JPWO2022138173A1 - - Google Patents

Info

Publication number
JPWO2022138173A1
JPWO2022138173A1 JP2022572110A JP2022572110A JPWO2022138173A1 JP WO2022138173 A1 JPWO2022138173 A1 JP WO2022138173A1 JP 2022572110 A JP2022572110 A JP 2022572110A JP 2022572110 A JP2022572110 A JP 2022572110A JP WO2022138173 A1 JPWO2022138173 A1 JP WO2022138173A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022572110A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022138173A1 publication Critical patent/JPWO2022138173A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/80—Masked polyisocyanates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Optical Filters (AREA)
JP2022572110A 2020-12-24 2021-12-08 Pending JPWO2022138173A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020215474 2020-12-24
PCT/JP2021/045180 WO2022138173A1 (ja) 2020-12-24 2021-12-08 共重合体およびその共重合体の製造方法

Publications (1)

Publication Number Publication Date
JPWO2022138173A1 true JPWO2022138173A1 (ja) 2022-06-30

Family

ID=82157752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022572110A Pending JPWO2022138173A1 (ja) 2020-12-24 2021-12-08

Country Status (5)

Country Link
JP (1) JPWO2022138173A1 (ja)
KR (1) KR20230096058A (ja)
CN (1) CN116529268A (ja)
TW (1) TW202237675A (ja)
WO (1) WO2022138173A1 (ja)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04216886A (ja) * 1990-12-17 1992-08-06 Lintec Corp 耐ブリスター性粘着シート
JP5132096B2 (ja) * 2006-07-13 2013-01-30 日東電工株式会社 活性エネルギー線硬化型再剥離用水分散型アクリル系粘着剤組成物及び粘着シート
WO2013154058A1 (ja) * 2012-04-13 2013-10-17 富士ゼロックス株式会社 表示媒体、および表示装置
JP2014215407A (ja) * 2013-04-24 2014-11-17 富士フイルム株式会社 表示媒体及びその製造方法、並びに表示装置
JP6178164B2 (ja) 2013-08-23 2017-08-09 富士フイルム株式会社 感光性着色組成物、カラーフィルタ、カラーフィルタの製造方法、有機ｅｌ液晶表示装置
JP2015129249A (ja) * 2014-01-09 2015-07-16 旭硝子株式会社 撥水撥油剤組成物の製造方法、撥水撥油剤組成物、及び物品の処理方法
JP6543489B2 (ja) * 2014-05-29 2019-07-10 株式会社日本触媒 水性硬化性樹脂組成物
JP6593331B2 (ja) * 2014-06-09 2019-10-23 Ａｇｃ株式会社 撥インク剤、ネガ型感光性樹脂組成物、隔壁および光学素子
KR20180017055A (ko) 2015-06-15 2018-02-20 토요잉크Sc홀딩스주식회사 감광성 조성물, 컬러필터용 감광성 조성물, 및 컬러필터
KR102626467B1 (ko) * 2017-08-03 2024-01-17 가부시끼가이샤 레조낙 감광성 수지 조성물 및 그 제조 방법
JP7346054B2 (ja) * 2019-03-28 2023-09-19 ヘンケルジャパン株式会社 水性接着剤

Also Published As

Publication number Publication date
TW202237675A (zh) 2022-10-01
WO2022138173A1 (ja) 2022-06-30
KR20230096058A (ko) 2023-06-29
CN116529268A (zh) 2023-08-01

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