JPWO2021033664A1 - - Google Patents
Info
- Publication number
- JPWO2021033664A1 JPWO2021033664A1 JP2021540937A JP2021540937A JPWO2021033664A1 JP WO2021033664 A1 JPWO2021033664 A1 JP WO2021033664A1 JP 2021540937 A JP2021540937 A JP 2021540937A JP 2021540937 A JP2021540937 A JP 2021540937A JP WO2021033664 A1 JPWO2021033664 A1 JP WO2021033664A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3171—Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors having potential barriers
- H01L29/94—Metal-insulator-semiconductors, e.g. MOS
- H01L29/945—Trench capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/562—Protection against mechanical damage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/564—Details not otherwise provided for, e.g. protection against moisture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/642—Capacitive arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66083—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
- H01L29/66181—Conductor-insulator-semiconductor capacitors, e.g. trench capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019151479 | 2019-08-21 | ||
JP2019151479 | 2019-08-21 | ||
PCT/JP2020/030993 WO2021033664A1 (ja) | 2019-08-21 | 2020-08-17 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2021033664A1 true JPWO2021033664A1 (ja) | 2021-02-25 |
JP7235124B2 JP7235124B2 (ja) | 2023-03-08 |
Family
ID=74660982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021540937A Active JP7235124B2 (ja) | 2019-08-21 | 2020-08-17 | 半導体装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US12100671B2 (ja) |
JP (1) | JP7235124B2 (ja) |
CN (1) | CN114008767A (ja) |
DE (1) | DE112020002238T5 (ja) |
WO (1) | WO2021033664A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2023248670A1 (ja) * | 2022-06-22 | 2023-12-28 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005079513A (ja) * | 2003-09-03 | 2005-03-24 | Seiko Epson Corp | 半導体装置及びその製造方法 |
JP2005191182A (ja) * | 2003-12-25 | 2005-07-14 | Nec Electronics Corp | 半導体装置及びその製造方法 |
JP2008124405A (ja) * | 2006-11-16 | 2008-05-29 | Matsushita Electric Ind Co Ltd | 半導体装置および半導体装置の製造方法 |
JP2008153497A (ja) * | 2006-12-19 | 2008-07-03 | Murata Mfg Co Ltd | 誘電体薄膜キャパシタの製造方法 |
WO2017145515A1 (ja) * | 2016-02-22 | 2017-08-31 | 株式会社村田製作所 | 半導体コンデンサおよび電源モジュール |
WO2019021817A1 (ja) * | 2017-07-25 | 2019-01-31 | 株式会社村田製作所 | キャパシタ |
JP2019029537A (ja) * | 2017-07-31 | 2019-02-21 | 株式会社村田製作所 | キャパシタ |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014200869B4 (de) * | 2013-11-22 | 2018-09-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Integrierter Kondensator und Verfahren zum Herstellen desselben und dessen Verwendung |
JP6880451B2 (ja) | 2017-08-07 | 2021-06-02 | 住友電工デバイス・イノベーション株式会社 | キャパシタ構造の作製方法 |
JP6508751B1 (ja) | 2018-03-06 | 2019-05-08 | 三菱ロジスネクスト株式会社 | 荷役車両 |
JP7314001B2 (ja) * | 2019-09-20 | 2023-07-25 | 株式会社東芝 | コンデンサ |
-
2020
- 2020-08-17 JP JP2021540937A patent/JP7235124B2/ja active Active
- 2020-08-17 DE DE112020002238.2T patent/DE112020002238T5/de active Pending
- 2020-08-17 CN CN202080045558.5A patent/CN114008767A/zh active Pending
- 2020-08-17 WO PCT/JP2020/030993 patent/WO2021033664A1/ja active Application Filing
-
2021
- 2021-12-22 US US17/645,617 patent/US12100671B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005079513A (ja) * | 2003-09-03 | 2005-03-24 | Seiko Epson Corp | 半導体装置及びその製造方法 |
JP2005191182A (ja) * | 2003-12-25 | 2005-07-14 | Nec Electronics Corp | 半導体装置及びその製造方法 |
JP2008124405A (ja) * | 2006-11-16 | 2008-05-29 | Matsushita Electric Ind Co Ltd | 半導体装置および半導体装置の製造方法 |
JP2008153497A (ja) * | 2006-12-19 | 2008-07-03 | Murata Mfg Co Ltd | 誘電体薄膜キャパシタの製造方法 |
WO2017145515A1 (ja) * | 2016-02-22 | 2017-08-31 | 株式会社村田製作所 | 半導体コンデンサおよび電源モジュール |
WO2019021817A1 (ja) * | 2017-07-25 | 2019-01-31 | 株式会社村田製作所 | キャパシタ |
JP2019029537A (ja) * | 2017-07-31 | 2019-02-21 | 株式会社村田製作所 | キャパシタ |
Also Published As
Publication number | Publication date |
---|---|
WO2021033664A1 (ja) | 2021-02-25 |
US20220115336A1 (en) | 2022-04-14 |
CN114008767A (zh) | 2022-02-01 |
JP7235124B2 (ja) | 2023-03-08 |
DE112020002238T5 (de) | 2022-02-17 |
US12100671B2 (en) | 2024-09-24 |
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