JPWO2021024895A1 - - Google Patents

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Publication number
JPWO2021024895A1
JPWO2021024895A1 JP2021537261A JP2021537261A JPWO2021024895A1 JP WO2021024895 A1 JPWO2021024895 A1 JP WO2021024895A1 JP 2021537261 A JP2021537261 A JP 2021537261A JP 2021537261 A JP2021537261 A JP 2021537261A JP WO2021024895 A1 JPWO2021024895 A1 JP WO2021024895A1
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JP
Japan
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JP2021537261A
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JP7188600B2 (ja
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Publication of JPWO2021024895A1 publication Critical patent/JPWO2021024895A1/ja
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Publication of JP7188600B2 publication Critical patent/JP7188600B2/ja
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/08—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/213—Spectrometric ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N2021/4126—Index of thin films
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427—Coatings
JP2021537261A 2019-08-08 2020-07-30 含フッ素有機ケイ素化合物の薄膜の光学定数計測方法 Active JP7188600B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019145856 2019-08-08
JP2019145856 2019-08-08
PCT/JP2020/029192 WO2021024895A1 (ja) 2019-08-08 2020-07-30 含フッ素有機ケイ素化合物の薄膜の光学定数計測方法

Publications (2)

Publication Number Publication Date
JPWO2021024895A1 true JPWO2021024895A1 (ja) 2021-02-11
JP7188600B2 JP7188600B2 (ja) 2022-12-13

Family

ID=74503599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021537261A Active JP7188600B2 (ja) 2019-08-08 2020-07-30 含フッ素有機ケイ素化合物の薄膜の光学定数計測方法

Country Status (6)

Country Link
US (1) US20220276151A1 (ja)
EP (1) EP4011935A4 (ja)
JP (1) JP7188600B2 (ja)
KR (1) KR20220044773A (ja)
CN (1) CN114174803A (ja)
WO (1) WO2021024895A1 (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05215905A (ja) * 1991-02-27 1993-08-27 Hoya Corp 撥水性薄膜を有する光学部材及びその製造方法
JP2007062101A (ja) * 2005-08-30 2007-03-15 Nippon Zeon Co Ltd 反射防止積層体
US20080284320A1 (en) * 2005-06-15 2008-11-20 Braggone Oy Optical Device Structure
WO2014069250A1 (ja) * 2012-11-05 2014-05-08 株式会社ニコン・エシロール 光学部品、光学部品の製造方法、及びゴースト光の定量方法
WO2016068112A1 (ja) * 2014-10-30 2016-05-06 旭硝子株式会社 防汚膜付き基体
JP2018083748A (ja) * 2016-11-11 2018-05-31 旭硝子株式会社 低反射膜付き基体およびその製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4097370A (en) 1977-04-14 1978-06-27 The Lummus Company Hydrotreating of pyrolysis gasoline
JPS57200192A (en) 1981-06-03 1982-12-08 Matsushita Electric Ind Co Ltd Washing machine with washstand
JP3283407B2 (ja) * 1995-09-13 2002-05-20 ジーイー東芝シリコーン株式会社 ポリシラン光学デバイス
JP3644863B2 (ja) * 2000-01-24 2005-05-11 沖電気工業株式会社 膜厚分布測定方法
JPWO2006106858A1 (ja) * 2005-03-31 2008-09-11 松下電器産業株式会社 プラズマドーピング方法及び装置
JP5215905B2 (ja) 2009-02-24 2013-06-19 パナソニック株式会社 工具用無線通信システム
JP5781350B2 (ja) * 2011-03-30 2015-09-24 リンテック株式会社 ガスバリア積層体、その製造方法、電子デバイス用部材及び電子デバイス
WO2013125598A1 (ja) * 2012-02-23 2013-08-29 旭硝子株式会社 フッ素含有有機ケイ素化合物薄膜の製造装置、及び、製造方法
JP2013174668A (ja) * 2012-02-23 2013-09-05 Asahi Glass Co Ltd フッ素含有有機ケイ素化合物薄膜製造装置および製造方法
JP6260579B2 (ja) 2015-05-01 2018-01-17 信越化学工業株式会社 フルオロポリエーテル基含有ポリマー変性シラン、表面処理剤及び物品
KR102483565B1 (ko) 2016-06-10 2023-01-02 신에쓰 가가꾸 고교 가부시끼가이샤 플루오로폴리에터기 함유 폴리머, 표면처리제 및 물품
US10877181B2 (en) * 2016-11-11 2020-12-29 AGC Inc. Substrate with low-reflection property and manufacturing method thereof
JP7140134B2 (ja) * 2017-10-10 2022-09-21 Ａｇｃ株式会社 カバー部材

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05215905A (ja) * 1991-02-27 1993-08-27 Hoya Corp 撥水性薄膜を有する光学部材及びその製造方法
US20080284320A1 (en) * 2005-06-15 2008-11-20 Braggone Oy Optical Device Structure
JP2007062101A (ja) * 2005-08-30 2007-03-15 Nippon Zeon Co Ltd 反射防止積層体
WO2014069250A1 (ja) * 2012-11-05 2014-05-08 株式会社ニコン・エシロール 光学部品、光学部品の製造方法、及びゴースト光の定量方法
WO2016068112A1 (ja) * 2014-10-30 2016-05-06 旭硝子株式会社 防汚膜付き基体
JP2018083748A (ja) * 2016-11-11 2018-05-31 旭硝子株式会社 低反射膜付き基体およびその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
TONEY, MICHAEL F. ET AL.: "Thickness Measurements of Thin Perfluoropolyether Polymer Films on Silicon and Amorphous-Hydrogenate", JOURNAL OF COLLOID AND INTERFACE SCIENCE, vol. 225, JPN6020036317, 2000, pages 219 - 226, XP055791431, ISSN: 0004911025, DOI: 10.1006/jcis.2000.6752 *

Also Published As

Publication number Publication date
EP4011935A1 (en) 2022-06-15
US20220276151A1 (en) 2022-09-01
WO2021024895A1 (ja) 2021-02-11
CN114174803A (zh) 2022-03-11
KR20220044773A (ko) 2022-04-11
EP4011935A4 (en) 2023-05-10
JP7188600B2 (ja) 2022-12-13

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