JPWO2020203003A1 - - Google Patents
Info
- Publication number
- JPWO2020203003A1 JPWO2020203003A1 JP2021511276A JP2021511276A JPWO2020203003A1 JP WO2020203003 A1 JPWO2020203003 A1 JP WO2020203003A1 JP 2021511276 A JP2021511276 A JP 2021511276A JP 2021511276 A JP2021511276 A JP 2021511276A JP WO2020203003 A1 JPWO2020203003 A1 JP WO2020203003A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/213—Exposing with the same light pattern different positions of the same surface at the same time
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019069148 | 2019-03-29 | ||
JP2019069148 | 2019-03-29 | ||
PCT/JP2020/009125 WO2020203003A1 (ja) | 2019-03-29 | 2020-03-04 | 露光装置、照明光学系、およびデバイス製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2020203003A1 true JPWO2020203003A1 (ja) | 2020-10-08 |
JP7533445B2 JP7533445B2 (ja) | 2024-08-14 |
Family
ID=72668281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021511276A Active JP7533445B2 (ja) | 2019-03-29 | 2020-03-04 | 露光装置、照明光学系、およびデバイス製造方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7533445B2 (ja) |
KR (1) | KR20210144669A (ja) |
CN (2) | CN113439239B (ja) |
TW (1) | TW202040283A (ja) |
WO (1) | WO2020203003A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10199800A (ja) * | 1997-01-09 | 1998-07-31 | Nikon Corp | オプティカルインテグレータを備える照明光学装置 |
JP2001297975A (ja) * | 2000-04-17 | 2001-10-26 | Nikon Corp | 露光装置及び露光方法 |
JP2001305745A (ja) * | 2000-04-24 | 2001-11-02 | Nikon Corp | 走査露光方法および走査型露光装置 |
JP2002258489A (ja) * | 2000-04-20 | 2002-09-11 | Nikon Corp | 露光装置および露光方法 |
JP2017198990A (ja) * | 2016-04-28 | 2017-11-02 | エルジー ディスプレイ カンパニー リミテッド | 分割露光装置及びそれを用いた液晶表示装置の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5326928B2 (ja) | 2009-08-19 | 2013-10-30 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
JP2016054230A (ja) | 2014-09-04 | 2016-04-14 | キヤノン株式会社 | 投影露光装置及び露光方法 |
CN108700825B (zh) | 2016-02-29 | 2021-07-23 | 株式会社尼康 | 曝光装置、平板显示器的制造方法、器件制造方法、遮光装置及曝光方法 |
-
2020
- 2020-03-04 JP JP2021511276A patent/JP7533445B2/ja active Active
- 2020-03-04 KR KR1020217025504A patent/KR20210144669A/ko unknown
- 2020-03-04 WO PCT/JP2020/009125 patent/WO2020203003A1/ja active Application Filing
- 2020-03-04 CN CN202080014640.1A patent/CN113439239B/zh active Active
- 2020-03-04 CN CN202410239514.6A patent/CN117908338A/zh active Pending
- 2020-03-20 TW TW109109293A patent/TW202040283A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10199800A (ja) * | 1997-01-09 | 1998-07-31 | Nikon Corp | オプティカルインテグレータを備える照明光学装置 |
JP2001297975A (ja) * | 2000-04-17 | 2001-10-26 | Nikon Corp | 露光装置及び露光方法 |
JP2002258489A (ja) * | 2000-04-20 | 2002-09-11 | Nikon Corp | 露光装置および露光方法 |
JP2001305745A (ja) * | 2000-04-24 | 2001-11-02 | Nikon Corp | 走査露光方法および走査型露光装置 |
JP2017198990A (ja) * | 2016-04-28 | 2017-11-02 | エルジー ディスプレイ カンパニー リミテッド | 分割露光装置及びそれを用いた液晶表示装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW202040283A (zh) | 2020-11-01 |
CN113439239A (zh) | 2021-09-24 |
KR20210144669A (ko) | 2021-11-30 |
JP7533445B2 (ja) | 2024-08-14 |
WO2020203003A1 (ja) | 2020-10-08 |
CN117908338A (zh) | 2024-04-19 |
CN113439239B (zh) | 2024-03-26 |
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