JPWO2025005084A5 - - Google Patents

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Publication number
JPWO2025005084A5
JPWO2025005084A5 JP2025530137A JP2025530137A JPWO2025005084A5 JP WO2025005084 A5 JPWO2025005084 A5 JP WO2025005084A5 JP 2025530137 A JP2025530137 A JP 2025530137A JP 2025530137 A JP2025530137 A JP 2025530137A JP WO2025005084 A5 JPWO2025005084 A5 JP WO2025005084A5
Authority
JP
Japan
Prior art keywords
atomic
edx
atoms
value
compositional analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025530137A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025005084A1 (https=
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2024/022999 external-priority patent/WO2025005084A1/ja
Publication of JPWO2025005084A1 publication Critical patent/JPWO2025005084A1/ja
Publication of JPWO2025005084A5 publication Critical patent/JPWO2025005084A5/ja
Pending legal-status Critical Current

Links

JP2025530137A 2023-06-28 2024-06-25 Pending JPWO2025005084A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023106422 2023-06-28
PCT/JP2024/022999 WO2025005084A1 (ja) 2023-06-28 2024-06-25 基板積層体

Publications (2)

Publication Number Publication Date
JPWO2025005084A1 JPWO2025005084A1 (https=) 2025-01-02
JPWO2025005084A5 true JPWO2025005084A5 (https=) 2026-03-25

Family

ID=93939079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025530137A Pending JPWO2025005084A1 (https=) 2023-06-28 2024-06-25

Country Status (5)

Country Link
JP (1) JPWO2025005084A1 (https=)
KR (1) KR20260016540A (https=)
CN (1) CN121444645A (https=)
TW (1) TW202501550A (https=)
WO (1) WO2025005084A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012174937A (ja) 2011-02-22 2012-09-10 Sony Corp 半導体装置、半導体装置の製造方法、半導体ウエハの貼り合わせ方法及び電子機器
JP7784240B2 (ja) * 2020-05-14 2025-12-11 三井化学株式会社 積層体、組成物及び積層体の製造方法
KR102796500B1 (ko) * 2020-09-10 2025-04-15 미쓰이 가가쿠 가부시키가이샤 조성물, 적층체 및 적층체의 제조 방법
JP7787390B2 (ja) * 2021-06-30 2025-12-17 ダイキン工業株式会社 積層体の製造方法および積層体
JPWO2024029390A1 (https=) * 2022-08-01 2024-02-08

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