JPWO2021112079A1 - - Google Patents

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Publication number
JPWO2021112079A1
JPWO2021112079A1 JP2021562654A JP2021562654A JPWO2021112079A1 JP WO2021112079 A1 JPWO2021112079 A1 JP WO2021112079A1 JP 2021562654 A JP2021562654 A JP 2021562654A JP 2021562654 A JP2021562654 A JP 2021562654A JP WO2021112079 A1 JPWO2021112079 A1 JP WO2021112079A1
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JP
Japan
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Application number
JP2021562654A
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Japanese (ja)
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JP7377890B2 (ja
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2021562654A 2019-12-02 2020-12-01 蛍光ｘ線分析装置 Active JP7377890B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019218356 2019-12-02
JP2019218356 2019-12-02
PCT/JP2020/044667 WO2021112079A1 (ja) 2019-12-02 2020-12-01 蛍光ｘ線分析装置

Publications (2)

Publication Number Publication Date
JPWO2021112079A1 true JPWO2021112079A1 (enrdf_load_stackoverflow) 2021-06-10
JP7377890B2 JP7377890B2 (ja) 2023-11-10

Family

ID=76222413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021562654A Active JP7377890B2 (ja) 2019-12-02 2020-12-01 蛍光ｘ線分析装置

Country Status (2)

Country Link
JP (1) JP7377890B2 (enrdf_load_stackoverflow)
WO (1) WO2021112079A1 (enrdf_load_stackoverflow)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01126555U (enrdf_load_stackoverflow) * 1988-02-24 1989-08-29
JPH06249804A (ja) * 1993-03-01 1994-09-09 Seiko Instr Inc 蛍光ｘ線分析装置
JPH0755731A (ja) * 1993-08-13 1995-03-03 Sumitomo Electric Ind Ltd 全反射蛍光ｘ線分析の測定方法及びその装置
JP2001235437A (ja) * 2000-02-21 2001-08-31 Technos Kenkyusho:Kk 全反射蛍光ｘ線分析装置
WO2004088296A1 (ja) * 2003-03-28 2004-10-14 Rigaku Industrial Corporation 蛍光ｘ線分析装置
JP2008039772A (ja) * 2006-07-14 2008-02-21 Japan Science & Technology Agency Ｘ線分析装置及びｘ線分析方法
JP2011107005A (ja) * 2009-11-19 2011-06-02 Seiko Instruments Inc 蛍光ｘ線検査装置及び蛍光ｘ線検査方法
JP2013108759A (ja) * 2011-11-17 2013-06-06 Fuji Electric Co Ltd 半導体ウェハプロセス用ふっ酸溶液の不純物分析方法および該ふっ酸溶液の交換時期の管理方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL120429A (en) * 1997-03-12 2000-09-28 Jordan Valley Applied Radiation Ltd X-ray fluorescence analyzer
JP2005345442A (ja) * 2004-06-07 2005-12-15 Rigaku Industrial Co 蛍光ｘ線分析用液体試料容器
JP2006030018A (ja) * 2004-07-16 2006-02-02 Nyuurii Kk 蛍光ｘ線分析装置
JP4838821B2 (ja) * 2008-03-18 2011-12-14 株式会社リガク 蛍光ｘ線分析用試料保持具ならびにそれを用いる蛍光ｘ線分析方法および装置
JP5487936B2 (ja) * 2009-12-16 2014-05-14 東亜ディーケーケー株式会社 蛍光ｘ線液分析計
JP2017083346A (ja) * 2015-10-29 2017-05-18 株式会社堀場製作所 液体試料分析装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01126555U (enrdf_load_stackoverflow) * 1988-02-24 1989-08-29
JPH06249804A (ja) * 1993-03-01 1994-09-09 Seiko Instr Inc 蛍光ｘ線分析装置
JPH0755731A (ja) * 1993-08-13 1995-03-03 Sumitomo Electric Ind Ltd 全反射蛍光ｘ線分析の測定方法及びその装置
JP2001235437A (ja) * 2000-02-21 2001-08-31 Technos Kenkyusho:Kk 全反射蛍光ｘ線分析装置
WO2004088296A1 (ja) * 2003-03-28 2004-10-14 Rigaku Industrial Corporation 蛍光ｘ線分析装置
JP2008039772A (ja) * 2006-07-14 2008-02-21 Japan Science & Technology Agency Ｘ線分析装置及びｘ線分析方法
JP2011107005A (ja) * 2009-11-19 2011-06-02 Seiko Instruments Inc 蛍光ｘ線検査装置及び蛍光ｘ線検査方法
JP2013108759A (ja) * 2011-11-17 2013-06-06 Fuji Electric Co Ltd 半導体ウェハプロセス用ふっ酸溶液の不純物分析方法および該ふっ酸溶液の交換時期の管理方法

Also Published As

Publication number Publication date
WO2021112079A1 (ja) 2021-06-10
JP7377890B2 (ja) 2023-11-10

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