JPWO2020195670A1 - - Google Patents

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Publication number
JPWO2020195670A1
JPWO2020195670A1 JP2021508922A JP2021508922A JPWO2020195670A1 JP WO2020195670 A1 JPWO2020195670 A1 JP WO2020195670A1 JP 2021508922 A JP2021508922 A JP 2021508922A JP 2021508922 A JP2021508922 A JP 2021508922A JP WO2020195670 A1 JPWO2020195670 A1 JP WO2020195670A1
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JP
Japan
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Application number
JP2021508922A
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JP7134336B2 (ja
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Publication of JPWO2020195670A1 publication Critical patent/JPWO2020195670A1/ja
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Publication of JP7134336B2 publication Critical patent/JP7134336B2/ja
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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/184Preparation
    • C01B32/186Preparation by chemical vapour deposition [CVD]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00Measuring polarisation of light
    • G01J4/04Polarimeters using electric detection means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • G01N2021/213Spectrometric ellipsometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/8422Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427Coatings
JP2021508922A 2019-03-25 2020-03-05 グラフェンの異常成長を検出する方法および測定装置、ならびに成膜システム Active JP7134336B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019055932 2019-03-25
JP2019055932 2019-03-25
PCT/JP2020/009360 WO2020195670A1 (ja) 2019-03-25 2020-03-05 グラフェンの異常成長を検出する方法および測定装置、ならびに成膜システム

Publications (2)

Publication Number Publication Date
JPWO2020195670A1 true JPWO2020195670A1 (ja) 2020-10-01
JP7134336B2 JP7134336B2 (ja) 2022-09-09

Family

ID=72611335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021508922A Active JP7134336B2 (ja) 2019-03-25 2020-03-05 グラフェンの異常成長を検出する方法および測定装置、ならびに成膜システム

Country Status (4)

Country Link
US (1) US20220185673A1 (ja)
JP (1) JP7134336B2 (ja)
KR (1) KR20210137174A (ja)
WO (1) WO2020195670A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022137419A1 (ja) * 2020-12-24 2022-06-30 日本電信電話株式会社 観察方法およびシステム

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0712714A (ja) * 1993-06-29 1995-01-17 Fuji Electric Co Ltd 磁気記録媒体のカーボン保護膜の評価方法
CN102507875A (zh) * 2011-11-09 2012-06-20 复旦大学 一种快速无损测量石墨烯薄膜厚度与能带结构的方法
JP2016088766A (ja) * 2014-10-30 2016-05-23 株式会社デンソー グラフェンの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5851804B2 (ja) 2011-11-09 2016-02-03 東京エレクトロン株式会社 前処理方法、グラフェンの形成方法及びグラフェン製造装置
JP6002087B2 (ja) 2013-05-29 2016-10-05 東京エレクトロン株式会社 グラフェンの生成方法
US9664734B2 (en) * 2015-05-21 2017-05-30 Kla-Tencor Corporation Multi-oscillator, continuous Cody-Lorentz model of optical dispersion

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0712714A (ja) * 1993-06-29 1995-01-17 Fuji Electric Co Ltd 磁気記録媒体のカーボン保護膜の評価方法
CN102507875A (zh) * 2011-11-09 2012-06-20 复旦大学 一种快速无损测量石墨烯薄膜厚度与能带结构的方法
JP2016088766A (ja) * 2014-10-30 2016-05-23 株式会社デンソー グラフェンの製造方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
ADAMSON, PEEP: "Correlation-free reflection diagnostics of graphene-like surface layers in the infrared region", SURFACE AND INTERFACE ANALYSIS, vol. Volume 47, Issue 13, JPN6020017074, 19 November 2015 (2015-11-19), pages 1161 - 1165, ISSN: 0004842220 *
ALBREKTSEN, O ET AL.: "High resolution imaging of few-layer graphene", JOURNAL OF APPLIED PHYSICS, vol. Volume 111, Issue 6, JPN6020017075, 19 March 2012 (2012-03-19), pages 064305 - 1, ISSN: 0004842221 *

Also Published As

Publication number Publication date
US20220185673A1 (en) 2022-06-16
JP7134336B2 (ja) 2022-09-09
KR20210137174A (ko) 2021-11-17
WO2020195670A1 (ja) 2020-10-01

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