JPWO2021192384A1 - - Google Patents
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- Publication number
- JPWO2021192384A1 JPWO2021192384A1 JP2022509236A JP2022509236A JPWO2021192384A1 JP WO2021192384 A1 JPWO2021192384 A1 JP WO2021192384A1 JP 2022509236 A JP2022509236 A JP 2022509236A JP 2022509236 A JP2022509236 A JP 2022509236A JP WO2021192384 A1 JPWO2021192384 A1 JP WO2021192384A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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PCT/JP2020/040372 WO2021192384A1 (ja) | 2020-03-25 | 2020-10-28 | 半導体装置および半導体装置の製造方法 |
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US20170062375A1 (en) * | 2014-02-27 | 2017-03-02 | Sharp Kabushiki Kaisha | Semiconductor device |
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