JPWO2022196533A1 - - Google Patents

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Publication number
JPWO2022196533A1
JPWO2022196533A1 JP2023507051A JP2023507051A JPWO2022196533A1 JP WO2022196533 A1 JPWO2022196533 A1 JP WO2022196533A1 JP 2023507051 A JP2023507051 A JP 2023507051A JP 2023507051 A JP2023507051 A JP 2023507051A JP WO2022196533 A1 JPWO2022196533 A1 JP WO2022196533A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2023507051A
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Japanese (ja)
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JPWO2022196533A5 (enExample
JP7496979B2 (ja
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Publication of JP7496979B2 publication Critical patent/JP7496979B2/ja
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/60—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrostatic variables, e.g. electrographic flaw testing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
JP2023507051A 2021-03-13 2022-03-10 ゼータ電位測定方法及び測定装置 Active JP7496979B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021040878 2021-03-13
JP2021040878 2021-03-13
PCT/JP2022/010701 WO2022196533A1 (ja) 2021-03-13 2022-03-10 ゼータ電位測定方法及び測定装置

Publications (3)

Publication Number Publication Date
JPWO2022196533A1 true JPWO2022196533A1 (enExample) 2022-09-22
JPWO2022196533A5 JPWO2022196533A5 (enExample) 2023-10-24
JP7496979B2 JP7496979B2 (ja) 2024-06-10

Family

ID=83320638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023507051A Active JP7496979B2 (ja) 2021-03-13 2022-03-10 ゼータ電位測定方法及び測定装置

Country Status (4)

Country Link
US (1) US12313590B2 (enExample)
JP (1) JP7496979B2 (enExample)
CN (1) CN116964443B (enExample)
WO (1) WO2022196533A1 (enExample)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818157A (ja) * 1981-07-24 1983-02-02 Shimadzu Corp ゼ−タ電位測定装置
WO1988003265A1 (en) * 1986-10-28 1988-05-05 Mta Kutatási Eszközöket Kivitelezo^" Vállalat Process for measuring and determining zeta-potential in a laminarly flowing medium for practical purposes
JPH07198655A (ja) * 1993-12-28 1995-08-01 Shimadzu Corp 流動電位測定装置
JPH07286984A (ja) * 1994-04-20 1995-10-31 Nippon Paper Ind Co Ltd ゼータ電位測定方法及びパルプスラリーの調製方法
JPH0968514A (ja) * 1995-08-31 1997-03-11 Shimadzu Corp 流動電位測定装置
JPH09257739A (ja) * 1996-03-19 1997-10-03 Shimadzu Corp ゼータ電位測定方法および装置
JPH1038835A (ja) * 1996-07-18 1998-02-13 Shimadzu Corp ゼータ電位測定方法および装置
JP2000019144A (ja) * 1998-06-30 2000-01-21 Shimadzu Corp ゼータ電位測定方法および測定装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08101158A (ja) 1994-09-30 1996-04-16 Shimadzu Corp 流動電位測定法
JP3376721B2 (ja) 1994-10-31 2003-02-10 株式会社島津製作所 流動電位測定法
JP3367234B2 (ja) 1994-11-11 2003-01-14 株式会社島津製作所 流動電位測定法
JP2957509B2 (ja) * 1997-03-07 1999-10-04 新潟日本電気株式会社 インクジェット記録装置
US6991863B2 (en) * 2000-09-04 2006-01-31 Zeon Corporation Magnetic disk substrate and magnetic disk
CN1808149B (zh) * 2006-02-24 2010-12-22 国家海洋局杭州水处理技术研究开发中心 平流式膜表面电位测定仪
JP6377527B2 (ja) * 2011-12-01 2018-08-22 バロフォールド，インコーポレイテッド 高圧タンパク質リフォールディングのための方法およびシステム
GB2501530A (en) * 2012-04-29 2013-10-30 Univ Sheffield Rheometer and rheometric method
CN103954657A (zh) * 2013-06-24 2014-07-30 浙江赛特膜技术有限公司 流动电位和ZeTa电位测定方法及测定仪器
WO2015033090A1 (en) * 2013-09-03 2015-03-12 Izon Science Limited Measurement of particle charge
AT515744B1 (de) * 2014-05-13 2016-08-15 Anton Paar Gmbh Verfahren und Vorrichtung zum Ermitteln des Zetapotenzials zum Charakterisieren einer Fest-Flüssig-Phasengrenze mit gesteuerter Druckprofilbeaufschlagung
US10493172B2 (en) * 2016-06-02 2019-12-03 California Institute Of Technology Gas-filled structures and related compositions, methods and systems to image a target site
CN109507264B (zh) * 2018-11-14 2022-11-01 南京工业大学 膜表面Zeta电位自动检测仪

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818157A (ja) * 1981-07-24 1983-02-02 Shimadzu Corp ゼ−タ電位測定装置
WO1988003265A1 (en) * 1986-10-28 1988-05-05 Mta Kutatási Eszközöket Kivitelezo^" Vállalat Process for measuring and determining zeta-potential in a laminarly flowing medium for practical purposes
JPH07198655A (ja) * 1993-12-28 1995-08-01 Shimadzu Corp 流動電位測定装置
JPH07286984A (ja) * 1994-04-20 1995-10-31 Nippon Paper Ind Co Ltd ゼータ電位測定方法及びパルプスラリーの調製方法
JPH0968514A (ja) * 1995-08-31 1997-03-11 Shimadzu Corp 流動電位測定装置
JPH09257739A (ja) * 1996-03-19 1997-10-03 Shimadzu Corp ゼータ電位測定方法および装置
JPH1038835A (ja) * 1996-07-18 1998-02-13 Shimadzu Corp ゼータ電位測定方法および装置
JP2000019144A (ja) * 1998-06-30 2000-01-21 Shimadzu Corp ゼータ電位測定方法および測定装置

Also Published As

Publication number Publication date
US20230408445A1 (en) 2023-12-21
CN116964443A (zh) 2023-10-27
US12313590B2 (en) 2025-05-27
WO2022196533A1 (ja) 2022-09-22
JP7496979B2 (ja) 2024-06-10
CN116964443B (zh) 2026-02-17

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