JPWO2021229961A5 - - Google Patents

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Publication number
JPWO2021229961A5
JPWO2021229961A5 JP2022504714A JP2022504714A JPWO2021229961A5 JP WO2021229961 A5 JPWO2021229961 A5 JP WO2021229961A5 JP 2022504714 A JP2022504714 A JP 2022504714A JP 2022504714 A JP2022504714 A JP 2022504714A JP WO2021229961 A5 JPWO2021229961 A5 JP WO2021229961A5
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JP
Japan
Prior art keywords
wick
area
vapor chamber
chamber according
internal space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022504714A
Other languages
English (en)
Japanese (ja)
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JPWO2021229961A1 (https=
JP7088435B2 (ja
Filing date
Publication date
Priority claimed from US16/874,853 external-priority patent/US11013145B1/en
Priority claimed from US16/874,898 external-priority patent/US20210356211A1/en
Priority claimed from US16/874,782 external-priority patent/US11473849B2/en
Priority claimed from US16/874,878 external-priority patent/US20210356214A1/en
Priority claimed from US16/874,801 external-priority patent/US11473850B2/en
Priority claimed from US16/874,937 external-priority patent/US11585606B2/en
Priority claimed from PCT/JP2021/014797 external-priority patent/WO2021229961A1/ja
Application filed filed Critical
Publication of JPWO2021229961A1 publication Critical patent/JPWO2021229961A1/ja
Publication of JPWO2021229961A5 publication Critical patent/JPWO2021229961A5/ja
Publication of JP7088435B2 publication Critical patent/JP7088435B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2022504714A 2020-05-15 2021-04-07 ベイパーチャンバー Active JP7088435B2 (ja)

Applications Claiming Priority (15)

Application Number Priority Date Filing Date Title
US202016874749A 2020-05-15 2020-05-15
US16/874,749 2020-05-15
US16/874,878 US20210356214A1 (en) 2020-05-15 2020-05-15 Vapor chamber
US16/874,782 US11473849B2 (en) 2020-05-15 2020-05-15 Vapor chamber
US16/874,898 2020-05-15
US16/874,801 2020-05-15
US16/874,937 2020-05-15
US16/874,937 US11585606B2 (en) 2020-05-15 2020-05-15 Vapor chamber
US16/874,853 2020-05-15
US16/874,801 US11473850B2 (en) 2020-05-15 2020-05-15 Vapor chamber
US16/874,853 US11013145B1 (en) 2020-05-15 2020-05-15 Vapor chamber
US16/874,782 2020-05-15
US16/874,898 US20210356211A1 (en) 2020-05-15 2020-05-15 Vapor chamber
US16/874,878 2020-05-15
PCT/JP2021/014797 WO2021229961A1 (ja) 2020-05-15 2021-04-07 ベイパーチャンバー

Publications (3)

Publication Number Publication Date
JPWO2021229961A1 JPWO2021229961A1 (https=) 2021-11-18
JPWO2021229961A5 true JPWO2021229961A5 (https=) 2022-04-26
JP7088435B2 JP7088435B2 (ja) 2022-06-21

Family

ID=78525759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022504714A Active JP7088435B2 (ja) 2020-05-15 2021-04-07 ベイパーチャンバー

Country Status (3)

Country Link
JP (1) JP7088435B2 (https=)
CN (1) CN219037720U (https=)
WO (1) WO2021229961A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN218483134U (zh) * 2022-01-25 2023-02-14 株式会社村田制作所 热扩散器件以及电子设备
CN218483131U (zh) * 2022-01-25 2023-02-14 株式会社村田制作所 热扩散器件和电子设备
JP2023150314A (ja) * 2022-03-31 2023-10-16 住友精密工業株式会社 沸騰式冷却器の製造方法および沸騰式冷却器
CN223965937U (zh) * 2022-10-06 2026-03-03 株式会社村田制作所 热扩散装置和电子设备
WO2024122400A1 (ja) * 2022-12-07 2024-06-13 株式会社村田製作所 熱拡散デバイス及び電子機器

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9163883B2 (en) * 2009-03-06 2015-10-20 Kevlin Thermal Technologies, Inc. Flexible thermal ground plane and manufacturing the same
JP2010243035A (ja) * 2009-04-03 2010-10-28 Sony Corp 熱輸送装置、電子機器及び熱輸送装置の製造方法
US9835383B1 (en) * 2013-03-15 2017-12-05 Hrl Laboratories, Llc Planar heat pipe with architected core and vapor tolerant arterial wick
US10458719B2 (en) * 2015-01-22 2019-10-29 Pimems, Inc. High performance two-phase cooling apparatus
JP6623296B2 (ja) * 2016-07-01 2019-12-18 古河電気工業株式会社 ベーパーチャンバ
JP6988170B2 (ja) * 2017-04-28 2022-01-05 株式会社村田製作所 ベーパーチャンバー
WO2018198372A1 (ja) * 2017-04-28 2018-11-01 株式会社村田製作所 ベーパーチャンバー
JP6911593B2 (ja) * 2017-07-12 2021-07-28 株式会社村田製作所 ベーパーチャンバー
CN114111410A (zh) * 2018-07-31 2022-03-01 株式会社村田制作所 均热板
US10962298B2 (en) * 2018-09-28 2021-03-30 Microsoft Technology Licensing, Llc Two-phase thermodynamic system having a porous microstructure sheet to increase an aggregate thin-film evaporation area of a working fluid

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