JPWO2025013922A1 - - Google Patents
Info
- Publication number
- JPWO2025013922A1 JPWO2025013922A1 JP2025532822A JP2025532822A JPWO2025013922A1 JP WO2025013922 A1 JPWO2025013922 A1 JP WO2025013922A1 JP 2025532822 A JP2025532822 A JP 2025532822A JP 2025532822 A JP2025532822 A JP 2025532822A JP WO2025013922 A1 JPWO2025013922 A1 JP WO2025013922A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M1/00—Inking and printing with a printer's forme
- B41M1/06—Lithographic printing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
- B41N1/14—Lithographic printing foils
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023114108 | 2023-07-11 | ||
| JP2024030658 | 2024-02-29 | ||
| PCT/JP2024/025144 WO2025013922A1 (ja) | 2023-07-11 | 2024-07-11 | 機上現像型平版印刷版原版、平版印刷版の作製方法、及び平版印刷方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2025013922A1 true JPWO2025013922A1 (https=) | 2025-01-16 |
Family
ID=94215910
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025532822A Pending JPWO2025013922A1 (https=) | 2023-07-11 | 2024-07-11 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2025013922A1 (https=) |
| CN (1) | CN121487839A (https=) |
| WO (1) | WO2025013922A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025132837A (ja) * | 2024-02-29 | 2025-09-10 | 富士フイルム株式会社 | 機上現像型平版印刷版原版、平版印刷版の作製方法、平版印刷方法、及び化合物 |
Family Cites Families (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2525568B2 (ja) | 1985-01-18 | 1996-08-21 | 富士写真フイルム株式会社 | 光可溶化組成物 |
| JP2655349B2 (ja) | 1989-05-18 | 1997-09-17 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
| JP2988756B2 (ja) | 1991-04-26 | 1999-12-13 | 協和醗酵工業株式会社 | 光重合開始剤およびこれを含有する光重合性組成物 |
| JP2739395B2 (ja) | 1991-08-19 | 1998-04-15 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
| JP2907643B2 (ja) | 1992-07-16 | 1999-06-21 | 富士写真フイルム株式会社 | 感光性平版印刷版およびその処理方法 |
| JPH08108621A (ja) | 1994-10-06 | 1996-04-30 | Konica Corp | 画像記録媒体及びそれを用いる画像形成方法 |
| DE69620336T2 (de) | 1995-10-24 | 2002-10-24 | Agfa-Gevaert, Mortsel | Verfahren zur Herstellung einer lithographischen Druckplatte mit Wasser als Entwickler |
| EP0770494B1 (en) | 1995-10-24 | 2000-05-24 | Agfa-Gevaert N.V. | A method for making a lithographic printing plate involving on press development |
| DE69608522T2 (de) | 1995-11-09 | 2001-01-25 | Agfa-Gevaert N.V., Mortsel | Wärmeempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer lithographischen Druckform damit |
| DE69613078T2 (de) | 1995-11-09 | 2001-11-22 | Agfa-Gevaert N.V., Mortsel | Wärmeempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer Druckform damit |
| JPH10282679A (ja) | 1997-04-08 | 1998-10-23 | Fuji Photo Film Co Ltd | ネガ型感光性平版印刷版 |
| EP0931647B1 (en) | 1998-01-23 | 2003-04-02 | Agfa-Gevaert | A heat sensitive element and a method for producing lithographic plates therewith |
| JP2001133969A (ja) | 1999-11-01 | 2001-05-18 | Fuji Photo Film Co Ltd | ネガ型平版印刷版原版 |
| JP2001277740A (ja) | 2000-01-27 | 2001-10-10 | Fuji Photo Film Co Ltd | 平版印刷版用原版 |
| JP2001277742A (ja) | 2000-01-27 | 2001-10-10 | Fuji Photo Film Co Ltd | 平版印刷版用原版 |
| JP4092055B2 (ja) | 2000-02-09 | 2008-05-28 | 三菱製紙株式会社 | 感光性組成物および感光性平版印刷版材料 |
| JP2002023360A (ja) | 2000-07-12 | 2002-01-23 | Fuji Photo Film Co Ltd | ネガ型画像記録材料 |
| JP4156784B2 (ja) | 2000-07-25 | 2008-09-24 | 富士フイルム株式会社 | ネガ型画像記録材料及び画像形成方法 |
| JP4319363B2 (ja) | 2001-01-15 | 2009-08-26 | 富士フイルム株式会社 | ネガ型画像記録材料 |
| US7261998B2 (en) | 2001-04-04 | 2007-08-28 | Eastman Kodak Company | Imageable element with solvent-resistant polymeric binder |
| JP2002328465A (ja) | 2001-04-27 | 2002-11-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| DE602004030519D1 (de) | 2003-07-22 | 2011-01-27 | Fujifilm Corp | Flachdruckplattenvorläufer und lithographisches Druckverfahren |
| JP4644458B2 (ja) | 2003-09-30 | 2011-03-02 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
| JP2006188038A (ja) | 2004-12-10 | 2006-07-20 | Fuji Photo Film Co Ltd | 平版印刷版原版および製版方法 |
| JP4469734B2 (ja) | 2005-02-03 | 2010-05-26 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP2006239867A (ja) | 2005-02-28 | 2006-09-14 | Fuji Photo Film Co Ltd | 平版印刷版原版および平版印刷方法 |
| ATE391014T1 (de) | 2005-06-21 | 2008-04-15 | Agfa Graphics Nv | Wärmeempfindliches bildaufzeichnungselement |
| JP5170960B2 (ja) | 2005-08-29 | 2013-03-27 | 富士フイルム株式会社 | 平版印刷版原版、及び平版印刷方法 |
| JP2008195018A (ja) | 2007-02-15 | 2008-08-28 | Fujifilm Corp | 平版印刷版原版および平版印刷方法 |
| JP5046744B2 (ja) | 2007-05-18 | 2012-10-10 | 富士フイルム株式会社 | 平版印刷版原版、及びそれを用いた印刷方法 |
| US8084182B2 (en) * | 2008-04-29 | 2011-12-27 | Eastman Kodak Company | On-press developable elements and methods of use |
| JP5645743B2 (ja) | 2010-04-30 | 2014-12-24 | 富士フイルム株式会社 | 平版印刷版原版、その製版方法、及び、多価イソシアネート化合物 |
| JP2012211938A (ja) * | 2011-03-30 | 2012-11-01 | Fujifilm Corp | 重合性組成物及び平版印刷版原版 |
| WO2016027886A1 (ja) | 2014-08-22 | 2016-02-25 | 富士フイルム株式会社 | 発色組成物、平版印刷版原版、平版印刷版の製版方法、及び、発色剤 |
| EP3594009B1 (en) | 2017-07-13 | 2021-04-21 | FUJIFILM Corporation | Lithographic printing plate original plate, and method for producing lithographic printing plate |
| JP6454828B1 (ja) | 2017-08-31 | 2019-01-16 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の製造方法、印刷方法 |
| WO2019219570A1 (en) | 2018-05-14 | 2019-11-21 | Agfa Nv | A lithographic printing plate precursor |
| JP2020069789A (ja) | 2018-10-31 | 2020-05-07 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
| EP3900942B1 (en) * | 2019-01-31 | 2024-09-04 | FUJIFILM Corporation | Planographic printing plate precursor, method of preparing a planographic printing plate, and planographic printing method |
| CN114096914A (zh) | 2019-06-28 | 2022-02-25 | 富士胶片株式会社 | 机上显影型平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
| CN116133862B (zh) | 2020-07-21 | 2025-10-10 | 富士胶片株式会社 | 机上显影型平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
| JP2023114108A (ja) | 2022-02-04 | 2023-08-17 | 株式会社Ｊｖｃケンウッド | 歩行補助システム |
| JP7436762B1 (ja) | 2022-08-24 | 2024-02-22 | 株式会社マスダック | スフレパンケーキ製造方法及び装置 |
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2024
- 2024-07-11 JP JP2025532822A patent/JPWO2025013922A1/ja active Pending
- 2024-07-11 CN CN202480046256.8A patent/CN121487839A/zh active Pending
- 2024-07-11 WO PCT/JP2024/025144 patent/WO2025013922A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN121487839A (zh) | 2026-02-06 |
| WO2025013922A1 (ja) | 2025-01-16 |