JPWO2024154612A1 - - Google Patents
Info
- Publication number
- JPWO2024154612A1 JPWO2024154612A1 JP2024571709A JP2024571709A JPWO2024154612A1 JP WO2024154612 A1 JPWO2024154612 A1 JP WO2024154612A1 JP 2024571709 A JP2024571709 A JP 2024571709A JP 2024571709 A JP2024571709 A JP 2024571709A JP WO2024154612 A1 JPWO2024154612 A1 JP WO2024154612A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
- H01J37/32165—Plural frequencies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023005664 | 2023-01-18 | ||
| PCT/JP2024/000187 WO2024154612A1 (ja) | 2023-01-18 | 2024-01-09 | プラズマ処理装置及びプラズマ処理方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024154612A1 true JPWO2024154612A1 (https=) | 2024-07-25 |
Family
ID=91955902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024571709A Pending JPWO2024154612A1 (https=) | 2023-01-18 | 2024-01-09 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250343027A1 (https=) |
| JP (1) | JPWO2024154612A1 (https=) |
| KR (1) | KR20250135221A (https=) |
| CN (1) | CN120570068A (https=) |
| TW (1) | TW202448216A (https=) |
| WO (1) | WO2024154612A1 (https=) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3122618B2 (ja) * | 1996-08-23 | 2001-01-09 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| US20050069651A1 (en) * | 2003-09-30 | 2005-03-31 | Tokyo Electron Limited | Plasma processing system |
| US20140367043A1 (en) * | 2013-06-17 | 2014-12-18 | Applied Materials, Inc. | Method for fast and repeatable plasma ignition and tuning in plasma chambers |
| JP7334102B2 (ja) | 2019-10-11 | 2023-08-28 | 株式会社ダイヘン | 高周波電源装置 |
-
2024
- 2024-01-09 JP JP2024571709A patent/JPWO2024154612A1/ja active Pending
- 2024-01-09 WO PCT/JP2024/000187 patent/WO2024154612A1/ja not_active Ceased
- 2024-01-09 CN CN202480007046.8A patent/CN120570068A/zh active Pending
- 2024-01-09 KR KR1020257026073A patent/KR20250135221A/ko active Pending
- 2024-01-10 TW TW113101047A patent/TW202448216A/zh unknown
-
2025
- 2025-07-10 US US19/265,822 patent/US20250343027A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN120570068A (zh) | 2025-08-29 |
| WO2024154612A1 (ja) | 2024-07-25 |
| TW202448216A (zh) | 2024-12-01 |
| US20250343027A1 (en) | 2025-11-06 |
| KR20250135221A (ko) | 2025-09-12 |