JPWO2024209754A5 - - Google Patents

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Publication number
JPWO2024209754A5
JPWO2024209754A5 JP2025512409A JP2025512409A JPWO2024209754A5 JP WO2024209754 A5 JPWO2024209754 A5 JP WO2024209754A5 JP 2025512409 A JP2025512409 A JP 2025512409A JP 2025512409 A JP2025512409 A JP 2025512409A JP WO2024209754 A5 JPWO2024209754 A5 JP WO2024209754A5
Authority
JP
Japan
Prior art keywords
radiation
resin composition
composition according
sensitive resin
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2025512409A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2024209754A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2023/046872 external-priority patent/WO2024209754A1/ja
Publication of JPWO2024209754A1 publication Critical patent/JPWO2024209754A1/ja
Publication of JPWO2024209754A5 publication Critical patent/JPWO2024209754A5/ja
Pending legal-status Critical Current

Links

JP2025512409A 2023-04-04 2023-12-27 Pending JPWO2024209754A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023060723 2023-04-04
PCT/JP2023/046872 WO2024209754A1 (ja) 2023-04-04 2023-12-27 感放射線性樹脂組成物及びパターン形成方法

Publications (2)

Publication Number Publication Date
JPWO2024209754A1 JPWO2024209754A1 (https=) 2024-10-10
JPWO2024209754A5 true JPWO2024209754A5 (https=) 2026-01-13

Family

ID=92971649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2025512409A Pending JPWO2024209754A1 (https=) 2023-04-04 2023-12-27

Country Status (5)

Country Link
JP (1) JPWO2024209754A1 (https=)
KR (1) KR20250171280A (https=)
CN (1) CN120530363A (https=)
TW (1) TW202449511A (https=)
WO (1) WO2024209754A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025164208A1 (ja) * 2024-01-30 2025-08-07 Jsr株式会社 感放射線性組成物、レジストパターン形成方法及び化合物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5856991B2 (ja) 2012-05-21 2016-02-10 富士フイルム株式会社 化学増幅型レジスト組成物、ネガ型化学増幅型レジスト組成物、それを用いたレジスト膜、レジスト塗布マスクブランクス、フォトマスクの製造方法及びパターン形成方法、並びに、電子デバイスの製造方法
KR102611586B1 (ko) * 2018-09-14 2023-12-07 도오꾜오까고오교 가부시끼가이샤 레지스트 조성물 및 레지스트 패턴 형성 방법
EP4282886A4 (en) * 2021-01-22 2024-07-31 FUJIFILM Corporation ACTINIC RAY OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAY OR RADIATION SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, COMPOUND AND RESIN
US20240369924A1 (en) * 2021-07-30 2024-11-07 Mitsubishi Gas Chemical Company, Inc. Resist composition and resist film forming method using same
TW202346262A (zh) * 2022-05-23 2023-12-01 日商Jsr 股份有限公司 感放射線性樹脂組成物及圖案形成方法

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