JPWO2021002388A1 - - Google Patents

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Publication number
JPWO2021002388A1
JPWO2021002388A1 JP2021529162A JP2021529162A JPWO2021002388A1 JP WO2021002388 A1 JPWO2021002388 A1 JP WO2021002388A1 JP 2021529162 A JP2021529162 A JP 2021529162A JP 2021529162 A JP2021529162 A JP 2021529162A JP WO2021002388 A1 JPWO2021002388 A1 JP WO2021002388A1
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JP
Japan
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JP2021529162A
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Japanese (ja)
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JPWO2021002388A5 (https=
JP7281545B2 (ja
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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/22Esters containing halogen
    • C08F220/24Esters containing halogen containing perhaloalkyl radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • C08F290/067Polyurethanes; Polyureas
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/40Layered products comprising a layer of synthetic resin comprising polyurethanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02Homopolymers or copolymers of hydrocarbons
    • C08J2325/04Homopolymers or copolymers of styrene
    • C08J2325/06Polystyrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2339/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen; Derivatives of such polymers
    • C08J2339/04Homopolymers or copolymers of monomers containing heterocyclic rings having nitrogen as ring member
    • C08J2339/06Homopolymers or copolymers of N-vinyl-pyrrolidones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2345/00Characterised by the use of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02Polyesters derived from dicarboxylic acids and dihydroxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2369/00Characterised by the use of polycarbonates; Derivatives of polycarbonates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2375/00Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
    • C08J2375/04Polyurethanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C12BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12MAPPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
    • C12M1/00Apparatus for enzymology or microbiology

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Optical Measuring Cells (AREA)
JP2021529162A 2019-07-02 2020-07-01 バイオアッセイ用微細ウェルフィルム、バイオアッセイ用微細ウェルフィルム形成用感光性樹脂組成物、及び、バイオアッセイ用微細ウェルフィルムの製造方法 Active JP7281545B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019123981 2019-07-02
JP2019123981 2019-07-02
PCT/JP2020/025838 WO2021002388A1 (ja) 2019-07-02 2020-07-01 バイオアッセイ用微細ウェルフィルム、バイオアッセイ用微細ウェルフィルム形成用感光性樹脂組成物、及び、バイオアッセイ用微細ウェルフィルムの製造方法

Publications (3)

Publication Number Publication Date
JPWO2021002388A1 true JPWO2021002388A1 (https=) 2021-01-07
JPWO2021002388A5 JPWO2021002388A5 (https=) 2022-03-30
JP7281545B2 JP7281545B2 (ja) 2023-05-25

Family

ID=74100385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021529162A Active JP7281545B2 (ja) 2019-07-02 2020-07-01 バイオアッセイ用微細ウェルフィルム、バイオアッセイ用微細ウェルフィルム形成用感光性樹脂組成物、及び、バイオアッセイ用微細ウェルフィルムの製造方法

Country Status (6)

Country Link
US (1) US12281187B2 (https=)
EP (1) EP3995518A4 (https=)
JP (1) JP7281545B2 (https=)
CN (1) CN114051514A (https=)
TW (1) TWI756729B (https=)
WO (1) WO2021002388A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240250064A1 (en) * 2021-06-03 2024-07-25 Tokyo Electron Limited Substrate processing method
WO2024204175A1 (ja) * 2023-03-31 2024-10-03 旭化成株式会社 バイオアッセイ用微細ウェルフィルム及びその製造方法、並びにバイオアッセイ用微細ウェルフィルム形成用の感光性樹脂組成物

Citations (4)

* Cited by examiner, † Cited by third party
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JP2004309405A (ja) * 2003-04-10 2004-11-04 Univ Tokyo 一分子酵素活性検出に用いられるマイクロチャンバ
US20130004967A1 (en) * 2009-11-23 2013-01-03 Halverson Kurt J Microwell array articles and methods of use
JP2014058667A (ja) * 2012-08-24 2014-04-03 Sekisui Chem Co Ltd 光学部品用光硬化性樹脂組成物及び光学部品の製造方法
JP2018102159A (ja) * 2016-12-22 2018-07-05 旭硝子株式会社 バイオチップ用感光性組成物及びバイオチップの製造方法

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JP4639558B2 (ja) 2001-09-07 2011-02-23 株式会社島津製作所 マイクロウエルチップ
EP2381255A1 (en) 2003-09-25 2011-10-26 Toyama Prefecture Microwell array chip and its manufacturing method
JP2005134339A (ja) 2003-10-31 2005-05-26 Kuraray Co Ltd 生物化学用途において蛍光分析に使用される樹脂製プレート、及びその製造方法
JP2005249429A (ja) * 2004-03-01 2005-09-15 Ebara Corp 反応検出チップ
US20050202163A1 (en) 2004-03-09 2005-09-15 Celgard Inc. Method of making a composite microporous membrane
US8492098B2 (en) 2006-02-21 2013-07-23 The Trustees Of Tufts College Methods and arrays for target analyte detection and determination of reaction components that affect a reaction
JP4936519B2 (ja) 2006-08-18 2012-05-23 公立大学法人大阪府立大学 ナノ構造及びマイクロ構造を有する構造体の成形用モールドの製造方法及び該モールドを用いる該構造体の製造方法
WO2010045357A2 (en) * 2008-10-15 2010-04-22 Cornell University Enhanced on-chip sers based biomolecular detection using electrokinetically active microwells
EP2546041B1 (en) 2010-03-10 2018-10-03 Asahi Kasei Kabushiki Kaisha Resin mold and method for manufacturing a resin mold
JP2013019707A (ja) 2011-07-08 2013-01-31 Sumitomo Bakelite Co Ltd バイオチップ
JP5839877B2 (ja) * 2011-07-27 2016-01-06 旭化成イーマテリアルズ株式会社 スピンコート用樹脂鋳型
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JP2014123077A (ja) * 2012-12-21 2014-07-03 Asahi Kasei E-Materials Corp 反射防止体及びその製造方法
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US20160243734A1 (en) 2015-02-25 2016-08-25 Sony Dadc Austria Ag Microfluidic or microtiter device and method of manufacture of microfluidic or microtiter device
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JP6941991B2 (ja) 2017-07-07 2021-09-29 日本化薬株式会社 バイオセンサ基板の接着に用いる紫外線硬化型樹脂組成物、それを用いたバイオセンサ基板
JP2019123981A (ja) 2018-01-15 2019-07-25 株式会社グローウィング ウィッグ用フィルムおよび当該ウィッグ用フィルムを備えたウィッグキャップ

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Publication number Priority date Publication date Assignee Title
JP2004309405A (ja) * 2003-04-10 2004-11-04 Univ Tokyo 一分子酵素活性検出に用いられるマイクロチャンバ
US20130004967A1 (en) * 2009-11-23 2013-01-03 Halverson Kurt J Microwell array articles and methods of use
JP2014058667A (ja) * 2012-08-24 2014-04-03 Sekisui Chem Co Ltd 光学部品用光硬化性樹脂組成物及び光学部品の製造方法
JP2018102159A (ja) * 2016-12-22 2018-07-05 旭硝子株式会社 バイオチップ用感光性組成物及びバイオチップの製造方法

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Also Published As

Publication number Publication date
EP3995518A4 (en) 2022-09-07
WO2021002388A1 (ja) 2021-01-07
US20220340700A1 (en) 2022-10-27
TWI756729B (zh) 2022-03-01
JP7281545B2 (ja) 2023-05-25
CN114051514A (zh) 2022-02-15
TW202108702A (zh) 2021-03-01
EP3995518A1 (en) 2022-05-11
US12281187B2 (en) 2025-04-22

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