JPWO2024181177A1 - - Google Patents
Info
- Publication number
- JPWO2024181177A1 JPWO2024181177A1 JP2025503778A JP2025503778A JPWO2024181177A1 JP WO2024181177 A1 JPWO2024181177 A1 JP WO2024181177A1 JP 2025503778 A JP2025503778 A JP 2025503778A JP 2025503778 A JP2025503778 A JP 2025503778A JP WO2024181177 A1 JPWO2024181177 A1 JP WO2024181177A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/22—Oxygen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Emergency Medicine (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023030551 | 2023-02-28 | ||
| PCT/JP2024/005585 WO2024181177A1 (ja) | 2023-02-28 | 2024-02-16 | 共重合体、ポジ型レジスト組成物、およびレジストパターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024181177A1 true JPWO2024181177A1 (https=) | 2024-09-06 |
Family
ID=92589746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025503778A Pending JPWO2024181177A1 (https=) | 2023-02-28 | 2024-02-16 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2024181177A1 (https=) |
| KR (1) | KR20250159151A (https=) |
| TW (1) | TW202436393A (https=) |
| WO (1) | WO2024181177A1 (https=) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4116335B2 (ja) * | 2002-06-07 | 2008-07-09 | 富士フイルム株式会社 | 感光性樹脂組成物 |
| JP4253486B2 (ja) * | 2002-09-25 | 2009-04-15 | 富士フイルム株式会社 | ポジ型又はネガ型レジスト組成物、酸発生剤及びパターン形成方法 |
| JP7215005B2 (ja) * | 2018-07-23 | 2023-01-31 | 日本ゼオン株式会社 | 重合体及びその製造方法、ポジ型レジスト組成物、並びにレジストパターン形成方法 |
| CN112368308B (zh) * | 2018-09-25 | 2023-01-13 | 日本瑞翁株式会社 | 共聚物和正型抗蚀剂组合物 |
| US20230324797A1 (en) | 2020-09-30 | 2023-10-12 | Zeon Corporation | Positive resist composition for extreme ultraviolet lithography and resist pattern formation kit for extreme ultraviolet lithography |
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2024
- 2024-02-16 JP JP2025503778A patent/JPWO2024181177A1/ja active Pending
- 2024-02-16 WO PCT/JP2024/005585 patent/WO2024181177A1/ja not_active Ceased
- 2024-02-16 KR KR1020257026684A patent/KR20250159151A/ko active Pending
- 2024-02-19 TW TW113105832A patent/TW202436393A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024181177A1 (ja) | 2024-09-06 |
| TW202436393A (zh) | 2024-09-16 |
| KR20250159151A (ko) | 2025-11-10 |