JPWO2021001935A1 - - Google Patents

Info

Publication number
JPWO2021001935A1
JPWO2021001935A1 JP2021529606A JP2021529606A JPWO2021001935A1 JP WO2021001935 A1 JPWO2021001935 A1 JP WO2021001935A1 JP 2021529606 A JP2021529606 A JP 2021529606A JP 2021529606 A JP2021529606 A JP 2021529606A JP WO2021001935 A1 JPWO2021001935 A1 JP WO2021001935A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021529606A
Other versions
JP7161053B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021001935A1 publication Critical patent/JPWO2021001935A1/ja
Application granted granted Critical
Publication of JP7161053B2 publication Critical patent/JP7161053B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/145—Combinations of electrostatic and magnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/103—Lenses characterised by lens type
    • H01J2237/1035—Immersion lens
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
JP2021529606A 2019-07-02 2019-07-02 荷電粒子線装置 Active JP7161053B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/026333 WO2021001935A1 (ja) 2019-07-02 2019-07-02 荷電粒子線装置

Publications (2)

Publication Number Publication Date
JPWO2021001935A1 true JPWO2021001935A1 (ja) 2021-01-07
JP7161053B2 JP7161053B2 (ja) 2022-10-25

Family

ID=74100641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021529606A Active JP7161053B2 (ja) 2019-07-02 2019-07-02 荷電粒子線装置

Country Status (3)

Country Link
US (1) US11823861B2 (ja)
JP (1) JP7161053B2 (ja)
WO (1) WO2021001935A1 (ja)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0536371A (ja) * 1990-06-11 1993-02-12 Siemens Ag 粒子線装置
JP2006278329A (ja) * 2005-03-17 2006-10-12 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh 高空間分解能および多視点結像用の荷電粒子ビーム装置
JP2014002835A (ja) * 2012-06-15 2014-01-09 Hitachi High-Technologies Corp 荷電粒子線装置
JP2014160678A (ja) * 2014-05-12 2014-09-04 Hitachi High-Technologies Corp 荷電粒子線装置
WO2017018432A1 (ja) * 2015-07-29 2017-02-02 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3966350B2 (ja) 1995-10-19 2007-08-29 株式会社日立製作所 走査形電子顕微鏡
JP4791840B2 (ja) * 2006-02-06 2011-10-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置、走査電子顕微鏡、および試料検査方法
JP4920385B2 (ja) * 2006-11-29 2012-04-18 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置、走査型電子顕微鏡、及び試料観察方法
JP5102580B2 (ja) * 2007-10-18 2012-12-19 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
JP5227643B2 (ja) * 2008-04-14 2013-07-03 株式会社日立ハイテクノロジーズ 高分解能でかつ高コントラストな観察が可能な電子線応用装置
JP5438937B2 (ja) * 2008-09-05 2014-03-12 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0536371A (ja) * 1990-06-11 1993-02-12 Siemens Ag 粒子線装置
JP2006278329A (ja) * 2005-03-17 2006-10-12 Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh 高空間分解能および多視点結像用の荷電粒子ビーム装置
JP2014002835A (ja) * 2012-06-15 2014-01-09 Hitachi High-Technologies Corp 荷電粒子線装置
JP2014160678A (ja) * 2014-05-12 2014-09-04 Hitachi High-Technologies Corp 荷電粒子線装置
WO2017018432A1 (ja) * 2015-07-29 2017-02-02 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Also Published As

Publication number Publication date
US20220254597A1 (en) 2022-08-11
US11823861B2 (en) 2023-11-21
JP7161053B2 (ja) 2022-10-25
WO2021001935A1 (ja) 2021-01-07

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