JPWO2020209327A5 - - Google Patents
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- JPWO2020209327A5 JPWO2020209327A5 JP2021513697A JP2021513697A JPWO2020209327A5 JP WO2020209327 A5 JPWO2020209327 A5 JP WO2020209327A5 JP 2021513697 A JP2021513697 A JP 2021513697A JP 2021513697 A JP2021513697 A JP 2021513697A JP WO2020209327 A5 JPWO2020209327 A5 JP WO2020209327A5
- Authority
- JP
- Japan
- Prior art keywords
- compound
- bifunctional
- reacting
- compounds
- prepared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019075867 | 2019-04-11 | ||
| JP2019075867 | 2019-04-11 | ||
| PCT/JP2020/015948 WO2020209327A1 (ja) | 2019-04-11 | 2020-04-09 | ヒドロキシアリール基末端の重合体を含む薬液耐性保護膜形成組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020209327A1 JPWO2020209327A1 (https=) | 2020-10-15 |
| JPWO2020209327A5 true JPWO2020209327A5 (https=) | 2023-03-31 |
| JP7563379B2 JP7563379B2 (ja) | 2024-10-08 |
Family
ID=72751317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021513697A Active JP7563379B2 (ja) | 2019-04-11 | 2020-04-09 | ヒドロキシアリール基末端の重合体を含む薬液耐性保護膜形成組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11965059B2 (https=) |
| JP (1) | JP7563379B2 (https=) |
| KR (1) | KR102915292B1 (https=) |
| CN (1) | CN113646352B (https=) |
| TW (1) | TWI846857B (https=) |
| WO (1) | WO2020209327A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2026023597A1 (ja) * | 2024-07-23 | 2026-01-29 | 日産化学株式会社 | 保護膜形成用組成物、保護膜、基板の製造方法及び半導体装置の製造方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6443521A (en) | 1987-08-10 | 1989-02-15 | Toray Industries | Epoxy resin |
| JPH06128360A (ja) | 1992-10-14 | 1994-05-10 | Matsushita Electric Works Ltd | 液状エポキシ樹脂組成物 |
| EP2251742B1 (en) * | 2008-02-21 | 2012-05-16 | Nissan Chemical Industries, Ltd. | Composition for forming resist underlayer film and method for forming resist pattern using the same |
| JP5522415B2 (ja) * | 2009-07-07 | 2014-06-18 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| JP5888523B2 (ja) * | 2011-03-15 | 2016-03-22 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| KR102156732B1 (ko) * | 2014-04-25 | 2020-09-16 | 닛산 가가쿠 가부시키가이샤 | 레지스트 하층막 형성 조성물 및 이것을 이용한 레지스트 패턴의 형성방법 |
| JP6372887B2 (ja) * | 2015-05-14 | 2018-08-15 | 信越化学工業株式会社 | 有機膜材料、有機膜形成方法、パターン形成方法、及び化合物 |
| JP7486919B2 (ja) | 2016-05-02 | 2024-05-20 | 日産化学株式会社 | 特定の架橋剤を含む保護膜形成組成物及びそれを用いたパターン形成方法 |
| WO2018052130A1 (ja) * | 2016-09-16 | 2018-03-22 | 日産化学工業株式会社 | 保護膜形成組成物 |
| CN110582728B (zh) * | 2017-05-02 | 2023-11-17 | 日产化学株式会社 | 耐受过氧化氢水溶液的保护膜形成用组合物 |
| JP7268684B2 (ja) * | 2018-10-05 | 2023-05-08 | 日産化学株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
-
2020
- 2020-04-09 US US17/601,674 patent/US11965059B2/en active Active
- 2020-04-09 WO PCT/JP2020/015948 patent/WO2020209327A1/ja not_active Ceased
- 2020-04-09 KR KR1020217029247A patent/KR102915292B1/ko active Active
- 2020-04-09 CN CN202080027542.1A patent/CN113646352B/zh active Active
- 2020-04-09 JP JP2021513697A patent/JP7563379B2/ja active Active
- 2020-04-10 TW TW109112130A patent/TWI846857B/zh active
-
2024
- 2024-03-26 US US18/616,255 patent/US12331156B2/en active Active
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