JPWO2025173150A1 - - Google Patents

Info

Publication number
JPWO2025173150A1
JPWO2025173150A1 JP2025522996A JP2025522996A JPWO2025173150A1 JP WO2025173150 A1 JPWO2025173150 A1 JP WO2025173150A1 JP 2025522996 A JP2025522996 A JP 2025522996A JP 2025522996 A JP2025522996 A JP 2025522996A JP WO2025173150 A1 JPWO2025173150 A1 JP WO2025173150A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2025522996A
Other languages
Japanese (ja)
Other versions
JP7721041B1 (ja
JPWO2025173150A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2025125350A priority Critical patent/JP2025142269A/ja
Application granted granted Critical
Publication of JP7721041B1 publication Critical patent/JP7721041B1/ja
Publication of JPWO2025173150A1 publication Critical patent/JPWO2025173150A1/ja
Publication of JPWO2025173150A5 publication Critical patent/JPWO2025173150A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66Vertical DMOS [VDMOS] FETs
JP2025522996A 2024-02-15 2024-02-15 半導体装置及び半導体装置の製造方法 Active JP7721041B1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025125350A JP2025142269A (ja) 2024-02-15 2025-07-28 半導体装置及び半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2024/005165 WO2025173150A1 (ja) 2024-02-15 2024-02-15 半導体装置及び半導体装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025125350A Division JP2025142269A (ja) 2024-02-15 2025-07-28 半導体装置及び半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP7721041B1 JP7721041B1 (ja) 2025-08-08
JPWO2025173150A1 true JPWO2025173150A1 (https=) 2025-08-21
JPWO2025173150A5 JPWO2025173150A5 (https=) 2026-01-21

Family

ID=96656979

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2025522996A Active JP7721041B1 (ja) 2024-02-15 2024-02-15 半導体装置及び半導体装置の製造方法
JP2025125350A Pending JP2025142269A (ja) 2024-02-15 2025-07-28 半導体装置及び半導体装置の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025125350A Pending JP2025142269A (ja) 2024-02-15 2025-07-28 半導体装置及び半導体装置の製造方法

Country Status (2)

Country Link
JP (2) JP7721041B1 (https=)
WO (1) WO2025173150A1 (https=)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3400846B2 (ja) * 1994-01-20 2003-04-28 三菱電機株式会社 トレンチ構造を有する半導体装置およびその製造方法
JP4608133B2 (ja) * 2001-06-08 2011-01-05 ルネサスエレクトロニクス株式会社 縦型mosfetを備えた半導体装置およびその製造方法
JP2003124233A (ja) * 2002-08-05 2003-04-25 Hitachi Ltd 半導体装置の製造方法
US7709888B2 (en) * 2004-09-29 2010-05-04 Panasonic Corporation Semiconductor device
JP5403966B2 (ja) * 2008-07-29 2014-01-29 ローム株式会社 トレンチ型半導体素子及びトレンチ型半導体素子の製造方法
DE112015004374B4 (de) * 2014-09-26 2019-02-14 Mitsubishi Electric Corporation Halbleitervorrichtung
JP6872951B2 (ja) * 2017-03-30 2021-05-19 エイブリック株式会社 半導体装置及びその製造方法
JP7388197B2 (ja) * 2020-01-07 2023-11-29 株式会社デンソー トレンチゲート型スイッチング素子の製造方法
JP7835562B2 (ja) * 2022-01-05 2026-03-25 ローム株式会社 半導体装置
CN119054085A (zh) * 2022-04-21 2024-11-29 罗姆股份有限公司 半导体装置

Also Published As

Publication number Publication date
JP7721041B1 (ja) 2025-08-08
WO2025173150A1 (ja) 2025-08-21
JP2025142269A (ja) 2025-09-30

Similar Documents

Publication Publication Date Title
CN309943191S (zh) 焊接固定装置
CN308407741S (https=)
CN309618679S (https=)
CN308405326S (https=)
CN308407220S (https=)
CN308407678S (https=)
CN309710079S (https=)
CN308407748S (https=)
CN308407756S (https=)
CN308407842S (https=)
CN308407949S (https=)
CN308407953S (https=)
CN308408305S (https=)
CN308408333S (https=)
CN308408342S (https=)
CN308408366S (https=)
CN308408652S (https=)
CN308408707S (https=)
CN308409752S (https=)
CN308409821S (https=)
CN308409822S (https=)
CN308410032S (https=)
CN308410171S (https=)
CN308410266S (https=)
CN308410301S (https=)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250422

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250422

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20250422

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250701

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250729

R150 Certificate of patent or registration of utility model

Ref document number: 7721041

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150