JP7399367B1 - 反射型ビーム径可変光学系、レーザ加工ヘッドおよびレーザ加工機 - Google Patents

反射型ビーム径可変光学系、レーザ加工ヘッドおよびレーザ加工機 Download PDF

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Publication number
JP7399367B1
JP7399367B1 JP2023553732A JP2023553732A JP7399367B1 JP 7399367 B1 JP7399367 B1 JP 7399367B1 JP 2023553732 A JP2023553732 A JP 2023553732A JP 2023553732 A JP2023553732 A JP 2023553732A JP 7399367 B1 JP7399367 B1 JP 7399367B1
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parabolic mirror
axis
axis parabolic
mirror
optical system
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JP2023553732A
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Japanese (ja)
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JPWO2024241573A5 (https=
JPWO2024241573A1 (https=
Inventor
周一 藤川
本敏 熊岡
孝 井上
陽子 井上
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Lenses (AREA)
  • Laser Beam Processing (AREA)
JP2023553732A 2023-05-25 2023-05-25 反射型ビーム径可変光学系、レーザ加工ヘッドおよびレーザ加工機 Active JP7399367B1 (ja)

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Application Number Priority Date Filing Date Title
PCT/JP2023/019519 WO2024241573A1 (ja) 2023-05-25 2023-05-25 反射型ビーム径可変光学系、レーザ加工ヘッドおよびレーザ加工機

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JP7399367B1 true JP7399367B1 (ja) 2023-12-15
JPWO2024241573A1 JPWO2024241573A1 (https=) 2024-11-28
JPWO2024241573A5 JPWO2024241573A5 (https=) 2025-04-30

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JP (1) JP7399367B1 (https=)
WO (2) WO2024241573A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102024111974A1 (de) * 2024-04-29 2025-10-30 Oliver Scheifinger Lichtbündelungseinrichtung zum Konzentrieren von Licht für photoelektrische, photothermische und faseroptische Anwendungen, Einrichtung zum Ausrichten zumindest einer Lichtbündelungseinrichtung

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07154018A (ja) * 1993-11-29 1995-06-16 Tokyo Electric Power Co Inc:The レーザビーム伝送装置
JPH11501738A (ja) * 1995-03-06 1999-02-09 ジョン マッケン 反射光学付きレーザー走査装置
JP2010135769A (ja) * 2008-11-06 2010-06-17 Komatsu Ltd 極端紫外光源装置、極端紫外光源装置の制御方法
JP2012137510A (ja) * 2009-07-27 2012-07-19 Chihiro Suzuki 光学ユニット
US20170325325A1 (en) * 2015-01-21 2017-11-09 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Adjusting a Beam Diameter and an Aperture Angle of a Laser Beam

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07154018A (ja) * 1993-11-29 1995-06-16 Tokyo Electric Power Co Inc:The レーザビーム伝送装置
JPH11501738A (ja) * 1995-03-06 1999-02-09 ジョン マッケン 反射光学付きレーザー走査装置
JP2010135769A (ja) * 2008-11-06 2010-06-17 Komatsu Ltd 極端紫外光源装置、極端紫外光源装置の制御方法
JP2012137510A (ja) * 2009-07-27 2012-07-19 Chihiro Suzuki 光学ユニット
US20170325325A1 (en) * 2015-01-21 2017-11-09 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Adjusting a Beam Diameter and an Aperture Angle of a Laser Beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102024111974A1 (de) * 2024-04-29 2025-10-30 Oliver Scheifinger Lichtbündelungseinrichtung zum Konzentrieren von Licht für photoelektrische, photothermische und faseroptische Anwendungen, Einrichtung zum Ausrichten zumindest einer Lichtbündelungseinrichtung

Also Published As

Publication number Publication date
WO2024241606A1 (ja) 2024-11-28
JPWO2024241573A1 (https=) 2024-11-28
WO2024241573A1 (ja) 2024-11-28

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