JPWO2022163113A1 - - Google Patents

Info

Publication number
JPWO2022163113A1
JPWO2022163113A1 JP2022578082A JP2022578082A JPWO2022163113A1 JP WO2022163113 A1 JPWO2022163113 A1 JP WO2022163113A1 JP 2022578082 A JP2022578082 A JP 2022578082A JP 2022578082 A JP2022578082 A JP 2022578082A JP WO2022163113 A1 JPWO2022163113 A1 JP WO2022163113A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022578082A
Other languages
Japanese (ja)
Other versions
JPWO2022163113A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022163113A1 publication Critical patent/JPWO2022163113A1/ja
Publication of JPWO2022163113A5 publication Critical patent/JPWO2022163113A5/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/08Modifications for protecting switching circuit against overcurrent or overvoltage
    • H03K17/081Modifications for protecting switching circuit against overcurrent or overvoltage without feedback from the output circuit to the control circuit
    • H03K17/0814Modifications for protecting switching circuit against overcurrent or overvoltage without feedback from the output circuit to the control circuit by measures taken in the output circuit
    • H03K17/08142Modifications for protecting switching circuit against overcurrent or overvoltage without feedback from the output circuit to the control circuit by measures taken in the output circuit in field-effect transistor switches
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/08Modifications for protecting switching circuit against overcurrent or overvoltage
    • H03K17/082Modifications for protecting switching circuit against overcurrent or overvoltage by feedback from the output to the control circuit
    • H03K17/0822Modifications for protecting switching circuit against overcurrent or overvoltage by feedback from the output to the control circuit in field-effect transistor switches
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/12Modifications for increasing the maximum permissible switched current
    • H03K17/122Modifications for increasing the maximum permissible switched current in field-effect transistor switches
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66Vertical DMOS [VDMOS] FETs
    • H10D30/668Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126Top-view geometrical layouts of the regions or the junctions
    • H10D62/127Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/393Body regions of DMOS transistors or IGBTs 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/111Field plates
    • H10D64/117Recessed field plates, e.g. trench field plates or buried field plates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/101Integrated devices comprising main components and built-in components, e.g. IGBT having built-in freewheel diode
    • H10D84/141VDMOS having built-in components
    • H10D84/148VDMOS having built-in components the built-in components being breakdown diodes, e.g. Zener diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/811Combinations of field-effect devices and one or more diodes, capacitors or resistors
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/08Modifications for protecting switching circuit against overcurrent or overvoltage
    • H03K2017/0806Modifications for protecting switching circuit against overcurrent or overvoltage against excessive temperature
JP2022578082A 2021-02-01 2021-11-29 Pending JPWO2022163113A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021014497 2021-02-01
PCT/JP2021/043544 WO2022163113A1 (ja) 2021-02-01 2021-11-29 半導体装置

Publications (2)

Publication Number Publication Date
JPWO2022163113A1 true JPWO2022163113A1 (https=) 2022-08-04
JPWO2022163113A5 JPWO2022163113A5 (https=) 2023-10-26

Family

ID=82654351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022578082A Pending JPWO2022163113A1 (https=) 2021-02-01 2021-11-29

Country Status (5)

Country Link
US (1) US12381548B2 (https=)
JP (1) JPWO2022163113A1 (https=)
CN (1) CN116802804A (https=)
DE (1) DE112021006324T5 (https=)
WO (1) WO2022163113A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024041277A (ja) * 2022-09-14 2024-03-27 ローム株式会社 半導体装置、電子機器、及び車両
EP4415263A1 (en) * 2023-02-07 2024-08-14 Infineon Technologies Austria AG Power switch assembly with co-packaged protection function
WO2025089229A1 (ja) * 2023-10-25 2025-05-01 ローム株式会社 アクティブクランプ回路、半導体装置、電子機器及び車両

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005191221A (ja) * 2003-12-25 2005-07-14 Toshiba Corp 半導体装置
JP2007202317A (ja) * 2006-01-27 2007-08-09 Rohm Co Ltd チャージポンプ回路及びこれを備えた電気機器
WO2020130141A1 (ja) * 2018-12-21 2020-06-25 ローム株式会社 半導体装置
WO2020246537A1 (ja) * 2019-06-06 2020-12-10 ローム株式会社 半導体装置
WO2021024813A1 (ja) * 2019-08-02 2021-02-11 ローム株式会社 半導体装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005038231B3 (de) * 2005-08-12 2007-04-12 Infineon Technologies Ag Verfahren und Vorrichtung zum Einschalten einer Spannungsversorgung einer Halbleiterschaltung und entsprechende Halbleiterschaltung
JP6237183B2 (ja) * 2013-12-09 2017-11-29 セイコーエプソン株式会社 静電気保護回路及び半導体集積回路装置
CN110768205B (zh) 2016-04-28 2022-02-25 罗姆股份有限公司 过电流保护电路
US9887011B1 (en) * 2017-02-06 2018-02-06 Macronix International Co., Ltd. Memory with controlled bit line charging
DE102019128072B4 (de) * 2019-10-17 2021-11-18 Infineon Technologies Ag Transistorbauelement mit einem variierenden flächenbezogenen spezifischen gaterunnerwiderstand
US11509230B2 (en) * 2019-11-07 2022-11-22 Texas Instruments Incorporated Power stage controller for switching converter with clamp
JP7676739B2 (ja) * 2020-07-30 2025-05-15 富士電機株式会社 集積回路及び電源回路

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005191221A (ja) * 2003-12-25 2005-07-14 Toshiba Corp 半導体装置
JP2007202317A (ja) * 2006-01-27 2007-08-09 Rohm Co Ltd チャージポンプ回路及びこれを備えた電気機器
WO2020130141A1 (ja) * 2018-12-21 2020-06-25 ローム株式会社 半導体装置
WO2020246537A1 (ja) * 2019-06-06 2020-12-10 ローム株式会社 半導体装置
WO2021024813A1 (ja) * 2019-08-02 2021-02-11 ローム株式会社 半導体装置

Also Published As

Publication number Publication date
WO2022163113A1 (ja) 2022-08-04
US20240088886A1 (en) 2024-03-14
US12381548B2 (en) 2025-08-05
CN116802804A (zh) 2023-09-22
DE112021006324T5 (de) 2023-10-12

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