JPWO2024241573A5 - - Google Patents

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Publication number
JPWO2024241573A5
JPWO2024241573A5 JP2023553732A JP2023553732A JPWO2024241573A5 JP WO2024241573 A5 JPWO2024241573 A5 JP WO2024241573A5 JP 2023553732 A JP2023553732 A JP 2023553732A JP 2023553732 A JP2023553732 A JP 2023553732A JP WO2024241573 A5 JPWO2024241573 A5 JP WO2024241573A5
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JP
Japan
Prior art keywords
mirror
axis parabolic
parabolic mirror
axis
beam diameter
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JP2023553732A
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English (en)
Japanese (ja)
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JP7399367B1 (ja
JPWO2024241573A1 (https=
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Priority claimed from PCT/JP2023/019519 external-priority patent/WO2024241573A1/ja
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Publication of JP7399367B1 publication Critical patent/JP7399367B1/ja
Publication of JPWO2024241573A1 publication Critical patent/JPWO2024241573A1/ja
Publication of JPWO2024241573A5 publication Critical patent/JPWO2024241573A5/ja
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JP2023553732A 2023-05-25 2023-05-25 反射型ビーム径可変光学系、レーザ加工ヘッドおよびレーザ加工機 Active JP7399367B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/019519 WO2024241573A1 (ja) 2023-05-25 2023-05-25 反射型ビーム径可変光学系、レーザ加工ヘッドおよびレーザ加工機

Publications (3)

Publication Number Publication Date
JP7399367B1 JP7399367B1 (ja) 2023-12-15
JPWO2024241573A1 JPWO2024241573A1 (https=) 2024-11-28
JPWO2024241573A5 true JPWO2024241573A5 (https=) 2025-04-30

Family

ID=89122217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023553732A Active JP7399367B1 (ja) 2023-05-25 2023-05-25 反射型ビーム径可変光学系、レーザ加工ヘッドおよびレーザ加工機

Country Status (2)

Country Link
JP (1) JP7399367B1 (https=)
WO (2) WO2024241573A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102024111974A1 (de) * 2024-04-29 2025-10-30 Oliver Scheifinger Lichtbündelungseinrichtung zum Konzentrieren von Licht für photoelektrische, photothermische und faseroptische Anwendungen, Einrichtung zum Ausrichten zumindest einer Lichtbündelungseinrichtung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3538445B2 (ja) * 1993-11-29 2004-06-14 東京電力株式会社 レーザビーム伝送装置
US5561544A (en) * 1995-03-06 1996-10-01 Macken; John A. Laser scanning system with reflecting optics
JP5368261B2 (ja) * 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
JP2012137510A (ja) * 2009-07-27 2012-07-19 Chihiro Suzuki 光学ユニット
WO2016116147A1 (de) * 2015-01-21 2016-07-28 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Strahlführungseinrichtung, euv-strahlungserzeugungsvorrichtung und verfahren zum einstellen eines strahldurchmessers und eines öffnungswinkels eines laserstrahls

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