JPWO2018045441A5 - - Google Patents

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Publication number
JPWO2018045441A5
JPWO2018045441A5 JP2019513887A JP2019513887A JPWO2018045441A5 JP WO2018045441 A5 JPWO2018045441 A5 JP WO2018045441A5 JP 2019513887 A JP2019513887 A JP 2019513887A JP 2019513887 A JP2019513887 A JP 2019513887A JP WO2018045441 A5 JPWO2018045441 A5 JP WO2018045441A5
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JP
Japan
Prior art keywords
complementary
rotation
axis
mounting structure
translational
Prior art date
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Application number
JP2019513887A
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English (en)
Japanese (ja)
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JP2019529902A5 (ru
JP7181184B2 (ja
JP2019529902A (ja
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Priority claimed from BR102016020900A external-priority patent/BR102016020900A2/pt
Application filed filed Critical
Priority claimed from PCT/BR2017/050262 external-priority patent/WO2018045441A1/pt
Priority claimed from BR102017019178-8A external-priority patent/BR102017019178B1/pt
Publication of JP2019529902A publication Critical patent/JP2019529902A/ja
Publication of JP2019529902A5 publication Critical patent/JP2019529902A5/ja
Publication of JPWO2018045441A5 publication Critical patent/JPWO2018045441A5/ja
Application granted granted Critical
Publication of JP7181184B2 publication Critical patent/JP7181184B2/ja
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JP2019513887A 2016-09-09 2017-09-06 シンクロトロンビームラインにおいて、ナノメートル機械的安定性及び分解能を有する光学素子を移動及び位置決めするための機器 Active JP7181184B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
BR102016020900A BR102016020900A2 (pt) 2016-09-09 2016-09-09 método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal
BRBR102016020900-5 2016-09-09
BRBR102017019178-8 2017-09-06
PCT/BR2017/050262 WO2018045441A1 (pt) 2016-09-09 2017-09-06 Instrumento para movimentação e posicionamento de elementos ópticos com resolução e estabilidade mecânica nanométricas em linhas de luz
BR102017019178-8A BR102017019178B1 (pt) 2017-09-06 2017-09-06 Instrumento para movimentação e posicionamento de elementos ópticos com resolução e estabilidade mecânica nanométricas em linhas de luz

Publications (4)

Publication Number Publication Date
JP2019529902A JP2019529902A (ja) 2019-10-17
JP2019529902A5 JP2019529902A5 (ru) 2021-07-26
JPWO2018045441A5 true JPWO2018045441A5 (ru) 2022-08-15
JP7181184B2 JP7181184B2 (ja) 2022-11-30

Family

ID=61561391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019513887A Active JP7181184B2 (ja) 2016-09-09 2017-09-06 シンクロトロンビームラインにおいて、ナノメートル機械的安定性及び分解能を有する光学素子を移動及び位置決めするための機器

Country Status (5)

Country Link
US (2) US20190204590A1 (ru)
JP (1) JP7181184B2 (ru)
AU (1) AU2017325120B2 (ru)
CA (1) CA3036294C (ru)
WO (1) WO2018045441A1 (ru)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240168395A1 (en) * 2022-11-18 2024-05-23 Orbotech Ltd. Vertical motion axis for imaging optical head

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590418B2 (ja) * 1992-06-25 1997-03-12 工業技術院長 ブタン液送システム
US5283682A (en) * 1992-10-06 1994-02-01 Ball Corporation Reactionless scanning and positioning system
EP1321822A1 (en) * 2001-12-21 2003-06-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7126671B2 (en) * 2003-04-04 2006-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8358039B2 (en) * 2008-10-17 2013-01-22 Massachusetts Institute Of Technology High-scan rate positioner for scanned probe microscopy
JP6048867B2 (ja) * 2012-04-17 2016-12-21 国立大学法人大阪大学 Ｘ線光学システム
DE102014204523A1 (de) * 2014-03-12 2015-09-17 Carl Zeiss Smt Gmbh Schwingungskompensiertes optisches system, lithographieanlage und verfahren

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