JPWO2024111420A1 - - Google Patents

Info

Publication number
JPWO2024111420A1
JPWO2024111420A1 JP2024560061A JP2024560061A JPWO2024111420A1 JP WO2024111420 A1 JPWO2024111420 A1 JP WO2024111420A1 JP 2024560061 A JP2024560061 A JP 2024560061A JP 2024560061 A JP2024560061 A JP 2024560061A JP WO2024111420 A1 JPWO2024111420 A1 JP WO2024111420A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024560061A
Other languages
Japanese (ja)
Other versions
JPWO2024111420A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024111420A1 publication Critical patent/JPWO2024111420A1/ja
Publication of JPWO2024111420A5 publication Critical patent/JPWO2024111420A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C08F290/144—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461—Unsaturated monoacids
    • C08G59/1466—Acrylic or methacrylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
JP2024560061A 2022-11-21 2023-11-09 Pending JPWO2024111420A1 (https=)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022185604 2022-11-21
JP2023099376 2023-06-16
PCT/JP2023/040340 WO2024111420A1 (ja) 2022-11-21 2023-11-09 アルカリ可溶性樹脂、感光性樹脂組成物、その製造方法、及び、その用途

Publications (2)

Publication Number Publication Date
JPWO2024111420A1 true JPWO2024111420A1 (https=) 2024-05-30
JPWO2024111420A5 JPWO2024111420A5 (https=) 2025-07-30

Family

ID=91195567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024560061A Pending JPWO2024111420A1 (https=) 2022-11-21 2023-11-09

Country Status (5)

Country Link
JP (1) JPWO2024111420A1 (https=)
KR (1) KR20250103750A (https=)
CN (1) CN120265675A (https=)
TW (1) TW202428680A (https=)
WO (1) WO2024111420A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026079431A1 (ja) * 2024-10-11 2026-04-16 株式会社日本触媒 樹脂、感光性樹脂組成物、及び硬化物

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000321769A (ja) * 1999-05-06 2000-11-24 Nippon Shokubai Co Ltd 感光性樹脂組成物
JP2001226449A (ja) * 1999-12-10 2001-08-21 Nippon Shokubai Co Ltd 液晶スペーサー用感光性樹脂および感光性樹脂組成物
JP2008250306A (ja) * 2007-03-05 2008-10-16 Nippon Shokubai Co Ltd 画像形成用感光性樹脂組成物及びその製造方法
JP2019032512A (ja) * 2017-08-07 2019-02-28 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色感光性樹脂組成物、これを含むカラーフィルタおよびこれを含む表示装置
JP2024036282A (ja) * 2022-09-05 2024-03-15 株式会社日本触媒 アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置
JP2024180378A (ja) * 2023-06-16 2024-12-26 株式会社日本触媒 樹脂、硬化性樹脂組成物、感光性樹脂組成物、及び硬化物
JP2025134399A (ja) * 2024-03-04 2025-09-17 株式会社日本触媒 変性樹脂の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3810896B2 (ja) 1997-08-05 2006-08-16 株式会社日本触媒 硬化性樹脂および樹脂組成物
JP3541136B2 (ja) 1997-12-19 2004-07-07 太陽インキ製造株式会社 アルカリ現像可能な光硬化性・熱硬化性組成物及びそれから得られる硬化皮膜

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000321769A (ja) * 1999-05-06 2000-11-24 Nippon Shokubai Co Ltd 感光性樹脂組成物
JP2001226449A (ja) * 1999-12-10 2001-08-21 Nippon Shokubai Co Ltd 液晶スペーサー用感光性樹脂および感光性樹脂組成物
JP2008250306A (ja) * 2007-03-05 2008-10-16 Nippon Shokubai Co Ltd 画像形成用感光性樹脂組成物及びその製造方法
JP2019032512A (ja) * 2017-08-07 2019-02-28 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色感光性樹脂組成物、これを含むカラーフィルタおよびこれを含む表示装置
JP2024036282A (ja) * 2022-09-05 2024-03-15 株式会社日本触媒 アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置
JP2024180378A (ja) * 2023-06-16 2024-12-26 株式会社日本触媒 樹脂、硬化性樹脂組成物、感光性樹脂組成物、及び硬化物
JP2025134399A (ja) * 2024-03-04 2025-09-17 株式会社日本触媒 変性樹脂の製造方法

Also Published As

Publication number Publication date
WO2024111420A1 (ja) 2024-05-30
KR20250103750A (ko) 2025-07-07
TW202428680A (zh) 2024-07-16
CN120265675A (zh) 2025-07-04

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