JPWO2021182117A1 - - Google Patents

Info

Publication number
JPWO2021182117A1
JPWO2021182117A1 JP2022505904A JP2022505904A JPWO2021182117A1 JP WO2021182117 A1 JPWO2021182117 A1 JP WO2021182117A1 JP 2022505904 A JP2022505904 A JP 2022505904A JP 2022505904 A JP2022505904 A JP 2022505904A JP WO2021182117 A1 JPWO2021182117 A1 JP WO2021182117A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022505904A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021182117A1 publication Critical patent/JPWO2021182117A1/ja
Priority to JP2024016335A priority Critical patent/JP2024040273A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/85Investigating moving fluids or granular solids
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/49Scattering, i.e. diffuse reflection within a body or fluid
    • G01N21/53Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2022505904A 2020-03-09 2021-02-25 Pending JPWO2021182117A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2024016335A JP2024040273A (ja) 2020-03-09 2024-02-06 異物検出装置、基板処理装置、異物検出方法、及び記憶媒体

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020039918 2020-03-09
PCT/JP2021/007047 WO2021182117A1 (ja) 2020-03-09 2021-02-25 異物検出装置、基板処理装置、異物検出方法、及び記憶媒体

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024016335A Division JP2024040273A (ja) 2020-03-09 2024-02-06 異物検出装置、基板処理装置、異物検出方法、及び記憶媒体

Publications (1)

Publication Number Publication Date
JPWO2021182117A1 true JPWO2021182117A1 (zh) 2021-09-16

Family

ID=77670656

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022505904A Pending JPWO2021182117A1 (zh) 2020-03-09 2021-02-25
JP2024016335A Pending JP2024040273A (ja) 2020-03-09 2024-02-06 異物検出装置、基板処理装置、異物検出方法、及び記憶媒体

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024016335A Pending JP2024040273A (ja) 2020-03-09 2024-02-06 異物検出装置、基板処理装置、異物検出方法、及び記憶媒体

Country Status (5)

Country Link
JP (2) JPWO2021182117A1 (zh)
KR (1) KR20220150339A (zh)
CN (1) CN115244387A (zh)
TW (1) TW202200988A (zh)
WO (1) WO2021182117A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118401825A (zh) * 2021-12-27 2024-07-26 东京毅力科创株式会社 异物检测装置和异物检测方法
TW202333256A (zh) * 2021-12-27 2023-08-16 日商東京威力科創股份有限公司 異物檢測裝置及異物檢測方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008180643A (ja) * 2007-01-25 2008-08-07 Kyokko Denki Kk 液体検知センサ
JP2016225574A (ja) * 2015-06-03 2016-12-28 東京エレクトロン株式会社 基板処理装置及び基板処理方法
WO2019202962A1 (ja) * 2018-04-18 2019-10-24 東京エレクトロン株式会社 薬液の異常検出装置、液処理装置、基板処理装置、薬液の異常検出方法、液処理方法及び基板処理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3151036B2 (ja) 1992-02-06 2001-04-03 ミクニキカイ株式会社 サブミクロン粒子の検出方法および装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008180643A (ja) * 2007-01-25 2008-08-07 Kyokko Denki Kk 液体検知センサ
JP2016225574A (ja) * 2015-06-03 2016-12-28 東京エレクトロン株式会社 基板処理装置及び基板処理方法
WO2019202962A1 (ja) * 2018-04-18 2019-10-24 東京エレクトロン株式会社 薬液の異常検出装置、液処理装置、基板処理装置、薬液の異常検出方法、液処理方法及び基板処理方法

Also Published As

Publication number Publication date
WO2021182117A1 (ja) 2021-09-16
TW202200988A (zh) 2022-01-01
CN115244387A (zh) 2022-10-25
JP2024040273A (ja) 2024-03-25
KR20220150339A (ko) 2022-11-10

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