JPWO2024105497A1 - - Google Patents

Info

Publication number
JPWO2024105497A1
JPWO2024105497A1 JP2024558476A JP2024558476A JPWO2024105497A1 JP WO2024105497 A1 JPWO2024105497 A1 JP WO2024105497A1 JP 2024558476 A JP2024558476 A JP 2024558476A JP 2024558476 A JP2024558476 A JP 2024558476A JP WO2024105497 A1 JPWO2024105497 A1 JP WO2024105497A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024558476A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024105497A1 publication Critical patent/JPWO2024105497A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/70Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates the floating gate being an electrode shared by two or more components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/63Vertical IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
JP2024558476A 2022-11-15 2023-11-08 Pending JPWO2024105497A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022182247 2022-11-15
PCT/IB2023/061251 WO2024105497A1 (ja) 2022-11-15 2023-11-08 記憶装置

Publications (1)

Publication Number Publication Date
JPWO2024105497A1 true JPWO2024105497A1 (https=) 2024-05-23

Family

ID=91083955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024558476A Pending JPWO2024105497A1 (https=) 2022-11-15 2023-11-08

Country Status (4)

Country Link
JP (1) JPWO2024105497A1 (https=)
KR (1) KR20250109700A (https=)
CN (1) CN120167134A (https=)
WO (1) WO2024105497A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101870119B1 (ko) 2009-12-25 2018-06-25 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
US9312257B2 (en) 2012-02-29 2016-04-12 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
TWI685113B (zh) * 2015-02-11 2020-02-11 日商半導體能源研究所股份有限公司 半導體裝置及其製造方法
WO2018203181A1 (ja) * 2017-05-01 2018-11-08 株式会社半導体エネルギー研究所 半導体装置
US11183594B2 (en) * 2018-03-28 2021-11-23 Intel Corporation Dual gate control for trench shaped thin film transistors
CN114424339A (zh) 2019-09-20 2022-04-29 株式会社半导体能源研究所 半导体装置及半导体装置的制造方法

Also Published As

Publication number Publication date
CN120167134A (zh) 2025-06-17
WO2024105497A1 (ja) 2024-05-23
KR20250109700A (ko) 2025-07-17

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