JPWO2019167129A1 - 欠陥検出装置、欠陥検出方法および欠陥観察装置 - Google Patents
欠陥検出装置、欠陥検出方法および欠陥観察装置 Download PDFInfo
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Abstract
Description
Claims (13)
- 被検査物に光を照射する照射系と、
光の照射により発生した散乱光を結像する光学系と、
前記光学系の結像面に配置されたマイクロレンズアレイと、
前記光学系の結像面からずらした位置に配置され、前記マイクロレンズアレイを通過した光を撮像する撮像素子と、
欠陥種類ごとに、あるいは欠陥の方向ごとに生成した複数のマスク画像を記憶するマスク画像記憶部と、
前記撮像素子より得られた画像に、前記複数のマスク画像でマスク処理を実行し、欠陥検出処理を行う演算部と、
を有する欠陥検出装置。 - 請求項1に記載の欠陥検出装置において、
前記マスク画像は、半導体ウェーハからの散乱光と、欠陥からの散乱光を区別するものである欠陥検出装置。 - 請求項1に記載の欠陥検出装置において、
前記演算部は、複数のマスク画像でマスク処理を実行して得られた画像の内、高輝度の画像から欠陥位置を検出する欠陥検出装置。 - 請求項1に記載の欠陥検出装置において、
欠陥検出処理で選択されたマスク画像に基づいて、欠陥種類を分類する欠陥分類部を有する欠陥検出装置。 - 被検査物に光を照射する照射系と、光の照射により発生した散乱光を結像する光学系と、前記光学系の結像面に配置されたマイクロレンズアレイと、前記光学系の結像面からずらした位置に配置され、前記マイクロレンズアレイを通過した光を撮像する撮像素子とを用いる欠陥検出方法であって、
欠陥種類ごとに、あるいは欠陥の方向ごとに生成された複数のマスク画像を記憶するステップと、
前記撮像素子より得られた画像に、前記複数のマスク画像によりマスク処理を行うステップと、
マスク処理を行った画像により欠陥検出を行うステップと
を有する欠陥検出方法。 - 請求項5に記載の欠陥検出方法において、
前記マスク画像は、半導体ウェーハからの散乱光と、欠陥からの散乱光を区別するものである欠陥検出方法。 - 請求項5に記載の欠陥検出方法において、
前記欠陥検出を行うステップは、複数のマスク画像でマスク処理を実行して得られた画像の内、高輝度の画像から欠陥位置を検出する欠陥検出方法。 - 請求項5に記載の欠陥検出方法において、更に、
欠陥検出処理で選択されたマスク画像に基づいて欠陥種類を分類するステップを有する欠陥検出方法。 - SEMと光学顕微鏡と画像処理部とを備える欠陥観察装置であって、
前記光学顕微鏡は、試料に光を照射する照射系と、光の照射により発生した散乱光を結像する光学系と、前記光学系の結像面に配置したマイクロレンズアレイと、前記光学系の結像面からずらした位置に配置され、前記マイクロレンズアレイを通過した光を撮像する撮像素子とを備え、
前記画像処理部は、欠陥の種類ごとに、あるいは欠陥の方向ごとに生成した複数のマスク画像を記憶するマスク画像記憶部と、前記撮像素子で撮像した撮像画像を記憶する画像記憶部と、前記マスク画像と前記撮像画像を用いて試料の欠陥位置を算出する演算部を備える欠陥観察装置。 - 請求項9に記載の欠陥観察装置において、
前記マスク画像は、半導体ウェーハからの散乱光と、欠陥からの散乱光を区別するものである欠陥観察装置。 - 請求項9に記載の欠陥観察装置において、
前記演算部は、複数のマスク画像でマスク処理を実行して得られた画像の内、高輝度の画像から欠陥位置を算出する欠陥観察装置。 - 請求項9に記載の欠陥観察装置において、
欠陥位置を算出のために使用されたマスク画像により、SEMで得た二次電子像、反射電子像など性質の異なる画像の混合比を変更して観察画像を生成する欠陥観察装置。 - 請求項9に記載の欠陥観察装置において、更に、
欠陥検出処理で選択されたマスク画像に基づいて、欠陥種類を分類する欠陥分類部を備える欠陥観察装置。
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