JP2016071009A - Direct drawing type exposure apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a direct drawing type exposure apparatus in which pattern exposure can be performed while an optical axis of an exposure beam is orthogonal to an exposure surface of a photosensitive resin.SOLUTION: A direct drawing type exposure apparatus performs pattern exposure by directly irradiating a film type photosensitive resin PP held by a substrate B with an exposure beam 1b; and the exposure apparatus includes a light source 1 that outputs the exposure beam 1b, a base 2, a support member 3 that can support a center area of a lower surface of the substrate B, a displacement mechanism 4a to 4d, and at least one support shaft 7a to 7d that can support a peripheral area of the lower surface of the substrate B. The displacement mechanism 4a to 4d operates to displace the support member 3 in an optical axis direction of the exposure beam 1b. The support member 3 is disposed above the base 2 in such a manner that, while the support member 3 is displaced by the displacement mechanism 4a to 4d to bring the peripheral area of the lower surface of the substrate B into contact with one end of at least one support shaft 7a to 7d, the optical axis of the exposure beam 1b is orthogonal to the upper surface of the support member 3.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a direct-drawing type exposure apparatus that pattern-exposes a photosensitive resin by directly irradiating a photosensitive resin with a light having a wavelength in the ultraviolet region without drawing a mask and drawing a predetermined pattern. is there.

  Screen printing is often used to form wiring patterns and electrode patterns in the manufacture of electronic components.

  Screen printing is a technique for printing ink on a printing object through a screen printing plate in which a mesh cloth called a cocoon, which is made to have a predetermined opening pattern, is stretched around a frame.

  For making a screen printing plate, a photosensitive resin is applied to the ridge, exposed to ultraviolet rays through a mask (original plate), exposed, and then unnecessary portions are washed away (developed) to form a predetermined opening pattern. It is done by getting.

  By the way, in recent years, a direct drawing type exposure apparatus that pattern-exposes a photosensitive resin by directly irradiating the photosensitive resin with an exposure light beam having a wavelength in the ultraviolet region without drawing a mask and drawing a predetermined pattern has become widespread. Have begun to do.

  As an example of such a direct drawing type exposure apparatus, for example, in Japanese Patent Application Laid-Open No. 11-320968 (Patent Document 1), a direct drawing type in which pattern exposure is performed using a digital micromirror device (hereinafter referred to as DMD). An exposure apparatus has been proposed.

  FIG. 10 is an explanatory diagram of the direct drawing type exposure apparatus 200 described in Patent Document 1. FIG. 10A is a schematic block diagram of the direct drawing type exposure apparatus 200. FIG. 10B is a schematic diagram showing a mirror configuration of DMD 205 used in direct drawing type exposure apparatus 200. FIG. 10C is a partially enlarged view of FIG.

  The DMD 205 has m microscopic square mirrors M in the horizontal direction (the left-right direction in FIG. 10B and the direction in which the micromirrors M form a row) and the vertical direction (the vertical direction in FIG. 10B). Thus, six rows are arranged in the direction in which the rows of micromirrors M are arranged. A gap g is provided between the minute mirrors M adjacent to each other in the lateral direction. The micromirrors M in each row (M11 to M16) are arranged with a predetermined distance from the micromirrors M in the adjacent upper and lower rows.

  The photosensitive resin PP that is an object to be exposed is in the form of a film, for example, in a dry film state of a single resin, or in a state where a liquid resin is applied on a substrate (not shown) and dried. Placed on. The table 203 is movable on the base 202 in the Y direction.

  And each micromirror M is comprised so that the edge part Mb can rotate by making the diagonal line which connects a pair of edge part Ma into a rotating shaft. The DMD control device 206 individually controls the rotation of each micromirror M of the DMD 205.

  Light having a wavelength in the ultraviolet region output from the light source 201 is converted into parallel light 201 a by the collimator lens 204 and enters the DMD 205. The direction of the reflected light of the parallel light 201a is determined by how each incident micromirror M is rotated.

  The reflected light from some of the micromirrors M is condensed by the microlens 207, and becomes an exposure light beam 201b, which is irradiated onto the exposure surface of the photosensitive resin PP, thereby contributing to exposure. On the other hand, the reflected light from another micromirror M is irradiated to a position away from the photosensitive resin PP and does not contribute to exposure.

  That is, in the direct drawing type exposure apparatus 200, the photosensitive resin PP can be subjected to pattern exposure by controlling the individual rotation angle of the micro mirror M of the DMD 205.

JP-A-11-320968

  Here, as shown in FIG. 11A, a liquid photosensitive resin PP is applied onto the ridge S stretched on the frame body F, and then dried, the screen printing plate is patterned by the direct drawing type exposure apparatus 200. Think about exposure.

  In the above screen printing plate, the liquid photosensitive resin PP is applied on the ridge S with a uniform film thickness so that the upper surface PPu and the lower surface PPl in the drawing are parallel to each other. It is assumed that the thickness of the frame F is not uniform.

  When such a screen printing plate is placed on the table 203 with the upper surface PPu as an exposure surface, the heel S stretched on the frame F is slightly inclined with respect to the upper surface of the table 203. If the inclination angle is θ, the optical axis 201c of the exposure light beam 201b and the upper surface PPu are not orthogonal to each other, and the normal direction PPn of the upper surface PPu is inclined by the angle θ with respect to the optical axis 201c of the exposure light beam 201b. .

  When exposed and developed in this state, as shown in FIG. 11 (B), it is inclined by an angle θ with respect to the normal direction PPn of the upper surface PPu, and the opening position Au on the upper surface PPu side and the opening position Al on the lower surface PPl side. A misaligned opening pattern is formed.

  Screen printing is performed such that the upper surface PPu of the photosensitive resin in FIG. 11B is in contact with the object to be printed. On the other hand, alignment with the printing object is performed from the lower surface PPl side. If the opening position is shifted between the upper surface PPu side and the lower surface PPl side, the ink is actually printed on the printing object even if alignment is performed at the opening position on the lower surface PPl side. Thus, printing misalignment occurs.

  Further, when the optical axis 201c of the exposure light beam 201b and the upper surface PPu are not orthogonal to each other, the projected image of the exposure light beam 201b on the upper surface PPu is distorted according to the deviation from the orthogonality. For example, if the cross section perpendicular to the optical axis 201c of the exposure light beam 201b is circular, the exposure light beam 201b is distorted into an ellipse on the upper surface PPu. If the projection image of the exposure light beam 201b on the upper surface PPu has a distortion, the opening pattern is also distorted.

  Therefore, an object of the present invention is to perform pattern exposure in a state where the optical axis of the exposure light beam is always orthogonal to the exposure surface of the photosensitive resin, even if the thickness of the substrate supporting the photosensitive resin is not uniform. It is to provide a direct drawing type exposure apparatus that can be used.

  In this invention, the height position of the base material supporting the photosensitive resin at the time of exposure is such that the pattern exposure can be performed with the optical axis of the exposure light beam orthogonal to the exposure surface of the photosensitive resin. Improvements to the mechanism for determining the value are made.

  The direct drawing type exposure apparatus according to the present invention performs pattern exposure by directly irradiating an exposure light beam in a predetermined pattern onto a film-like photosensitive resin held on a plate-like substrate with the following configuration.

  A direct drawing type exposure apparatus according to the present invention includes a light source that outputs an exposure light beam, a base, a support member that can support a lower surface central region of the base material, a displacement mechanism that includes a drive unit and a drive shaft, and a base material And at least one support shaft capable of supporting the lower peripheral edge region of the.

  The displacement mechanism operates to displace the support member in the optical axis direction of the exposure light beam. In the state where the support member is displaced by the displacement mechanism and the lower surface peripheral region of the base material and at least one end portion of the support shaft are in contact with each other, the optical axis of the exposure light beam and the upper surface of the support member Are disposed above the base so that they are orthogonal to each other.

  In the direct drawing type exposure apparatus described above, the displacement mechanism displaces the support member, and the optical axis of the exposure light beam and the base are in contact with the lower surface peripheral area of the substrate and at least one end of the support shaft. The upper surface of the material is orthogonal.

  Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam is always orthogonal to the upper surface (exposure surface) of the photosensitive resin provided on the upper surface of the substrate within an allowable error range. .

  That is, the opening position of the opening pattern does not shift between the upper surface side and the lower surface (positioning surface) side of the photosensitive resin. Further, the opening pattern is not distorted.

  Therefore, when a photosensitive resin is used for a printing plate such as a screen printing plate, a highly accurate opening pattern can be obtained, so that ink can be printed with high accuracy at a desired position after alignment. .

  In a first preferred embodiment of the direct drawing type exposure apparatus according to the present invention, the support shaft has an elastically deforming portion that is elastically deformed with respect to axial stress.

  The base material is supported by the support member at the initial position.

  In the direct drawing type exposure apparatus described above, the support shaft receives at least a part of the weight of the base material by abutting the lower surface peripheral region of the base material with one end portion of the support shaft. As a result, the elastic deformation portion of the support shaft is elastically deformed with respect to the stress generated in the axial direction of the support shaft.

  Therefore, even if the displacement mechanism further slightly displaces the support member after the lower surface peripheral region of the base material and the one end portion of the support shaft abut, the elastic deformation portion is elastically deformed as described above, The support member continues to support the substrate. That is, it is avoided that the base material is suddenly supported only by the support shaft.

  For example, as a base material, a material in which a heel is stretched on a frame having a non-uniform thickness as described above is used, and a state in which the lower surface central region of the heel is supported by a support member at an initial position is considered. Further, it is assumed that there are a plurality of support shafts and that one end thereof is provided at the same height position. In this state, the exposure surface of the photosensitive resin applied to the upper surface of the ridge is orthogonal to the optical axis of the exposure light beam. Further, the lower surface of the frame body has not yet come into contact with one end portion of the support shaft.

  From this state, the displacement mechanism further displaces the support member to sequentially abut one end of the plurality of support shafts and the lower surface of the frame body, and finally, the frame body having a non-uniform thickness is formed only by the support shaft. The state is supported.

  When the support shaft is a rigid body, in the above state, the exposure surface of the photosensitive resin applied to the upper surface of the collar stretched on the frame body is inclined with respect to the optical axis of the exposure light beam. Therefore, if it exposes in that state, it will differ from a desired opening pattern (refer FIG. 11 and its description).

  On the other hand, when the displacement mechanism further slightly displaces the support member after the one end of the support shaft abuts the lower surface of the frame body, a state is considered in which the elastic deformation portion is elastically deformed as described above. In this state, the support member continues to support the lower surface central region of the bag.

  Support of the lower surface central region of the heel by the support member continues in the elastic deformation region of the support shaft that first contacts the lower surface of the frame. That is, it is avoided that the base material is suddenly supported only by the support shaft. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, an opening pattern with higher accuracy can be obtained.

  The second preferred embodiment of the direct-drawing exposure apparatus according to the present invention further comprises a load detection unit that is connected to the support shaft and detects a load applied in the axial direction of the support shaft, and a control device.

  The control device performs control so as to give an operation command to stop the operation to the drive unit based on information that informs that the load detected by the load detection unit has increased to a predetermined value.

  In the direct-drawing type exposure apparatus, the support shaft receives at least a part of the weight of the base material by contacting the base material with at least one of the one end portions of the support shaft. The load detector detects that the load has increased to a predetermined value. The information is transmitted to the control device, and the control device gives an operation command to stop the operation to the drive unit based on the information.

  In other words, the displacement mechanism reliably displaces the support member until the load detection unit detects that the load applied to at least one of the support shafts has increased to a predetermined value. Therefore, it is possible to achieve both the contact between the lower surface central region of the substrate and the upper surface of the support member, and the contact between the lower surface peripheral region of the substrate and at least one of the one ends of the support shaft, and support the optical axis of the exposure light beam. The upper surface of the member can be surely orthogonal. The predetermined value is preferably a load applied to the support shaft supporting the base material in a state where elastic deformation of the base material is eliminated by supporting at least one of the support shafts.

  Further, in the direct drawing type exposure apparatus, when the load detection unit detects that the load applied to at least one of the support shafts has reached a predetermined value, the control device causes the drive unit to stop the operation. Therefore, the displacement mechanism does not need to displace the support member excessively. That is, it can be avoided that the substrate is supported only by the support shaft.

  For example, as a base material, a material in which a heel is stretched on a frame body as described above is used, and a state where the lower surface central region of the heel is supported by a support member at an initial position is considered.

  Then, the support member is displaced, and when the load detection unit detects the start of an increase in the load applied to the support shaft, the control device stops the operation of the drive unit so that the lower surface central region of the rod is continuously supported by the support member. To. In this state, the exposure surface of the photosensitive resin applied to the upper surface of the ridge is not inclined with respect to the optical axis of the exposure light beam. Furthermore, since the frame is supported by the support shaft, elastic deformation that cannot be ignored does not occur in the heel. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, an opening pattern with higher accuracy can be obtained as in the first preferred embodiment.

  In a third preferred embodiment of the direct-drawing exposure apparatus according to the present invention, the distance to the upper surface of the base material corresponding to the position where the lower surface peripheral region of the base material and at least one of the one end portions of the support shaft contact each other. A distance detecting unit for detecting the control signal and a control device.

  The control device gives an operation command for stopping the operation to the drive unit based on information from the distance detection unit that informs that the distance between the distance detection unit and the upper surface of the base material has increased to a predetermined value. To control.

  In the direct drawing type exposure apparatus, the distance detection unit detects that the distance between the distance detection unit and the upper surface of the substrate has increased to a predetermined value as a result of the displacement mechanism displacing the support member. The information is transmitted to the control device, and the control device gives an operation command to stop the operation to the drive unit based on the information.

  In other words, the displacement mechanism reliably displaces the support member until it is detected that the distance between the distance detection unit and the upper surface of the base material has increased to a predetermined value. Therefore, both the contact between the lower surface central region of the substrate and the upper surface of the support member and the contact between the lower surface peripheral region of the substrate and one end portion of the support shaft are achieved, and the optical axis of the exposure light beam and the upper surface of the support member Can be reliably orthogonal. The predetermined value is determined by the distance detecting unit above the support shaft supporting the base material and the upper surface of the base material in a state where the elastic deformation of the base material is eliminated by supporting the base material by at least one of the support shafts. It is preferable that the distance is between.

  In the direct drawing type exposure apparatus described above, the displacement mechanism is supported by controlling the controller to give an operation command to stop the operation when the distance detected by the distance detector reaches that value. It is not necessary to displace the member too much. That is, as in the first and second preferred embodiments, it can be avoided that the base material is supported only by the support member.

  For example, as a base material, a material in which a heel is stretched on a frame body as described above is used, and a state where the lower surface central region of the heel is supported by a support member at an initial position is considered.

  Then, the support member is displaced, and when the distance detected by the distance detection unit reaches the predetermined value, the control device stops the operation of the drive unit, and the lower surface central region of the heel is continuously supported by the support member. Like that. In this state, the exposure surface of the photosensitive resin applied to the upper surface of the ridge is not inclined with respect to the optical axis of the exposure light beam. Furthermore, since the frame is supported by the support shaft, elastic deformation that cannot be ignored does not occur in the heel. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, as with the first and second preferred embodiments, a more accurate opening pattern can be obtained.

  In a fourth preferred embodiment of the direct drawing type exposure apparatus according to the present invention, an inclination detection mechanism and an inclination adjustment mechanism are further provided. The control device performs control so that an operation command for adjusting the tilt angle of the base is given to the tilt adjustment mechanism based on information from the tilt detection mechanism.

  In the direct drawing type exposure apparatus described above, the control device adjusts the tilt angle of the base by operating the tilt adjustment mechanism based on information from the tilt detection mechanism.

  Since the support member is installed on the base, the inclination angle thereof can be adjusted by adjusting the inclination angle of the base.

  Therefore, by adjusting the inclination angle of the base, the angle between the optical axis of the exposure light beam and the upper surface of the substrate is orthogonal in the state where the upper surface of the support member and the lower surface central region of the substrate are in contact with each other. Can be adjusted as follows. That is, by performing exposure in this state, a more accurate opening pattern can be obtained.

  In the direct drawing type exposure apparatus according to the present invention, the displacement mechanism displaces the support member, and the optical axis of the exposure light beam in a state where the lower surface peripheral area of the substrate and at least one of the one end portions of the support shaft are in contact with each other. And the upper surface of the substrate are orthogonal to each other.

  Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam is always orthogonal to the upper surface (exposure surface) of the photosensitive resin provided on the upper surface of the substrate within an allowable error range. .

  That is, the opening position of the opening pattern does not shift between the upper surface side and the lower surface (positioning surface) side of the photosensitive resin. Further, the opening pattern is not distorted.

  Therefore, when a photosensitive resin is used for a printing plate such as a screen printing plate, a highly accurate opening pattern can be obtained, so that ink can be printed with high accuracy at a desired position after alignment. .

It is sectional drawing (arrow sectional drawing of the arrow of the surface containing the Y1-Y1 line | wire of FIG. 2) of the direct drawing type exposure apparatus 100 concerning this invention. It is a top view of the principal part of the direct drawing type exposure apparatus 100 concerning this invention. FIG. 2 is a cross-sectional view corresponding to FIG. 1 for schematically explaining the positioning of the height position of the base material B by the support member 3 in the direct drawing type exposure apparatus 100 according to the present invention. (A) is sectional drawing of the state which has the support member 3 in an initial position (position before the displacement mechanisms 4a and 4b operate | move). (B) is sectional drawing of the state in which the lower surface of the frame F contact | abutted to the one end part of the support shaft 7a. (C) is a cross-sectional view of a state where the lower surface central region of the heel S is supported by the support member 3 and the frame body F is supported by the support shaft 7a. It is sectional drawing equivalent to FIG. 1 of 1st modification 100A in the direct drawing type exposure apparatus which concerns on this invention. It is sectional drawing equivalent to FIG. 1 of the 2nd modification 100B in the direct drawing type exposure apparatus which concerns on this invention. It is sectional drawing equivalent to FIG. 1 of the 3rd modification 100C in the direct drawing type exposure apparatus which concerns on this invention. It is sectional drawing equivalent to FIG. 1 of the 4th modification 100D in the direct drawing type exposure apparatus which concerns on this invention. It is a partial see-through perspective view of the 5th modification 100E in the direct drawing type exposure apparatus concerning this invention. It is a top view of the principal part of the 5th modification 100E in the direct drawing type exposure apparatus concerning this invention. It is explanatory drawing of the direct drawing type exposure apparatus 200 of background art. (A) is a schematic block diagram of the direct drawing type exposure apparatus 200. FIG. (B) is a schematic diagram showing a mirror configuration of DMD 205 used in direct drawing type exposure apparatus 200. FIG. (C) is the elements on larger scale of (B). In order to explain the problem to be solved by the present invention, the photosensitive resin PP on the heel S stretched on the frame F having a non-uniform thickness is obtained by directly drawing the background art shown in FIG. It is sectional drawing which shows typically the principal part of the direct drawing type exposure apparatus 200 in the case of performing pattern exposure using the exposure apparatus 200. FIG.

  Embodiments of the present invention will be described below to describe the features of the present invention in more detail.

-Embodiment of direct drawing type exposure apparatus according to the present invention-
An embodiment of a direct drawing type exposure apparatus according to the present invention will be described with reference to FIGS.

  FIG. 1 is a sectional view of a direct drawing type exposure apparatus 100 according to this embodiment. FIG. 2 is a top view of the main part of the direct drawing type exposure apparatus 100 according to this embodiment. FIG. 1 is a cross-sectional view of the plane including the Y1-Y1 line of FIG.

  The direct drawing type exposure apparatus 100 according to this embodiment directly irradiates the exposure light 1b in a predetermined pattern onto the film-like photosensitive resin PP held on the upper surface of the plate-like substrate B with the following configuration. Thus, pattern exposure is performed.

  In FIG. 1, as the base material B, a material in which a mesh cloth called heel S is stretched around the frame F as described above is used. As the base material B, a desired material such as a plate-shaped member made of any material can be used. The photosensitive resin PP is also in the form of a film as described above, for example, in the form of a dry film of a single resin, or in a state in which a liquid resin is applied on the ridge S and then dried. Things can be used.

  Note that the non-uniformity of the thickness of the photosensitive resin PP is negligible, and the upper surface PPu (exposure surface) is substantially parallel to the upper surface of the base material B (ＢS).

  The direct-drawing exposure apparatus 100 includes a light source 1, a base 2, a support member 3, displacement mechanisms 4a to 4d, and support shafts 7a to 7d.

  The light source 1 outputs an exposure light beam 1b. The exposure light beam 1b is a light beam having a wavelength that causes a chemical change in the photosensitive resin PP. As a light emitter of the light source 1 for that purpose, for example, an ultraviolet laser, an ultra-high pressure mercury lamp, or an LED that emits light having a wavelength in the ultraviolet region can be used. The light source 1 may further include a lens system such as a collimator lens or a condenser lens.

  In FIG. 1, the light source 1 is movable in the horizontal direction and the vertical direction by a horizontal movement mechanism 1h and a vertical movement mechanism 1v. That is, in FIG. 1, pattern exposure is performed by moving the light source 1 horizontally by the horizontal movement mechanism 1 h without moving the base 2. Further, the focus position is adjusted by moving the light source 1 up and down by the vertical movement mechanism 1v.

  In order to perform pattern exposure, the irradiation position of the exposure light beam may be changed by using a DMD described in Patent Document 1 or a reflecting mirror such as a galvano mirror without moving the light source 1. . Further, pattern exposure may be performed by moving the base 2 in at least one of the horizontal direction and the vertical direction by at least one of a horizontal movement mechanism and a vertical movement mechanism provided separately.

  The base 2 is not particularly limited in shape, and may be a flat plate or a recess formed by a bottom portion and a side wall. In the direct drawing type exposure apparatus 100 according to this embodiment, driving units 5 a to 5 d that drive displacement mechanisms 4 a to 4 d described later are installed on the upper surface of the base 2. The driving units 5a to 5d may be provided with a recess on the upper surface of the base 2 and installed in the recess.

  The displacement mechanisms 4a to 4d include a drive unit and a drive shaft that is displaced by the drive unit. For example, the displacement mechanism 4a includes a drive unit 5a and a drive shaft 6a that is displaced by the drive unit 5a. The displacement mechanisms 4b to 4d have the same configuration as the displacement mechanism 4a, and include a drive unit 5b and a drive shaft 6b, a drive unit 5c and a drive shaft 6c, a drive shaft 5d and a drive shaft 6d, respectively. The drive units 5a to 5d are respectively installed on the upper surface of the base 2 as described above.

  As the drive units 5a to 5d, for example, a cylinder stroke adjustment mechanism by pneumatic pressure or hydraulic pressure, a linear motion mechanism by a ball screw connected to a servo motor, a stepping motor with a lead screw, or the like can be preferably used. The positional relationship between the drive unit and the drive shaft is not limited to that shown in FIG. 1. For example, the drive shaft is installed on the upper surface of the base 2, and a support member 3 described later is attached on the drive shaft. It may be a linear motor in which the drive unit moves.

  The displacement mechanisms 4a to 4d support the lower surface peripheral region of the support member 3 by the drive shafts provided respectively. Further, the displacement mechanisms 4a to 4d displace the support member 3 in the optical axis direction of the exposure light beam 1b by driving the drive shafts by drive units to which the drive shafts are connected.

  That is, the displacement mechanism 4a-4d is operated to displace the support member 3, thereby bringing the lower surface peripheral region of the base material B into contact with at least one of one end portions of support shafts 7a-7d described later. It can be.

  In the direct drawing type exposure apparatus 100 according to this embodiment, the displacement mechanisms 4a to 4d are configured so as to be interlocked with each other. In addition, the drive parts 5a-5d are set so that the drive of the connected drive shaft may be stopped and maintained in a predetermined position (to be in a hold state).

  In the support member 3, the optical axis of the exposure light beam 1 b and the upper surface of the support member 3 are orthogonal within an allowable error range in a state where the upper surface of the support member 3 and the lower surface central region of the base material B are in contact with each other. Thus, it is installed at a predetermined height above the base 2 by the displacement mechanisms 4a to 4d. A stem 8 is attached to the lower surface of the support member 3, and an air passage 8 </ b> A is provided inside the stem 8.

  The support member 3 has an air passage 3 </ b> A that opens on the upper surface thereof. The air passage 3A communicates with a decompression mechanism (not shown) through an air chamber 3R and an air passage 3A formed by the flange portion 8G of the stem 8 and a recess provided on the lower surface of the support member 3. With such a configuration, the upper surface of the support member 3 can suck the lower surface central region of the base material B under reduced pressure.

  That is, in the direct drawing type exposure apparatus 100 according to this embodiment, the lower surface central region of the base material B is adsorbed and fixed by the support member 3 in a state where the upper surface of the support member 3 and the lower surface central region of the base material B are in close contact. Is done.

  Therefore, in this state, the upper surface of the support member 3 and the upper surface PPu (exposure surface) of the photosensitive resin PP held on the upper surface of the base material B are parallel to each other.

  The support shafts 7a to 7d are installed at positions where they can come into contact with the peripheral area of the lower surface of the base material B that is attracted and fixed to the support member 3 when the support members 3 are displaced by operating the displacement mechanisms 4a to 4d. Has been. At least one of the support shafts 7 a to 7 d supports the lower surface peripheral region of the base material B on the base 2 by coming into contact with the lower surface peripheral region of the base material B.

  Next, positioning of the height position of the base material B at the time of exposure by the support member 3 and the support shafts 7a to 7d will be described with reference to FIG.

  As a specific example, let us consider a case where the base material B is a screen printing plate including the frame body F and the wrinkles S stretched thereon, and the thickness of the frame body F is not uniform. In order to simplify the explanation, it is assumed that the base material B is displaced in the optical axis direction of the exposure light beam 1b by the displacement mechanisms 4a and 4b. Actually, including the displacement mechanisms 4c and 4d, the base material B is displaced in the optical axis direction of the exposure light beam 1b to position the base material B at the time of exposure.

  Here, it is assumed that the thickness (Fa) of the frame body F above the support shaft 7a is thicker than the thickness (Fb) of the frame body F above the support shaft 7b (see also FIG. 11A).

  Further, as described above, in the state where the upper surface of the support member 3 is in contact with the lower surface central region of the base material B, the support member 3 allows the optical axis of the exposure light beam 1b and the upper surface of the support member 3 to be allowed. It is installed at a predetermined height above the base 2 by the displacement mechanisms 4a to 4d so as to be orthogonal within a possible error range.

  FIG. 3A shows a state in which the support member 3 that sucks and fixes the heel S stretched on the frame F is in an initial position (position before the displacement mechanisms 4a and 4b operate). It is sectional drawing showing. In the initial position, the distance between the upper surface of the support member 3 and the upper surface of the base 2 is H1. In this state, since the ridge S is adsorbed and fixed to the upper surface of the support member 3, the normal direction PPn of the upper surface PPu of the photosensitive resin PP applied to the upper surface of the ridge S is the optical axis 1c of the exposure light beam 1b. Is consistent with

  However, the lower surface of the frame F is not in contact with one end portion of the support shafts 7a and 7b, and the weight of the frame F is applied to the heel S, so that the elastic deformation portion ED that cannot be ignored by the heel S. Is present.

  FIG. 3 (B) shows that the support mechanism 3 is displaced so that the distance between the upper surface of the support member 3 and the upper surface of the base 2 becomes H2, by operating the displacement mechanisms 4a and 4b. 7a is a cross-sectional view illustrating a state in which one end of 7a is in contact with the lower surface of the frame F. FIG.

  When the support member 3 is displaced from the state shown in FIG. 3A, the lower surface of the frame body F above the support shaft 7a is moved forward at one end of the support shaft 7a by the difference in thickness between Fa and Fb. Abut.

  However, at this time, since the support shaft 7a hardly supports the weight of the frame body F, and the weight of the frame body F is still on the heel S, the elastic deformation portion ED still exists in the heel S. Yes.

  In FIG. 3C, the support member 3 is further displaced so that the distance between the upper surface of the support member 3 and the upper surface of the base 2 becomes H3, so that the support shaft 7a sufficiently supports the frame F. It is sectional drawing showing the state which became.

  When the support member 3 is further displaced from the state shown in FIG. 3B, the support shaft 7a sufficiently supports the frame body F, and the weight of the frame body F on the heel S is sufficiently reduced. As a result, the elastic deformation of the heel S is eliminated. Then, when the elastic deformation of the heel S is eliminated, the operations of the drive units 5a and 5b of the displacement mechanisms 4a and 4b are stopped, and the displacement mechanisms 4a and 4b are placed in the hold state.

  By doing so, the support member 3 is further displaced, and the frame F is relatively pushed up by the support shaft 7a, so that the heel S is not separated from the upper surface of the support member 3 and tilted. Alternatively, one end of the support shaft 7b and the lower surface of the frame body F come into contact with each other, and finally the frame body F having a non-uniform thickness is supported only by the support shafts 7a and 7b. Due to the difference in thickness of F, the heel S does not tilt.

  That is, the coincidence between the normal direction PPn of the upper surface PPu of the photosensitive resin PP applied to the upper surface of the ridge S and the optical axis 1 of the exposure light beam 1b is maintained.

  As described above, the frame F abuts on one end of the support shaft 7a, and the weight of the frame F is supported by the support shaft 7a. It is supported. Even if one end portion of the support shaft 7b is not in contact with the lower surface of the frame body F, at least one support shaft supports the weight of the frame body F, so that the elastic deformation of the heel S is greatly improved. .

  That is, the photosensitive resin PP held on the upper surface of the ridge S is also in a state without elastic deformation.

  Through the above steps, in the direct drawing type exposure apparatus 100 according to this embodiment, the upper surface of the support member 7 and the lower surface central region of the ridge S are in close contact with each other, and at least one of the support shafts 7a to 7d. Thus, the height position of the base material B is positioned so that the frame body F is supported on the base 2.

  In the above description, the elastic deformation of the heel S is considered. However, for example, when the weight of the frame body F is light and the elastic deformation of the heel S due to the weight of the frame body F is negligible, one of the support shafts 7a. When the end portion comes into contact with the lower surface of the frame F, the displacement mechanisms 4a and 4b may be placed in the hold state.

  This also applies to the case where the base material B is made of, for example, a highly rigid plate-like member and is essentially difficult to elastically deform even if the weight of the frame body F is applied.

  As can be seen from the above specific example, in the direct-drawing exposure apparatus 100 according to this embodiment, even if the thickness of the base material B is not uniform, the base material B, the support member 3, and the base material B In the contact state with at least one of the one end portions of the support shafts 7a to 7d, the optical axis of the exposure light beam 1b and the upper surface of the base material B are surely orthogonal to each other. Therefore, pattern exposure can be performed in a state where the optical axis of the exposure light beam 1b is orthogonal to the upper surface PPu (exposure surface) of the photosensitive resin PP.

  In addition, since at least one of the support shafts 7a to 7d sufficiently supports the weight of the base material B, the base material B does not undergo non-negligible elastic deformation. Therefore, the photosensitive resin PP held on the upper surface is also included. In this state, there is no elastic deformation. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, in the direct drawing type exposure apparatus 100 according to this embodiment, the opening position of the opening pattern does not shift between the upper surface PPu side and the lower surface PPl side of the photosensitive resin PP. Further, the opening pattern is not distorted. That is, when the photosensitive resin PP is used for a printing plate such as a screen printing plate, it is possible to print ink with high accuracy at a desired position where alignment has been performed. Further, the dimensional variation of the print pattern can be reduced.

-First modification of embodiment of direct drawing type exposure apparatus according to the present invention-
A first modification 100A of the embodiment of the direct drawing type exposure apparatus according to the present invention will be described with reference to FIG.

  FIG. 4 is a cross-sectional view of a first modification 100A of the embodiment of the direct drawing type exposure apparatus according to the present invention. In the first modification 100A, the displacement mechanism 4 that displaces the support member 3 drives the stem 8 by the drive unit 5. That is, the stem 8 becomes the drive shaft 6. Therefore, the other parts are the same as those in the above-described embodiment of the direct drawing type exposure apparatus according to the present invention, and the description thereof will be omitted.

  In the first modification 100A, since the drive shaft 6 and the stem 8 of the displacement mechanism 4 are combined, the configuration of the direct drawing type exposure apparatus can be simplified. Further, when the support member 3 is displaced by a plurality of displacement mechanisms, in order to ensure the orthogonality between the optical axis of the exposure light beam 1b and the upper surface of the upper surface of the support member 3, interlocking between these displacement mechanisms is performed. It is necessary to adjust precisely. On the other hand, in the first modified example 100A, since the support member 3 is displaced by only one drive shaft 6 that is also used as the stem 8, such adjustment is not necessary.

  That is, in the first modification 100A of the embodiment of the direct drawing type exposure apparatus according to the present invention, the manufacturing cost of the direct drawing type exposure apparatus can be reduced, and maintenance labor and cost can be reduced.

-Second modification of the embodiment of the direct drawing type exposure apparatus according to the present invention-
A second modification 100B of the embodiment of the direct drawing type exposure apparatus according to the present invention will be described with reference to FIG.

  FIG. 5 is a cross-sectional view of a second modification 100B of the embodiment of the direct drawing type exposure apparatus according to the present invention. In the second modification 100B, the base material B is suddenly supported only by the support shaft after the lower surface peripheral region of the base material B and at least one of the one end portions of the support shafts 7a to 7d abut. The structure which prevents this is added to the drive shafts 6a to 6d. Therefore, the other parts are the same as those in the above-described embodiment of the direct drawing type exposure apparatus according to the present invention, and the description thereof will be omitted.

  In the direct drawing type exposure apparatus 100B according to the second modification, the support shafts 7a to 7d (support shafts 7c and 7d are not shown) each include a rigid body portion and an elastic deformation portion. For example, the support shaft 7a includes a rigid body portion 7as and an elastic deformation portion 7ae connected to one end portion of the rigid body portion 7as. The support shafts 7b to 7d have the same configuration as the support shaft 7a, and include a rigid body portion 7bs and an elastic deformation portion 7be, a rigid body portion 7cs and an elastic deformation portion 7ce, a rigid body portion 7ds, and an elastic deformation portion 7de, respectively.

  As the elastically deforming portions 7ae to 7de, for example, rubber and springs can be preferably used. Further, the positional relationship between the rigid body portion and the elastic deformation portion in the support shafts 7a to 7d is not limited to that shown in FIG. 5, and for example, two rigid body portions may be connected by the elastic deformation portion.

  As described above, at least a part of the weight of the base material B is brought into contact with the base material B by the contact between the lower surface peripheral region of the base material B and at least one of the one ends of the support shafts 7a to 7d. The support shaft is received. As a result, in the direct drawing type exposure apparatus 100B according to the second modification, the elastically deforming portion of the support shaft in contact with the base material B is elastically deformed with respect to the stress generated in the axial direction of the support shaft. When the elastically deforming portion of the abutting support shaft is elastically deformed, the base material B is not relatively pushed up by the abutting support shaft, and the base material B and the upper surface of the support member 3 are kept in close contact with each other.

  Therefore, even if the displacement mechanisms 4a to 4d further displace the support member 3 after the lower surface peripheral region of the base material B comes into contact with at least one of the one ends of the support shafts 7a to 7d, the support member 3 Continues to support the substrate B. That is, it is avoided that the base material B is suddenly supported only by the support shafts 7a to 7d.

  For example, as the base material B, a material in which the heel S is stretched on the frame F having a non-uniform thickness as described above is used, and the lower surface central region of the heel S is supported by the support member at the initial position. think of. Further, it is assumed that the one end portions of the support shafts 7a to 7d are provided so as to have the same height position.

  From this state, the displacement mechanisms 4a to 4d displace the support member 3 so that the one end portions of the support shafts 7a to 7d and the lower surface of the frame body F are sequentially brought into contact with each other. Assume that the body F is supported only by the support shaft.

  When the elastically deforming portions of the support shafts 7a to 7d are elastically deformed, the support member 3 can continue to support the lower surface central region of the ridge S as described above.

  Support of the lower surface central region of the heel S by the support member 3 continues in the elastic deformation region of one end portion of the support shafts 7a to 7d that first contacts the lower surface of the frame F. That is, it is possible to avoid that the base material B is suddenly supported only by the support shaft. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

  Therefore, a more accurate opening pattern can be obtained by exposing the photosensitive resin PP in that state.

-Third modification of the embodiment of the direct drawing type exposure apparatus according to the present invention-
A third modification 100C of the embodiment of the direct drawing type exposure apparatus according to the present invention will be described with reference to FIG.

  FIG. 6A is a cross-sectional view of a third modification 100C of the embodiment of the direct drawing type exposure apparatus according to the present invention. The third modification 100C is a state in which at least one of the support shafts 7a to 7d sufficiently supports the weight of the base material B described in the embodiment of the direct drawing type exposure apparatus according to the present invention described above. Is added with a configuration for reliably detecting. Therefore, the other parts are the same as those in the above-described embodiment of the direct drawing type exposure apparatus according to the present invention, and the description thereof will be omitted.

  The direct drawing type exposure apparatus 100C according to the third modification is connected to each of the support shafts 7a to 7d (support shafts 7c and 7d are not shown), and applies the load applied in the axial direction of each of the support shafts 7a to 7d. It further includes a load detection unit to detect, and a control device 11 to which the load detection unit and the drive unit are connected.

  For example, the load detection unit 9 a is attached to one end of the support shaft 7 a that contacts the frame body F, and is connected to the control device 11. In FIG. 6A, the connection state is indicated by a dotted line. Moreover, the control apparatus 11 is connected with the drive part 5a so that an operation command can be given to the drive part 5a based on the information from the load detection part 9a.

  Similarly to the load detection unit 9a, the load detection units 9b to 9d (load detection units 9c and 9d are not shown) are respectively attached to the end portions of the corresponding support shafts and connected to the control device 11, respectively. Yes. Moreover, the control apparatus 11 is connected to each of the drive parts 5b-5d similarly to the above.

  Based on the information that informs that the load detected by the load detection units 9a to 9d has increased to a predetermined value, the control device 11 gives an operation command to stop the operation to the drive unit corresponding to each load detection unit. Control to give.

  For example, a pressure sensor and a load cell can be preferably used as the load detection units 9a to 9d. Moreover, the attachment position of the load detection part in support shaft 7a-7d is not restricted to what was shown to FIG. 6 (A), For example, you may attach the load detection part in the support shaft.

  In the third modified example 100C, the base material B abuts at least one of the one end portions of the support shafts 7a to 7d, so that the support shaft that abuts at least a part of the weight of the base material B receives. As a result, it is detected by the load detectors attached to the support shafts 7a to 7d that the load applied to the contacted support shaft has increased to a predetermined value.

  The information is transmitted to the control device 11, and the control device 11 gives an operation command to stop the operation to the drive unit corresponding to the load detection unit that transmitted the information. In this case, it is preferable that the displacement mechanisms 4a to 4d are configured to be interlocked with each other.

  Moreover, said predetermined value is the load concerning the support shaft which is supporting the base material B in the state in which the elastic deformation of the base material B was canceled when at least 1 of the support shafts 7a-7d supported the base material. Preferably there is.

  In said structure, when the load detection part attached to each of the support shafts 7a to 7d detects that the load applied to at least one of the support shafts 7a to 7d has reached a predetermined value, the control device 11 However, control is performed to give an operation command to stop the operation to the corresponding drive unit.

  In other words, the displacement mechanisms 4a to 4d reliably displace the support member 3 until the load detection unit detects that the load applied to at least one of the support shafts has increased to a predetermined value. Therefore, the contact between the lower surface central region of the base material B and the upper surface of the support member 3 and the contact between the lower surface peripheral region of the base material B and at least one of the one end portions of the support shafts 7a to 7d are achieved. The optical axis of the light beam 1b and the upper surface of the support member 3 can be reliably orthogonal to each other, and the occurrence of non-negligible elastic deformation in the base material B can be avoided.

  Further, in the third modification example 100C, when the load detection unit detects that the load applied to at least one of the support shafts 7a to 7d has reached a predetermined value, the control device 11 operates the corresponding drive unit. By controlling to give an operation command to stop the movement, the displacement mechanisms 4a to 4d do not need to displace the support member 3 too much. That is, it is possible to avoid that the base material B is supported only by the support shafts 7a to 7d.

  That is, in the third modification 100C, the opening position of the opening pattern is shifted between the upper surface PPu side and the lower surface PPl side of the photosensitive resin PP, as in the above-described embodiment of the direct drawing type exposure apparatus according to the present invention. There is nothing. Further, the opening pattern is not distorted.

  Therefore, when the photosensitive resin PP is used for a printing plate such as a screen printing plate, it is possible to print ink with high accuracy at a desired position where alignment has been performed. Further, the dimensional variation of the print pattern can be reduced.

  As shown in FIG. 6B, the third modification 100C of the embodiment of the direct-drawing exposure apparatus according to the present invention includes support shafts 7a to 7d (support shafts 7c and 7d are not shown). You may make it provide a rigid body part and an elastic deformation part (refer the above-mentioned 2nd modification 100B).

  In this case, it is avoided that the base material B is suddenly supported only by the support shaft due to the displacement of the support member 3. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

-Fourth modification of the embodiment of the direct-drawing exposure apparatus according to the present invention-
A fourth modification 100D of the embodiment of the direct drawing type exposure apparatus according to the present invention will be described with reference to FIG.

  FIG. 7A is a sectional view of a fourth modification 100D of the embodiment of the direct drawing type exposure apparatus according to the present invention. In the fourth modified example, as in the third modified example, at least one of the support shafts 7a to 7d described in the above-described embodiment of the direct drawing type exposure apparatus according to the present invention has sufficient weight of the substrate B. A configuration for reliably detecting the state of support is added. Therefore, the other parts are the same as those in the above-described embodiment of the direct drawing type exposure apparatus according to the present invention, and the description thereof will be omitted.

  The direct-drawing type exposure apparatus 100D according to the fourth modification is a place where the lower surface peripheral area of the base material B and at least one of the one ends of the support shafts 7a to 7d (support shafts 7c and 7d are not shown) are in contact The distance detection part which detects the distance to the upper surface of the base material B corresponding to, and the control apparatus 11 are further provided.

  For example, the distance detection unit 10a can detect the distance to the upper surface of the base material B corresponding to the position where the lower surface peripheral region of the base material B and at least one of the one end portions of the support shaft 7a abut. And is connected to the control device 11. In FIG. 7A, the connection state is indicated by a dotted line. In FIG. 7A, the distance detection unit 10a is provided such that its detection axis (one-dot chain line) and the central axis of the support shaft 7a are the same. Moreover, the control apparatus 11 is connected with the drive part 5a so that an operation command can be given to the drive part 5a based on the information from the distance detection part 10a.

  The distance detectors 10b to 10d (distance detectors 10c and 10d are not shown) are also provided at positions corresponding to the support shafts 7b to 7d, respectively, and are connected to the control device 11 as in the distance detector 10a. Has been. The distance detection units 10b to 10d are provided so that their detection axes (one-dot chain lines) and the central axes of the corresponding support shafts 7b to 7d are the same. Furthermore, the control apparatus 11 is connected to each of the drive parts 5b-5d similarly to the above.

  The control device 11 receives each distance detection unit from the distance detection units 10a to 10d based on information that indicates that the distance between each distance detection unit and the upper surface of the base material B has increased to a predetermined value. Control is performed so as to give an operation command to stop the operation to the corresponding drive unit.

  As the distance detection units 10a to 10d, for example, a laser displacement meter can be preferably used.

  In the direct drawing type exposure apparatus 100D according to the fourth modified example, as a result of the displacement mechanisms 4a to 4d displacing the support member 3, the distance between the distance detectors 10a to 10d and the upper surface of the base material B is predetermined. It is detected by the distance detection units 10a to 10d that the value has increased to the value.

  The information is transmitted to the control device 11, and the control device 11 gives an operation command to stop the operation to the drive unit corresponding to the distance detection unit that transmitted the information. In this case, it is preferable that the displacement mechanisms 4a to 4d are configured to be interlocked with each other.

  In addition, the predetermined value is above the support shaft that supports the base material B when at least one of the support shafts 7a to 7d supports the base material B so that the elastic deformation of the base material B is eliminated. It is preferable that the distance is between the distance detection unit and the upper surface of the base material B.

  In said structure, when the distance which the distance detection parts 10a-10d detects becomes the value, the control apparatus 11 is controlled to give the operation command which stops operation | movement to a corresponding drive part.

  In other words, the displacement mechanisms 4a to 4d support the support member 3 until the distance detection unit detects that the distance between at least one of the distance detection units 10a to 10d and the upper surface of the base material B has increased to a predetermined value. Displace it securely. Therefore, the contact between the lower surface central region of the base material B and the upper surface of the support member 3 and the contact between the lower surface peripheral region of the base material B and at least one end portion of the support shafts 7a to 7d can be achieved. The optical axis of the light beam 1b and the upper surface of the support member 3 can be reliably orthogonal to each other, and the occurrence of non-negligible elastic deformation in the base material B can be avoided.

  That is, in the fourth modification 100D of the embodiment of the direct-drawing exposure apparatus according to the present invention, the same effect as in the third modification can be obtained, and on the upper surface PPu side and the lower surface PPl side of the photosensitive resin PP. The opening position of the opening pattern is not shifted. Further, the opening pattern is not distorted.

  Therefore, when the photosensitive resin PP is used for a printing plate such as a screen printing plate, it is possible to print ink with high accuracy at a desired position where alignment has been performed. Further, the dimensional variation of the print pattern can be reduced.

  In the fourth modification 100D of the embodiment of the direct drawing type exposure apparatus according to the present invention, as shown in FIG. 7B, support shafts 7a to 7d (support shafts 7c and 7d are not shown) are provided. You may make it provide a rigid body part and an elastic deformation part (refer the above-mentioned 2nd modification 100B).

  In this case, it is avoided that the base material B is suddenly supported only by the support shaft due to the displacement of the support member 3. As a result, the exposure pattern and the opening pattern after development can be matched with high accuracy.

-Fifth modification of the embodiment of the direct drawing type exposure apparatus according to the present invention-
A fifth modification 100E of the embodiment of the direct drawing type exposure apparatus according to the present invention will be described with reference to FIGS.

  FIG. 8 is a perspective view of the direct drawing type exposure apparatus 100E according to the fifth modified example seen through the base 2 simplified in illustration. FIG. 9 is a top view of the main part of the direct drawing type exposure apparatus 100E according to the fifth modification. In the fifth modification, a mechanism for adjusting the inclination generated for some reason is added to the base 2. Therefore, since other parts are the same as those in the above-described embodiment, description thereof is omitted. For example, in FIG. 8, illustrations of the drive units 5a to 5d and the stem 8 shown in FIG. 1 are omitted.

  In the fifth modification, the direct drawing type exposure apparatus 100E further includes tilt adjustment mechanisms 14a to 14c, tilt detection mechanisms 17a to 17c, and a control device 11.

  The inclination adjusting mechanisms 14a to 14c are installed on the upper surface of the pedestal 13, and include a drive unit and a drive shaft that is displaced by the drive unit. For example, the inclination adjustment mechanism 14a includes a drive unit 15a and a drive shaft 16a that is displaced by the drive unit 15a. The inclination adjustment mechanisms 14b and 14c have the same configuration as the inclination adjustment mechanism 14a, and include a drive unit 15b, a drive shaft 16b, a drive unit 15c, and a drive shaft 16c, respectively.

  In addition, as inclination adjustment mechanism 14a-14c, not only said mechanism but what can adjust inclination to arbitrary angles should just be. For example, a biaxial tilt stage or tilt unit can be used.

  The drive shafts 16a to 16c are respectively inserted into the recesses 12a to 12c provided on the lower surface of the base 2, and support the base 2 by coming into contact with the top surfaces of the recesses 12a to 12c. In addition, in FIG. 9, illustration of the drive parts 15a-15c is abbreviate | omitted. As the drive units 15a to 15c, for example, a cylinder stroke adjusting mechanism by pneumatic pressure or hydraulic pressure, a linear motion mechanism by a ball screw connected to a servo motor, a stepping motor with a lead screw, or the like can be preferably used.

  As the tilt detection mechanisms 17a to 17c, for example, a laser displacement meter can be preferably used. Each of the inclination detection mechanisms 17a to 17c irradiates predetermined detection spots 18a to 18c on the substrate 2 with laser light, and measures the distance between the base 2 and the inclination detection mechanisms 17a to 17c.

  The control device 11 detects the tilt of the base 2 by comparing the distances of the three points obtained by the tilt detection mechanisms 17a to 17c with each other. And it controls so that the operation command which adjusts the inclination-angle of the base 2 may be given to the inclination adjustment mechanisms 14a-14c.

  In FIG. 8, the tilt adjustment mechanisms 14 a to 14 c are shown through the base 2, and the positional relationship between the tilt adjustment mechanisms 14 a to 14 c and the tilt detection mechanisms 17 a to 17 c is illustrated. For example, the inclination detection mechanism 17a, the detection spot 18a, and the inclination adjustment mechanism 14a are configured to be on the same axis.

  The positional relationship among the tilt detection mechanism, the detection spot, and the tilt adjustment mechanism at other positions is the same. That is, the inclination detection mechanism 17b, the detection spot 18b, and the inclination adjustment mechanism 14b are on the same axis, and the inclination detection mechanism 17c, the detection spot 18c, and the inclination adjustment mechanism 14c are on the same axis. Note that the tilt detection mechanism and the detection spot and the corresponding tilt adjustment mechanism do not have to exist on the same axis.

  In FIG. 8, the tilt detection mechanism is arranged at three locations to detect the tilt of the base 2, and the tilt angle of the base 2 is adjusted by the corresponding three tilt adjustment mechanisms. Each of the tilt adjustment mechanisms may be three or more. Further, the number of tilt detection mechanisms and tilt adjustment mechanisms may be different.

  The control device 11 adjusts the inclination angle of the base 2 by operating the inclination adjustment mechanisms 14a to 14c based on information by the inclination detection mechanisms 17a to 17c.

  Since the support member 3 is supported above the base 2 by the displacement mechanisms 4 a to 4 d, the inclination angle thereof can be adjusted by adjusting the inclination angle of the base 2.

  Therefore, in the fifth modification, by adjusting the inclination angle of the base 2, the lower surface peripheral region of the base material B and at least one of the one end portions of the support shafts 7a to 7d are in contact with each other. The angle between the optical axis of the exposure light beam 1b and the upper surface of the base material B can be adjusted to be orthogonal. That is, by performing exposure in this state, a more accurate opening pattern can be obtained.

  In addition, this invention is not limited to said embodiment, A various application and deformation | transformation are possible within the scope of this invention.

100, 100A to 100E Direct-drawing exposure apparatus 1 Light source 1b Exposure light 2 Base 3 Support member 4, 4a to 4d Displacement mechanism 5, 5a to 5d Drive unit 6, 6a to 6d Drive shaft 6ae to 6de Elastic deformation unit 7a to 7d Support shafts 9a to 9d Load detectors 10a to 10c Distance detector 11 Controller B Base material PP Photosensitive resin

Claims (5)

A direct drawing type exposure apparatus that performs pattern exposure by directly irradiating an exposure light beam in a predetermined pattern to a film-like photosensitive resin held on a plate-like base material,
A light source that outputs exposure light;
The base,
A support member capable of supporting the lower surface central region of the substrate;
A displacement mechanism that includes a drive unit and a drive shaft, and operates to displace the support member in an optical axis direction of the exposure light beam;
At least one support shaft capable of supporting the lower peripheral edge region of the substrate;
Including
In the state where the support member is displaced by the displacement mechanism and at least one of the lower end peripheral area of the substrate and one end of the support shaft is in contact, the optical axis of the exposure light beam A direct-drawing type exposure apparatus, wherein the direct-drawing type exposure apparatus is disposed above the base so that an upper surface of the support member and the upper surface of the support member are orthogonal to each other.   The direct drawing type exposure apparatus according to claim 1, wherein the support shaft has an elastically deformable portion that is elastically deformed with respect to axial stress. A load detector connected to the support shaft and detecting a load applied in the axial direction of the support shaft; and a control device,
The control device controls to give an operation command to stop the operation to the drive unit based on information that informs that the load detected by the load detection unit has increased to a predetermined value. The direct drawing type exposure apparatus according to claim 1 or 2. A distance detection unit that detects a distance to the upper surface of the base material, corresponding to a location where the lower surface peripheral region of the base material and one end portion of the support shaft abut, and a control device;
The control device stops the operation to the drive unit based on information from the distance detection unit that informs that the distance between the distance detection unit and the upper surface of the base material has increased to a predetermined value. 3. The direct drawing type exposure apparatus according to claim 1, wherein control is performed so as to give an operation command. Further comprising an inclination detection mechanism and an inclination adjustment mechanism;
5. The control device according to claim 3, wherein the control device performs control so that an operation command for adjusting an inclination angle of the base is given to the inclination adjustment mechanism based on information from the inclination detection mechanism. The direct drawing type exposure apparatus as described.

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