JPWO2021153266A1 - - Google Patents
Info
- Publication number
- JPWO2021153266A1 JPWO2021153266A1 JP2021574625A JP2021574625A JPWO2021153266A1 JP WO2021153266 A1 JPWO2021153266 A1 JP WO2021153266A1 JP 2021574625 A JP2021574625 A JP 2021574625A JP 2021574625 A JP2021574625 A JP 2021574625A JP WO2021153266 A1 JPWO2021153266 A1 JP WO2021153266A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/015—Manufacture or treatment of FETs having heterojunction interface channels or heterojunction gate electrodes, e.g. HEMT
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having two-dimensional [2D] charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/257—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are characterised by top-view geometrical layouts, e.g. interdigitated, semi-circular, annular or L-shaped electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/343—Gate regions of field-effect devices having PN junction gates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
- H10D62/8503—Nitride Group III-V materials, e.g. AlN or GaN
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/111—Field plates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/256—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are recessed in semiconductor bodies
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020011740 | 2020-01-28 | ||
| PCT/JP2021/001166 WO2021153266A1 (ja) | 2020-01-28 | 2021-01-15 | 窒化物半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2021153266A1 true JPWO2021153266A1 (https=) | 2021-08-05 |
Family
ID=77078839
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021574625A Pending JPWO2021153266A1 (https=) | 2020-01-28 | 2021-01-15 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230045660A1 (https=) |
| JP (1) | JPWO2021153266A1 (https=) |
| CN (1) | CN114981979A (https=) |
| DE (1) | DE112021000745T5 (https=) |
| WO (1) | WO2021153266A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11424247B1 (en) | 2021-05-07 | 2022-08-23 | Fujian Jinhua Integrated Circuit Co., Ltd. | Semiconductor memory device having a second active region disposed at an outer side of a first active region |
| JPWO2023042617A1 (https=) * | 2021-09-14 | 2023-03-23 | ||
| JPWO2023219046A1 (https=) * | 2022-05-12 | 2023-11-16 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012523697A (ja) * | 2009-04-08 | 2012-10-04 | エフィシエント パワー コンヴァーション コーポレーション | エンハンスメントモードGaNHEMTデバイス、及びその製造方法 |
| JP2012523700A (ja) * | 2009-04-08 | 2012-10-04 | エフィシエント パワー コンヴァーション コーポレーション | 逆拡散抑制構造 |
| JP2015204304A (ja) * | 2014-04-10 | 2015-11-16 | トヨタ自動車株式会社 | スイッチング素子 |
| JP2018163928A (ja) * | 2017-03-24 | 2018-10-18 | 住友電気工業株式会社 | 半導体装置の製造方法 |
| JP2018195845A (ja) * | 2018-08-06 | 2018-12-06 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
-
2021
- 2021-01-15 US US17/789,786 patent/US20230045660A1/en not_active Abandoned
- 2021-01-15 JP JP2021574625A patent/JPWO2021153266A1/ja active Pending
- 2021-01-15 DE DE112021000745.9T patent/DE112021000745T5/de active Pending
- 2021-01-15 CN CN202180009696.2A patent/CN114981979A/zh active Pending
- 2021-01-15 WO PCT/JP2021/001166 patent/WO2021153266A1/ja not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012523697A (ja) * | 2009-04-08 | 2012-10-04 | エフィシエント パワー コンヴァーション コーポレーション | エンハンスメントモードGaNHEMTデバイス、及びその製造方法 |
| JP2012523700A (ja) * | 2009-04-08 | 2012-10-04 | エフィシエント パワー コンヴァーション コーポレーション | 逆拡散抑制構造 |
| JP2015204304A (ja) * | 2014-04-10 | 2015-11-16 | トヨタ自動車株式会社 | スイッチング素子 |
| JP2018163928A (ja) * | 2017-03-24 | 2018-10-18 | 住友電気工業株式会社 | 半導体装置の製造方法 |
| JP2018195845A (ja) * | 2018-08-06 | 2018-12-06 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20230045660A1 (en) | 2023-02-09 |
| DE112021000745T5 (de) | 2022-11-10 |
| WO2021153266A1 (ja) | 2021-08-05 |
| CN114981979A (zh) | 2022-08-30 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231115 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20241121 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20250410 |