JPWO2021033664A1 - - Google Patents

Info

Publication number
JPWO2021033664A1
JPWO2021033664A1 JP2021540937A JP2021540937A JPWO2021033664A1 JP WO2021033664 A1 JPWO2021033664 A1 JP WO2021033664A1 JP 2021540937 A JP2021540937 A JP 2021540937A JP 2021540937 A JP2021540937 A JP 2021540937A JP WO2021033664 A1 JPWO2021033664 A1 JP WO2021033664A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021540937A
Other versions
JP7235124B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021033664A1 publication Critical patent/JPWO2021033664A1/ja
Application granted granted Critical
Publication of JP7235124B2 publication Critical patent/JP7235124B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3157Partial encapsulation or coating
    • H01L23/3171Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors having potential barriers
    • H01L29/94Metal-insulator-semiconductors, e.g. MOS
    • H01L29/945Trench capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3157Partial encapsulation or coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/562Protection against mechanical damage
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/564Details not otherwise provided for, e.g. protection against moisture
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/642Capacitive arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66083Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
    • H01L29/66181Conductor-insulator-semiconductor capacitors, e.g. trench capacitors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2021540937A 2019-08-21 2020-08-17 半導体装置 Active JP7235124B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019151479 2019-08-21
JP2019151479 2019-08-21
PCT/JP2020/030993 WO2021033664A1 (ja) 2019-08-21 2020-08-17 半導体装置

Publications (2)

Publication Number Publication Date
JPWO2021033664A1 true JPWO2021033664A1 (ja) 2021-02-25
JP7235124B2 JP7235124B2 (ja) 2023-03-08

Family

ID=74660982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021540937A Active JP7235124B2 (ja) 2019-08-21 2020-08-17 半導体装置

Country Status (5)

Country Link
US (1) US12100671B2 (ja)
JP (1) JP7235124B2 (ja)
CN (1) CN114008767A (ja)
DE (1) DE112020002238T5 (ja)
WO (1) WO2021033664A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2023248670A1 (ja) * 2022-06-22 2023-12-28

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005079513A (ja) * 2003-09-03 2005-03-24 Seiko Epson Corp 半導体装置及びその製造方法
JP2005191182A (ja) * 2003-12-25 2005-07-14 Nec Electronics Corp 半導体装置及びその製造方法
JP2008124405A (ja) * 2006-11-16 2008-05-29 Matsushita Electric Ind Co Ltd 半導体装置および半導体装置の製造方法
JP2008153497A (ja) * 2006-12-19 2008-07-03 Murata Mfg Co Ltd 誘電体薄膜キャパシタの製造方法
WO2017145515A1 (ja) * 2016-02-22 2017-08-31 株式会社村田製作所 半導体コンデンサおよび電源モジュール
WO2019021817A1 (ja) * 2017-07-25 2019-01-31 株式会社村田製作所 キャパシタ
JP2019029537A (ja) * 2017-07-31 2019-02-21 株式会社村田製作所 キャパシタ

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014200869B4 (de) * 2013-11-22 2018-09-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Integrierter Kondensator und Verfahren zum Herstellen desselben und dessen Verwendung
JP6880451B2 (ja) 2017-08-07 2021-06-02 住友電工デバイス・イノベーション株式会社 キャパシタ構造の作製方法
JP6508751B1 (ja) 2018-03-06 2019-05-08 三菱ロジスネクスト株式会社 荷役車両
JP7314001B2 (ja) * 2019-09-20 2023-07-25 株式会社東芝 コンデンサ

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005079513A (ja) * 2003-09-03 2005-03-24 Seiko Epson Corp 半導体装置及びその製造方法
JP2005191182A (ja) * 2003-12-25 2005-07-14 Nec Electronics Corp 半導体装置及びその製造方法
JP2008124405A (ja) * 2006-11-16 2008-05-29 Matsushita Electric Ind Co Ltd 半導体装置および半導体装置の製造方法
JP2008153497A (ja) * 2006-12-19 2008-07-03 Murata Mfg Co Ltd 誘電体薄膜キャパシタの製造方法
WO2017145515A1 (ja) * 2016-02-22 2017-08-31 株式会社村田製作所 半導体コンデンサおよび電源モジュール
WO2019021817A1 (ja) * 2017-07-25 2019-01-31 株式会社村田製作所 キャパシタ
JP2019029537A (ja) * 2017-07-31 2019-02-21 株式会社村田製作所 キャパシタ

Also Published As

Publication number Publication date
WO2021033664A1 (ja) 2021-02-25
US20220115336A1 (en) 2022-04-14
CN114008767A (zh) 2022-02-01
JP7235124B2 (ja) 2023-03-08
DE112020002238T5 (de) 2022-02-17
US12100671B2 (en) 2024-09-24

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