JPWO2019106800A1 - マトリックス膜形成装置 - Google Patents
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- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/24—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas with means, e.g. a container, for supplying liquid or other fluent material to a discharge device
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
- G01N33/68—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing involving proteins, peptides or amino acids
- G01N33/6803—General methods of protein analysis not limited to specific proteins or families of proteins
- G01N33/6848—Methods of protein analysis involving mass spectrometry
- G01N33/6851—Methods of protein analysis involving laser desorption ionisation mass spectrometry
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- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/08—Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means
- B05B12/12—Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means responsive to conditions of ambient medium or target, e.g. humidity, temperature position or movement of the target relative to the spray apparatus
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- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/14—Arrangements for controlling delivery; Arrangements for controlling the spray area for supplying a selected one of a plurality of liquids or other fluent materials or several in selected proportions to a spray apparatus, e.g. to a single spray outlet
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- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/06—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane
- B05B7/062—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane with only one liquid outlet and at least one gas outlet
- B05B7/063—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane with only one liquid outlet and at least one gas outlet one fluid being sucked by the other
- B05B7/064—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane with only one liquid outlet and at least one gas outlet one fluid being sucked by the other the liquid being sucked by the gas
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- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/06—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane
- B05B7/062—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane with only one liquid outlet and at least one gas outlet
- B05B7/066—Spray pistols; Apparatus for discharge with at least one outlet orifice surrounding another approximately in the same plane with only one liquid outlet and at least one gas outlet with an inner liquid outlet surrounded by at least one annular gas outlet
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/2813—Producing thin layers of samples on a substrate, e.g. smearing, spinning-on
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
- G01N27/64—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using wave or particle radiation to ionise a gas, e.g. in an ionisation chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
- H01J49/0431—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for liquid samples
- H01J49/0445—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for liquid samples with means for introducing as a spray, a jet or an aerosol
- H01J49/045—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for liquid samples with means for introducing as a spray, a jet or an aerosol with means for using a nebulising gas, i.e. pneumatically assisted
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
- H01J49/161—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser
- H01J49/164—Laser desorption/ionisation, e.g. matrix-assisted laser desorption/ionisation [MALDI]
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- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B16/00—Spray booths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
- H01J49/0409—Sample holders or containers
- H01J49/0418—Sample holders or containers for laser desorption, e.g. matrix-assisted laser desorption/ionisation [MALDI] plates or surface enhanced laser desorption/ionisation [SELDI] plates
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Abstract
Description
a) サンプルプレートが取り付けられるサンプルステージを収容したチャンバと、
b) 前記サンプルステージに向けて、マトリックス支援レーザ脱離イオン化法に用いるマトリックス物質を含む溶液を噴霧する噴霧ノズルと、
c) 前記チャンバに形成されたガス導入口と、
d) 前記ガス導入口に置換ガスを供給する置換ガス供給手段と、
e) 前記チャンバ内における前記置換ガスの流れを拡散させる置換ガス拡散手段と、
を有することを特徴としている。
f) 前記チャンバに形成されたガス排出口、
を有し、
前記置換ガス拡散手段が、前記サンプルプレートと前記ガス排出口の間に配置された、前記ガス排出口に向かうガスの流れを迂回させる迂回板を有することが望ましい。
g) 前記チャンバに形成されたガス排出口、
を有し、
前記チャンバが、前記噴霧ノズルによる噴霧の実行中において前記ガス導入口及びガス排出口以外が密閉されるものとすることが望ましい。
h) 前記噴霧ノズルによる前記溶液の噴霧の実行中において、前記ガス導入口に前記置換ガスを供給するよう前記置換ガス供給手段を制御する制御手段、
を有するものとすることが望ましい。
前記置換ガス供給手段が、前記噴霧ノズルから噴出する噴霧ガスの流量よりも大きい流量で、前記ガス導入口に前記置換ガスを供給するものであることが望ましい。
前記置換ガス供給手段が、前記ガス導入口に前記置換ガスを供給することにより、前記噴霧ノズルから噴出する噴霧ガスの前記チャンバ内の線速度よりも小さい線速度で、前記ガス導入口から前記置換ガスを噴出させるものであることが望ましい。
i) ガス源と、該ガス源から供給される不活性ガスを前記噴霧ノズルに供給する噴霧ガス供給手段、
を有し、
前記置換ガス供給手段が、前記噴霧ガス供給手段に設けられた前記ガス源から供給される不活性ガスを前記置換ガスとして前記ガス導入口に供給するものであることが望ましい。
11、81…サンプルステージ
12…XYステージ
13…ガス排出口
14…ガス導入口
15…拡散板
16…開口
17…迂回板
18…拡散管
19…開口
20、70…噴霧ノズル
21、71…溶液管
22、72…ガス管
23、73…ニードル
30、75…溶液容器
31…溶液供給管
32…抵抗管
40、74…ガス源
41…共通配管
42…マニホールド
43…ガス置換用バルブ
44…噴霧用バルブ
45…加圧用バルブ
46…噴霧ガス配管
47…置換ガス配管
48…加圧用ガス配管
49…排気管
51、52、53…圧力調整バルブ
54…圧力計
55、57…流量計
56…流量調整バルブ
60…制御部
61…入力部
P…サンプルプレート
Claims (9)
- a) サンプルプレートが取り付けられるサンプルステージを収容したチャンバと、
b) 前記サンプルステージに向けて、マトリックス支援レーザ脱離イオン化法に用いるマトリックス物質を含む溶液を噴霧する噴霧ノズルと、
c) 前記チャンバに形成されたガス導入口と、
d) 前記ガス導入口に置換ガスを供給する置換ガス供給手段と、
e) 前記チャンバ内における前記置換ガスの流れを拡散させる置換ガス拡散手段と、
を有することを特徴とするマトリックス膜形成装置。 - 前記置換ガス拡散手段が、前記ガス導入口と前記サンプルステージの間に配置された、複数の孔が形成された板である置換ガス拡散板を有することを特徴とする請求項1に記載のマトリックス膜形成装置。
- 前記置換ガス拡散手段が、前記チャンバ内に配置された管であって、一端が前記ガス導入口に接続され、周面に複数の開口が形成された置換ガス拡散管を有することを特徴とする請求項1に記載のマトリックス膜形成装置。
- 更に、
f) 前記チャンバに形成されたガス排出口、
を有し、
前記置換ガス拡散手段が、前記サンプルプレートと前記ガス排出口の間に配置された、前記ガス排出口に向かうガスの流れを迂回させる迂回板を有することを特徴とする請求項1に記載のマトリックス膜形成装置。 - 更に、
g) 前記チャンバに形成されたガス排出口、
を有し、
前記チャンバが、前記噴霧ノズルによる噴霧の実行中において前記ガス導入口及びガス排出口以外が密閉されることを特徴とする請求項1に記載のマトリックス膜形成装置。 - 更に、
h) 前記噴霧ノズルによる前記溶液の噴霧の実行中において、前記ガス導入口に前記置換ガスを供給するよう前記置換ガス供給手段を制御する制御手段、
を有することを特徴とする請求項1に記載のマトリックス膜形成装置。 - 前記置換ガス供給手段が、前記噴霧ノズルから噴出する噴霧ガスの流量よりも大きい流量で、前記ガス導入口に前記置換ガスを供給することを特徴とする請求項1に記載のマトリックス膜形成装置。
- 前記置換ガス供給手段が、前記ガス導入口に前記置換ガスを供給することにより、前記噴霧ノズルから噴出する噴霧ガスの前記チャンバ内の線速度よりも小さい線速度で、前記ガス導入口から前記置換ガスを噴出させることを特徴とする請求項1に記載のマトリックス膜形成装置。
- 更に、
i) ガス源と、該ガス源から供給される不活性ガスを前記噴霧ノズルに供給する噴霧ガス供給手段、
を有し、
前記置換ガス供給手段が、前記噴霧ガス供給手段に設けられた前記ガス源から供給される不活性ガスを前記置換ガスとして前記ガス導入口に供給することを特徴とする請求項1に記載のマトリックス膜形成装置。
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PCT/JP2017/043146 WO2019106800A1 (ja) | 2017-11-30 | 2017-11-30 | マトリックス膜形成装置 |
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JPWO2019106800A1 true JPWO2019106800A1 (ja) | 2020-10-08 |
JP6863474B2 JP6863474B2 (ja) | 2021-04-21 |
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JP (1) | JP6863474B2 (ja) |
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DE112019006947B4 (de) | 2019-03-01 | 2023-09-28 | Shimadzu Corporation | Matrixschichtaufbringungssystem und Matrixschichtaufbringungsverfahren |
JP6743224B1 (ja) * | 2019-03-20 | 2020-08-19 | 浜松ホトニクス株式会社 | 試料支持体、試料支持体の製造方法、イオン化法及び質量分析方法 |
JP7251431B2 (ja) * | 2019-10-04 | 2023-04-04 | 株式会社島津製作所 | Maldi用前処理装置 |
US20210387215A1 (en) * | 2020-06-10 | 2021-12-16 | Jtb Holdings, Llc | Airstream Propelled Spray Atomizer Apparatus and Method of Fluid Atomization by Codirectional Airstream Propulsion |
CN114749317B (zh) * | 2022-04-01 | 2023-12-19 | 中国科学院长春应用化学研究所 | 一种粉末喷涂固化系统 |
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JP2000111524A (ja) * | 1998-09-30 | 2000-04-21 | Shimadzu Corp | 質量分析装置 |
JP2010032219A (ja) * | 2008-07-24 | 2010-02-12 | Nec Corp | ペプチドの分解方法、ペプチドの分析方法、ペプチドの分解装置、ペプチドの分析装置 |
WO2010113210A1 (ja) * | 2009-03-31 | 2010-10-07 | 株式会社島津製作所 | 質量分析装置 |
US20150093780A1 (en) * | 2013-10-02 | 2015-04-02 | Bruker Daltonik Gmbh | Preparation of thin tissue sections for imaging mass spectrometry |
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US5381701A (en) * | 1993-03-26 | 1995-01-17 | At&T Corp. | Dust particle exposure chamber |
WO2001051680A1 (en) * | 2000-01-12 | 2001-07-19 | Tokyo Electron Limited | Vacuum processing apparatus |
JP2002098380A (ja) * | 2000-09-25 | 2002-04-05 | Air Cycle Kenkyusho:Kk | マンション屋内換気構造 |
KR100634451B1 (ko) * | 2005-01-10 | 2006-10-16 | 삼성전자주식회사 | 반도체 소자 제조 장치 |
WO2012078425A1 (en) * | 2010-12-07 | 2012-06-14 | University Of Florida Research Foundation, Inc. | Spraying system and methods of use thereof |
WO2013098606A1 (en) * | 2011-12-28 | 2013-07-04 | Dh Technologies Development Pte. Ltd. | Gas diffuser ion inlet |
JP5914690B2 (ja) * | 2012-11-05 | 2016-05-11 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
GB2550199B (en) * | 2016-05-13 | 2021-12-22 | Micromass Ltd | Enclosure for Ambient Ionisation Ion Source |
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- 2017-11-30 JP JP2019556491A patent/JP6863474B2/ja active Active
- 2017-11-30 WO PCT/JP2017/043146 patent/WO2019106800A1/ja active Application Filing
- 2017-11-30 US US16/760,752 patent/US20200346232A1/en not_active Abandoned
- 2017-11-30 CN CN201780096501.6A patent/CN111316092A/zh not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000111524A (ja) * | 1998-09-30 | 2000-04-21 | Shimadzu Corp | 質量分析装置 |
JP2010032219A (ja) * | 2008-07-24 | 2010-02-12 | Nec Corp | ペプチドの分解方法、ペプチドの分析方法、ペプチドの分解装置、ペプチドの分析装置 |
WO2010113210A1 (ja) * | 2009-03-31 | 2010-10-07 | 株式会社島津製作所 | 質量分析装置 |
US20150093780A1 (en) * | 2013-10-02 | 2015-04-02 | Bruker Daltonik Gmbh | Preparation of thin tissue sections for imaging mass spectrometry |
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US20200346232A1 (en) | 2020-11-05 |
WO2019106800A1 (ja) | 2019-06-06 |
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