JPWO2021193494A1 - - Google Patents
Info
- Publication number
- JPWO2021193494A1 JPWO2021193494A1 JP2022510463A JP2022510463A JPWO2021193494A1 JP WO2021193494 A1 JPWO2021193494 A1 JP WO2021193494A1 JP 2022510463 A JP2022510463 A JP 2022510463A JP 2022510463 A JP2022510463 A JP 2022510463A JP WO2021193494 A1 JPWO2021193494 A1 JP WO2021193494A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020051233 | 2020-03-23 | ||
PCT/JP2021/011627 WO2021193494A1 (ja) | 2020-03-23 | 2021-03-22 | 露光装置及び露光方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021193494A1 true JPWO2021193494A1 (ko) | 2021-09-30 |
Family
ID=77890387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022510463A Pending JPWO2021193494A1 (ko) | 2020-03-23 | 2021-03-22 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2021193494A1 (ko) |
KR (1) | KR20220157448A (ko) |
CN (1) | CN115335772A (ko) |
TW (1) | TW202141202A (ko) |
WO (1) | WO2021193494A1 (ko) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006186302A (ja) * | 2004-11-26 | 2006-07-13 | Sanee Giken Kk | 走査型露光用光源ユニット |
JP4472560B2 (ja) | 2005-03-08 | 2010-06-02 | 日立ビアメカニクス株式会社 | マスクレス露光装置及びその露光方法並びに配線基板の製造方法 |
JP2006330534A (ja) * | 2005-05-30 | 2006-12-07 | Nikon Corp | 基準指標板、基準指標板の調整方法、露光装置及びマイクロデバイスの製造方法 |
JP2008233638A (ja) * | 2007-03-22 | 2008-10-02 | Dainippon Screen Mfg Co Ltd | 描画装置および描画方法 |
JP2010231062A (ja) * | 2009-03-27 | 2010-10-14 | Dainippon Screen Mfg Co Ltd | 描画装置および描画方法 |
JP6082884B2 (ja) * | 2012-06-12 | 2017-02-22 | サンエー技研株式会社 | 露光装置、露光方法 |
JP6117594B2 (ja) * | 2013-03-29 | 2017-04-19 | 株式会社Screenホールディングス | 描画装置および描画方法 |
JP2017067888A (ja) * | 2015-09-29 | 2017-04-06 | 株式会社Screenホールディングス | 描画装置および位置情報取得方法 |
-
2021
- 2021-03-22 TW TW110110176A patent/TW202141202A/zh unknown
- 2021-03-22 JP JP2022510463A patent/JPWO2021193494A1/ja active Pending
- 2021-03-22 KR KR1020227036399A patent/KR20220157448A/ko unknown
- 2021-03-22 WO PCT/JP2021/011627 patent/WO2021193494A1/ja active Application Filing
- 2021-03-22 CN CN202180021552.9A patent/CN115335772A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
TW202141202A (zh) | 2021-11-01 |
CN115335772A (zh) | 2022-11-11 |
KR20220157448A (ko) | 2022-11-29 |
WO2021193494A1 (ja) | 2021-09-30 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221125 |
|
AA64 | Notification of invalidation of claim of internal priority (with term) |
Free format text: JAPANESE INTERMEDIATE CODE: A241764 Effective date: 20221125 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240226 |