JPWO2023282136A1 - - Google Patents
Info
- Publication number
- JPWO2023282136A1 JPWO2023282136A1 JP2023533556A JP2023533556A JPWO2023282136A1 JP WO2023282136 A1 JPWO2023282136 A1 JP WO2023282136A1 JP 2023533556 A JP2023533556 A JP 2023533556A JP 2023533556 A JP2023533556 A JP 2023533556A JP WO2023282136 A1 JPWO2023282136 A1 JP WO2023282136A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D7/00—Sublimation
- B01D7/02—Crystallisation directly from the vapour phase
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021111718 | 2021-07-05 | ||
PCT/JP2022/025890 WO2023282136A1 (ja) | 2021-07-05 | 2022-06-29 | 一酸化珪素の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2023282136A1 true JPWO2023282136A1 (ja) | 2023-01-12 |
Family
ID=84801613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023533556A Pending JPWO2023282136A1 (ja) | 2021-07-05 | 2022-06-29 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP4368572A1 (ja) |
JP (1) | JPWO2023282136A1 (ja) |
KR (1) | KR20240031296A (ja) |
CN (1) | CN117597307A (ja) |
TW (1) | TW202319343A (ja) |
WO (1) | WO2023282136A1 (ja) |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60215514A (ja) | 1984-04-10 | 1985-10-28 | Toyota Motor Corp | 一酸化珪素の製造方法 |
JPS61178408A (ja) | 1985-02-02 | 1986-08-11 | Toyota Motor Corp | 窒化ケイ素粉末の製造方法 |
JPH0761855B2 (ja) | 1989-11-29 | 1995-07-05 | トヨタ自動車株式会社 | 二酸化珪素粉末の製造方法 |
JPH0677629B2 (ja) | 1990-07-20 | 1994-10-05 | 株式会社エース電研 | 遊技機島 |
JP3108468B2 (ja) | 1990-08-16 | 2000-11-13 | 株式会社東芝 | 表示装置 |
JP2868039B2 (ja) * | 1992-01-31 | 1999-03-10 | 日亜化学工業株式会社 | 低級金属酸化物の製造方法 |
JP2997741B2 (ja) | 1992-07-29 | 2000-01-11 | セイコーインスツルメンツ株式会社 | 非水電解質二次電池及びその製造方法 |
JP3824047B2 (ja) | 2000-02-04 | 2006-09-20 | 信越化学工業株式会社 | 非晶質酸化珪素粉末の製造方法 |
JP3952118B2 (ja) | 2000-02-04 | 2007-08-01 | 信越化学工業株式会社 | 活性なケイ素を含むケイ素酸化物及びその評価方法 |
JP3865033B2 (ja) | 2000-02-04 | 2007-01-10 | 信越化学工業株式会社 | 酸化珪素粉末の連続製造方法及び連続製造装置 |
JP4752992B2 (ja) | 2001-06-15 | 2011-08-17 | 信越化学工業株式会社 | 非水電解質二次電池用負極材 |
JP2003221218A (ja) | 2002-01-30 | 2003-08-05 | Admatechs Co Ltd | 鉄系酸化物微粒子を含有した真球状シリカ粒子及びその製造方法 |
JP5362614B2 (ja) * | 2010-02-16 | 2013-12-11 | 日清エンジニアリング株式会社 | 一酸化珪素微粒子の製造方法および一酸化珪素微粒子 |
CN109244420B (zh) | 2013-05-23 | 2021-09-24 | 信越化学工业株式会社 | 非水电解质二次电池用负极材料和二次电池 |
JP6281306B2 (ja) | 2014-02-06 | 2018-02-21 | 信越化学工業株式会社 | リチウムイオン二次電池用負極材、その製造方法、負極及びリチウムイオン二次電池 |
-
2022
- 2022-06-29 WO PCT/JP2022/025890 patent/WO2023282136A1/ja active Application Filing
- 2022-06-29 KR KR1020247000035A patent/KR20240031296A/ko unknown
- 2022-06-29 JP JP2023533556A patent/JPWO2023282136A1/ja active Pending
- 2022-06-29 CN CN202280046915.9A patent/CN117597307A/zh active Pending
- 2022-06-29 EP EP22837552.3A patent/EP4368572A1/en active Pending
- 2022-06-30 TW TW111124492A patent/TW202319343A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
TW202319343A (zh) | 2023-05-16 |
EP4368572A1 (en) | 2024-05-15 |
KR20240031296A (ko) | 2024-03-07 |
CN117597307A (zh) | 2024-02-23 |
WO2023282136A1 (ja) | 2023-01-12 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231227 |