JPWO2021079420A1 - - Google Patents

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Publication number
JPWO2021079420A1
JPWO2021079420A1 JP2021553194A JP2021553194A JPWO2021079420A1 JP WO2021079420 A1 JPWO2021079420 A1 JP WO2021079420A1 JP 2021553194 A JP2021553194 A JP 2021553194A JP 2021553194 A JP2021553194 A JP 2021553194A JP WO2021079420 A1 JPWO2021079420 A1 JP WO2021079420A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2021553194A
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Japanese (ja)
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JP7133724B2 (ja
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
JP2021553194A 2019-10-22 2019-10-22 プラズマ発生装置、およびプラズマ処理方法 Active JP7133724B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/041419 WO2021079420A1 (ja) 2019-10-22 2019-10-22 プラズマ発生装置、およびプラズマ処理方法

Publications (2)

Publication Number Publication Date
JPWO2021079420A1 true JPWO2021079420A1 (enrdf_load_html_response) 2021-04-29
JP7133724B2 JP7133724B2 (ja) 2022-09-08

Family

ID=75619936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021553194A Active JP7133724B2 (ja) 2019-10-22 2019-10-22 プラズマ発生装置、およびプラズマ処理方法

Country Status (4)

Country Link
EP (1) EP4050973A4 (enrdf_load_html_response)
JP (1) JP7133724B2 (enrdf_load_html_response)
CN (1) CN114586473B (enrdf_load_html_response)
WO (1) WO2021079420A1 (enrdf_load_html_response)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS3621622Y1 (enrdf_load_html_response) * 1959-02-03 1961-08-21
JP2005302681A (ja) * 2003-05-14 2005-10-27 Sekisui Chem Co Ltd プラズマ処理装置
JP2015144078A (ja) * 2014-01-31 2015-08-06 富士機械製造株式会社 大気圧プラズマ発生装置
WO2016194138A1 (ja) * 2015-06-02 2016-12-08 富士機械製造株式会社 プラズマ発生装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5317126A (en) * 1992-01-14 1994-05-31 Hypertherm, Inc. Nozzle and method of operation for a plasma arc torch
JP3707563B2 (ja) * 1995-01-27 2005-10-19 日野自動車株式会社 ホール型燃料噴射ノズル
DE29911974U1 (de) 1999-07-09 2000-11-23 Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen Plasmadüse
GB201021870D0 (en) * 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
US9637838B2 (en) * 2010-12-23 2017-05-02 Element Six Limited Methods of manufacturing synthetic diamond material by microwave plasma enhanced chemical vapor deposition from a microwave generator and gas inlet(s) disposed opposite the growth surface area
US9144148B2 (en) * 2013-07-25 2015-09-22 Hypertherm, Inc. Devices for gas cooling plasma arc torches and related systems and methods
JP6461983B2 (ja) * 2014-09-16 2019-01-30 株式会社Ｆｕｊｉ プラズマガス照射装置
WO2016105489A2 (en) * 2014-12-24 2016-06-30 Clearsign Combustion Corporation Flame holders with fuel and oxidant recirculation, combustion systems including such flame holders, and related methods
JP6534745B2 (ja) * 2015-09-29 2019-06-26 株式会社Ｆｕｊｉ プラズマ発生装置
JP6678232B2 (ja) * 2016-03-14 2020-04-08 株式会社Ｆｕｊｉ プラズマ発生装置
DE102016125699A1 (de) * 2016-12-23 2018-06-28 Plasmatreat Gmbh Düsenanordnung, Vorrichtung zur Erzeugung eines atmosphärischen Plasmastrahls, Verwendung derselben, Verfahren zur Plasmabehandlung eines Stoffs oder einer Kunststofffolie, plasmabehandelter Vliesstoff und Verwendung desselben
EP3357879A1 (de) * 2017-02-07 2018-08-08 Heraeus Quarzglas GmbH & Co. KG Gasverteilelement für den einsatz in der halbleiterfertigung sowie verfahren zur herstellung eines gasverteilelements
EP3749064B1 (en) * 2018-01-30 2023-05-24 FUJI Corporation Plasma processing machine
JP6713039B2 (ja) * 2018-12-26 2020-06-24 株式会社Ｆｕｊｉ プラズマガス照射装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS3621622Y1 (enrdf_load_html_response) * 1959-02-03 1961-08-21
JP2005302681A (ja) * 2003-05-14 2005-10-27 Sekisui Chem Co Ltd プラズマ処理装置
JP2015144078A (ja) * 2014-01-31 2015-08-06 富士機械製造株式会社 大気圧プラズマ発生装置
WO2016194138A1 (ja) * 2015-06-02 2016-12-08 富士機械製造株式会社 プラズマ発生装置

Also Published As

Publication number Publication date
EP4050973A1 (en) 2022-08-31
CN114586473A (zh) 2022-06-03
WO2021079420A1 (ja) 2021-04-29
CN114586473B (zh) 2025-02-18
EP4050973A4 (en) 2022-11-09
JP7133724B2 (ja) 2022-09-08

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