JPWO2023022215A1 - - Google Patents

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Publication number
JPWO2023022215A1
JPWO2023022215A1 JP2023542450A JP2023542450A JPWO2023022215A1 JP WO2023022215 A1 JPWO2023022215 A1 JP WO2023022215A1 JP 2023542450 A JP2023542450 A JP 2023542450A JP 2023542450 A JP2023542450 A JP 2023542450A JP WO2023022215 A1 JPWO2023022215 A1 JP WO2023022215A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023542450A
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Japanese (ja)
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JP7557633B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed filed Critical
Publication of JPWO2023022215A1 publication Critical patent/JPWO2023022215A1/ja
Application granted granted Critical
Publication of JP7557633B2 publication Critical patent/JP7557633B2/ja
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/04—Physical treatment, e.g. grinding or treatment with ultrasonic vibrations
    • C09C3/043—Drying, calcination
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/88—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by thermal analysis data, e.g. TGA, DTA, DSC
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C01P2006/13—Surface area thermal stability thereof at high temperatures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/32—Thermal properties
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • C01P2006/82—Compositional purity water content

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2023542450A 2021-08-20 2022-08-19 球状結晶質シリカ粉末及びその製造方法 Active JP7557633B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021134709 2021-08-20
JP2021134709 2021-08-20
PCT/JP2022/031305 WO2023022215A1 (ja) 2021-08-20 2022-08-19 球状結晶質シリカ粉末及びその製造方法

Publications (2)

Publication Number Publication Date
JPWO2023022215A1 true JPWO2023022215A1 (https=) 2023-02-23
JP7557633B2 JP7557633B2 (ja) 2024-09-27

Family

ID=85239868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023542450A Active JP7557633B2 (ja) 2021-08-20 2022-08-19 球状結晶質シリカ粉末及びその製造方法

Country Status (7)

Country Link
US (1) US20240351893A1 (https=)
EP (1) EP4389704A4 (https=)
JP (1) JP7557633B2 (https=)
KR (1) KR20240043154A (https=)
CN (1) CN117794860A (https=)
TW (1) TWI870689B (https=)
WO (1) WO2023022215A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118760268B (zh) * 2024-07-29 2025-02-11 江苏晶辉新材料科技有限公司 一种石英砂生产用酸洗反应釜温度控制系统

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498638B1 (https=) * 1967-03-23 1974-02-27
JPH04238808A (ja) * 1990-12-28 1992-08-26 Nippon Steel Chem Co Ltd 高純度結晶質シリカの製造方法
JP2005231973A (ja) * 2004-02-23 2005-09-02 Sumitomo Chemical Co Ltd シリカ粒子およびその製造方法
WO2018186308A1 (ja) * 2017-04-05 2018-10-11 新日鉄住金マテリアルズ株式会社 球状結晶性シリカ粒子およびその製造方法
WO2020195205A1 (ja) * 2019-03-26 2020-10-01 デンカ株式会社 球状シリカ粉末
JP2021178770A (ja) * 2020-04-24 2021-11-18 デンカ株式会社 球状シリカ粉末

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0222119A (ja) * 1988-07-11 1990-01-25 Tokuyama Soda Co Ltd 結晶性ケイ素酸化物及びその製造方法
JP2545293B2 (ja) * 1990-05-17 1996-10-16 日東化学工業株式会社 オパール状物質の製造方法
CN1035608C (zh) * 1992-01-21 1997-08-13 亓飞 无羟基透明石英玻璃的连续电熔法
JPH08259214A (ja) * 1995-03-16 1996-10-08 Shunsuke Yamane 金属酸化物を添加した二酸化ケイ素からの石英の生成法
JP3875780B2 (ja) * 1997-10-29 2007-01-31 三菱化学株式会社 高純度粉体の製造方法
KR100720016B1 (ko) * 1999-12-28 2007-05-18 가부시키가이샤 와타나베 쇼코 실리카 입자, 합성 석영 가루 및 합성 석영 유리의 합성방법
SG11201701501XA (en) 2014-08-25 2017-03-30 Nippon Steel & Sumikin Mat Co Spherical crystalline silica particles and method for producing same
CN106268037A (zh) * 2016-09-06 2017-01-04 安徽丰磊制冷工程有限公司 一种耐高温的熔喷聚丙烯复合驻极体空气过滤材料及其制备方法
KR102644020B1 (ko) * 2019-05-31 2024-03-07 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 구상 결정성 실리카 입자, 구상 실리카 입자 혼합물 및 컴포지트 재료
CN111470767B (zh) * 2020-05-08 2022-07-05 江苏永鼎光纤科技有限公司 管外法沉积工艺中固废石英粉末的回收及再利用方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498638B1 (https=) * 1967-03-23 1974-02-27
JPH04238808A (ja) * 1990-12-28 1992-08-26 Nippon Steel Chem Co Ltd 高純度結晶質シリカの製造方法
JP2005231973A (ja) * 2004-02-23 2005-09-02 Sumitomo Chemical Co Ltd シリカ粒子およびその製造方法
WO2018186308A1 (ja) * 2017-04-05 2018-10-11 新日鉄住金マテリアルズ株式会社 球状結晶性シリカ粒子およびその製造方法
WO2020195205A1 (ja) * 2019-03-26 2020-10-01 デンカ株式会社 球状シリカ粉末
JP2021178770A (ja) * 2020-04-24 2021-11-18 デンカ株式会社 球状シリカ粉末

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
OKABAYASHI, M. ET AL., CHEMISTRY LETTERS, vol. 34, JPN6022044487, 11 December 2004 (2004-12-11), pages 58 - 59, ISSN: 0005413362 *

Also Published As

Publication number Publication date
EP4389704A1 (en) 2024-06-26
US20240351893A1 (en) 2024-10-24
TW202317474A (zh) 2023-05-01
KR20240043154A (ko) 2024-04-02
JP7557633B2 (ja) 2024-09-27
EP4389704A4 (en) 2025-07-02
CN117794860A (zh) 2024-03-29
WO2023022215A1 (ja) 2023-02-23
TWI870689B (zh) 2025-01-21

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