JPWO2021200815A1 - - Google Patents
Info
- Publication number
- JPWO2021200815A1 JPWO2021200815A1 JP2022512207A JP2022512207A JPWO2021200815A1 JP WO2021200815 A1 JPWO2021200815 A1 JP WO2021200815A1 JP 2022512207 A JP2022512207 A JP 2022512207A JP 2022512207 A JP2022512207 A JP 2022512207A JP WO2021200815 A1 JPWO2021200815 A1 JP WO2021200815A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020061359 | 2020-03-30 | ||
PCT/JP2021/013268 WO2021200815A1 (ja) | 2020-03-30 | 2021-03-29 | ラジカル重合開始剤、組成物、硬化物及び硬化物の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021200815A1 true JPWO2021200815A1 (zh) | 2021-10-07 |
Family
ID=77929418
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022512207A Pending JPWO2021200815A1 (zh) | 2020-03-30 | 2021-03-29 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2021200815A1 (zh) |
KR (1) | KR20220161262A (zh) |
CN (1) | CN115151579B (zh) |
TW (1) | TW202200633A (zh) |
WO (1) | WO2021200815A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024004426A1 (ja) * | 2022-06-27 | 2024-01-04 | 富士フイルム株式会社 | 硬化性組成物、硬化物の製造方法、膜、光学素子、イメージセンサ、固体撮像素子、画像表示装置、及び、ラジカル重合開始剤 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100528838C (zh) | 2001-06-11 | 2009-08-19 | 西巴特殊化学品控股有限公司 | 具有复合结构的肟酯光引发剂 |
EP1780209B1 (en) | 2004-08-20 | 2010-03-10 | Adeka Corporation | Oxime ester compound and photopolymerization initiator containing such compound |
EP2072500B1 (en) | 2006-12-27 | 2012-09-26 | Adeka Corporation | Oxime ester compound and photopolymerization initiator containing the compound |
CN101508744B (zh) | 2009-03-11 | 2011-04-06 | 常州强力电子新材料有限公司 | 咔唑肟酯类光引发剂 |
CN101565472B (zh) | 2009-05-19 | 2011-05-04 | 常州强力电子新材料有限公司 | 酮肟酯类光引发剂 |
JP4818458B2 (ja) | 2009-11-27 | 2011-11-16 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
CN102020727B (zh) | 2010-11-23 | 2013-01-23 | 常州强力先端电子材料有限公司 | 一种高感光度咔唑肟酯类光引发剂、其制备方法及应用 |
JP6010483B2 (ja) * | 2013-02-28 | 2016-10-19 | 株式会社カネカ | 感光性樹脂組成物作製キット及びその利用 |
US10189847B2 (en) * | 2014-04-04 | 2019-01-29 | Adeka Corporation | Oxime ester compound and photopolymerization initiator containing said compound |
JP6782298B2 (ja) * | 2016-08-31 | 2020-11-11 | 富士フイルム株式会社 | 樹脂組成物およびその応用 |
JP7194492B2 (ja) * | 2016-10-24 | 2022-12-22 | 東京応化工業株式会社 | 感光性組成物、感光性組成物の製造方法、光重合開始剤、及び光重合開始剤の調製方法 |
CN109856910B (zh) * | 2017-11-30 | 2022-08-02 | 北京鼎材科技有限公司 | 一种感光树脂组合物及其应用 |
JP2019168654A (ja) * | 2018-03-26 | 2019-10-03 | 株式会社Adeka | 感光性組成物 |
-
2021
- 2021-03-29 JP JP2022512207A patent/JPWO2021200815A1/ja active Pending
- 2021-03-29 TW TW110111405A patent/TW202200633A/zh unknown
- 2021-03-29 WO PCT/JP2021/013268 patent/WO2021200815A1/ja active Application Filing
- 2021-03-29 CN CN202180015284.XA patent/CN115151579B/zh active Active
- 2021-03-29 KR KR1020227026855A patent/KR20220161262A/ko unknown
Also Published As
Publication number | Publication date |
---|---|
CN115151579B (zh) | 2023-12-08 |
CN115151579A (zh) | 2022-10-04 |
WO2021200815A1 (ja) | 2021-10-07 |
TW202200633A (zh) | 2022-01-01 |
KR20220161262A (ko) | 2022-12-06 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240311 |