JPWO2021067357A5

JPWO2021067357A5 -

Info

Publication number: JPWO2021067357A5
Application number: JP2022504549A
Authority: JP
Publication date: 2023-09-29

Claims

at least one mesa formed on the substrate;
A microlens formed from a microlens layer covering at least an upper portion of the at least one mesa, the microlens comprising:
The material of the microlens layer is different from the material of the at least one mesa,
the microlens layer is in direct physical contact with the at least one mesa;
including a light-emitting pixel unit.

The light emitting pixel unit of claim 1, wherein the microlenses are individually formed around the top of the at least one mesa.

The light emitting pixel unit according to claim 1 or 2, wherein a spacer is formed between the at least one mesa and the microlens from the same microlens layer.

The light emitting pixel unit according to claim 3, wherein the material of the spacer is the same as the material of the microlens.

The light emitting pixel unit according to claim 1, wherein the microlens is made of dielectric material.

The light emitting pixel unit according to claim 1, wherein the material of the microlens is a photoresist.

The light emitting pixel unit according to claim 1, wherein the height of the microlens is 2 micrometers or less.

The light emitting pixel unit according to claim 1, wherein the width of the microlens is 4 micrometers or less.

The light emitting pixel unit of claim 1, wherein on the substrate, the at least one mesa is in a matrix of mesa arrays, and the microlenses are in a matrix of microlens arrays arranged according to the arrangement of the mesa arrays. .

The light emitting pixel unit according to claim 1, wherein the upper part of the at least one mesa is flat and the shape of the microlens is hemispherical.

The light emitting pixel unit of claim 1, wherein the at least one mesa includes at least a light emitting device.

Providing a substrate;
forming at least one mesa on the substrate;
directly depositing a layer of microlens material on at least the top of the at least one mesa, the layer of microlens material conforming to the shape of the at least one mesa and depositing a hemispherical shape on the at least one mesa; and
A method of manufacturing a light emitting pixel unit, comprising:

13. The method of manufacturing a light emitting pixel unit according to claim 12, wherein the layer of microlens material is deposited by chemical vapor deposition techniques.

13. The method of manufacturing a light emitting pixel unit according to claim 12, further comprising patterning the microlens material layer to expose electrode areas of the substrate.

The patterning may include:
forming a mask on the surface of the microlens material;
patterning the mask by a photolithographic process to form openings in the mask to expose the layer of microlens material above the electrode area of the at least one mesa;
etching a portion of the microlens material layer exposed by the opening with mask protection provided at a predetermined position;
The method of manufacturing a light emitting pixel unit according to claim 14, further comprising:

The method of manufacturing a light emitting pixel unit according to claim 15, wherein the etching is a wet etching method.

providing a substrate;
forming at least one mesa on the substrate;
directly depositing a layer of microlens material on at least the top of the at least one mesa, the layer of microlens material covering the top of the at least one mesa, and the top surface of the microlens material being flat; And,
patterning the microlens material layer from top to bottom, thereby forming at least a hemisphere in the microlens material layer without penetrating the microlens material layer, the hemisphere forming at least one hemisphere in the microlens material layer; be placed on top of the
A method of manufacturing a light emitting pixel unit, comprising:

18. The method of manufacturing a light emitting pixel unit according to claim 17, wherein the layer of microlens material is deposited by spin coating.

After forming the at least one mesa and before depositing the layer of microlens material, the method further comprises forming a mark layer having marks for aligning the layer of microlens material in a patterning process. 18. A method of manufacturing the light emitting pixel unit according to 17.

18. The method of manufacturing a light emitting pixel unit according to claim 17, further comprising patterning the microlens material layer to expose an electrode region of the substrate after patterning the microlens material layer.

depositing a mask layer on the surface of the microlens material layer;
patterning the mask layer to form a hemispherical pattern in the mask layer;
etching the microlens material layer using the hemispherical pattern as a mask to form a hemisphere within the microlens material layer;
The method of manufacturing a light emitting pixel unit according to claim 17, further comprising:

After the microlens material layer is etched, the microlens material layer is not etched through to expose the top surface of the at least one mesa, thereby causing the top surface of the at least one mesa to be etched. 22. The method of manufacturing a light emitting pixel unit according to claim 21, wherein spacers are formed.

22. The method of manufacturing a light emitting pixel unit according to any one of claims 21 to 22, wherein the mask layer is first patterned by a photolithographic process and then by a reflow process.