JPWO2023013549A1 - - Google Patents

Info

Publication number
JPWO2023013549A1
JPWO2023013549A1 JP2022552772A JP2022552772A JPWO2023013549A1 JP WO2023013549 A1 JPWO2023013549 A1 JP WO2023013549A1 JP 2022552772 A JP2022552772 A JP 2022552772A JP 2022552772 A JP2022552772 A JP 2022552772A JP WO2023013549 A1 JPWO2023013549 A1 JP WO2023013549A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022552772A
Other versions
JPWO2023013549A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2023013549A1 publication Critical patent/JPWO2023013549A1/ja
Publication of JPWO2023013549A5 publication Critical patent/JPWO2023013549A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/78—Ring systems having three or more relevant rings
    • C07D311/80—Dibenzopyrans; Hydrogenated dibenzopyrans
    • C07D311/82—Xanthenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • C08K5/18—Amines; Quaternary ammonium compounds with aromatically bound amino groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/12—Compositions of unspecified macromolecular compounds characterised by physical features, e.g. anisotropy, viscosity or electrical conductivity
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/28—Pyronines ; Xanthon, thioxanthon, selenoxanthan, telluroxanthon dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
JP2022552772A 2021-08-06 2022-07-29 Pending JPWO2023013549A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021129709 2021-08-06
JP2022024575 2022-02-21
PCT/JP2022/029310 WO2023013549A1 (ja) 2021-08-06 2022-07-29 キサンテン化合物、樹脂組成物、硬化物、硬化物の製造方法、有機ｅｌ表示装置および表示装置

Publications (2)

Publication Number Publication Date
JPWO2023013549A1 true JPWO2023013549A1 (ja) 2023-02-09
JPWO2023013549A5 JPWO2023013549A5 (ja) 2024-03-14

Family

ID=85154753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022552772A Pending JPWO2023013549A1 (ja) 2021-08-06 2022-07-29

Country Status (4)

Country Link
JP (1) JPWO2023013549A1 (ja)
KR (1) KR20240044383A (ja)
TW (1) TW202319381A (ja)
WO (1) WO2023013549A1 (ja)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4416971A (en) * 1982-12-28 1983-11-22 Polaroid Corporation Novel xanthene compounds and their photographic use
JPS61137876A (ja) * 1984-12-07 1986-06-25 Hodogaya Chem Co Ltd キサンテン化合物、キサンテン化合物の製造方法及びキサンテン化合物を含有する画像形成組成物
JPH06230215A (ja) 1993-02-05 1994-08-19 Sumitomo Chem Co Ltd ブラックマトリックス用ポジ型レジスト組成物
JP2001288389A (ja) * 2000-04-06 2001-10-16 Fuji Photo Film Co Ltd インクジェット用インクおよびインクジェット記録方法
JP2003119381A (ja) 2001-10-17 2003-04-23 Hitachi Cable Ltd 黒色ポリイミド組成物及びブラックマトリックス
JP6009246B2 (ja) 2012-07-02 2016-10-19 中外化成株式会社 キサンテン色素およびその製造方法
JP6251067B2 (ja) * 2014-01-31 2017-12-20 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタの製造方法、カラーフィルタ、固体撮像素子および画像表示装置
SG11201707976RA (en) 2015-04-01 2017-10-30 Toray Industries Photosensitive colored resin composition
JP2020111627A (ja) 2019-01-08 2020-07-27 日本化薬株式会社 着色樹脂組成物
WO2022138710A1 (ja) * 2020-12-25 2022-06-30 富士フイルム株式会社 平版印刷版原版、平版印刷版の製造方法、印刷方法、アルミニウム支持体の製造方法

Also Published As

Publication number Publication date
TW202319381A (zh) 2023-05-16
KR20240044383A (ko) 2024-04-04
WO2023013549A1 (ja) 2023-02-09

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