JPWO2017183168A1 - 荷電粒子顕微鏡および試料撮像方法 - Google Patents
荷電粒子顕微鏡および試料撮像方法 Download PDFInfo
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- H01J2237/2602—Details
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- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
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Abstract
Description
この結果より、試料ギャップの条件において二次電子信号由来の電離衝突による増幅分の計測が可能なことを確認した。
Claims (11)
- 荷電粒子線を集束し試料に照射する荷電粒子光学鏡筒と、
前記荷電粒子光学鏡筒内部の真空空間から前記試料が載置される非真空空間を分離する隔壁と、
上部電極と、
前記試料が載置される下部電極と、
前記上部電極または前記下部電極の少なくともいずれか一方に電圧を印加する電源と、
前記試料と前記隔壁の間隔を調整する試料ギャップ調整機構と、
前記下部電極に吸収された電流に基づいて前記試料の画像を形成する画像形成部と、を有する荷電粒子顕微鏡。 - 請求項1に記載の荷電粒子顕微鏡において、
前記隔壁は前記荷電粒子線が透過可能な薄膜または前記荷電粒子線が通過するオリフィスである荷電粒子顕微鏡。 - 請求項1に記載の荷電粒子顕微鏡において、
前記試料と前記隔壁の間隔は、前記試料が載置される非真空空間に存在する気体中での、前記荷電粒子線の平均自由工程に基づいて調整される荷電粒子顕微鏡。 - 請求項1に記載の荷電粒子顕微鏡において、
前記試料と前記隔壁の間隔は、前記試料が載置される非真空空間に存在する気体中での、前記試料から放出される反射電子の平均自由工程の3倍以下に調整される荷電粒子顕微鏡。 - 請求項1に記載の荷電粒子顕微鏡において、
前記隔壁の前記試料に対向する面には、絶縁部材または絶縁膜が配置される荷電粒子顕微鏡。 - 請求項1に記載の荷電粒子顕微鏡において、
前記荷電粒子線を前記試料に照射せずかつ前記上部電極と前記下部電極間に電界をかけた状態で、前記下部電極に吸収されるリーク電流を計測するリーク電流計測部を有し、
前記画像形成部は、前記荷電粒子線を前記試料に照射しかつ前記上部電極と前記下部電極間に電界をかけた状態で前記下部電極に吸収された電流から、前記リーク電流を差し引いた電流値に基づいて前記画像を形成する荷電粒子顕微鏡。 - 請求項6に記載の荷電粒子顕微鏡において、
前記リーク電流の大きさと、前記試料と前記隔壁の間隔との関係を記憶する記憶部と、
前記リーク電流の大きさに基づいて、前記試料と前記隔壁の間隔を求める制御部とを有する荷電粒子顕微鏡。 - 前記荷電粒子光学鏡筒内部の真空空間から隔壁によって分離された非真空空間に配置された下部電極に試料を載置し、
集束した荷電粒子線を前記試料に照射し、
前記上部電極または前記下部電極の少なくともいずれか一方に電圧を印加し、
前記試料と前記隔壁の間隔を調整し、
前記下部電極に吸収された電流を測定し、
前記電流に基づいて前記試料の画像を形成する試料撮像方法。 - 請求項8に記載の試料撮像方法において、
前記試料が載置される非真空空間に存在する気体中での、前記試料からの放出電子の平均自由工程に基づいて、前記試料と前記隔壁の間隔を調整する試料撮像方法。 - 請求項8に記載の試料撮像方法において、
前記試料から放出される反射電子の前記非真空空間における平均自由工程の3倍以下に、前記試料と前記隔壁の間隔を調整する試料撮像方法。 - 請求項8に記載の試料撮像方法において、
前記荷電粒子線を前記試料に照射せずかつ前記上部電極と前記下部電極間に電界をかけた状態で、前記下部電極に吸収されるリーク電流を計測し、
前記荷電粒子線を前記試料に照射しかつ前記上部電極と前記下部電極間に電界をかけた状態で前記下部電極に吸収された電流から、前記リーク電流を差し引いた電流値に基づいて前記画像を形成する試料撮像方法。
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PCT/JP2016/062697 WO2017183168A1 (ja) | 2016-04-22 | 2016-04-22 | 荷電粒子顕微鏡および試料撮像方法 |
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US (1) | US20210233740A1 (ja) |
JP (1) | JP6539779B2 (ja) |
CN (1) | CN109075002B (ja) |
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JP7218381B2 (ja) * | 2018-10-25 | 2023-02-06 | 株式会社日立ハイテク | 荷電粒子線装置、荷電粒子線装置のオートフォーカス処理方法、及び検出器 |
US11355624B2 (en) * | 2019-04-05 | 2022-06-07 | Stmicroelectronics S.R.L. | Electrically confined ballistic devices and methods |
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JP2004259577A (ja) * | 2003-02-26 | 2004-09-16 | Hitachi Displays Ltd | 平板型画像表示装置 |
JP2005149733A (ja) * | 2003-11-11 | 2005-06-09 | Jeol Ltd | 走査電子顕微鏡 |
JP2008262886A (ja) | 2007-04-12 | 2008-10-30 | Beam Seiko:Kk | 走査型電子顕微鏡装置 |
WO2010084860A1 (ja) * | 2009-01-22 | 2010-07-29 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡 |
JP5707082B2 (ja) * | 2010-10-08 | 2015-04-22 | 株式会社日立ハイテクノロジーズ | 液体の表面を浮遊する試料の走査電子顕微鏡観察方法 |
US9679741B2 (en) * | 2010-11-09 | 2017-06-13 | Fei Company | Environmental cell for charged particle beam system |
JP5914020B2 (ja) * | 2012-02-09 | 2016-05-11 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
JP5936484B2 (ja) * | 2012-08-20 | 2016-06-22 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び試料観察方法 |
JP2014053073A (ja) * | 2012-09-05 | 2014-03-20 | Hitachi High-Technologies Corp | 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 |
JP5909431B2 (ja) * | 2012-09-27 | 2016-04-26 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
US9633817B2 (en) * | 2013-08-23 | 2017-04-25 | Hitachi High-Technologies Corporation | Diaphragm mounting member and charged particle beam device |
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- 2016-04-22 US US16/094,281 patent/US20210233740A1/en not_active Abandoned
- 2016-04-22 WO PCT/JP2016/062697 patent/WO2017183168A1/ja active Application Filing
- 2016-04-22 CN CN201680084947.2A patent/CN109075002B/zh not_active Expired - Fee Related
- 2016-04-22 JP JP2018512729A patent/JP6539779B2/ja active Active
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DE112016006577T5 (de) | 2018-11-22 |
CN109075002A (zh) | 2018-12-21 |
CN109075002B (zh) | 2020-09-29 |
JP6539779B2 (ja) | 2019-07-03 |
US20210233740A1 (en) | 2021-07-29 |
WO2017183168A1 (ja) | 2017-10-26 |
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