JPWO2020088413A5 - - Google Patents

Claims (16)

It ’s a liner assembly.
In the grounded liner ring, a plurality of shielding units are arranged in places along the circumferential direction of the liner ring, and the plurality of shielding units are formed on the inner peripheral surface of the liner ring and the outer peripheral surface of the liner ring. A gap formed between the two, and penetrating the gap, the gap is a plurality of first passages arranged in various places in the direction from the inner peripheral surface to the outer peripheral surface, and two adjacent ones each. A grounded liner with a plurality of second passages communicating with the first passage, and orthogonal projection of each of the two adjacent first passages on the inner peripheral surface of the liner ring. Are separated from each other , the gaps forming a labyrinth structure, thereby protecting the sidewalls of the reaction chamber, liner assembly. The liner ring comprises at least two nested sub-rings with different inner diameters, each sub-ring is grounded and, in terms of gaps, the first passages are respectively arranged correspondingly within the individual sub-rings. The liner assembly of claim 1, wherein each is a radial through hole and the second passage is an annular gap correspondingly arranged between two individual subrings adjacent to each other. The depth-to-width ratio of each gap is
B / A + C / D> 5
Here, A is the width of the radial through hole in the circumferential direction of the sub ring, B is the radial thickness of the sub ring, and C is adjacent to each other in the same sub ring. The liner assembly according to claim 2, wherein the distance between the centers is the distance between the two individual radial through holes, and D is the radial thickness of the annular gap. The liner assembly according to claim 2, wherein the center-to-center distance between two adjacent radial through holes in the same subring is 2 mm or more. The liner assembly according to claim 2, wherein the subring has a radial thickness of 5 mm or less. The liner assembly according to claim 2, wherein the radial thickness of the annular gap is less than 10 mm. The liner assembly according to claim 2, wherein the width of the radial through hole in the circumferential direction of the subring is in the range of 0.5 mm to 10 mm. The liner assembly according to any one of claims 1 to 7, wherein the number of the gaps is several tens. The liner assembly according to claim 8, wherein the number of the gaps is 60 or more. Between two individual sub-rings adjacent to each other, each radial through-hole in one sub-ring corresponds to an intermediate position between the two radial through-holes in the other sub-ring and 2 in the other sub-ring. The liner assembly according to claim 2, wherein the one radial through hole is adjacent to the radial through hole in the one subring. The liner assembly according to claim 2, wherein each radial through hole extends in the axial direction of the subring. The liner assembly according to claim 11, wherein each radial through hole penetrates the subring in the axial direction of the subring. A reaction chamber with a chamber body, and further
A base for supporting the workpiece to be processed, which is placed in the chamber body, and
With a target located above the base and within the chamber body,
A reaction chamber comprising the liner assembly according to any one of claims 1 to 12, which is arranged inside the side wall of the chamber body and surrounds the inside. A coil wound along the outside of the side wall of the chamber body,
13. The reaction chamber according to claim 13, further comprising a radio frequency power source electrically connected to the coil. The length of each gap in the axial direction of the liner ring is longer than the axial length of the coil, and the orthogonal projection of the coil on the outer peripheral surface of the liner ring is the two ends of the gap in the axial direction of the liner ring. The reaction chamber according to claim 14, which is positioned between the two. A semiconductor processing apparatus comprising the reaction chamber according to any one of claims 13 to 15.