JPWO2016017414A1 - Direct drawing type exposure system - Google Patents

Abstract

The direct-drawing type exposure apparatus (100) performs pattern exposure by directly irradiating an exposure light beam (1b) to a film-like photosensitive resin (PP) held on a base material (B), The light source (1) that outputs the exposure light beam (1b), the base (2), and the lower surface peripheral area of the base material (B) can be supported, and the base material (in the optical axis direction of the exposure light beam (1b)) Displacement mechanisms (4a to 4d) that operate so as to displace B) and a support member (7) that can support the lower surface central region of the base material (B). In the state where the support member (7) displaces the base material (B) by the displacement mechanism (4a to 4d), and the upper surface of the support member (7) and the lower surface central region of the base material (B) are brought into contact with each other. The optical axis of the exposure light beam (1b) and the upper surface of the support member (7) are arranged above the base (2) so as to be orthogonal to each other.

Description

  The present invention relates to a direct-drawing type exposure apparatus that pattern-exposes a photosensitive resin by directly irradiating a photosensitive resin with a light having a wavelength in the ultraviolet region without drawing a mask and drawing a predetermined pattern. is there.

  Screen printing is often used to form wiring patterns and electrode patterns in the manufacture of electronic components.

  Screen printing is a technique for printing ink on a printing object through a screen printing plate in which a mesh cloth called a cocoon, which is made to have a predetermined opening pattern, is stretched around a frame.

  For making a screen printing plate, a photosensitive resin is applied to the ridge, exposed to ultraviolet rays through a mask (original plate), exposed, and then unnecessary portions are washed away (developed) to form a predetermined opening pattern. It is done by getting.

  By the way, in recent years, a direct drawing type exposure apparatus that pattern-exposes a photosensitive resin by directly irradiating the photosensitive resin with an exposure light beam having a wavelength in the ultraviolet region without drawing a mask and drawing a predetermined pattern has become widespread. Have begun to do.

  As an example of such a direct drawing type exposure apparatus, for example, in Japanese Patent Application Laid-Open No. 11-320968 (Patent Document 1), a direct drawing type in which pattern exposure is performed using a digital micromirror device (hereinafter referred to as DMD). An exposure apparatus has been proposed.

  FIG. 9 is an explanatory diagram of the direct drawing type exposure apparatus 200 described in the above publication. FIG. 9A is a schematic block diagram of the direct drawing type exposure apparatus 200. FIG. 9B is a schematic diagram showing a mirror configuration of the DMD 205 used in the direct drawing type exposure apparatus 200. FIG. 9C is a partially enlarged view of FIG.

  As shown in FIG. 9B, the DMD 205 includes m microscopic square mirrors M in the horizontal direction (the left-right direction in FIG. 9B and the direction in which the micromirrors M form a row) in the vertical direction ( 9 rows are arranged in the vertical direction in FIG. 9B and in which the rows of micromirrors M are arranged. A gap g is provided between the minute mirrors M adjacent to each other in the lateral direction. The micromirrors M in each row (M11 to M16) are arranged with a predetermined distance from the micromirrors M in the adjacent upper and lower rows.

  As shown in FIG. 9A, the photosensitive resin PP that is an exposure object is in the form of a film, for example, in the form of a dry film of a single resin, or a liquid resin is applied on a substrate (not shown). After that, it is placed on the table 203 in a dried state. The table 203 is movable on the base 202 in the Y direction.

  As shown in FIG. 9C, each micromirror M is configured such that the end Mb is rotatable about a diagonal line connecting the pair of end Ma as a rotation axis. The DMD control device 206 individually controls the rotation of each micromirror M of the DMD 205.

  Light having a wavelength in the ultraviolet region output from the light source 201 is converted into parallel light 201 a by the collimator lens 204 and enters the DMD 205. The direction of the reflected light of the parallel light 201a is determined by how each incident micromirror M is rotated.

  The reflected light from some of the micromirrors M is condensed by the microlens 207, and becomes an exposure light beam 201b, which is irradiated onto the exposure surface of the photosensitive resin PP, thereby contributing to exposure. On the other hand, the reflected light from another micromirror M is irradiated to a position away from the photosensitive resin PP and does not contribute to exposure.

  That is, in the direct drawing type exposure apparatus 200, the photosensitive resin PP can be subjected to pattern exposure by controlling the individual rotation angle of the micro mirror M of the DMD 205.

JP-A-11-320968

  Here, as shown in FIG. 10A, a liquid photosensitive resin PP is applied on the ridge S stretched on the frame body F, and then dried, the screen printing plate is patterned by the direct drawing type exposure apparatus 200. Think about exposure.

  In the above screen printing plate, the liquid photosensitive resin PP is applied on the ridge S with a uniform film thickness so that the upper surface PPu and the lower surface PPl in the drawing are parallel to each other. It is assumed that the thickness of the frame F is not uniform.

  When such a screen printing plate is placed on the table 203 with the upper surface PPu as an exposure surface, the heel S stretched on the frame F is slightly inclined with respect to the upper surface of the table 203. If the inclination angle is θ, the optical axis 201c of the exposure light beam 201b and the upper surface PPu are not orthogonal to each other, and the normal direction PPn of the upper surface PPu is inclined by the angle θ with respect to the optical axis 201c of the exposure light beam 201b. .

  When exposed and developed in this state, as shown in FIG. 10 (B), it is inclined by an angle θ with respect to the normal direction PPn of the upper surface PPu, and the opening position Au on the upper surface PPu side and the opening position Al on the lower surface PPl side. A misaligned opening pattern is formed.

  Screen printing is performed such that the upper surface PPu of the photosensitive resin in FIG. On the other hand, alignment with the printing object is performed from the lower surface PPl side. If the opening position is shifted between the upper surface PPu side and the lower surface PPl side, the ink is actually printed on the printing object even if alignment is performed at the opening position on the lower surface PPl side. Thus, printing misalignment occurs.

  Further, when the optical axis 201c of the exposure light beam 201b and the upper surface PPu are not orthogonal to each other, the projected image of the exposure light beam 201b on the upper surface PPu is distorted according to the deviation from the orthogonality. For example, if the cross section perpendicular to the optical axis 201c of the exposure light beam 201b is circular, the exposure light beam 201b is distorted into an ellipse on the upper surface PPu. If the projection image of the exposure light beam 201b on the upper surface PPu has a distortion, the opening pattern is also distorted.

  Therefore, an object of the present invention is to perform pattern exposure in a state where the optical axis of the exposure light beam is always orthogonal to the exposure surface of the photosensitive resin, even if the thickness of the substrate supporting the photosensitive resin is not uniform. It is to provide a direct drawing type exposure apparatus that can be used.

  In this invention, the height position of the base material supporting the photosensitive resin at the time of exposure is such that the pattern exposure can be performed with the optical axis of the exposure light beam orthogonal to the exposure surface of the photosensitive resin. Improvements to the mechanism for determining the value are made.

  The direct drawing type exposure apparatus according to the present invention performs pattern exposure by directly irradiating an exposure light beam in a predetermined pattern onto a film-like photosensitive resin held on a plate-like substrate with the following configuration.

  A direct-drawing exposure apparatus according to the present invention includes a light source that outputs an exposure light beam, a base, a plurality of displacement mechanisms including a drive unit and a drive shaft, a support member that can support the lower surface central region of the substrate, Is provided.

  The plurality of displacement mechanisms can support the lower surface peripheral region of the substrate and operate to displace the substrate in the optical axis direction of the exposure light beam. In the support member, the optical axis of the exposure light beam and the upper surface of the support member are orthogonal to each other in a state where the base member is displaced by a plurality of displacement mechanisms and the upper surface of the support member and the lower surface central region of the support member are in contact with each other. As described above, it is disposed above the base.

  In the direct drawing type exposure apparatus, the optical axis of the exposure light beam and the upper surface of the base material in a state where the plurality of displacement mechanisms displace the base material and the upper surface of the support member and the lower surface central region of the base material are in contact with each other. And are orthogonal.

  Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam is always orthogonal to the upper surface (exposure surface) of the photosensitive resin provided on the upper surface of the substrate within an allowable error range. .

  That is, the opening position of the opening pattern does not shift between the upper surface side and the lower surface (positioning surface) side of the photosensitive resin. Further, the opening pattern is not distorted.

  Therefore, when a photosensitive resin is used for a printing plate such as a screen printing plate, a highly accurate opening pattern can be obtained, so that ink can be printed with high accuracy at a desired position after alignment. .

  In a first preferred embodiment of the direct drawing type exposure apparatus according to the present invention, the drive shaft has an elastically deforming portion that is elastically deformed with respect to axial stress.

  The base material is supported by the drive shaft of the displacement mechanism in a state where the elastic deformation portion is deformed by its weight at the initial position.

  In the direct drawing type exposure apparatus, the support member receives at least a part of the weight of the base material when the upper surface of the support member comes into contact with the lower surface central region of the base material. As a result, the elastically deforming portion of the drive shaft is reversely deformed so as to return to the original shape as much as the load applied in the axial direction is reduced.

  Therefore, even if the displacement mechanism further displaces the base material after the upper surface of the support member and the lower surface center region of the base material are in contact, the elastic deformation portion only slightly reversely deforms. Continue to support. That is, it is avoided that the base material is suddenly supported only by the support member.

  For example, as the base material, a mesh cloth called a heel stretched as described above is used for the frame, the frame is not supported by the drive shaft, and the lower surface central region of the heel is supported by the support member. Consider the state of being supported. In this state, the heel may be pulled by the weight of the frame and elastically deformed.

  If the elastic deformation of the eyelids cannot be ignored, assuming that exposure is performed in an elastically deformed state, the exposure pattern is deformed by releasing the elastic deformation and becomes different from the desired opening pattern.

  On the other hand, let us consider a state in which the frame body is continuously supported by the drive shaft until the elastic deformation portion returns to the original shape as described above. In this state, the heel is hardly pulled because the heel only has a very small frame weight. That is, no elastic deformation that cannot be ignored occurs in the heel. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, by exposing the photosensitive resin in that state, a more accurate opening pattern can be obtained.

  The second preferred embodiment of the direct-drawing exposure apparatus according to the present invention further comprises a load detection unit that is connected to the drive shaft and detects a load applied in the axial direction of the drive shaft, and a control device.

  The control device performs control so as to give an operation command to stop the operation to the drive unit based on information that informs that the load detected by the load detection unit has decreased to a predetermined value.

  In the above-described direct drawing type exposure apparatus, the load applied to the drive shaft reaches a predetermined value as a result of the support member receiving at least a part of the weight of the substrate by the substrate contacting the support member. The load detection unit detects the decrease. The information is transmitted to the control device, and the control device gives an operation command to stop the operation to the drive unit based on the information.

  In other words, the displacement mechanism reliably displaces the base material until the load detection unit detects that the load applied to the drive shaft has decreased to a predetermined value. Therefore, the upper surface of the support member and the center area of the lower surface of the substrate can be reliably brought into contact with each other, and the optical axis of the exposure light beam and the upper surface of the support member can be reliably orthogonal to each other.

  Note that when the base material comes into contact with the support member, the load detected by the load detection unit in the vicinity of the contact portion decreases rapidly. And if a base material leaves | separates from the drive shaft near the contact location, the load concerning the drive shaft will no longer be detected. Therefore, the predetermined value is preferably a load value of about 80 to 99% of the load value detected by the load detection unit before the base material comes into contact with the support member.

  In the direct drawing type exposure apparatus, when the load detection unit detects that the load applied to the drive shaft starts to be reduced, the control unit controls the drive unit to give an operation command to stop the operation. Thus, the drive unit does not need to displace the drive shaft too much. That is, as in the first preferred embodiment, it is possible to avoid the base material being supported only by the support member.

  For example, as a base material, a material in which a heel is stretched on a frame body as described above is used, and a state in which the frame body is supported by a drive shaft of a displacement mechanism at an initial position is considered. Then, when the load detection unit detects the start of reduction of the load applied to the drive shaft, the control device stops the operation of the drive unit so that the frame body is continuously supported by the drive shaft. In this state, the heel is hardly pulled as in the first preferred embodiment. That is, no elastic deformation that cannot be ignored occurs in the heel.

  In addition, in the state where all the load detection units detect a decrease in load and all the drive units stop operating, the upper surface of the support member comes into contact with the central region of the lower surface of the ridge, and the optical axis of the exposure light beam and the ridge It is orthogonal to the top surface. In this state, the exposure surface of the photosensitive resin applied to the upper surface of the ridge is not inclined with respect to the optical axis of the exposure light beam. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, an opening pattern with higher accuracy can be obtained as in the first preferred embodiment.

  A third preferred embodiment of the direct-drawing type exposure apparatus according to the present invention is a distance detection unit that detects a distance to the upper surface of the base material corresponding to a location supported by the drive shaft in the lower peripheral edge region of the base material. And a control device.

  The control device gives an operation command for stopping the operation to the drive unit based on information from the distance detection unit that informs that the distance between the distance detection unit and the upper surface of the base material has increased to a predetermined value. To control.

  In the direct drawing type exposure apparatus, the distance detection unit detects that the distance between the distance detection unit and the upper surface of the substrate has increased to a predetermined value as a result of the plurality of displacement mechanisms displacing the substrate. . The information is transmitted to the control device, and the control device gives an operation command to stop the operation to the drive unit based on the information.

  In other words, the displacement mechanism reliably displaces the substrate until the distance detection unit detects that the distance between the distance detection unit and the upper surface of the substrate has increased to a predetermined value. Therefore, both the contact between the upper surface of the support member and the lower surface central region of the base material and the contact between the lower surface peripheral region of the base material and the drive shaft are ensured, and the optical axis of the exposure light beam and the upper surface of the support member are reliably secured. Can be orthogonal.

  Moreover, it is preferable that said predetermined value is a distance between the distance detection part and the upper surface of a base material when the upper surface of a supporting member and the lower surface center area | region of a base material contact | abut. In the above-described direct drawing type exposure apparatus, when the distance detected by the distance detection unit reaches that value, the control unit controls the drive unit to give an operation command to stop the operation, thereby driving the drive unit. It is not necessary to displace the shaft too much. That is, as in the first and second preferred embodiments, it can be avoided that the base material is supported only by the support member.

  For example, as described above, a base material in which a heel is stretched on a frame body is used, and a state in which the frame body is supported by a drive shaft of a displacement mechanism at an initial position is considered. Then, the drive shaft is displaced by the drive unit, and when the distance detected by the distance detection unit reaches the predetermined value, the control device stops the operation of the drive unit, and the frame body is continuously supported by the drive shaft. Like that. In this state, the heel is hardly pulled as in the first preferred embodiment. That is, no elastic deformation that cannot be ignored occurs in the heel.

  In addition, when the distances detected by all the distance detection units become a predetermined distance and all the driving units stop operating, the upper surface of the support member is in contact with the central region of the lower surface of the collar, and the optical axis of the exposure light beam It is perpendicular to the top surface of the ridge. In this state, the exposure surface of the photosensitive resin applied to the upper surface of the ridge is not inclined with respect to the optical axis of the exposure light beam. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, as with the first and second preferred embodiments, a more accurate opening pattern can be obtained.

  In a fourth preferred embodiment of the direct drawing type exposure apparatus according to the present invention, an inclination detection mechanism and an inclination adjustment mechanism are further provided. The control device performs control so that an operation command for adjusting the tilt angle of the base is given to the tilt adjustment mechanism based on information from the tilt detection mechanism.

  In the direct drawing type exposure apparatus described above, the control device adjusts the tilt angle of the base by operating the tilt adjustment mechanism based on information from the tilt detection mechanism.

  Since the support member is installed on the base, the inclination angle thereof can be adjusted by adjusting the inclination angle of the base.

  Therefore, by adjusting the inclination angle of the base, the angle between the optical axis of the exposure light beam and the upper surface of the substrate is orthogonal in the state where the upper surface of the support member and the lower surface central region of the substrate are in contact with each other. Can be adjusted as follows. That is, by performing exposure in this state, a more accurate opening pattern can be obtained.

  In the direct drawing type exposure apparatus according to the present invention, the optical axis of the exposure light beam and the upper surface of the substrate are orthogonal to each other in a state where the upper surface of the support member and the lower surface central region of the substrate are in contact with each other.

  Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam is always orthogonal to the upper surface (exposure surface) of the photosensitive resin provided on the upper surface of the substrate within an allowable error range. .

  That is, the opening position of the opening pattern does not shift between the upper surface side and the lower surface (positioning surface) side of the photosensitive resin. Further, the opening pattern is not distorted.

  Therefore, when a photosensitive resin is used for a printing plate such as a screen printing plate, a highly accurate opening pattern can be obtained, so that ink can be printed with high accuracy at a desired position after alignment. .

It is sectional drawing (arrow sectional drawing of the arrow of the surface containing the Y1-Y1 line | wire of FIG. 2) of the direct drawing type exposure apparatus 100 concerning this invention. It is a top view of the principal part of the direct drawing type exposure apparatus 100 concerning this invention. FIG. 2 is a cross-sectional view corresponding to FIG. 1 for schematically explaining the positioning of the height position of the base material B by the support member 7 in the direct drawing type exposure apparatus 100 according to the present invention. Sectional view of the state in which the material B is in the initial position (position before the displacement mechanisms 4a and 4b operate), (B) shows the portion Sb of the kite S close to the drive shaft 6b in contact with the upper surface of the support member 7 FIG. 6C is a cross-sectional view showing a state where the portion Sa of the heel S near the drive shaft 6a also abuts the upper surface of the support member 7, and as a result, the upper surface of the support member 7 and the lower surface central region of the heel S are in close contact. It is sectional drawing of the state contacted. It is sectional drawing equivalent to FIG. 1 of 1st modification 100A in the direct drawing type exposure apparatus which concerns on this invention. It is sectional drawing equivalent to FIG. 1 of the 2nd modification 100B in the direct drawing type exposure apparatus which concerns on this invention. It is sectional drawing equivalent to FIG. 1 of the 3rd modification 100C in the direct drawing type exposure apparatus which concerns on this invention. It is a partial see-through perspective view of the 4th modification 100D in the direct drawing type exposure apparatus concerning this invention. It is a top view of the principal part of 4th modification 100D in the direct drawing type exposure apparatus which concerns on this invention. It is explanatory drawing of the direct drawing type exposure apparatus 200 of background art, (A) is a schematic block diagram of the direct drawing type exposure apparatus 200, (B) is the mirror of DMD205 used for the direct drawing type exposure apparatus 200 The schematic diagram which shows a structure, (C) is the elements on larger scale of (B). FIG. 9 is an explanatory diagram for explaining a problem to be solved by the present invention, and FIG. 9A shows a photosensitive resin PP on a ridge S stretched on a frame F having a non-uniform thickness. Sectional drawing which shows typically the principal part of the direct drawing type exposure apparatus 200 in the case of carrying out pattern exposure using the direct drawing type exposure apparatus 200 of the background art, (B) is the elements on larger scale of (A). .

  Embodiments of the present invention will be described below to describe the features of the present invention in more detail.

<Embodiment of direct drawing type exposure apparatus according to the present invention>
An embodiment of a direct drawing type exposure apparatus according to the present invention will be described with reference to FIGS.

  FIG. 1 is a sectional view of a direct drawing type exposure apparatus 100 according to this embodiment. FIG. 2 is a top view of the main part of the direct drawing type exposure apparatus 100 according to this embodiment. FIG. 1 is a cross-sectional view of the plane including the Y1-Y1 line of FIG.

  With reference to FIGS. 1 and 2, a direct drawing type exposure apparatus 100 according to this embodiment exposes a film-like photosensitive resin PP held on the upper surface of a plate-like substrate B with the following configuration. Pattern exposure is performed by directly irradiating the light beam 1b in a predetermined pattern.

  In FIG. 1, as the base material B, a material in which a mesh cloth called heel S is stretched around the frame F as described above is used. As the base material B, a desired material such as a plate-shaped member made of any material can be used. The photosensitive resin PP is also in the form of a film as described above, for example, in the form of a dry film of a single resin, or in a state in which a liquid resin is applied on the ridge S and then dried. Things can be used.

  Note that the non-uniformity of the thickness of the photosensitive resin PP is negligible, and the upper surface PPu (exposure surface) is substantially parallel to the upper surface of the base material B (ＢS).

  The direct drawing type exposure apparatus 100 includes a light source 1, a base 2, displacement mechanisms 4 a to 4 d, and a support member 7.

  The light source 1 outputs an exposure light beam 1b. The exposure light beam 1b is a light beam having a wavelength that causes a chemical change in the photosensitive resin PP. As a light emitter of the light source 1 for that purpose, for example, an ultraviolet laser, an ultra-high pressure mercury lamp, or an LED that emits light having a wavelength in the ultraviolet region can be used. The light source 1 may further include a lens system such as a collimator lens or a condenser lens.

  In FIG. 1, the light source 1 is movable in the horizontal direction and the vertical direction by a horizontal movement mechanism 1h and a vertical movement mechanism 1v. That is, in FIG. 1, pattern exposure is performed by moving the light source 1 horizontally by the horizontal movement mechanism 1 h without moving the base 2. Further, the focus position is adjusted by moving the light source 1 up and down by the vertical movement mechanism 1v.

  In order to perform pattern exposure, the irradiation position of the exposure light beam is changed by using the DMD described in JP-A-11-320968 and a reflecting mirror such as a galvanometer mirror without moving the light source 1. You may do it. Further, pattern exposure may be performed by moving the base 2 in at least one of the horizontal direction and the vertical direction by at least one of a horizontal movement mechanism and a vertical movement mechanism provided separately.

  The base 2 is not particularly limited in shape, and may be a flat plate or a recess formed by a bottom portion and a side wall. In the direct-drawing type exposure apparatus 100 according to this embodiment, drive units 5a to 5d that drive displacement mechanisms 4a to 4d described later are respectively installed in recesses 3a to 3d provided on the upper surface of the base 2. . For example, the drive part 5a is installed in the recessed part 3a. Similarly to the drive unit 5a, the drive units 5b to 5d are also installed in the corresponding recesses 3b to 3d, respectively. In addition, you may make it the drive parts 5a-5d install in the upper surface of the flat base 2 in which the recessed parts 3a-3d are not provided.

  The displacement mechanisms 4a to 4d include a drive unit and a drive shaft that is displaced by the drive unit. For example, the displacement mechanism 4a includes a drive unit 5a and a drive shaft 6a that is displaced by the drive unit 5a. The displacement mechanisms 4b to 4d have the same configuration as the displacement mechanism 4a, and include a drive unit 5b and a drive shaft 6b, a drive unit 5c and a drive shaft 6c, a drive shaft 5d and a drive shaft 6d, respectively. The drive parts 5a-5d are each installed in the corresponding recessed part 3a-3d provided in the upper surface of the base 2, as mentioned above.

  As the drive units 5a to 5d, for example, a cylinder stroke adjustment mechanism by pneumatic pressure or hydraulic pressure, a linear motion mechanism by a ball screw connected to a servo motor, a stepping motor with a lead screw, or the like can be preferably used. The positional relationship between the drive unit and the drive shaft is not limited to that shown in FIG. 1. For example, a linear motor in which the drive shaft is installed on the upper surface of the base 2 and the drive unit moves on the drive shaft is used. It may be anything.

  The displacement mechanisms 4a to 4d can support the lower surface peripheral region of the base material B by the drive shafts included in each of the displacement mechanisms 4a to 4d. Further, the displacement mechanisms 4a to 4d displace the base material B in the optical axis direction of the exposure light beam 1b by driving the drive shafts by drive units to which the drive shafts are connected.

  That is, by operating the displacement mechanisms 4a to 4d to displace the base material B, it is possible to bring the upper surface of the support member 7 described later into contact with the lower surface central region of the base material B.

  In the direct drawing type exposure apparatus 100 according to this embodiment, the displacement mechanisms 4a to 4d are configured so that each can operate independently. In addition, the drive parts 5a-5d are set so that the drive of the connected drive shaft may be stopped and maintained in a predetermined position (to be in a hold state).

  In the support member 7, the optical axis of the exposure light beam 1 b and the upper surface of the support member 7 are orthogonal within an allowable error range in a state where the upper surface of the support member 7 and the lower surface central region of the base material B are in contact with each other. Thus, the stem 8 is disposed at a predetermined height above the base 2. An air passage 8 </ b> A is provided inside the stem 8.

  Moreover, the support member 7 has an air passage 7 </ b> A that opens on the upper surface thereof. The air passage 7A communicates with a decompression mechanism (not shown) through an air chamber 7R and an air passage 8A formed by the flange portion 8G of the stem 8 and a recess provided on the lower surface of the support member 7. With such a configuration, the upper surface of the support member 7 is capable of adsorbing the lower surface central region of the base material B under reduced pressure.

  Since the direct drawing type exposure apparatus 100 according to this embodiment has the above-described configuration, the lower surface central region of the base material B is supported in a state where the upper surface of the support member 7 and the lower surface central region of the base material B are in close contact with each other. Adsorbed and fixed by the member 7.

  Therefore, in this state, the upper surface of the support member 7 and the upper surface PPu (exposure surface) of the photosensitive resin PP held on the upper surface of the base material B are parallel to each other.

  Next, positioning of the height position of the base material B during exposure by the displacement mechanisms 4a to 4d and the support member 7 will be described with reference to FIG.

  As a specific example, let us consider a case where the base material B is a screen printing plate including the frame body F and the wrinkles S stretched thereon, and the thickness of the frame body F is not uniform. In order to simplify the explanation, it is assumed that the base material B is displaced in the optical axis direction of the exposure light beam 1b by the displacement mechanisms 4a and 4b. Actually, including the displacement mechanisms 4c and 4d, the base material B is displaced in the optical axis direction of the exposure light beam 1b to position the base material B at the time of exposure.

  Here, it is assumed that the thickness (Fa) of the frame body F that is displaced by the displacement mechanism 4a is larger than the thickness (Fb) of the location that is displaced by the displacement mechanism 4b (see also FIG. 9A).

  Further, as described above, the support member 7 allows the optical axis of the exposure light beam 1b and the upper surface of the support member 7 to be allowed when the upper surface of the support member 7 and the lower surface central region of the base material B are in contact with each other. The stem 8 is disposed at a predetermined height above the base 2 so as to be orthogonal within a possible error range.

  FIG. 3 (A) shows that the drive shafts 6a and 6b of the displacement mechanisms 4a and 4b supporting the lower surface peripheral region of the base material B are in the initial positions (before the displacement mechanisms 4a and 4b are operated). It is sectional drawing showing the state in a position of (). In addition, in the initial position, the height position H from the upper surface of the base 2 of the edge part which contact | abuts to the frame F of the drive shafts 6a and 6b is the same.

  Therefore, the height position of the portion Sb close to the drive shaft 6b of the heel S stretched on the frame F is lower than the height position of the portion Sa close to the drive shaft 6a. That is, the portion Sb of the rod S near the drive shaft 6b is closer to the support member 7 than the portion Sa near the drive shaft 6a. Therefore, the normal direction PPn of the upper surface PPu of the photosensitive resin PP is inclined by the angle θ with respect to the optical axis 1c of the exposure light beam 1b.

  FIG. 3B shows a state in which the portion Sb close to the drive shaft 6b of the heel S is in contact with the upper surface of the support member 7 when the displacement mechanisms 4a and 4b are operated and the frame body F is displaced. It is sectional drawing.

  When the drive shafts 6a and 6b are displaced from the state shown in FIG. 3A, the portion Sb of the heel S close to the drive shaft 6b contacts the upper surface of the support member 7 first by the difference in thickness between Fa and Fb. Touch. At this time, the operation of the drive unit 5b of the displacement mechanism 4b is stopped, and the displacement mechanism 4b is placed in the hold state. Therefore, the frame F is continuously supported by the drive shaft 6b.

  On the other hand, at this point, the portion Sa of the rod S close to the drive shaft 6a has not yet contacted the upper surface of the support member 7. Since the displacement mechanisms 4a and 4b are configured to be able to operate independently, the displacement mechanism 4a continues to move the frame F even when the displacement mechanism 4b is in the hold state.

  FIG. 3C is a cross-sectional view showing a state in which the portion Sa near the drive shaft 6a of the heel S is also in contact with the upper surface of the support member 7 as the displacement mechanism 4a continues to operate and the drive shaft 6a is further displaced. It is. As a result, the upper surface of the support member 7 and the lower surface central region of the flange S are in close contact with each other.

  When the location of the frame F supported by the drive shaft 6a is displaced from the state shown in FIG. 3B, the portion Sa of the kite S close to the drive shaft 6a will eventually come into contact with the upper surface of the support member 7. At this time, the operation of the drive unit 5a of the displacement mechanism 4a is stopped, and the displacement mechanism 4a is placed in the hold state. Therefore, the frame F is continuously supported also by the drive shaft 6a.

  Through the above-described steps, in the direct drawing type exposure apparatus 100 according to this embodiment, the height position of the base material B so that the upper surface of the support member 7 and the lower surface central region of the ridge S are in close contact with each other. Is positioned. In this state, the upper surface of the support member 7 and the upper surface PPu (exposure surface) of the photosensitive resin PP held on the upper surface of the ridge S are parallel to each other. Therefore, in the above state, the upper surface PPu (exposure surface) of the photosensitive resin PP is at a height position orthogonal to the optical axis of the exposure light beam 1b within an allowable error range.

  Furthermore, even after the height position of the base material B is positioned, the frame F is continuously supported by the drive shafts 6a and 6b. In this state, the heel is hardly pulled because the heel only has a very small frame weight.

  In the above description, the displacement mechanisms 4a and 4b operate independently in consideration of the elastic deformation of the heel S, and the frame F remains on the drive shaft 6a even after the height position of the base material B is positioned. And 6b continued to be supported. On the other hand, for example, when the weight of the frame F is light and the elastic deformation of the heel S due to the weight of the frame F is negligible, the drive shafts 6a and 6b are displaced until they are separated from the lower surface of the frame F, and the base material B May be supported only by the support member 7. In this case, the displacement mechanisms 4a and 4b can be configured to operate in conjunction with each other.

  This also applies to the case where the base material B is made of, for example, a highly rigid plate-like member and is essentially difficult to elastically deform even if the weight of the frame body F is applied.

  As can be seen from the above specific example, in the direct drawing type exposure apparatus 100 according to this embodiment, even if the thickness of the base material B is not uniform, the lower surface central region of the base material B and the upper surface of the support member 7 are used. In this state, the optical axis of the exposure light beam 1b and the upper surface of the base material B are surely orthogonal to each other. Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam 1b is orthogonal to the upper surface PPu (exposure surface) of the photosensitive resin PP.

  Further, since the driving shafts 6a to 6d sufficiently support the weight of the base material B, the elastic deformation that cannot be ignored in the ridge S does not occur. Therefore, the photosensitive resin PP held on the upper surface is also elastically deformed. No state. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, in the direct drawing type exposure apparatus 100 according to this embodiment, the opening position of the opening pattern does not shift between the upper surface PPu side and the lower surface PPl side of the photosensitive resin PP. In addition, since the opening pattern is not distorted, a highly accurate opening pattern can be obtained. That is, when the photosensitive resin PP is used for a printing plate such as a screen printing plate, it is possible to print ink with high accuracy at a desired position where alignment has been performed. Further, the dimensional variation of the print pattern can be reduced.

<First Modification of Embodiment of Direct Drawing Exposure Apparatus According to the Present Invention>
A direct drawing type exposure apparatus 100A according to a first modification of the above embodiment will be described with reference to FIG.

  FIG. 4 is a cross-sectional view of a direct drawing type exposure apparatus 100A according to the first modification. In the first modification, the drive shaft 6a is configured to prevent the base material B from being suddenly supported only by the support member 7 after the upper surface of the support member 7 comes into contact with the lower surface central region of the base material B. To 6d. Therefore, since other parts are the same as those of the direct drawing type exposure apparatus 100 according to the present invention described above, description thereof will be omitted.

  In the direct drawing type exposure apparatus 100A according to the first modification, the drive shafts 6a to 6d (drive shafts 6c and 6d are not shown) each include a rigid body portion and an elastic deformation portion. For example, the displacement mechanism 6a includes a rigid body portion 6as and an elastic deformation portion 6ae connected to the end of the rigid body portion 6as. The drive shafts 6b to 6d have the same configuration as the drive shaft 6a, and include a rigid body portion 6bs and an elastic deformation portion 6be, a rigid body portion 6cs and an elastic deformation portion 6ce, a rigid body portion 6ds and an elastic deformation portion 6de, respectively.

  As the elastically deformable portions 6ae to 6de, for example, rubber and springs can be preferably used. Further, the positional relationship between the rigid body portion and the elastic deformation portion in the drive shafts 6a to 6d is not limited to that shown in FIG. 4, but for example, the drive shaft may have two rigid body portions connected by the elastic deformation portion. Good.

  As described above, the upper surface of the support member 7 and the lower surface central region of the base material B come into contact with each other, so that the support member 7 receives at least a part of the weight of the base material B.

  As a result, in the first modification, the upper surface of the support member 7 and the lower surface central region of the base material B come into contact with each other, and the load applied in the axial direction of the drive shafts 6a to 6d is reduced, so that the elastic deformation portions 6ae to 6de. Is reversely deformed to return to its original shape.

  Therefore, even if the displacement mechanisms 4a to 4d further displace the base material B after the upper surface of the support member 7 and the lower surface central region of the base material B contact each other, the elastic deformation portions 6ae to 6de are slightly reversely deformed. The displacement mechanisms 4a to 4d simply continue to support the base material B. That is, it is possible to avoid that the base material B is suddenly supported only by the support member 7.

  In said structure, even after the height position of the base material B is positioned, the frame F continues to be reliably supported by the drive shafts 6a to 6d. As described above, even if there is a possibility that the heel S is elastically deformed when pulled by the weight of the frame F, in the above configuration, the heel S is only slightly loaded with the weight of the frame F.紗紗 S is hardly pulled.

  That is, elastic deformation that cannot be ignored in the heel S does not occur. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, a more accurate opening pattern can be obtained by exposing the photosensitive resin PP in that state.

<Second Modification of Embodiment of Direct Drawing Exposure Apparatus According to the Invention>
A direct drawing type exposure apparatus 100B according to a second modification of the above embodiment will be described with reference to FIG.

  FIG. 5 is a sectional view of a direct drawing type exposure apparatus 100B according to the second modification. In the second modification, the state in which the upper surface of the support member 7 and the lower surface central region of the ridge S are in close contact with each other as described in the embodiment of the direct drawing type exposure apparatus 100 according to the present invention described above, A configuration for reliably detecting is added. Therefore, since other parts are the same as those of the direct drawing type exposure apparatus 100 according to the present invention described above, description thereof will be omitted.

  Direct-drawing type exposure apparatus 100B according to the second modification is connected to each of drive shafts 6a to 6d (drive shafts 6c and 6d are not shown), and applies a load applied in the axial direction of each of drive shafts 6a to 6d. It further includes a load detection unit to detect, and a control device 11 to which the load detection unit and the drive unit are connected.

  For example, the load detection unit 9 a is attached to an end portion that contacts the frame body F of the drive shaft 6 a and is connected to the control device 11. In FIG. 5, the connection state is indicated by a dotted line. Moreover, the control apparatus 11 is connected with the drive part 5a so that an operation command can be given to the drive part 5a based on the information from the load detection part 9a.

  Similarly to the load detection unit 9a, the load detection units 9b to 9d (load detection units 9c and 9d are not shown) are respectively attached to the end portions of the corresponding drive shafts and connected to the control device 11, respectively. Yes. Moreover, the control apparatus 11 is connected to each of the drive parts 5b-5d similarly to the above.

  Based on the information that informs that the load detected by the load detection units 9a to 9d has decreased to a predetermined value, the control device 11 gives an operation command to stop the operation to the drive unit corresponding to each load detection unit. Control to give.

  For example, a pressure sensor and a load cell can be preferably used as the load detection units 9a to 9d. Moreover, the attachment position of the load detection part in drive shaft 6a-6d is not restricted to what was shown in FIG. 5, For example, the thing which connected two rigid body parts with the load detection part may be used.

  In the direct-drawing type exposure apparatus 100B according to the second modification, as a result of the support member 7 receiving at least a part of the weight of the base material B when the base material B comes into contact with the support member 7, driving is performed. The load detectors attached to the drive shafts 6a to 6d respectively detect that the load applied to each of the shafts 6a to 6d has decreased to a predetermined value.

  The information is transmitted to the control device 11, and the control device 11 gives an operation command to stop the operation to the drive unit corresponding to the load detection unit that transmitted the information. In this case, it is preferable that the displacement mechanisms 4a to 4d are configured to be able to operate independently.

  In addition, it is preferable that said predetermined value is a load value about 80 to 99% of the load value which the load detection part detected before the base material contact | abutted to the support member.

  In said structure, when the load detection part attached to drive shaft 6a-6d detects that the reduction | decrease of the load concerning drive shaft 6a-6d started, the control apparatus 12 respond | corresponds to the corresponding drive part. Is controlled to give an operation command to stop the operation.

  In other words, with the above configuration, in the description of the positioning of the height position of the base material B (see FIG. 3), confirmation of the contact between the heel S and the support member 7, and the displacement mechanisms 4a to 4d based on the confirmation. The operation of each drive unit is automatically stopped.

  Accordingly, the drive units 5a to 5d do not need to displace the drive shafts connected to each of them. That is, the base material B can be avoided from being supported only by the support member 7.

  In said structure, even after the height position of the base material B is positioned, the frame F continues to be reliably supported by the drive shafts 6a to 6d. As described above, even if there is a possibility that the heel S is elastically deformed when pulled by the weight of the frame F, in the above configuration, the heel S is only slightly loaded with the weight of the frame F.紗紗 S is hardly pulled.

  That is, elastic deformation that cannot be ignored in the heel S does not occur. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, a more accurate opening pattern can be obtained by exposing the photosensitive resin PP in that state.

  In the second modification 100B of the embodiment of the direct drawing type exposure apparatus according to the present invention, the drive shafts 6a to 6d may each include a rigid body portion and an elastic deformation portion (the above-described first embodiment). (See the direct-drawing type exposure apparatus 100A according to a modification).

  In this case, it is avoided that the base material B is suddenly supported only by the support member 7 due to the displacement of the drive shafts 6a to 6d. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

<Third Modification of Embodiment of Direct Drawing Exposure Apparatus According to the Present Invention>
A direct drawing type exposure apparatus 100C according to a third modification of the above embodiment will be described with reference to FIG.

  FIG. 6 is a cross-sectional view of a direct drawing type exposure apparatus 100C according to a third modification. In the third modification, as in the second modification, the upper surface of the support member 7 and the lower surface central region of the heel S described in the embodiment of the direct drawing type exposure apparatus 100 according to the present invention described above are in close contact with each other. Thus, a configuration for reliably detecting the contact state is added. Therefore, since other parts are the same as those of the direct drawing type exposure apparatus 100 according to the present invention described above, description thereof will be omitted.

  The direct drawing type exposure apparatus 100C according to the third modified example corresponds to the base material B corresponding to the portions respectively supported by the drive shafts 6a to 6d (drive shafts 6c and 6d are not shown) on the lower surface of the base material B. The distance detection part which each detects the distance to the upper surface of each and the control apparatus 11 are further provided.

  For example, the distance detection unit 10a is provided at a position that can detect the distance to the upper surface of the base material B, corresponding to the location supported by the drive shaft 6a on the lower surface of the base material B. And it is connected to the control device 11. In FIG. 6, the connection state is represented by a dotted line. In FIG. 6, the distance detection unit 10 a is provided so that its detection axis (one-dot chain line) and the central axis of the drive shaft 6 a are the same. Moreover, the control apparatus 11 is connected with the drive part 5a so that an operation command can be given to the drive part 5a based on the information from the distance detection part 10a.

  The distance detection units 10b to 10d (distance detection units 10c and 10d are not shown) are also provided at positions corresponding to the drive shafts 6b to 6d, respectively, and are connected to the control device 11 in the same manner as the distance detection unit 10a. Has been. The distance detection units 10b to 10d are provided so that their detection axes (one-dot chain lines) and the central axes of the corresponding drive shafts 6b to 6d are the same. Furthermore, the control apparatus 11 is connected to each of the drive parts 5b-5d similarly to the above.

  The control device 11 receives each distance detection unit from the distance detection units 10a to 10d based on information that indicates that the distance between each distance detection unit and the upper surface of the base material B has increased to a predetermined value. Control is performed so as to give an operation command to stop the operation to the corresponding drive unit.

  As the distance detection units 10a to 10d, for example, a laser displacement meter can be preferably used.

  In the direct drawing type exposure apparatus 100C according to the third modification, the distance between the distance detection units 10a to 10d and the upper surface of the base material B is a predetermined value as a result of the displacement mechanisms 4a to 4d displacing the base material B. It is detected by the distance detection units 10a to 10d that the value has increased to the value.

  The information is transmitted to the control device 11, and the control device 11 gives an operation command to stop the operation to the drive unit corresponding to the distance detection unit that transmitted the information. In this case, it is preferable that the displacement mechanisms 4a to 4d are configured to be able to operate independently.

  Moreover, said predetermined value is the distance between each of the distance detection parts 10a-10d and the upper surface of the base material B when the upper surface of the support member 7 and the lower surface center area | region of the base material B contact | abutted. It is preferable that

  In said structure, when the distance which the distance detection parts 10a-10d detects becomes the value, the control apparatus 11 is controlled to give the operation command which stops operation | movement to a corresponding drive part.

  In other words, with the above-described configuration, as in the direct drawing type exposure apparatus 100B according to the second modified example described above, confirmation of contact between the collar S and the support member 7 and each of the displacement mechanisms 4a to 4d based thereon are confirmed. The operation of the drive unit is automatically stopped.

  Therefore, the same effects as those of the direct drawing type exposure apparatus 100B according to the second modification can be obtained, and exposure is performed with the base material B continuously supported by the drive shafts 6a to 6d, thereby further increasing the accuracy. An opening pattern can be obtained.

  In addition, in the third modification 100C of the embodiment of the direct drawing type exposure apparatus according to the present invention, the drive shafts 6a to 6d may each include a rigid body portion and an elastic deformation portion (the first described above). (See the direct-drawing type exposure apparatus 100A according to a modification).

  In this case, it is avoided that the base material B is suddenly supported only by the support member 7 due to the displacement of the drive shafts 6a to 6d. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

<Fourth Modification of Embodiment of Direct Drawing Exposure Apparatus According to the Invention>
A direct drawing type exposure apparatus 100D according to a fourth modification of the above embodiment will be described with reference to FIGS.

  FIG. 7 is a perspective view of the direct drawing type exposure apparatus 100D according to the fourth modified example seen through the base 2 simplified in illustration. FIG. 8 is a top view of the main part of the direct drawing type exposure apparatus 100D according to the third modification. In the fourth modification, a mechanism for adjusting the inclination generated for some reason is added to the base 2. Therefore, since other parts are the same as those of the direct drawing type exposure apparatus 100 according to the present invention described above, description thereof will be omitted. For example, in FIG. 7, the recesses 3a to 3d illustrated in FIG. 1, the drive units 5a to 5d installed in the corresponding recesses, the stem 8, and the like are also omitted.

  In the fourth modification, the direct drawing type exposure apparatus 100D further includes tilt adjustment mechanisms 14a to 14c, tilt detection mechanisms 17a to 17c, and a control device 11.

  The inclination adjusting mechanisms 14a to 14c are installed on the upper surface of the pedestal 13, and include a drive unit and a drive shaft that is displaced by the drive unit. For example, the inclination adjustment mechanism 14a includes a drive unit 15a and a drive shaft 16a that is displaced by the drive unit 15a. The inclination adjustment mechanisms 14b and 14c have the same configuration as the inclination adjustment mechanism 14a, and include a drive unit 15b, a drive shaft 16b, a drive unit 15c, and a drive shaft 16c, respectively.

  In addition, as inclination adjustment mechanism 14a-14c, not only said mechanism but what can adjust inclination to arbitrary angles should just be. For example, a biaxial tilt stage or tilt unit can be used.

  The drive shafts 16a to 16c are respectively inserted into the recesses 12a to 12c provided on the lower surface of the base 2, and support the base 2 by coming into contact with the top surfaces of the recesses 12a to 12c. In addition, illustration of the drive parts 15a-15c is abbreviate | omitted in FIG. As the drive units 15a to 15c, for example, a cylinder stroke adjusting mechanism by pneumatic pressure or hydraulic pressure, a linear motion mechanism by a ball screw connected to a servo motor, a stepping motor with a lead screw, or the like can be preferably used.

  As the tilt detection mechanisms 17a to 17c, for example, a laser displacement meter can be preferably used. Each of the inclination detection mechanisms 17a to 17c irradiates predetermined detection spots 18a to 18c on the substrate 2 with laser light, and measures the distance between the base 2 and the inclination detection mechanisms 17a to 17c.

  The control device 11 detects the tilt of the base 2 by comparing the distances of the three points obtained by the tilt detection mechanisms 17a to 17c with each other. And it controls so that the operation command which adjusts the inclination-angle of the base 2 may be given to the inclination adjustment mechanisms 14a-14c.

  In FIG. 7, the tilt adjustment mechanisms 14 a to 14 c are shown through the base 2, and the positional relationship between the tilt adjustment mechanisms 14 a to 14 c and the tilt detection mechanisms 17 a to 17 c is illustrated. For example, the inclination detection mechanism 17a, the detection spot 18a, and the inclination adjustment mechanism 14a are configured to be on the same axis.

  The positional relationship among the tilt detection mechanism, the detection spot, and the tilt adjustment mechanism at other positions is the same. That is, the inclination detection mechanism 17b, the detection spot 18b, and the inclination adjustment mechanism 14b are on the same axis, and the inclination detection mechanism 17c, the detection spot 18c, and the inclination adjustment mechanism 14c are on the same axis. Note that the tilt detection mechanism and the detection spot and the corresponding tilt adjustment mechanism do not have to exist on the same axis.

  7 and 8, the tilt detection mechanisms are arranged at three locations to detect the tilt of the base 2, and the tilt angle of the base 2 is adjusted by the corresponding three tilt adjustment mechanisms. There may be three or more inclination detection mechanisms and inclination adjustment mechanisms, respectively. Further, the number of tilt detection mechanisms and tilt adjustment mechanisms may be different.

  The control device 11 adjusts the inclination angle of the base 2 by operating the inclination adjustment mechanisms 14a to 14c based on information by the inclination detection mechanisms 17a to 17c.

  Since the support member 7 is supported above the base 2 by the displacement mechanisms 4 a to 4 d, the inclination angle can be adjusted by adjusting the inclination angle of the base 2.

  Therefore, in the fourth modification, the optical axis of the exposure light beam 1b is adjusted in a state where the upper surface of the support member 7 and the lower surface central region of the base material B are brought into contact with each other by adjusting the inclination angle of the base 2. It can adjust so that the angle with the upper surface of the base material B may become orthogonal. That is, by performing exposure in this state, a more accurate opening pattern can be obtained.

  In addition, this invention is not limited to said embodiment, A various application and deformation | transformation are possible within the scope of this invention. The technical scope of the present invention is defined by the scope of the claims, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

  100, 100A to 100D Direct drawing type exposure apparatus, 1 light source, 1b exposure beam, 2 bases, 4a to 4d displacement mechanism, 5a to 5d drive unit, 6a to 6d drive shaft, 6ae to 6de elastic deformation unit, 7 support member , 9a to 9d Load detection unit, 10a to 10d Distance detection unit, 11 control device, B base material, PP photosensitive resin.

Claims (5)

A direct-drawing type exposure apparatus that performs pattern exposure by directly irradiating an exposure light beam in a predetermined pattern onto a film-like photosensitive resin held on a plate-like substrate,
A light source that outputs exposure light;
The base,
A plurality of displacement mechanisms that include a drive unit and a drive shaft, are capable of supporting the lower surface peripheral region of the substrate, and operate to displace the substrate in the optical axis direction of the exposure light beam;
A support member capable of supporting the lower surface central region of the base material,
The support member displaces the substrate by the plurality of displacement mechanisms, and the optical axis of the exposure light beam and the support are in contact with the upper surface of the support member and the lower surface central region of the substrate. A direct-drawing type exposure apparatus disposed above the base so that the upper surface of the member is orthogonal.   The direct-drawing type exposure apparatus according to claim 1, wherein the drive shaft has an elastically deformable portion that elastically deforms in response to axial stress. A load detection unit that is connected to the drive shaft and detects a load applied in an axial direction of the drive shaft;
And a control device,
The control device performs control so as to give an operation command to stop the operation to the drive unit based on information that informs that the load detected by the load detection unit has decreased to a predetermined value. 2. The direct drawing type exposure apparatus according to 2. A distance detection unit for detecting a distance to the upper surface of the base material, corresponding to a location supported by the drive shaft in the lower peripheral edge region of the base material;
And a control device,
The control device stops the operation to the drive unit based on information from the distance detection unit that informs that the distance between the distance detection unit and the upper surface of the base material has increased to a predetermined value. 3. The direct drawing type exposure apparatus according to claim 1, wherein the direct drawing type exposure apparatus is controlled so as to give an operation command. An inclination detection mechanism;
An inclination adjustment mechanism,
5. The direct drawing type according to claim 3, wherein the control device performs control so that an operation command for adjusting an inclination angle of the base is given to the inclination adjustment mechanism based on information by the inclination detection mechanism. Exposure device.

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