JPWO2021245923A1 - - Google Patents

Info

Publication number
JPWO2021245923A1
JPWO2021245923A1 JP2022528383A JP2022528383A JPWO2021245923A1 JP WO2021245923 A1 JPWO2021245923 A1 JP WO2021245923A1 JP 2022528383 A JP2022528383 A JP 2022528383A JP 2022528383 A JP2022528383 A JP 2022528383A JP WO2021245923 A1 JPWO2021245923 A1 JP WO2021245923A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022528383A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021245923A1 publication Critical patent/JPWO2021245923A1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen; Reversible storage of hydrogen
    • C01B3/02Production of hydrogen; Production of gaseous mixtures containing hydrogen
    • C01B3/04Production of hydrogen; Production of gaseous mixtures containing hydrogen by decomposition of inorganic compounds
    • C01B3/042Decomposition of water
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/227Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a Schottky barrier
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/40Carbon monoxide
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/50Carbon dioxide
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • H10F77/124Active materials comprising only Group III-V materials, e.g. GaAs
    • H10F77/1246III-V nitrides, e.g. GaN
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/063Titanium; Oxides or hydroxides thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/40Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
    • B01J23/42Platinum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/74Iron group metals
    • B01J23/75Cobalt
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/30Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39Photocatalytic properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Catalysts (AREA)
JP2022528383A 2020-06-05 2020-06-05 Pending JPWO2021245923A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/022364 WO2021245923A1 (ja) 2020-06-05 2020-06-05 半導体デバイス

Publications (1)

Publication Number Publication Date
JPWO2021245923A1 true JPWO2021245923A1 (https=) 2021-12-09

Family

ID=78830751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022528383A Pending JPWO2021245923A1 (https=) 2020-06-05 2020-06-05

Country Status (3)

Country Link
US (1) US12501721B2 (https=)
JP (1) JPWO2021245923A1 (https=)
WO (1) WO2021245923A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023150160A (ja) * 2022-03-31 2023-10-16 セイコーエプソン株式会社 光触媒装置、光触媒装置の製造方法、およびガス製造装置
WO2026006901A1 (en) * 2024-07-05 2026-01-08 The Royal Institution For The Advancement Of Learning/Mcgill University Photocatalytic reduction of carboxylic acids using gallium nitride

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007239048A (ja) * 2006-03-09 2007-09-20 Univ Of Electro-Communications 光エネルギー変換装置及び半導体光電極
JP2010247109A (ja) * 2009-04-17 2010-11-04 Sony Corp 光触媒装置及びガス発生装置
JP2016043304A (ja) * 2014-08-21 2016-04-04 日本電信電話株式会社 光触媒デバイス
JP2017121598A (ja) * 2016-01-05 2017-07-13 日本電信電話株式会社 半導体光触媒
JP2018090863A (ja) * 2016-12-05 2018-06-14 日本電信電話株式会社 半導体光電極
JP2018089604A (ja) * 2016-12-07 2018-06-14 日本電信電話株式会社 半導体光電極
JP2018204044A (ja) * 2017-05-30 2018-12-27 日本電信電話株式会社 半導体電極とその製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8845877B2 (en) * 2010-03-19 2014-09-30 Liquid Light, Inc. Heterocycle catalyzed electrochemical process
EP4181241A1 (en) * 2011-04-05 2023-05-17 Brilliant Light Power, Inc. H20 - based electrochemical hydrogen - catalyst power system
US20140170511A1 (en) * 2012-08-19 2014-06-19 Ftorion, Inc. Flow Battery And Regeneration System With Improved Safety
JP6067344B2 (ja) * 2012-11-20 2017-01-25 株式会社東芝 光化学反応システム
JP5840170B2 (ja) * 2013-05-10 2016-01-06 株式会社昭和 高耐久性、高変換効率を有する色素増感型太陽電池
DE102013114226B4 (de) * 2013-12-17 2019-03-07 Osram Opto Semiconductors Gmbh Halbleiterlaserdiode, Verfahren zur Herstellung einer Halbleiterlaserdiode und Halbleiterlaserdiodenanordnung
JP6239412B2 (ja) * 2014-03-14 2017-11-29 株式会社東芝 酸化電極および電気化学装置
WO2015148358A1 (en) * 2014-03-24 2015-10-01 Cornell University Solar flow battery
CN106133198B (zh) * 2014-04-14 2018-09-21 富士通株式会社 光合成装置
JP6495630B2 (ja) * 2014-11-28 2019-04-03 株式会社東芝 光電気化学反応装置
JP6470190B2 (ja) * 2016-01-05 2019-02-13 日本電信電話株式会社 半導体光触媒
JP6672193B2 (ja) * 2017-02-02 2020-03-25 株式会社東芝 二酸化炭素の電解セルと電解装置
JP6783814B2 (ja) * 2018-03-22 2020-11-11 株式会社東芝 二酸化炭素電解装置および二酸化炭素電解方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007239048A (ja) * 2006-03-09 2007-09-20 Univ Of Electro-Communications 光エネルギー変換装置及び半導体光電極
JP2010247109A (ja) * 2009-04-17 2010-11-04 Sony Corp 光触媒装置及びガス発生装置
JP2016043304A (ja) * 2014-08-21 2016-04-04 日本電信電話株式会社 光触媒デバイス
JP2017121598A (ja) * 2016-01-05 2017-07-13 日本電信電話株式会社 半導体光触媒
JP2018090863A (ja) * 2016-12-05 2018-06-14 日本電信電話株式会社 半導体光電極
JP2018089604A (ja) * 2016-12-07 2018-06-14 日本電信電話株式会社 半導体光電極
JP2018204044A (ja) * 2017-05-30 2018-12-27 日本電信電話株式会社 半導体電極とその製造方法

Also Published As

Publication number Publication date
US20230215966A1 (en) 2023-07-06
US12501721B2 (en) 2025-12-16
WO2021245923A1 (ja) 2021-12-09

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