JPWO2023037941A5 - - Google Patents

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Publication number
JPWO2023037941A5
JPWO2023037941A5 JP2023546901A JP2023546901A JPWO2023037941A5 JP WO2023037941 A5 JPWO2023037941 A5 JP WO2023037941A5 JP 2023546901 A JP2023546901 A JP 2023546901A JP 2023546901 A JP2023546901 A JP 2023546901A JP WO2023037941 A5 JPWO2023037941 A5 JP WO2023037941A5
Authority
JP
Japan
Prior art keywords
curable composition
meth
energy ray
acryloxy
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023546901A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2023037941A1 (https=
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/JP2022/032782 external-priority patent/WO2023037941A1/ja
Publication of JPWO2023037941A1 publication Critical patent/JPWO2023037941A1/ja
Publication of JPWO2023037941A5 publication Critical patent/JPWO2023037941A5/ja
Pending legal-status Critical Current

Links

JP2023546901A 2021-09-10 2022-08-31 Pending JPWO2023037941A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021147622 2021-09-10
PCT/JP2022/032782 WO2023037941A1 (ja) 2021-09-10 2022-08-31 高エネルギー線硬化性組成物およびその用途

Publications (2)

Publication Number Publication Date
JPWO2023037941A1 JPWO2023037941A1 (https=) 2023-03-16
JPWO2023037941A5 true JPWO2023037941A5 (https=) 2025-08-13

Family

ID=85506324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023546901A Pending JPWO2023037941A1 (https=) 2021-09-10 2022-08-31

Country Status (2)

Country Link
JP (1) JPWO2023037941A1 (https=)
WO (1) WO2023037941A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5000112B2 (ja) * 2005-09-09 2012-08-15 東京応化工業株式会社 ナノインプリントリソグラフィによるパターン形成方法
WO2011049078A1 (ja) * 2009-10-22 2011-04-28 日産化学工業株式会社 ケイ素化合物を用いる膜形成組成物
JP2013138179A (ja) * 2011-11-30 2013-07-11 Central Glass Co Ltd 光重合性組成物並びにそれを用いたパターン形成方法
JP7175092B2 (ja) * 2018-03-16 2022-11-18 東京応化工業株式会社 光硬化性組成物及びパターン形成方法
JP2019183137A (ja) * 2018-03-30 2019-10-24 三菱ケミカル株式会社 無機酸化物粒子又はシロキサン化合物を含む重合性組成物、該重合性組成物を用いた層の製造方法及び無機酸化物粒子又はシロキサン化合物を含む層

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