JPWO2022030139A1 - - Google Patents

Info

Publication number
JPWO2022030139A1
JPWO2022030139A1 JP2022514259A JP2022514259A JPWO2022030139A1 JP WO2022030139 A1 JPWO2022030139 A1 JP WO2022030139A1 JP 2022514259 A JP2022514259 A JP 2022514259A JP 2022514259 A JP2022514259 A JP 2022514259A JP WO2022030139 A1 JPWO2022030139 A1 JP WO2022030139A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022514259A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022030139A1 publication Critical patent/JPWO2022030139A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2022514259A 2020-08-05 2021-06-28 Pending JPWO2022030139A1 (enrdf_load_stackoverflow)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020132821 2020-08-05
PCT/JP2021/024283 WO2022030139A1 (ja) 2020-08-05 2021-06-28 光酸発生剤

Publications (1)

Publication Number Publication Date
JPWO2022030139A1 true JPWO2022030139A1 (enrdf_load_stackoverflow) 2022-02-10

Family

ID=80117935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022514259A Pending JPWO2022030139A1 (enrdf_load_stackoverflow) 2020-08-05 2021-06-28

Country Status (4)

Country Link
JP (1) JPWO2022030139A1 (enrdf_load_stackoverflow)
KR (1) KR102792755B1 (enrdf_load_stackoverflow)
CN (1) CN114402260A (enrdf_load_stackoverflow)
WO (1) WO2022030139A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116008458A (zh) * 2022-12-26 2023-04-25 衢州康鹏化学有限公司 一种全氟芳基硼酸盐溶液中有效成分含量的检测方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61212554A (ja) * 1985-03-15 1986-09-20 Asahi Denka Kogyo Kk 芳香族ジスルホニウム塩の製法
WO2005000801A1 (ja) * 2003-06-25 2005-01-06 San-Apro Limited モノスルホニウム塩の製造方法、カチオン重合開始剤、硬化性組成物および硬化物
WO2007061024A1 (ja) * 2005-11-25 2007-05-31 San-Apro Limited フッ素化アルキルフルオロリン酸スルホニウムの製造方法
JP2010254654A (ja) * 2009-04-28 2010-11-11 San Apro Kk スルホニウム塩，光酸発生剤，光硬化性組成物，及びその硬化体
WO2011016425A1 (ja) * 2009-08-03 2011-02-10 サンアプロ株式会社 光酸発生剤，光硬化性組成物，及びその硬化体
JP2012246456A (ja) * 2011-05-31 2012-12-13 San Apro Kk フッ素化アルキルリン酸オニウム塩系酸発生剤
JP2017048325A (ja) * 2015-09-03 2017-03-09 サンアプロ株式会社 硬化性組成物及びそれを用いた硬化体
JP2019086559A (ja) * 2017-11-02 2019-06-06 サンアプロ株式会社 ネガ型フォトレジスト用樹脂組成物及び硬化膜

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197174A (en) 1979-03-14 1980-04-08 American Can Company Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6
JPS61190524A (ja) 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
JP3567984B2 (ja) 1999-11-01 2004-09-22 日本電気株式会社 スルホニウム塩化合物、フォトレジスト組成物、およびそれを用いたパターン形成方法
JP4023086B2 (ja) 1999-12-27 2007-12-19 和光純薬工業株式会社 スルホニウム塩化合物
JP3351424B2 (ja) 1999-12-28 2002-11-25 日本電気株式会社 スルホニウム塩化合物及びレジスト組成物、並びにそれを用いたパターン形成方法
JP2011039411A (ja) * 2009-08-17 2011-02-24 San Apro Kk 化学増幅型ポジ型フォトレジスト組成物及びレジストパターンの作製方法
KR101747769B1 (ko) * 2013-09-30 2017-06-15 후지필름 가부시키가이샤 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 el 표시 장치 및 액정 표시 장치
JP2019212554A (ja) * 2018-06-07 2019-12-12 株式会社豊田自動織機 電池モジュール

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61212554A (ja) * 1985-03-15 1986-09-20 Asahi Denka Kogyo Kk 芳香族ジスルホニウム塩の製法
WO2005000801A1 (ja) * 2003-06-25 2005-01-06 San-Apro Limited モノスルホニウム塩の製造方法、カチオン重合開始剤、硬化性組成物および硬化物
WO2007061024A1 (ja) * 2005-11-25 2007-05-31 San-Apro Limited フッ素化アルキルフルオロリン酸スルホニウムの製造方法
JP2010254654A (ja) * 2009-04-28 2010-11-11 San Apro Kk スルホニウム塩，光酸発生剤，光硬化性組成物，及びその硬化体
WO2011016425A1 (ja) * 2009-08-03 2011-02-10 サンアプロ株式会社 光酸発生剤，光硬化性組成物，及びその硬化体
JP2012246456A (ja) * 2011-05-31 2012-12-13 San Apro Kk フッ素化アルキルリン酸オニウム塩系酸発生剤
JP2017048325A (ja) * 2015-09-03 2017-03-09 サンアプロ株式会社 硬化性組成物及びそれを用いた硬化体
JP2019086559A (ja) * 2017-11-02 2019-06-06 サンアプロ株式会社 ネガ型フォトレジスト用樹脂組成物及び硬化膜

Also Published As

Publication number Publication date
CN114402260A (zh) 2022-04-26
KR20230047050A (ko) 2023-04-06
KR102792755B1 (ko) 2025-04-07
TW202206411A (zh) 2022-02-16
WO2022030139A1 (ja) 2022-02-10

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