JPWO2023047663A1 - - Google Patents

Info

Publication number
JPWO2023047663A1
JPWO2023047663A1 JP2023549354A JP2023549354A JPWO2023047663A1 JP WO2023047663 A1 JPWO2023047663 A1 JP WO2023047663A1 JP 2023549354 A JP2023549354 A JP 2023549354A JP 2023549354 A JP2023549354 A JP 2023549354A JP WO2023047663 A1 JPWO2023047663 A1 JP WO2023047663A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023549354A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023047663A1 publication Critical patent/JPWO2023047663A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/805Coatings
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/806Optical elements or arrangements associated with the image sensors
    • H10F39/8063Microlenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
JP2023549354A 2021-09-27 2022-03-24 Pending JPWO2023047663A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021157295 2021-09-27
PCT/JP2022/014049 WO2023047663A1 (ja) 2021-09-27 2022-03-24 受光素子および電子機器

Publications (1)

Publication Number Publication Date
JPWO2023047663A1 true JPWO2023047663A1 (https=) 2023-03-30

Family

ID=85720388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023549354A Pending JPWO2023047663A1 (https=) 2021-09-27 2022-03-24

Country Status (5)

Country Link
US (1) US20250133848A1 (https=)
JP (1) JPWO2023047663A1 (https=)
CN (1) CN117795689A (https=)
TW (1) TW202315149A (https=)
WO (1) WO2023047663A1 (https=)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000068491A (ja) * 1998-08-24 2000-03-03 Nikon Corp 撮像素子、撮像素子の製造方法および露光装置
JP2001068658A (ja) * 1999-08-27 2001-03-16 Sony Corp 固体撮像装置及びその製造方法
WO2006028128A1 (ja) * 2004-09-09 2006-03-16 Matsushita Electric Industrial Co., Ltd. 固体撮像素子
JP2008306160A (ja) * 2007-05-07 2008-12-18 Sony Corp 固体撮像装置とその製造方法および撮像装置
US20120038015A1 (en) * 2010-08-13 2012-02-16 Taiwan Semiconductor Manufacturing Company, Ltd. Antireflective layer for backside illuminated image sensor and method of manufacturing same
WO2019220897A1 (ja) * 2018-05-18 2019-11-21 ソニーセミコンダクタソリューションズ株式会社 撮像素子および電子機器並びに撮像素子の駆動方法
WO2019230354A1 (ja) * 2018-05-31 2019-12-05 ソニー株式会社 光電変換素子および光電変換素子の製造方法
JP2021132086A (ja) * 2020-02-19 2021-09-09 ソニーセミコンダクタソリューションズ株式会社 撮像装置及び電子機器

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000068491A (ja) * 1998-08-24 2000-03-03 Nikon Corp 撮像素子、撮像素子の製造方法および露光装置
JP2001068658A (ja) * 1999-08-27 2001-03-16 Sony Corp 固体撮像装置及びその製造方法
WO2006028128A1 (ja) * 2004-09-09 2006-03-16 Matsushita Electric Industrial Co., Ltd. 固体撮像素子
JP2008306160A (ja) * 2007-05-07 2008-12-18 Sony Corp 固体撮像装置とその製造方法および撮像装置
US20120038015A1 (en) * 2010-08-13 2012-02-16 Taiwan Semiconductor Manufacturing Company, Ltd. Antireflective layer for backside illuminated image sensor and method of manufacturing same
WO2019220897A1 (ja) * 2018-05-18 2019-11-21 ソニーセミコンダクタソリューションズ株式会社 撮像素子および電子機器並びに撮像素子の駆動方法
WO2019230354A1 (ja) * 2018-05-31 2019-12-05 ソニー株式会社 光電変換素子および光電変換素子の製造方法
JP2021132086A (ja) * 2020-02-19 2021-09-09 ソニーセミコンダクタソリューションズ株式会社 撮像装置及び電子機器

Also Published As

Publication number Publication date
WO2023047663A1 (ja) 2023-03-30
US20250133848A1 (en) 2025-04-24
CN117795689A (zh) 2024-03-29
TW202315149A (zh) 2023-04-01

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