JPWO2021153266A1 - - Google Patents

Info

Publication number
JPWO2021153266A1
JPWO2021153266A1 JP2021574625A JP2021574625A JPWO2021153266A1 JP WO2021153266 A1 JPWO2021153266 A1 JP WO2021153266A1 JP 2021574625 A JP2021574625 A JP 2021574625A JP 2021574625 A JP2021574625 A JP 2021574625A JP WO2021153266 A1 JPWO2021153266 A1 JP WO2021153266A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021574625A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021153266A1 publication Critical patent/JPWO2021153266A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/015Manufacture or treatment of FETs having heterojunction interface channels or heterojunction gate electrodes, e.g. HEMT
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/40FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
    • H10D30/47FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having two-dimensional [2D] charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
    • H10D30/471High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
    • H10D30/475High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/257Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are characterised by top-view geometrical layouts, e.g. interdigitated, semi-circular, annular or L-shaped electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/343Gate regions of field-effect devices having PN junction gates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • H10D62/8503Nitride Group III-V materials, e.g. AlN or GaN
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/111Field plates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/256Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are recessed in semiconductor bodies
JP2021574625A 2020-01-28 2021-01-15 Pending JPWO2021153266A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020011740 2020-01-28
PCT/JP2021/001166 WO2021153266A1 (ja) 2020-01-28 2021-01-15 窒化物半導体装置

Publications (1)

Publication Number Publication Date
JPWO2021153266A1 true JPWO2021153266A1 (https=) 2021-08-05

Family

ID=77078839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021574625A Pending JPWO2021153266A1 (https=) 2020-01-28 2021-01-15

Country Status (5)

Country Link
US (1) US20230045660A1 (https=)
JP (1) JPWO2021153266A1 (https=)
CN (1) CN114981979A (https=)
DE (1) DE112021000745T5 (https=)
WO (1) WO2021153266A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11424247B1 (en) 2021-05-07 2022-08-23 Fujian Jinhua Integrated Circuit Co., Ltd. Semiconductor memory device having a second active region disposed at an outer side of a first active region
JPWO2023042617A1 (https=) * 2021-09-14 2023-03-23
JPWO2023219046A1 (https=) * 2022-05-12 2023-11-16

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012523697A (ja) * 2009-04-08 2012-10-04 エフィシエント パワー コンヴァーション コーポレーション エンハンスメントモードGaNHEMTデバイス、及びその製造方法
JP2012523700A (ja) * 2009-04-08 2012-10-04 エフィシエント パワー コンヴァーション コーポレーション 逆拡散抑制構造
JP2015204304A (ja) * 2014-04-10 2015-11-16 トヨタ自動車株式会社 スイッチング素子
JP2018163928A (ja) * 2017-03-24 2018-10-18 住友電気工業株式会社 半導体装置の製造方法
JP2018195845A (ja) * 2018-08-06 2018-12-06 ルネサスエレクトロニクス株式会社 半導体装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012523697A (ja) * 2009-04-08 2012-10-04 エフィシエント パワー コンヴァーション コーポレーション エンハンスメントモードGaNHEMTデバイス、及びその製造方法
JP2012523700A (ja) * 2009-04-08 2012-10-04 エフィシエント パワー コンヴァーション コーポレーション 逆拡散抑制構造
JP2015204304A (ja) * 2014-04-10 2015-11-16 トヨタ自動車株式会社 スイッチング素子
JP2018163928A (ja) * 2017-03-24 2018-10-18 住友電気工業株式会社 半導体装置の製造方法
JP2018195845A (ja) * 2018-08-06 2018-12-06 ルネサスエレクトロニクス株式会社 半導体装置

Also Published As

Publication number Publication date
US20230045660A1 (en) 2023-02-09
DE112021000745T5 (de) 2022-11-10
WO2021153266A1 (ja) 2021-08-05
CN114981979A (zh) 2022-08-30

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