JPWO2022030498A1 - - Google Patents

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Publication number
JPWO2022030498A1
JPWO2022030498A1 JP2022541568A JP2022541568A JPWO2022030498A1 JP WO2022030498 A1 JPWO2022030498 A1 JP WO2022030498A1 JP 2022541568 A JP2022541568 A JP 2022541568A JP 2022541568 A JP2022541568 A JP 2022541568A JP WO2022030498 A1 JPWO2022030498 A1 JP WO2022030498A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022541568A
Other versions
JP7307281B2 (ja
JPWO2022030498A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022030498A1 publication Critical patent/JPWO2022030498A1/ja
Publication of JPWO2022030498A5 publication Critical patent/JPWO2022030498A5/ja
Priority to JP2023107557A priority Critical patent/JP2023120441A/ja
Application granted granted Critical
Publication of JP7307281B2 publication Critical patent/JP7307281B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022541568A 2020-08-05 2021-08-03 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法 Active JP7307281B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023107557A JP2023120441A (ja) 2020-08-05 2023-06-29 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020133262 2020-08-05
JP2020133262 2020-08-05
PCT/JP2021/028798 WO2022030498A1 (ja) 2020-08-05 2021-08-03 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023107557A Division JP2023120441A (ja) 2020-08-05 2023-06-29 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JPWO2022030498A1 true JPWO2022030498A1 (ja) 2022-02-10
JPWO2022030498A5 JPWO2022030498A5 (ja) 2023-04-25
JP7307281B2 JP7307281B2 (ja) 2023-07-11

Family

ID=80118068

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022541568A Active JP7307281B2 (ja) 2020-08-05 2021-08-03 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法
JP2023107557A Pending JP2023120441A (ja) 2020-08-05 2023-06-29 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023107557A Pending JP2023120441A (ja) 2020-08-05 2023-06-29 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法

Country Status (7)

Country Link
US (1) US12078923B2 (ja)
EP (1) EP4155430A1 (ja)
JP (2) JP7307281B2 (ja)
KR (2) KR102689722B1 (ja)
CN (1) CN115735160A (ja)
TW (1) TWI845855B (ja)
WO (1) WO2022030498A1 (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02168613A (ja) * 1988-09-30 1990-06-28 Canon Inc Ｘ線透過膜保持枠、ｘ線マスクブランクス、ｘ線マスク構造体及びそれらの製造方法
JPH11167198A (ja) * 1997-12-03 1999-06-22 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2006184704A (ja) * 2004-12-28 2006-07-13 Asahi Kasei Electronics Co Ltd 液晶用大型ペリクル
JP2017076024A (ja) * 2015-10-14 2017-04-20 日本特殊陶業株式会社 ペリクル枠およびペリクル枠の製造方法
JP2019168502A (ja) * 2018-03-22 2019-10-03 三井化学株式会社 カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法
JP2019174628A (ja) * 2018-03-28 2019-10-10 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101010260B (zh) 2004-07-27 2010-09-29 独立行政法人产业技术综合研究所 单层碳纳米管以及取向单层碳纳米管块结构体以及它们的制造方法、装置以及用途
JP2007005661A (ja) 2005-06-24 2007-01-11 Ses Co Ltd ベベル研磨方法及びベベル研磨装置
JP5657407B2 (ja) 2011-01-31 2015-01-21 旭化成イーマテリアルズ株式会社 ペリクル枠体、ペリクル及びペリクル枠体の製造方法
JP5742661B2 (ja) * 2011-10-25 2015-07-01 信越化学工業株式会社 ポジ型レジスト組成物及びパターン形成方法
JP6008784B2 (ja) 2013-04-15 2016-10-19 信越化学工業株式会社 ペリクルフレーム及びその製作方法とペリクル
WO2014188710A1 (ja) * 2013-05-24 2014-11-27 三井化学株式会社 ペリクル、及びこれらを含むｅｕｖ露光装置
JP2015178250A (ja) 2014-03-19 2015-10-08 日立化成株式会社 シート状乾燥材と支持体付き接着フィルムとを重ねた積層体、及び支持体付き接着フィルムの保存方法
EP3264175B1 (en) * 2015-02-24 2020-01-08 Mitsui Chemicals, Inc. Method for producing a pellicle
WO2018003603A1 (ja) * 2016-06-28 2018-01-04 三井化学株式会社 ペリクル膜、ペリクル枠体、ペリクル、及びその製造方法
JP6781864B2 (ja) 2016-07-05 2020-11-11 三井化学株式会社 ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法
KR101813186B1 (ko) * 2016-11-30 2017-12-28 삼성전자주식회사 포토마스크용 펠리클과 이를 포함하는 레티클 및 리소그래피용 노광 장치
JP2020133262A (ja) 2019-02-20 2020-08-31 年晶 伴 木造建築物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02168613A (ja) * 1988-09-30 1990-06-28 Canon Inc Ｘ線透過膜保持枠、ｘ線マスクブランクス、ｘ線マスク構造体及びそれらの製造方法
JPH11167198A (ja) * 1997-12-03 1999-06-22 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2006184704A (ja) * 2004-12-28 2006-07-13 Asahi Kasei Electronics Co Ltd 液晶用大型ペリクル
JP2017076024A (ja) * 2015-10-14 2017-04-20 日本特殊陶業株式会社 ペリクル枠およびペリクル枠の製造方法
JP2019168502A (ja) * 2018-03-22 2019-10-03 三井化学株式会社 カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法
JP2019174628A (ja) * 2018-03-28 2019-10-10 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置

Also Published As

Publication number Publication date
JP7307281B2 (ja) 2023-07-11
EP4155430A1 (en) 2023-03-29
CN115735160A (zh) 2023-03-03
TWI845855B (zh) 2024-06-21
KR20240121338A (ko) 2024-08-08
WO2022030498A1 (ja) 2022-02-10
JP2023120441A (ja) 2023-08-29
US12078923B2 (en) 2024-09-03
KR102689722B1 (ko) 2024-07-31
US20230341763A1 (en) 2023-10-26
TW202212962A (zh) 2022-04-01
KR20230012050A (ko) 2023-01-25

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