A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2025182054A1 publication Critical patent/JPWO2025182054A1/ja
Publication of JPWO2025182054A5 publication Critical patent/JPWO2025182054A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
JP2025514414A 2024-02-29 2024-02-29 Pending JPWO2025182054A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2024/007654 WO2025182054A1 (ja) 2024-02-29 2024-02-29 Ｅｕｖ透過膜及びその加工方法、並びに露光方法

Publications (2)

Publication Number Publication Date
JPWO2025182054A1 true JPWO2025182054A1 (https=) 2025-09-04
JPWO2025182054A5 JPWO2025182054A5 (https=) 2026-02-04

Family

ID=96881136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025514414A Pending JPWO2025182054A1 (https=) 2024-02-29 2024-02-29

Country Status (6)

Country Link
US (1) US20250278032A1 (https=)
EP (1) EP4636488A1 (https=)
JP (1) JPWO2025182054A1 (https=)
KR (1) KR20250134065A (https=)
TW (1) TW202540760A (https=)
WO (1) WO2025182054A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7554368B2 (ja) * 2022-09-15 2024-09-19 日本碍子株式会社 Ｅｕｖ透過膜及びその使用方法、並びに露光方法

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20160334698A1 (en) * 2015-05-13 2016-11-17 Hwanchul JEON Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same
JP2017522590A (ja) * 2014-07-04 2017-08-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置
US20180004082A1 (en) * 2016-06-30 2018-01-04 Samsung Electronics Co., Ltd. Pellicle for photomask and exposure apparatus including the pellicle
JP2018035014A (ja) * 2016-08-29 2018-03-08 エア・ウォーター株式会社 ペリクルの製造方法
JP2019028462A (ja) * 2017-07-31 2019-02-21 三星電子株式会社Ｓａｍｓｕｎｇ Ｅｌｅｃｔｒｏｎｉｃｓ Ｃｏ．，Ｌｔｄ． フォトマスク用ペリクル、及びそれを含むレチクル、並びにフォトマスク用ペリクルの製造方法
US20220326600A1 (en) * 2021-04-08 2022-10-13 Korea Electronics Technology Institute Pellicle for extreme ultraviolet lithography containing amorphous carbon and method for manufacturing the same
JP2022543545A (ja) * 2019-07-30 2022-10-13 エーエスエムエル ネザーランズ ビー．ブイ． ペリクル膜
WO2023067739A1 (ja) * 2021-10-20 2023-04-27 日本碍子株式会社 Ｅｕｖ透過膜
WO2023112330A1 (ja) * 2021-12-17 2023-06-22 日本碍子株式会社 ペリクルの製造に用いられるためのＳｉメンブレン構造体、及びペリクルの製造方法
WO2023175990A1 (ja) * 2022-03-18 2023-09-21 日本碍子株式会社 Ｅｕｖ透過膜の製造方法及びペリクル
JP7372501B1 (ja) * 2022-09-15 2023-10-31 日本碍子株式会社 Ｅｕｖ透過膜

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020098227A (ja) 2018-12-17 2020-06-25 信越化学工業株式会社 フォトリソグラフィ用ペリクル膜及びこれを備えたペリクル

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017522590A (ja) * 2014-07-04 2017-08-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置
US20160334698A1 (en) * 2015-05-13 2016-11-17 Hwanchul JEON Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same
US20180004082A1 (en) * 2016-06-30 2018-01-04 Samsung Electronics Co., Ltd. Pellicle for photomask and exposure apparatus including the pellicle
JP2018035014A (ja) * 2016-08-29 2018-03-08 エア・ウォーター株式会社 ペリクルの製造方法
JP2019028462A (ja) * 2017-07-31 2019-02-21 三星電子株式会社Ｓａｍｓｕｎｇ Ｅｌｅｃｔｒｏｎｉｃｓ Ｃｏ．，Ｌｔｄ． フォトマスク用ペリクル、及びそれを含むレチクル、並びにフォトマスク用ペリクルの製造方法
JP2022543545A (ja) * 2019-07-30 2022-10-13 エーエスエムエル ネザーランズ ビー．ブイ． ペリクル膜
US20220326600A1 (en) * 2021-04-08 2022-10-13 Korea Electronics Technology Institute Pellicle for extreme ultraviolet lithography containing amorphous carbon and method for manufacturing the same
WO2023067739A1 (ja) * 2021-10-20 2023-04-27 日本碍子株式会社 Ｅｕｖ透過膜
WO2023112330A1 (ja) * 2021-12-17 2023-06-22 日本碍子株式会社 ペリクルの製造に用いられるためのＳｉメンブレン構造体、及びペリクルの製造方法
WO2023175990A1 (ja) * 2022-03-18 2023-09-21 日本碍子株式会社 Ｅｕｖ透過膜の製造方法及びペリクル
JP7372501B1 (ja) * 2022-09-15 2023-10-31 日本碍子株式会社 Ｅｕｖ透過膜

Also Published As

Publication number Publication date
EP4636488A1 (en) 2025-10-22
KR20250134065A (ko) 2025-09-09
TW202540760A (zh) 2025-10-16
WO2025182054A1 (ja) 2025-09-04
US20250278032A1 (en) 2025-09-04

Similar Documents

Publication Publication Date Title
JPWO2025182054A1 (https=)
CN308403106S (https=)
CN308414024S (https=)
CN309420483S (https=)
CN308963856S (https=)
CN308915267S (https=)
CN309695161S (https=)
CN309570917S (https=)
CN309397812S (https=)
CN308412428S (https=)
CN308412425S (https=)
CN309388531S (https=)
CN309214087S (https=)
CN308983080S (https=)
CN308928438S (https=)
CN308412405S (https=)
CN308916892S (https=)
CN308699076S (https=)
CN308556280S (https=)
CN308409342S (https=)
CN308408815S (https=)
CN308503759S (https=)
CN308414812S (https=)
CN308408522S (https=)
CN308414500S (https=)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250307

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250307

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20260417