JP2016017975A - Direct-drawing type exposure apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a direct-drawing type exposure apparatus that can carry out pattern exposure while the optical axis of an exposure beam is orthogonal to an exposure surface of a photosensitive resin.SOLUTION: The direct-drawing type exposure apparatus carries out pattern exposure by directly irradiating a photosensitive resin PP in a film state held by a substrate B with an exposure beam 1b, and the apparatus includes: a light source 1 that outputs the exposure beam 1b; a base 2; positioning members 3a to 3d that determine a height position of the substrate B during exposure; displacement mechanisms 5a to 5d that interlock and operate; and support shafts 8a to 8d that support the substrate B on the base 2 and can deform or displace in response to an axial stress. The substrate B is set at a height position where the optical axis of the exposure beam 1b and an upper surface of the substrate B are orthogonal to each other, while an edge region on the upper surface of the substrate B or an upper surface of the photosensitive resin PP is brought into contact with lower surfaces of the positioning members 3a to 3d and at least one of the support shafts 8a to 8d is deformed or displaced by a stress induced in the axial direction of the support shaft by the contact.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a direct-drawing type exposure apparatus that pattern-exposes a photosensitive resin by directly irradiating a photosensitive resin with a light having a wavelength in the ultraviolet region without drawing a mask and drawing a predetermined pattern. is there.

  Screen printing is often used to form wiring patterns and electrode patterns in the manufacture of electronic components.

  Screen printing is a technique for printing ink on a printing object through a screen printing plate in which a mesh cloth called a cocoon, which is made to have a predetermined opening pattern, is stretched around a frame.

  For making a screen printing plate, a photosensitive resin is applied to the ridge, exposed to ultraviolet rays through a mask (original plate), exposed, and then unnecessary portions are washed away (developed) to form a predetermined opening pattern. It is done by getting.

  By the way, in recent years, a direct drawing type exposure apparatus that pattern-exposes a photosensitive resin by directly irradiating the photosensitive resin with an exposure light beam having a wavelength in the ultraviolet region without drawing a mask and drawing a predetermined pattern has become widespread. Have begun to do.

  As an example of such a direct drawing type exposure apparatus, for example, in Japanese Patent Application Laid-Open No. 11-320968 (Patent Document 1), a direct drawing type exposure that performs pattern exposure using a spatial light modulator (hereinafter referred to as DMD). A device has been proposed.

  FIG. 5 is an explanatory diagram of the direct drawing type exposure apparatus 200 described in Patent Document 1. FIG. 5A is a schematic block diagram of the direct drawing type exposure apparatus 200. FIG. 5B is a schematic diagram showing a mirror configuration of DMD 205 used in direct drawing type exposure apparatus 200. FIG. 5C is a partially enlarged view of FIG.

  The DMD 205 includes m micro mirrors M arranged in the horizontal direction (left-right direction in FIG. 5B) and six rows in the vertical direction (up-down direction in the figure). A gap g is provided between the micromirror M and the adjacent micromirror M. The micromirrors M in each row (M11 to M16) are arranged with a predetermined distance from the micromirrors M in the adjacent upper and lower rows.

  The photosensitive resin PP that is an object to be exposed is in the form of a film, for example, in a dry film state of a single resin, or in a state where a liquid resin is applied on a substrate (not shown) and dried. Placed on. The table 203 is movable on the base 202 in the Y direction. The DMD 205 is positioned such that the lateral direction is perpendicular to the moving direction of the photosensitive resin PP.

  And each micromirror M is comprised so that the edge part Mb can rotate by making the diagonal line which connects a pair of edge part Ma into a rotating shaft. The DMD control device 206 individually controls the rotation of each micromirror M of the DMD 205.

  Light having a wavelength in the ultraviolet region output from the light source 201 is converted into parallel light 201 a by the collimator lens 204 and enters the DMD 205. The direction of the reflected light of the parallel light 201a is determined by how each incident micromirror M is rotated.

  The reflected light from some of the micromirrors M is condensed by the microlens 207 provided for each micromirror M, so that the exposure light 201b is irradiated onto the exposure surface of the photosensitive resin PP and contributes to the exposure. To do. On the other hand, the reflected light from another micromirror M is irradiated to a position away from the photosensitive resin PP and does not contribute to exposure.

  That is, in the direct drawing type exposure apparatus 200, the photosensitive resin PP can be subjected to pattern exposure by controlling the individual rotation angle of the micro mirror M of the DMD 205.

JP-A-11-320968

  Here, as shown in FIG. 6A, a liquid photosensitive resin PP is applied on a ridge S stretched on a frame F, and then dried, a screen printing plate is patterned by a direct-drawing exposure apparatus 200. Think about exposure.

  In the above screen printing plate, the liquid photosensitive resin PP is applied on the ridge S with a uniform film thickness so that the upper surface PPu and the lower surface PPl in the drawing are parallel to each other. It is assumed that the thickness of the frame F is not uniform.

  When such a screen printing plate is placed on the table 203 with the upper surface PPu as an exposure surface, the heel S stretched on the frame F is slightly inclined with respect to the upper surface of the table 203. If the inclination angle is θ, the optical axis 201c of the exposure light beam 201b and the upper surface PPu are not orthogonal to each other, and the normal direction PPn of the upper surface PPu is inclined by the angle θ with respect to the optical axis 201c of the exposure light beam 201b. .

  When developed after exposure in this state, as shown in FIG. 6B, the opening position is shifted between the upper surface PPu side and the lower surface PPl side with an inclination of an angle θ with respect to the normal direction PPn of the upper surface PPu. An opening pattern is formed.

  Screen printing is performed such that the upper surface PPu of the photosensitive resin in FIG. On the other hand, alignment with the printing object is performed from the lower surface PPl side. If the opening position is shifted between the upper surface PPu side and the lower surface PPl side, the ink is actually printed on the printing object even if alignment is performed at the opening position on the lower surface PPl side. Thus, printing misalignment occurs.

  In the case shown in FIG. 6A, the deviation of the opening position is relatively small on the left side of the ridge S, but is large on the right side. Therefore, the dimensional variation of the print pattern in the surface of the heel S increases.

  Accordingly, an object of the present invention is to perform pattern exposure in a state where the optical axis of the exposure light beam is orthogonal to the exposure surface of the photosensitive resin even if the thickness of the substrate supporting the photosensitive resin is not uniform. It is to provide a direct drawing type exposure apparatus.

  In this invention, the height position of the base material supporting the photosensitive resin at the time of exposure is such that the pattern exposure can be performed with the optical axis of the exposure light beam orthogonal to the exposure surface of the photosensitive resin. Improvements to the mechanism for determining the value are made.

  The direct drawing type exposure apparatus according to the present invention performs pattern exposure by directly irradiating an exposure light beam in a predetermined pattern onto a film-like photosensitive resin held on a plate-like substrate with the following configuration.

  The direct-drawing type exposure apparatus according to the present invention includes a light source that outputs an exposure light beam, a base, a plate-like positioning member, a drive unit installed on the base and a drive unit, and is moved up and down by the positioning member. It includes a plurality of displacement mechanisms having drive shafts connected thereto, and a plurality of support shafts that support the base material on the base.

  The plate-like positioning member determines the height position of the substrate at the time of exposure. The displacement mechanism operates in conjunction so as to displace the positioning member in the optical axis direction of the exposure light beam. The support shaft is configured to be deformable or displaceable with respect to axial stress.

  The positioning member contacts the upper surface peripheral region of the substrate or the upper surface of the photosensitive resin and the lower surface of the positioning member, and among the plurality of support shafts due to the axial stress of the support shaft generated by the contact. In a state where at least one is deformed or displaced, the substrate is displaced by a plurality of displacement mechanisms such that the optical axis of the exposure light beam and the upper surface of the substrate are at a height position orthogonal to each other.

  For example, in the above configuration, consider a case where a rigid support shaft is fixed on a base. It is assumed that the lower surface of the positioning member is brought into contact with the upper surface of the collar stretched on the frame body having a non-uniform thickness supported by the support shaft. When the positioning member descends, it first comes into contact with the heel stretched on the thick part of the frame.

  However, since the support shaft is a rigid body and is fixed on the base, the abutting positioning member cannot be further lowered and stops there. Since the plurality of displacement mechanisms for lowering the positioning member operate in conjunction with each other, the positioning member does not come into contact with the heel stretched on the thin portion of the frame.

  On the other hand, as described above, when the support shaft is configured to be deformable or displaceable with respect to the axial stress, when the positioning member comes into contact with the collar previously stretched on the thick part of the frame body, When the support shaft supporting the thick part of the body is deformed or displaced, the positioning member can be further lowered while pushing down the thick part of the frame. As a result, the positioning member eventually comes into contact with the thin portion of the frame body, and uniform contact of the positioning member as a whole can be realized.

  That is, in the above-described direct drawing type exposure apparatus, the upper peripheral edge region of the base material supported by the support shaft or the upper surface of the photosensitive resin and the lower surface of the positioning member are brought into contact with each other, and the support shaft generated by the contact In a state where at least one of the plurality of support shafts is deformed or displaced by the stress in the axial direction, the base material is at a height position where the optical axis of the exposure light beam and the upper surface of the base material are orthogonal to each other. The displacement mechanism interlocks to displace the position of the positioning member in the optical axis direction of the exposure light beam.

  Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam is orthogonal to the upper surface (exposure surface) of the photosensitive resin.

  Therefore, the opening position of the opening pattern does not shift between the upper surface side and the lower surface (positioning surface) side of the photosensitive resin. That is, when the photosensitive resin is used for a printing plate such as a screen printing plate, it is possible to print the ink with high accuracy at a desired position where alignment has been performed. Further, the dimensional variation of the print pattern can be reduced.

  In a first preferred embodiment of the direct drawing type exposure apparatus according to the present invention, the support shaft includes a rigid body portion and an elastically deformable portion that is elastically deformed with respect to an axial stress.

  In the above-described direct drawing type exposure apparatus, the above-mentioned uniform positioning member contact is realized by the elastic deformation portion being deformed by the stress applied in the axial direction of the support shaft.

  For example, an elastically deformable portion such as rubber or a spring is easily attached to the support shaft and is inexpensive. In addition, management such as maintenance and replacement is easy even after installation.

  Therefore, the direct drawing type exposure apparatus can be easily manufactured and the manufacturing cost can be reduced. Furthermore, the direct drawing type exposure apparatus after manufacture can be easily managed. That is, a screen printing plate having a highly accurate opening pattern can be obtained inexpensively and stably.

  In a second preferred embodiment of the direct-drawing type exposure apparatus according to the present invention, the support shaft includes a rigid portion and a mechanical or electromagnetic stress relaxation mechanism that displaces the support shaft with respect to axial stress. .

  In the above direct-drawing type exposure apparatus, the mechanical or electromagnetic stress relaxation mechanism displaces the rigid part against the stress applied in the axial direction of the support shaft, thereby realizing the above-mentioned uniform positioning member contact doing.

  As the mechanical or electromagnetic stress relaxation mechanism, a damping device such as an air damper, an oil damper, or a magnet damper can be used. Since these damping devices can displace the support shaft with a small resistance against the stress applied in the axial direction of the support shaft, the height position of the substrate can be controlled with high accuracy. In addition, it has a long life and requires almost no replacement.

  Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam and the upper surface of the photosensitive resin are orthogonally crossed with high accuracy. In addition, the direct drawing type exposure apparatus after manufacture can be easily managed. That is, it is possible to stably obtain a screen printing plate having a highly accurate opening pattern.

  In the direct drawing type exposure apparatus according to the present invention, the upper peripheral area of the substrate or the upper surface of the photosensitive resin supported by the support shaft is brought into contact with the lower surface of the positioning member, and the support shaft generated by the contact In a state where at least one of the plurality of support shafts is deformed or displaced by the stress in the axial direction, the base material is at a height position where the optical axis of the exposure light beam and the upper surface of the base material are orthogonal to each other. The displacement mechanism interlocks to displace the position of the positioning member in the optical axis direction of the exposure light beam.

  Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam is orthogonal to the upper surface (exposure surface) of the photosensitive resin.

  Therefore, the opening position of the opening pattern does not shift between the upper surface side and the lower surface (positioning surface) side of the photosensitive resin. That is, when the photosensitive resin is used for a printing plate such as a screen printing plate, it is possible to print the ink with high accuracy at a desired position where alignment has been performed. Further, the dimensional variation of the print pattern can be reduced.

FIG. 2 is a cross-sectional view of a direct drawing type exposure apparatus 100 according to the first embodiment of the present invention (a cross-sectional view taken along the line Y1-Y1 in FIG. ). It is a top view of the principal part of the direct drawing type exposure apparatus 100 which concerns on 1st Embodiment of this invention. It is sectional drawing of the direct drawing type exposure apparatus 100 which concerns on 2nd Embodiment of this invention. It is a top view of the principal part of the direct drawing type exposure apparatus 100 which concerns on 2nd Embodiment of this invention. It is explanatory drawing of the direct drawing type exposure apparatus 200 of background art. FIG. 5A is a schematic block diagram of the direct drawing type exposure apparatus 200. FIG. 5B is a schematic diagram showing a mirror configuration of DMD 205 used in direct drawing type exposure apparatus 200. FIG. 5C is a partially enlarged view of FIG. Direct exposure when the photosensitive resin PP on the ridge S stretched on the frame F having a non-uniform thickness is subjected to pattern exposure using the background direct exposure apparatus 200 shown in FIG. 3 is a cross-sectional view schematically showing a main part of the device 200. FIG.

  Embodiments of the present invention will be described below to describe the features of the present invention in more detail.

-First embodiment-
A direct drawing type exposure apparatus 100 according to a first embodiment of the present invention will be described with reference to FIGS.

  FIG. 1 is a sectional view of a direct drawing type exposure apparatus 100 according to the first embodiment of the present invention. FIG. 2 is a top view of the main part of the direct drawing type exposure apparatus 100 according to the first embodiment of the present invention. FIG. 1 is a cross-sectional view of the plane including the Y1-Y1 line of FIG.

  The direct-drawing exposure apparatus according to the direct-drawing exposure apparatus 100 according to the first embodiment of the present invention exposes a film-like photosensitive resin PP held on a plate-like substrate B with the following configuration. Pattern exposure is performed by directly irradiating the light beam 1b in a predetermined pattern.

  In FIG. 1, as the base material B, a material in which a mesh cloth called heel S is stretched around the frame F as described above is used. As the base material B, a desired material such as a plate-shaped member made of any material can be used. The photosensitive resin PP is also in the form of a film as described above, for example, in the form of a dry film of a single resin, or in a state in which a liquid resin is applied on the ridge S and then dried. Things can be used.

  Note that the non-uniformity of the thickness of the photosensitive resin PP is negligible, and the upper surface PPu (exposure surface) is substantially parallel to the upper surface of the base material B (ＢS).

  The direct-drawing exposure apparatus 100 includes a light source 1, a base 2, plate-shaped positioning members 3a to 3d, displacement mechanisms 5a to 5d, and support shafts 8a to 8d.

  The light source 1 outputs an exposure light beam 1b. The exposure light beam 1b is a light beam having a wavelength that causes a chemical change in the photosensitive resin PP. As a light emitter of the light source 1 for that purpose, for example, an ultraviolet laser, an ultra-high pressure mercury lamp, or an LED that emits light having a wavelength in the ultraviolet region can be used. The light source 1 may further include a lens system such as a collimator lens or a condenser lens.

  In FIG. 1, the light source 1 is movable in the horizontal direction and the vertical direction by a horizontal movement mechanism 1h and a vertical movement mechanism 1v. That is, in FIG. 1, pattern exposure is performed by moving the light source 1 horizontally by the horizontal movement mechanism 1 h without moving the base 2. Further, the focus position is adjusted by moving the light source 1 up and down by the vertical movement mechanism 1v.

  In order to perform pattern exposure, the irradiation position of the exposure light beam may be changed by using a DMD described in Patent Document 1 or a reflecting mirror such as a galvano mirror without moving the light source 1. . Alternatively, pattern exposure may be performed by moving the base 2 horizontally and vertically by separately providing a horizontal movement mechanism and a vertical movement mechanism.

  The base 2 is not particularly limited in shape, and may be a flat plate or a recess formed by a bottom portion and a side wall. In the direct drawing type exposure apparatus 100 according to the first embodiment, drive units 6a to 6d of displacement mechanisms 5a to 5d described later are respectively installed in storage units 4a to 4d provided on the upper surface of the base 2. . In addition, you may make it the drive parts 6a-6d install in the upper surface of the flat base 2 in which the accommodating parts 4a-4d are not provided.

  The plate-like positioning members 3a to 3d are connected to drive shafts 7a to 7d of displacement mechanisms 5a to 5d described later, and determine the height position of the base material B at the time of exposure. In FIG. 2, four rectangular positioning members 3 a to 3 d are arranged so that the drive shafts 7 a to 7 d are respectively connected to the lower surface near one end side, and the other end side faces the central portion of the base 2. .

  1 and 2, the positioning members 3 a to 3 d are set so that the lower surface near the other end and the upper surface peripheral region of the base material B can come into contact with each other. Note that, depending on the area of the photosensitive resin PP, the upper surface of the photosensitive resin PP may be set to contact the lower surface in the vicinity of the other ends of the positioning members 3a to 3d.

  In addition, the plate-like positioning members 3a to 3d are arranged so that their lower surfaces are on the same plane orthogonal to the optical axis of the exposure light beam 1b as an initial position (position before the displacement mechanisms 5a to 5d are operated). Connected to the drive shafts 7a to 7d, respectively. The displacement mechanisms 5a to 5d operate in conjunction with each other, so that the lower surfaces of the displacement mechanisms 5a to 5d move up and down in the optical axis direction of the exposure light beam 1b while maintaining a state where they are on the same plane orthogonal to the optical axis of the exposure light beam 1b. .

  Note that the number and shape of the positioning members are not limited thereto, and may be any number and shape that can achieve the functions of the present invention.

  The displacement mechanisms 5a to 5d include drive units 6a to 6d and drive shafts 7a to 7d that are moved up and down by the drive units 6a to 6d, respectively. The drive units 6a to 6d are respectively installed in the storage units 4a to 4d provided on the upper surface of the base 2 as described above. The displacement mechanisms 5a to 5d drive the drive shafts 7a to 7d by the drive units 6a to 6d, respectively, thereby positioning the positioning members 3a to 3d connected to the drive shafts 7a to 7d in the optical axis direction of the exposure light beam 1b, respectively. Move up and down.

  That is, by operating the displacement mechanisms 5a to 5d to lower the positioning members 3a to 3d, the upper surface of the upper surface peripheral region of the base material B supported on the base 2 by the support shafts 8a to 8d described later, The lower surfaces of the positioning members 3a to 3d can be brought into contact with each other.

  The displacement mechanisms 5a to 5d are configured to operate in conjunction with each other as described above. The drive units 6a to 6d of the displacement mechanisms 5a to 5d are set to stop driving the drive shafts 7a to 7d and maintain the state (hold state) when a load of a predetermined value or more is detected. ing.

  The support shafts 8 a to 8 d support the base material B on the base 2. The support shafts 8a to 8d include rigid body portions 8as to 8ds and elastic deformation portions 8ae to 8de that are elastically deformed in response to axial stress, respectively. The support shafts 8 a to 8 d are arranged on the base 2 so as to stand upright on the base 2.

  In the direct drawing type exposure apparatus 100 according to the first embodiment, the positioning members 3a to 3d are deformed by deforming at least one of the elastically deforming portions 8ae to 8de with respect to the stress applied in the axial direction of the support shafts 8a to 8d. And the base material B are uniformly contacted. As the elastically deforming portions 8ae to 8de, for example, rubber or a spring can be used.

  Next, the positioning of the height position of the base material B at the time of exposure by the plate-like positioning members 3a to 3d will be described below.

  As a specific example, let us consider a case where the base material B is a screen printing plate including the frame F and the ridge S stretched thereon, and the thickness of the frame F is not uniform. In order to simplify the description, positioning of the height position of the base material B based on the positioning members 3a and 3b will be described. That is, in FIG. 1, the thickness (Fa) of the part of the frame F supported on the base 2 by the support shaft 8a is greater than the thickness (Fb) of the part of the frame F supported on the base 2 by the support shaft 8b. It is assumed that it is thick (see also FIG. 6A).

  In this case, the lower surface of the positioning member 3a lowered by the displacement mechanism 5a is placed on the upper surface of the flange S that is stretched on the base 2 supported by the support shaft 8a of the frame F. It contacts first by the difference in thickness. At this time, the lower surface of the positioning member 3b, which is descending in conjunction with the positioning member 3a, is still on the upper surface of the heel S stretched at a place supported on the base 2 by the support shaft 8b of the frame F. There is no contact.

  However, since the elastic deformation portion 8ae of the support shaft 8a is elastically deformed by the axial stress generated by the contact, the positioning member 3a is supported by the support shaft 8a of the frame F without stopping at the contact position. It goes down further while pushing down the part that has been.

  The displacement mechanisms 5a and 5b operate in conjunction with each other, and the positioning members 3a and 3b descend while maintaining the state that the lower surfaces thereof are on the same plane orthogonal to the optical axis of the exposure light beam 1b as described above. Eventually, the lower surface of the positioning member 3b comes into contact with the upper surface of the collar S stretched at a location supported on the base 2 by the support shaft 8b of the frame F. That is, uniform contact between the lower surfaces of the positioning members 3a and 3b and the upper surface of the flange S can be realized.

  The positioning members 3a and 3b may be further lowered slightly, but if the elastic deformation of the elastic deformation portion 3a that has been elastically deformed first becomes a limit and a load of a predetermined value or more is generated in the drive portion 6a, the displacement is displaced. The mechanism 7a enters the hold state and is maintained at that position.

  Since the positioning members 3a and 3b have their lower surfaces on the same plane perpendicular to the optical axis of the exposure light beam 1b, the upper surfaces of the ridges S that are in contact with the lower surfaces of the positioning members 3a and 3b are exposed to the exposure light beam 1b. The height is perpendicular to the optical axis.

  As can be seen from the above specific example, the optical axis of the exposure light beam 1b and the base material B in the contact state between the base material B and the positioning members 3a to 3d even if the thickness of the base material B is not uniform. It is surely perpendicular to the upper surface. The same applies to the case where the photosensitive resin PP and the positioning members 3a to 3d are in contact with each other.

  Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam 1b is orthogonal to the upper surface PPu (exposure surface) of the photosensitive resin PP.

  Therefore, the opening position of the opening pattern does not shift between the upper surface PPu side and the lower surface PPl side of the photosensitive resin PP. That is, when the photosensitive resin PP is used for a printing plate such as a screen printing plate, it is possible to print ink with high accuracy at a desired position where alignment has been performed. Further, the dimensional variation of the print pattern can be reduced.

-Second Embodiment-
A direct drawing type exposure apparatus 100 according to a second embodiment of the present invention will be described with reference to FIGS.

  FIG. 3 is a sectional view of a direct drawing type exposure apparatus 100 according to the second embodiment of the present invention. 4 corresponds to an arrow cross-sectional view of a plane including the Y1-Y1 line of FIG.

  The direct drawing type exposure apparatus 100 according to the second embodiment of the present invention is different from the first embodiment in the configuration of the support shafts 8a to 8d among the components described in the first embodiment. Since other parts are the same as those in the first embodiment, the description thereof is omitted.

  In the second embodiment, the support shafts 8a to 8d are respectively rigid body portions 8as to 8ds and mechanical or electromagnetic stress relaxation mechanisms 10a to 10d for displacing the rigid body portions 8as to 8ds with respect to axial stress. And comprising.

  In the support shafts 8a to 8d, the rigid body portions 8as to 8ds are mechanically or electromagnetically connected to the stress relaxation mechanisms 10a to 10d.

  In the direct drawing type exposure apparatus 100 according to the second embodiment, the stress relaxation mechanisms 10 a to 10 d are provided on the upper surface of the base 2 so that the rigid body portions 8 as to 8 ds stand upright with respect to the upper surface of the base 2. Installed in the storage portions 9a to 9d. The stress relaxation mechanisms 10a to 10d may be installed on the upper surface of the flat base 2 where the storage portions 9a to 9d are not provided.

  In the direct drawing type exposure apparatus described above, the stress relaxation mechanisms 10a to 10d displace the rigid body portions 8as to 8ds, respectively, with respect to the stress applied in the axial direction of the support shafts 8a to 8d, whereby the lower surfaces of the positioning members 3a and 3b. And uniform contact with the upper surface of the heel S.

  As the stress relaxation mechanisms 10a to 10d, a mechanical damping device such as an air damper and an oil damper, or an electromagnetic damping device such as a magnet damper can be used.

  In addition, this invention is not limited to said embodiment, A various application and deformation | transformation are possible within the scope of this invention.

DESCRIPTION OF SYMBOLS 100 Direct drawing type exposure apparatus 1 Light source 1b Exposure light 2 Base 3a-3d Positioning member 5a-5d Displacement mechanism 6a-6d Drive part 7a-7d Drive shaft 8a-8d Support shaft 8ae-8de Elastic deformation part 10a-10d Stress relaxation Mechanism B Base material PP Photosensitive resin

Claims (3)

A direct-drawing type exposure apparatus that performs pattern exposure by directly irradiating an exposure light beam in a predetermined pattern onto a film-like photosensitive resin held on a plate-like substrate,
A light source that outputs exposure light;
The base,
A plate-like positioning member that determines the height position of the substrate at the time of exposure;
A drive unit installed on the base; and a drive shaft that is moved up and down by the drive unit and connected to the positioning member, the position of the positioning member in the optical axis direction of the exposure light beam being displaced A plurality of displacement mechanisms operating in conjunction with each other,
A plurality of support shafts for supporting the base material on the base,
The support shaft is configured to be deformable or displaceable with respect to axial stress,
The positioning member brings the upper surface peripheral region of the base material or the upper surface of the photosensitive resin into contact with the lower surface of the positioning member, and due to the axial stress of the support shaft generated by the contact, In a state where at least one of the plurality of support shafts is deformed or displaced, the plurality of displacements are performed such that the base material is at a height position where the optical axis of the exposure light beam and the upper surface of the base material are orthogonal to each other. A direct-drawing type exposure apparatus characterized in that it is displaced by a mechanism.   The direct drawing type exposure apparatus according to claim 1, wherein the support shaft includes a rigid body portion and an elastically deformable portion that is elastically deformed with respect to an axial stress.   The direct-drawing exposure according to claim 1, wherein the support shaft includes a rigid body portion and a mechanical or electromagnetic stress relaxation mechanism that displaces the rigid body portion with respect to an axial stress. apparatus.

Images