JPWO2023042736A5 - - Google Patents

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Publication number
JPWO2023042736A5
JPWO2023042736A5 JP2023548436A JP2023548436A JPWO2023042736A5 JP WO2023042736 A5 JPWO2023042736 A5 JP WO2023042736A5 JP 2023548436 A JP2023548436 A JP 2023548436A JP 2023548436 A JP2023548436 A JP 2023548436A JP WO2023042736 A5 JPWO2023042736 A5 JP WO2023042736A5
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JP
Japan
Prior art keywords
manufacturing
substrate
sublimation
steps
film
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Pending
Application number
JP2023548436A
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English (en)
Japanese (ja)
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JPWO2023042736A1 (https=
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Priority claimed from PCT/JP2022/033662 external-priority patent/WO2023042736A1/ja
Publication of JPWO2023042736A1 publication Critical patent/JPWO2023042736A1/ja
Publication of JPWO2023042736A5 publication Critical patent/JPWO2023042736A5/ja
Pending legal-status Critical Current

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JP2023548436A 2021-09-15 2022-09-08 Pending JPWO2023042736A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021150186 2021-09-15
PCT/JP2022/033662 WO2023042736A1 (ja) 2021-09-15 2022-09-08 基板の製造方法および昇華乾燥方法

Publications (2)

Publication Number Publication Date
JPWO2023042736A1 JPWO2023042736A1 (https=) 2023-03-23
JPWO2023042736A5 true JPWO2023042736A5 (https=) 2024-06-05

Family

ID=85602156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023548436A Pending JPWO2023042736A1 (https=) 2021-09-15 2022-09-08

Country Status (7)

Country Link
US (1) US20240371627A1 (https=)
EP (1) EP4404243A4 (https=)
JP (1) JPWO2023042736A1 (https=)
KR (1) KR20240067920A (https=)
IL (1) IL311467A (https=)
TW (1) TW202332994A (https=)
WO (1) WO2023042736A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025125474A (ja) * 2024-02-15 2025-08-27 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法、基板処理装置及び基板処理液

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5681560B2 (ja) 2011-05-17 2015-03-11 東京エレクトロン株式会社 基板乾燥方法及び基板処理装置
JP6022829B2 (ja) * 2012-07-03 2016-11-09 株式会社Ｓｃｒｅｅｎホールディングス 基板乾燥方法および基板乾燥装置
JP7265879B2 (ja) * 2019-02-14 2023-04-27 株式会社Ｓｃｒｅｅｎホールディングス 基板乾燥方法および基板処理装置
WO2020189688A1 (ja) * 2019-03-19 2020-09-24 セントラル硝子株式会社 凹凸パターン乾燥用組成物、及び表面に凹凸パターンを有する基板の製造方法
JP2021150186A (ja) 2020-03-19 2021-09-27 東芝ライテック株式会社 推定装置、推定システム、推定方法および推定プログラム

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