JPWO2023157526A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2023157526A5
JPWO2023157526A5 JP2024501024A JP2024501024A JPWO2023157526A5 JP WO2023157526 A5 JPWO2023157526 A5 JP WO2023157526A5 JP 2024501024 A JP2024501024 A JP 2024501024A JP 2024501024 A JP2024501024 A JP 2024501024A JP WO2023157526 A5 JPWO2023157526 A5 JP WO2023157526A5
Authority
JP
Japan
Prior art keywords
integer
group
different
same
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024501024A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2023157526A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2023/000984 external-priority patent/WO2023157526A1/ja
Publication of JPWO2023157526A1 publication Critical patent/JPWO2023157526A1/ja
Publication of JPWO2023157526A5 publication Critical patent/JPWO2023157526A5/ja
Pending legal-status Critical Current

Links

JP2024501024A 2022-02-21 2023-01-16 Pending JPWO2023157526A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022025148 2022-02-21
PCT/JP2023/000984 WO2023157526A1 (ja) 2022-02-21 2023-01-16 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、化合物、及び樹脂

Publications (2)

Publication Number Publication Date
JPWO2023157526A1 JPWO2023157526A1 (https=) 2023-08-24
JPWO2023157526A5 true JPWO2023157526A5 (https=) 2024-10-25

Family

ID=87578101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024501024A Pending JPWO2023157526A1 (https=) 2022-02-21 2023-01-16

Country Status (5)

Country Link
US (1) US20240419071A1 (https=)
JP (1) JPWO2023157526A1 (https=)
KR (1) KR102946530B1 (https=)
TW (1) TW202334752A (https=)
WO (1) WO2023157526A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250076758A1 (en) * 2023-08-31 2025-03-06 Taiwan Semiconductor Manufacturing Company, Ltd. Photo acid generator
JP2025066061A (ja) * 2023-10-10 2025-04-22 信越化学工業株式会社 レジスト材料及びパターン形成方法
WO2025182650A1 (ja) * 2024-02-28 2025-09-04 Jsr株式会社 感放射線性組成物及びパターン形成方法
WO2026079112A1 (ja) * 2024-10-11 2026-04-16 Jsr株式会社 感放射線性組成物、パターン形成方法、化合物、化合物の製造方法及び重合体

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60179406A (ja) * 1984-02-24 1985-09-13 Sumitomo Chem Co Ltd 高屈折率レンズ用樹脂
US7019453B2 (en) 2000-08-17 2006-03-28 Lumera Corporation Polymers having pendant nonlinear optical chromophores and electro-optic devices therefrom
JP5172099B2 (ja) 2006-03-07 2013-03-27 富士フイルム株式会社 平版印刷版原版および平版印刷方法
JP4902292B2 (ja) 2006-08-11 2012-03-21 富士フイルム株式会社 光硬化性着色組成物及びそれを用いたカラーフィルタ
JP4846484B2 (ja) 2006-08-11 2011-12-28 富士フイルム株式会社 光硬化性着色組成物及びそれを用いたカラーフィルタ
JP5081560B2 (ja) * 2007-09-28 2012-11-28 富士フイルム株式会社 ポジ型レジスト組成物およびこれを用いたパターン形成方法
JP2009155372A (ja) 2007-12-25 2009-07-16 Konica Minolta Medical & Graphic Inc 有機高分子材料、有機複合材料、有機圧電材料、有機圧電膜、超音波振動子、超音波探触子、及び超音波医用画像診断装置
TWI797243B (zh) * 2018-02-09 2023-04-01 日商富士軟片股份有限公司 試劑盒、壓印用下層膜形成組成物、積層體、使用該等之製造方法
EP3974047A4 (en) 2019-05-22 2023-06-07 Tokyo Ohka Kogyo Co., Ltd. METHOD OF MANUFACTURE OF PURIFIED RESIST COMPOSITION PRODUCT, RESIST SAMPLE MANUFACTURING METHOD AND PURIFIED RESIST COMPOSITION PRODUCT

Similar Documents

Publication Publication Date Title
JPWO2023157526A5 (https=)
EP2341089B1 (en) Photosensitive compositions
KR100753350B1 (ko) 요오도늄 염 및 광개시제로서의 이의 용도
KR100754230B1 (ko) 방사선 민감성 공중합체, 이의 포토레지스트 조성물 및이의 심 자외선 이층 시스템
JP2008268931A5 (https=)
KR20120124392A (ko) 감광성 조성물, 격벽, 컬러 필터 및 유기 el 소자
KR101414535B1 (ko) 포지티브형 감광성 조성물 및 그것을 이용한 패턴 형성 방법
KR20090009655A (ko) 아세탈기를 가지는 산 증폭제 및 이를 포함하는포토레지스트 조성물
KR20250012644A (ko) 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법, 및 전자 디바이스의 제조 방법
JP2004038142A (ja) ポリシロキサンを製造する方法及びそれを含むフォトレジスト組成物
JP2619358B2 (ja) 感光性樹脂組成物
JPWO2022220201A5 (https=)
CN103858056A (zh) 正型感光性树脂组合物、硬化物的制造方法、树脂图案制造方法、硬化物及光学构件
KR20080029848A (ko) 실세스퀴옥산계 화합물 혼합물 및 가수분해성 실란 화합물,그의 제조 방법 및 그것을 이용한 레지스트 조성물, 및패턴 형성 방법 및 기판의 가공 방법
KR20120124397A (ko) 감광성 조성물, 격벽, 컬러 필터 및 유기 el 소자
JP2011209694A5 (https=)
EP0392236B1 (en) Process for forming a fine pattern
JPWO2022172597A5 (https=)
JP5159144B2 (ja) 半導体素子の製造方法
JP2014153411A (ja) 感光性樹脂組成物及びその硬化物
TW202337927A (zh) 硬化性樹脂組成物、樹脂硬化膜、半導體封裝及顯示裝置
JPWO2023162565A5 (https=)
TWI273349B (en) A low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
CN114063389A (zh) 图案化材料和图案化薄膜
KR102448080B1 (ko) 신규 화합물 및 이를 포함하는 극자외선용 포토레지스트 조성물