KR102636341B1 - Optical element support - Google Patents

Abstract

The invention relates to an optical device for use in an optical imaging device, in particular for microlithography, comprising an optical element unit (108) and a detection device (112) and/or an actuation device (110), comprising: 108) includes at least one optical element 108.1. Detection device 112 generates a detection value representing the relative position or orientation of the element reference of optical element 108.1 with respect to the primary reference of detection device 112 in each degree of freedom, in each case in a plurality of M degrees of freedom. configured to determine, the detection device 112 comprises a plurality of N detection units 112.1, each of which has an optical element 108.1 and a secondary reference 112.2 assigned to each detection unit 112.1. is configured to output a detection signal representing the distance and/or displacement of the detection unit 112.1, wherein the optical element unit 108 and the detection device 112 represent the conversion of the N detection signals into M detection values. Define a detection transformation matrix. Additionally or alternatively, the actuating device 110 provides in each case a plurality of context values expressing the relative position or orientation of the elemental reference of the optical element with respect to the first reference of the actuating device 110 in each degree of freedom. configured to set in R degrees of freedom, the actuating device 110 comprising a plurality of S actuating units 110.1, each of which has an actuating state at the interface of the actuating unit 110.1 with respect to the optical element unit 108. configured to generate, wherein the optical element unit 108 and the actuation device 110 define an actuation transformation matrix representing the transformation of S actuation states into R situation values. In this case, the condition number of the transformation matrix is defined as the ratio of the maximum singular value of the transformation matrix to the minimum singular value of the transformation matrix. The detection device 112 and/or the optical element unit 108 is configured in such a way that the condition number of the detection transformation matrix is 5 to 30, in particular 5 to 20, more preferably 8 to 15. Additionally or alternatively, the actuating device 110 and/or the optical element unit 108 is configured in such a way that the condition number of the actuating transformation matrix is 5 to 30, in particular 5 to 20, more preferably 8 to 15. do.

Description

Optical element support

Cross-reference to related applications

This application claims the benefit of German Patent Application No. 10 2018 216 344.8 (filing date: September 25, 2018), the entire disclosure of which is incorporated herein by reference.

Background of the invention

The present invention relates to optical devices. Moreover, the present invention relates to optical imaging devices including such optical devices, corresponding methods for supporting optical elements, corresponding optical imaging methods, and methods for designing the corresponding optical devices. The present invention can be used with any desired optical imaging method. This can be used particularly advantageously in the production or inspection of microelectronic circuits and the optical components used therefor (eg optical masks).

Optical devices used in connection with the production of microelectronic circuits typically include a plurality of optical element units comprising one or more optical elements such as lens elements, mirrors or optical gratings arranged in an imaging optical path. The optical elements typically cooperate in an imaging process to transfer an image of an object (eg a pattern formed on a mask) onto a substrate (eg a so-called wafer). Optical elements are typically combined into one or more functional groups, where appropriate, retained in individual imaging units. In particular, for predominantly refractive systems operating at wavelengths in the so-called vacuum ultraviolet range (VUV, e.g. a wavelength of 193 nm), these imaging units are often formed from a stack of optical modules holding one or more optical elements. The optical module typically comprises a support structure with a substantially ring-shaped external support unit supporting one or more optical element holders, which in turn retain the optical elements.

The ever-advancing miniaturization of semiconductor components places ongoing demands on increased resolution of the optical systems used for their production. This demand for increased resolution requires increased numerical aperture (NA) and increased imaging accuracy of the optical system.

One approach to achieve increased optical resolution consists in reducing the wavelength of light used in the imaging process. Recent trends are promoting the development of systems in which light in the so-called extreme ultraviolet range (EUV) is used, typically at a wavelength of 5 nm to 20 nm, and in most cases at a wavelength of approximately 13 nm. In this EUV range, it is no longer possible to use conventional refractive optical systems. This is due to the fact that the materials used for refractive optical systems in this EUV range have too high an absorbance to achieve acceptable imaging results with the available optical power. As a result, in this EUV range, there is a need to use reflective optical systems for imaging.

This transition to reflective optical systems with high numerical apertures (e.g., NA > 0.4 to 0.5) in the EUV range poses significant challenges with regard to the design of imaging devices.

The above-mentioned factors give rise to very stringent requirements with regard to the position and/or orientation of the optical elements participating in the imaging with respect to each other and also with regard to the deformation of the individual optical elements in order to achieve the desired imaging accuracy. Moreover, there is a need to maintain this high imaging accuracy throughout operation and ultimately over the life of the system.

As a result, the components of the optical imaging device (i.e., e.g., mask, optical element, and substrate) that cooperate during imaging maintain a well-defined predefined spatial relationship between these components and minimize It must be supported in a well-defined manner to avoid undesirable deformation and ultimately achieve the highest possible imaging quality.

In order to maintain this predefined spatial relationship between the components throughout the entire imaging process, for such optical imaging devices this spatial relationship must be detected at least intermittently and at least in one degree of freedom (up to six degrees of freedom in space). It is common to actively coordinate at least individual components among said components in a dependent manner. A similar situation is often applicable with regard to deformation of individual components. Moreover, it is typically necessary to move the mask and substrate from time to time to image different areas of the mask pattern on different areas of the substrate.

In this case, of particular importance to the quality of the circuit produced is usually the so-called line-of-sight accuracy or the so-called overlay (i.e., therefore, the accuracy of the alignment of the individual structures of the circuit). In this case, errors in the position and/or orientation of the optical elements used in different degrees of freedom typically affect the resulting imaging accuracy to different extents. Therefore, mainly in degrees of freedom where errors have a significant impact on the imaging accuracy, in particular suppression of disturbances as good as possible or sufficiently precise positioning of the components participating in the imaging with respect to each other or with respect to their respective reference points or reference structures and/ Alternatively, it is important to realize a particularly high-performance mirror control loop to achieve orientation.

The problem in this case is that the detection devices (i.e. measurement devices, e.g. interferometers, encoders, etc.) used for the control loop are typically supported by a reference structure (often called a measurement frame), which does not actually behave as a rigid body, but rather, due to external or internal mechanical disturbances (vibrations, etc.), is subject to rather severe deformations (in particular so-called quasi-static deformations) to which the used optical components, especially the optical elements, are obviously not intended to conform. do. In this context, the problem is to identify or detect which part of the signal of the measurement device used arises from this deformation of the associated reference structure and to compensate for this measurement error to keep the imaging quality as high as possible.

Similar problems exist with respect to actuating devices used for control loops (i.e. actuators used, for example, to actively set the relevant optical elements in one or more degrees of freedom).

Against this background, the present invention provides an optical device, an optical imaging device, an optical device which does not have the above-described disadvantages, or at least has the above-described disadvantages to a lesser extent and which makes it possible in particular for high imaging quality to be reliably maintained in a simple manner. It is based on the purpose of providing a method for supporting an element, an imaging method and a method for designing an imaging device.

In the case of optical devices of the type mentioned at the outset, the invention relates to the conversion of the signal of the detection device into a detection value used for control with respect to the position and/or orientation of the reference (i.e. of, for example, reference point) of the optical element. Alternatively, if the detection device and the optical element unit are configured in such a way that the transformation matrix representing the transition has a condition number of 5 to 30, especially 5 to 20, more preferably 8 to 15, a high It is based on technical teachings where imaging quality can be realized in a simple manner. Additionally or alternatively, conversion of the operating state in the operating unit of the operating device into situational values arising from the control with respect to the position and/or orientation of the reference (i.e. of, for example, reference point) of the optical element, or A similar situation is applicable if the actuating device and the optical element unit are configured in this way in interaction, where the transformation matrix representing the transition has a condition number from 5 to 30, in particular from 5 to 20, more preferably from 8 to 15. .

Here, the condition number is a measure of conditioning of the transcription system. The transfer system is typically better conditioned, and the smaller the ratio between the maximum and minimum singularities of the transformation matrix. As a result, it follows that the conditioning of the system is therefore much better, with the result that, for example, the noise gain of the control loop is thus much lower and the condition number is smaller. Typically, the value of the condition number CN = 1 is obtained accordingly.

In other words, the condition number is a measure of the quality of the transcription system. A large condition number means that the matrix of the transcription system is almost singular. For measurement systems for determining the position of an object, a large condition number means that the position of the object, for example in at least one direction, can only be reconstructed incorrectly from the measurements. Similarly, for an actuation system for establishing the position of an object, for example a large condition number means that the position of the object in at least one direction can only be set incorrectly. Small errors (or noise) in the measuring or operating system here lead to large measuring or positioning errors, respectively.

In the undesirable extreme case, there exists a singular transformation matrix whose determinant is then equal to zero or whose rows and/or columns are linearly dependent. In this case, subsequently, for example, at least one direction can no longer be reconstructed at all from the measurements or the object cannot be adjusted in at least one direction even by expending large forces.

In contrast, transformation matrices that are usually considered ideal or seekable therefore have the condition number CN = 1. In this case, measurement errors are not amplified or equal forces must be expended in all operating directions to adjust the object.

However, for the case of application in the field of such optical imaging devices, the present invention provides for an increased It was recognized that a system with improved imaging quality could be achieved. This is essentially due to the fact that such systems with the above-described condition numbers can be significantly more compact and thus have improved dynamic properties which influence the quality of control or feasible minimization of imaging errors.

The condition number (CN) of the transformation matrix (TM) is the ratio of the maximum singular value (SV _max ) of the transformation matrix (TM) to the minimum singular value (SV _min ) of the transformation matrix, that is,

(One)

In this case, the condition number (CN) can be calculated, for example, by the corresponding eigenvalues (EV _i ) of the matrix (TM ^T TM or TM TM ^T ) (and consequently the transpose of the transformation matrix (TM) using the matrix (TM ^T ), where a simple transpose of the transformation matrix (TM) is sufficient:

(2)

It goes without saying that, in principle, both the detection device or actuating device and the optical element unit can be correspondingly configured or adapted to achieve the desired condition number (CN). In this case, only the optical boundary conditions of the optical elements, which are ultimately defined by their use in the imaging device, are invariant. In particular, it is possible to modify or correspondingly adapt the components of the optical element unit outside the respective optically used area of the optical surface.

Preferably, during the design of the optical device, first of all, a first step involves configuring the optical element unit and the detection device and/or the actuation device to achieve in each case the desired condition number (CN). Only then are the corresponding support structures of the optical imaging device and, if appropriate, other adjacent components (eg cooling devices, etc.) designed in a second stage with boundary conditions arising from the first stage. Thereby, it is possible to obtain a system optimized with respect to imaging errors in a relatively simple manner.

Accordingly, according to one aspect, the invention relates to an optical device for use in an optical imaging device, in particular for microlithography, comprising an optical element unit and a detection device and/or an actuation device, wherein the optical element unit comprises at least one contains optical elements. The detection device is configured to determine, in each case in a plurality of M degrees of freedom, a detection value expressing the relative position or orientation of the element reference of the optical element with respect to the first reference of the detection device in each degree of freedom. The detection device includes a plurality of N detection units, each of which is configured to output a detection signal representing the distance and/or displacement of the detection unit with respect to the optical element and a secondary reference assigned to each detection unit. The optical element unit and the detection device define a detection transformation matrix representing the transformation of N detection signals into M detection values. Additionally or alternatively, the actuating device sets, in each case in a plurality of R degrees of freedom, a context value expressing the relative position or orientation of the elemental reference of the optical element with respect to the first reference of the actuating device in each degree of freedom. It is configured to do so. The actuating device includes a plurality of S actuating units, each of which is configured to generate an actuating state at the interface of the actuating unit with respect to the optical element unit. The optical element unit and the actuation device define an actuation transformation matrix expressing the transformation of S actuation states into R context values. Here, the condition number of the transformation matrix is defined as the ratio of the maximum singular value of the transformation matrix to the minimum singular value of the transformation matrix. The detection device and/or optical element unit is configured in such a way that the condition number of the detection transformation matrix is 5 to 30, in particular 5 to 20, more preferably 8 to 15. Additionally or alternatively, the actuation device and/or optical element unit is configured in such a way that the condition number of the actuation transformation matrix is between 5 and 30, in particular between 5 and 20, more preferably between 8 and 15.

If appropriate, it goes without saying that it is also possible for only the optical element unit or the detection device or the actuation device to be adapted to obtain the desired condition number (CN), or the corresponding detection or actuation transformation matrix. However, preferably, all configuration possibilities for each pairing (including optical element units and detection or actuation devices) are used. However, it is particularly advantageous if all these components are jointly adapted.

It goes without saying that in principle, as many degrees of freedom as desired (up to six degrees of freedom in space) can be considered in each transformation matrix. Preferably, the degrees of freedom considered in each transformation matrix are limited to those degrees of freedom that have a significant impact on the imaging quality of the imaging device. As a result, they can therefore advantageously be limited to these degrees of freedom, where errors during detection and/or setup constitute a significant proportion of the total error budget of the imaging device. However, due to the typically high accuracy requirements, all six degrees of freedom in space are usually considered.

In a preferred variant, the plurality M therefore has the values 2 to 6, preferably 4 to 6, more preferably 6. Additionally or alternatively, the plurality of N may have a value of 2 to 6, preferably 4 to 6, more preferably 6. In principle, a different number of M associated degrees of freedom and N detection units can be provided. However, if the plurality of N numbers is at least equal to the plurality of M numbers, a particularly desirable configuration with relatively simple allocation arises. Here, where appropriate, it is also possible to provide more detection units (N) (i.e. N > M) than the degrees of freedom (M) involved or considered, and consequently, if appropriate, to achieve a certain amount of redundancy of the detection signal. It goes without saying that N > 6 may thus hold for good (e.g. to make it possible to detect deformation of the optical element if appropriate). In this regard, by way of example, at least two detection units can be provided for one or more degrees of freedom (in particular specifically for error-related).

Additionally or alternatively, the plurality of R may have a value of 2 to 6, preferably 4 to 6, more preferably 6. Likewise, additionally or alternatively, the plurality of S may have a value of 2 to 6, preferably 4 to 6, more preferably 6. Here too, in principle, a different number of R relevant degrees of freedom and S actuating units can be provided. However, if the plurality of S numbers is at least equal to the plurality of R numbers, a particularly desirable configuration with relatively simple allocation subsequently arises. However, here too, if appropriate, it is possible to provide more operating units (S) (i.e. S > R) than relevant or considered context values or degrees of freedom (R), and consequently, if appropriate, a certain amount of operating units. It goes without saying that in order to obtain redundancy (and if appropriate also to obtain predefinable transformations of the optical elements) S > 6 may thus hold.

The focus on the degrees of freedom associated with the imaging error - already described above - is realized in a particularly advantageous variant in which the optical imaging device has a predefinable maximum allowable imaging error during operation, wherein the imaging device has M detections for controlling the imaging device. configured to use values (assigned to M degrees of freedom), wherein a detection value error of at least one of the M detection values makes a contribution to the maximum allowable imaging error. In this case, the detection value error of the at least one detection value is at least 0.05% to 1.0% of the maximum acceptable imaging error, preferably at least 0.1% to 0.8% of the maximum acceptable imaging error, more preferably at least 0.1% to 0.8% of the maximum acceptable imaging error. Makes a contribution to the maximum allowable imaging error of at least 0.1% to 0.4% of the error. Degrees of freedom or detection values whose expected contribution to the maximum allowable imaging error are below this threshold may be ignored, i.e. may therefore not be reached in the detection transformation matrix. As a result, error-insensitive degrees of freedom or detection values may therefore be excluded from consideration or not taken into account in the adaptation of the condition number (CN). Imaging errors of the imaging device may be, for example, so-called overlay errors, ie errors in the alignment of the structures in different exposure processes.

Additionally or alternatively, the sum of the detection value errors of the M detection values is at least 0.5% to 10% of the maximum allowable imaging error, preferably at least 1% to 8% of the maximum allowable imaging error, more preferably Alternatively, it may be provided to make a contribution to the maximum allowable imaging error of at least 1% to 4% of the maximum allowable imaging error. This ensures that in any case a degree of freedom whose contribution to the total imaging error is not negligible is taken into account.

Additionally or alternatively, the same approach can also be adopted for the actuating device. Preferably, the imaging device is thus configured to set R context values (assigned to R degrees of freedom) upon control of the imaging device. The context value error of at least one of the R context values then makes a contribution to the maximum allowable imaging error, and the context value error of the at least one context value is at least 0.05% to 1.0% of the maximum allowable imaging error, preferably Makes a contribution to the maximum allowable imaging error of at least 0.1% to 0.8% of the maximum allowable imaging error, more preferably at least 0.1% to 0.4% of the maximum allowable imaging error. Even by this means, degrees of freedom or context values whose expected contribution to the maximum allowable imaging error is below this threshold may be ignored, i.e. may therefore not be reached in the operational transformation matrix. As a result, error-insensitive degrees of freedom or context values may therefore be excluded from consideration or not taken into account in the adaptation of the condition number (CN).

Additionally or alternatively, the sum of the context value errors of the R context values is at least 0.5% to 10% of the maximum allowable imaging error, preferably at least 1% to 8% of the maximum allowable imaging error, more preferably Alternatively, it may then be provided to make a contribution to the maximum allowable imaging error of at least 1% to 4% of the maximum allowable imaging error. This in turn ensures that degrees of freedom whose contribution to the total imaging error is not negligible are taken into account in any case.

It goes without saying that in principle it is possible to fully take into account the transformation matrix and the assigned degrees of freedom so that all detection units and/or actuation units are taken into account. In an advantageous variant, in addition, transformation matrices for one or more pairs of detection units and/or actuation units are taken into account. This may be particularly advantageous, for example, if the pair involves particularly sensitive degrees of freedom, i.e. degrees of freedom whose errors therefore constitute a particularly high proportion of the imaging error of the imaging device.

In this variant, then preferably at least two of the N detection units, in particular each two of the N detection units form a detection unit pair, and the pair of detection units with their assigned secondary reference Each detection unit defines a detection direction. Preferably, the detection directions of the two detection units of the detection unit pair lie at least substantially in a common detection unit pair plane. The detection unit pair is then, in each case, in at least two, preferably three detection pair degrees of freedom in the detection unit pair plane, in each case the detection pair elements of the optical element with respect to the first order reference in the respective detection pair degrees of freedom. and determine a detection pair detection value representing the relative position or orientation of the reference - assigned to the detection unit pair. The optical element unit and detection unit pair then define a detection pair transformation matrix representing the transformation of the detection signal of the detection unit pair into a detection pair detection value. Here too, the detection unit pairs and/or optical element units are then configured in this way, preferably where the condition number of the detection pair transformation matrix is 5 to 30, in particular 5 to 20, more preferably 8 to 15. As a result, by this means it is thus possible to achieve the desired conditioning for a single pair of detection units or for a plurality of such pairs of detection units.

In certain advantageous variants, at least one of the detection pair degrees of freedom is a translational degree of freedom and one of the detection pair degrees of freedom is a rotational degree of freedom, since these pairs of translational and rotational degrees of freedom often have a significant impact on imaging errors.

In these variants, the element datum can in principle be arranged in any suitable place with respect to the detection unit pair, in particular the detection unit pair plane. In principle, it is particularly advantageous if the element references of the optical elements are arranged at least substantially within the detection unit pair plane. Additionally or alternatively, the elemental criteria of the optical element may at least substantially match the detection pair elemental criteria of the optical element. In these cases, conditioning of the detection pair transformation matrix is typically particularly important.

In a particular variant, a particularly preferred conditioning of the system is achieved if the detection direction angle between the detection directions of the pair of detection units is less than 120°, preferably between 60° and 110°, more preferably between 75° and 95°. In this case, the result is a particularly desirable ratio between the noise gain and the dynamic advantage of the system that arises as a result of the deviation from the ideal condition number (CN = 1), which is mentioned in the introduction. The dynamic advantages then more than compensate for the disadvantages arising from intentional or targeted deviations from these ideal conditioning values.

A plurality of detection unit pairs, especially three detection unit pairs, are provided, and the detection direction angle between the detection directions of each detection unit pair is 10° to less than 40°, preferably 5° to less than 25°, more preferably A similar situation is applicable for variants that deviate from each other by less than 2° to 15°. In this case, a particularly advantageous variant is obtained if the two secondary references of at least one of the pairs of detection units, in particular of the detection units of all pairs of detection units, are arranged adjacent to each other. In this case, it is particularly advantageous and therefore preferred if the secondary references of the detection unit are arranged immediately adjacent to each other.

In another variant, a plurality of detection unit pairs are provided, and the detection unit pair planes of the two detection unit pairs are 5° to less than 30°, preferably 3° to less than 15°, more preferably 1° to 10°. are inclined relative to each other by less than In this case, it may be particularly advantageous if the two detection unit pair planes extend substantially parallel. As a result, a particularly advantageous configuration can be obtained, especially if the detection units of the two pairs of detection units cover the same degree of freedom in a pairwise manner. As will be explained in greater detail below, it is thereby possible, in particular, to obtain a configuration that is insensitive (or “blind”) to vibrations of the support structure; As a result, the errors introduced into the control system as a result of vibrations of the support structure can therefore be kept small, especially if the direction of movement of the vibration support structure extends substantially perpendicular to the detection unit pair plane.

It should be noted here that the angle between two planes indicated in the present application is always measured in a measuring plane extending perpendicular to the intersection line of the two planes (unless explicit indication to the contrary is provided below).

In another variant, a plurality of detection unit pairs are provided, and the detection unit pair planes of the two detection unit pairs are 5° to less than 30°, preferably 3° to less than 15°, more preferably 1° to 10°. It is inclined with respect to the direction of gravity by an inclination angle of less than. It may be particularly advantageous here if the angle of inclination with respect to the direction of gravity is substantially 0°. This results in a particularly desirable conditioning with respect to the error in degrees of freedom along the direction of gravity. This holds in particular if the vibrations of the support structure are directed substantially perpendicular to the direction of gravity.

In another variant, a plurality of detection unit pairs are provided, and the detection unit pair planes of two detection unit pairs are inclined with respect to the direction of gravity by an inclination angle, the inclination angle being from 5° to less than 30°, preferably from 3° to 15°. They differ from each other by less than, more preferably by less than 1° to less than 10°. These small differences in the inclination of the detection unit pair planes with respect to the direction of gravity are also particularly desirable with regard to good conditioning of the system. In particular, this is due to errors in degrees of freedom perpendicular to the direction of gravity (translation along one degree of freedom perpendicular to the direction of gravity and tilt or rotation around an axis perpendicular to the direction of gravity), especially in the case of vibrations of the support structure described above. It is mainly established in relation to

The advantages of pairing described above can also be realized in the context of an actuating device. Therefore, preferably, at least two of the S actuating units, in particular each two of the S actuating units, form an actuating unit pair, each actuating unit of the actuating unit pair defining an actuating direction, and the actuating unit The operating directions of the two operating units of the pair lie at least substantially in a common operating unit pair plane. The actuating unit pairs are then arranged in at least two, preferably three actuating pair degrees of freedom in the actuating unit pair plane, in each case an actuating pair element reference of the optical element with respect to a first order reference in each actuating pair degree of freedom - actuating unit pair. Assigned to - is configured to set a pair context value expressing the relative position or orientation of . The optical element unit and detection unit pair then define an operational pair transformation matrix representing the transformation of the operational state of the operational unit pair into a pair context value. The actuating unit pairs and/or optical element units are then configured in this way such that the condition number of the actuating pair transformation matrix is 5 to 30, in particular 5 to 20, more preferably 8 to 15.

Here too, it is preferably provided that at least one of the operational pair degrees of freedom is a translational degree of freedom and one of the operational pair degrees of freedom is a rotational degree of freedom. Additionally or alternatively, it may be provided that the operating direction angle between the operating directions of the pair of operating units is less than 120°, preferably between 60° and 110°, more preferably between 75° and 95°. This is also advantageous with regard to as good a noise behavior as possible of the control system. The above explanation is also applicable with respect to the location of element criteria. In particular, it is preferably provided that the element references of the optical elements are arranged at least substantially in the plane of the actuating unit pair. Additionally or alternatively, the element criteria of the optical element may at least substantially match the operational pair element criteria of the optical element.

The above-described aspects and advantages considering single and multiple pairs of operational units may likewise become apparent. Therefore, in a particular variant, a plurality of actuating unit pairs, in particular three actuating unit pairs, can be provided, the actuating direction angle between the actuating directions of each actuating unit pair being between 10° and less than 40°, preferably 5°. and deviate from each other by less than 25°, more preferably by less than 2° and less than 15°. Here too, it can subsequently be provided that the two interface devices of at least one of the actuating unit pairs, in particular of the actuating units of all actuating unit pairs, are arranged adjacent to each other. Here too, it is subsequently advantageous if the relevant interface units are arranged immediately adjacent to each other.

In another variant, a plurality of actuating unit pairs may be provided, wherein the actuating unit pair planes of the two actuating unit pairs are angled between 5° and less than 30°, preferably between 3° and less than 15°, more preferably between 1° and 1°. They are inclined relative to each other by less than 10°. Here too, it may be particularly advantageous if the actuating unit pair planes extend substantially parallel. Additionally or alternatively, in the case of a plurality of actuating unit pairs, the actuating unit pair plane of two actuating unit pairs is 5° to less than 30°, preferably 3° to less than 15°, more preferably 1°. It may be inclined with respect to the direction of gravity by an inclination angle of less than 10°. Here too, it may be particularly advantageous if the angle of inclination with respect to the direction of gravity is substantially 0°. Likewise, a plurality of actuating unit pairs may be provided, wherein the actuating unit pair planes of two actuating unit pairs are inclined with respect to the direction of gravity by an inclination angle, the inclination angle being from 5° to less than 30°, preferably from 3° to less than 15°. , more preferably differ from each other by less than 1° to 10°. With all these variants, the corresponding advantages described above with respect to the detection unit pair can also be achieved in the case of the actuating device.

The detection unit of the detection device can in principle be supported in any suitable way by one or more individual support structures. In a particularly preferred variant, the support is carried out in such a way that the eigenfrequencies and resulting eigenforms of the support structures are taken into account. Accordingly, in a preferred variant, at least one of the N detection units is supported by a detection device support structure of the detection device, and under vibrational excitation at at least one natural frequency the detection device support structure is assigned to a natural frequency and in particular at least one It has at least one eigentype with oscillating nodes.

In this case, the position and/or orientation of the at least one detection unit at at least one natural frequency, in at least one vibrational degree of freedom, in particular in a plurality of vibrational degrees of freedom, up to all six vibrational degrees of freedom. The maximum change in the detection value of the detection unit relative to the resting state is 5% to less than 10%, preferably 2% to less than 6%, more preferably 1% to less than 4% of the detection value of the detection unit. It may be arranged in this way that it may be arranged in particular in the vicinity of at least one vibration node. Preferably, the change in the detection value of the detection unit relative to the resting state is 0% to 0.5% of the detection value of the detection unit. What can thereby be achieved is that the errors introduced into the control system as a result of vibrations of the support structure can be kept small.

Additionally or alternatively, at least one detection unit with an assigned secondary reference defines a detection direction, and at least one detection unit at at least one natural frequency defines a position and/or orientation in at least one vibrational degree of freedom. , wherein the at least one detection unit changes its position and/or orientation in the detection direction by at most 5° to 30°, preferably by at most 3° to 15°, more preferably by at most 1° to 10°. It can be provided to be arranged in this way inclined with respect to a plane perpendicular to the vibrational degree of freedom representing the change. As a result, what can advantageously be achieved is that the detection unit or the detection signal supplied by it is insensitive (or “blind”) to the vibrations of the support structure; As a result, here too the errors introduced into the control system as a result of vibrations of the support structure can thus be kept small.

This positioning and/or orientation of the detection direction of the at least one detection unit depending on the specific type(s) of the support structure is in each case described herein by the condition numbers of the detection transformation matrix and the condition numbers of the operation transformation matrix, respectively. It should be noted here that it constitutes an independently protectable inventive concept independent of the established setting. Nevertheless, where appropriate, the effects and advantages of these inventive concepts can be advantageously combined.

In particular, the above and/or hereinafter indications regarding the detection direction angles, the mutual angles between the detection unit pair planes and/or the detection unit pair planes with respect to the direction of gravity of the detection device are also without exception (without the above provisions regarding the condition number ) can be advantageously implemented individually or in any desired combination with these further inventive concepts. It is particularly advantageous here if a configuration of the detection device that is as symmetrical as possible is chosen. This holds particularly true for the quality of control that can be achieved as a result. It is particularly advantageous if the symmetry is selected with respect to the symmetry plane and/or symmetry axis of the optical element.

The same holds also for (additional or alternative) combinations with the actuating devices described above and/or below. Consequently, the above indications regarding the operating direction angles, the mutual angles between the planes of the pairs of operating units and/or of the planes of the pairs of operating units with respect to the direction of gravity are therefore also without exception also (without the above provisions regarding condition numbers) individually or these It can be advantageously implemented in any desired combination with further inventive concepts. Here too, the symmetrical configuration described above is particularly advantageous with regard to the quality of control that can be achieved.

The support structure can, in principle, be formed in any desired way in each of these cases. In particular, a closed frame or ring-shaped structure can be selected. In certain variants, where a particularly compact configuration is achieved that is well adapted to the beam path of the imaging device (i.e. does not block the beam path of the imaging device), the detection device support structure is configured to support at least one of the N detection units, in particular all of them. It includes a substantially U-shaped structure for supporting N detection units. In connection with these open structures, the above variants are particularly advantageous since these open structures usually have a relatively pronounced intrinsic form. The mentioned advantages become particularly well apparent if at least one of the N detection units is arranged in the area of the free end of the U-shaped structure.

The advantages and variants just outlined in relation to the support of the detection device can in principle be realized in the same way for the actuating device (once again independently of the above definition regarding condition numbers). Accordingly, in a particular variant, at least one of the R actuating units is supported by an actuating device support structure of an actuating device, wherein under vibrational excitation at at least one natural frequency the actuating device support structure is assigned to a natural frequency and in particular at least one Provision is made for having at least one eigentype with oscillating nodes.

In a similar manner to the above description, here also the at least one actuating unit is configured to operate at at least one natural frequency, in at least one vibrational degree of freedom, in particular in a plurality of vibrational degrees of freedom, up to all six vibrational degrees of freedom. The maximum change in position and/or orientation of the operating unit relative to its resting state is from 5% to less than 10%, preferably from 2% to less than 6%, more preferably from 1% to less than 4% of the operating state of the operating unit. It can be arranged in this way to produce a change in operating state, in particular arranged in the vicinity of at least one oscillating node. Preferably, the change in the operating state of the operating unit relative to the resting state is between 0% and 0.5% of the operating state of the operating unit. Even by this means, what can be achieved is that the errors introduced into the control system as a result of vibrations of the support structure can be kept small.

Additionally or alternatively, the at least one actuation unit may define an actuation direction, wherein at least one actuation unit at at least one natural frequency has a maximum change in position and/or orientation in at least one vibrational degree of freedom. and the at least one actuating unit has a maximum change in position and/or orientation in the operating direction by at most 5° to 30°, preferably at most 3° to 15°, more preferably at most 1° to 10°. It can be arranged in this way inclined with respect to a plane perpendicular to the vibrational degree of freedom. As a result, what can advantageously be achieved is that the operating unit or the operating state generated by it is then as insensitive (or “blind”) as possible to the vibrations of the support structure; As a result, here too the errors introduced into the control system as a result of vibrations of the support structure can thus be kept small.

Here too, in a space-saving variant with little obstruction, it can be provided that the actuating device support structure comprises a substantially U-shaped structure for supporting at least one of the R actuating units, in particular all R actuating units. The advantages once again become particularly good if one of the R actuating units is arranged in the area of the free end of the U-shaped structure.

In principle, it goes without saying that any suitable point or section of the optical element is suitable for the element criteria of the optical element. A particularly advantageous configuration occurs if the element reference of the optical element is the area center of the optical surface of the optical element. Alternatively, the element reference of the optical element may be the center of mass of the optical element. Likewise, the element reference of the optical element may be the volume center of the optical element. Finally, an optical element for use in an imaging device is provided, and the element reference of the optical element may then be the point of incidence of the central ray of the used light beam of the imaging device. Particularly desirable results can be achieved in all these cases.

In principle, any desired optical element is suitable for the optical element. In this regard, reflective, refractive or diffractive optical elements or apertures may be included. The advantages of the invention become particularly well apparent if the optical element is configured for use with UV light, especially at wavelengths in the vacuum UV range (VUV) or extreme UV range (EUV), in particular at a wavelength between 5 nm and 20 nm.

For the detection unit, it is in principle possible to use any suitable operating principle with which the desired detection signal or desired detection value can be achieved with sufficient precision. The same applies to the assigned corresponding secondary criteria. In a variant that is preferred because of its simplicity and high precision, at least one detection unit, in particular each detection unit, comprises an interferometer, and the secondary reference in turn comprises in particular a reflective element. Additionally or alternatively, at least one detection unit, in particular each detection unit, may comprise an encoder, and the secondary reference preferably then comprises a reflective grating.

As for the operating unit, it is in principle possible to apply any suitable operating principle that satisfies the precision requirements imposed on the imaging device. A particularly simple configuration can be obtained if at least one actuating unit, in particular each actuating unit, comprises at least one actuator, in particular a force actuator and/or a displacement actuator.

The invention furthermore relates to optics for microlithography and/or wafer inspection, comprising an illumination device with a first group of optical elements, an object device for receiving an object, a projection device with a second group of optical elements, and an imaging device. Regarding an imaging device, the lighting device is configured to illuminate an object and the projection device is configured to project an image of the object onto the imaging device. The lighting device and/or the projection device comprises at least one optical device according to the invention, the optical element being part of a group of related optical elements. Preferably, a control device is provided, which is connected to the detection device and the actuation device and is configured to drive the actuation device according to signals from the detection device. The modifications and advantages described above in the context of the optical device according to the invention can thereby be realized to the same extent, and reference is therefore made to the above description in this connection.

The invention furthermore relates to a method for supporting an optical element unit with optical elements in an optical imaging device, particularly for microlithography, wherein the detection device has a plurality of N detection units in a plurality of M degrees of freedom, A detection value expressing the relative position or orientation of the element reference of the optical element with respect to the primary reference of the detection device is determined in each case, and each detection unit is determined in each case by the optical element and the secondary reference assigned to each detection unit. Outputs a detection signal expressing the distance and/or displacement of the detection unit. The optical element unit and the detection device define a detection transformation matrix representing the transformation of N detection signals into M detection values. Additionally or alternatively, an actuating device having a plurality of S actuating units in a plurality of R degrees of freedom expresses a relative position or orientation of an element reference of the optical element with respect to a first order reference of the actuating device in each degree of freedom. Adjust the situation value in each case. Each actuating unit generates an actuating state at the actuating unit's interface for the optical element unit. The optical element unit and the actuation device define an actuation transformation matrix expressing the transformation of S actuation states into R context values. Here, the condition number of the transformation matrix is once again defined as the ratio of the maximum singular value of the transformation matrix to the minimum singular value of the transformation matrix. Here, the condition number of the detection transformation matrix is 5 to 30, particularly 5 to 20, and more preferably 8 to 15. Additionally or alternatively, the condition number of the operational transformation matrix is 5 to 30, especially 5 to 20, more preferably 8 to 15. The variants and advantages described above in the context of the optical device according to the invention can thereby also be realized to the same extent, and reference is therefore made to the above description in this connection.

The invention furthermore particularly relates to an optical imaging method for microlithography and/or wafer inspection, wherein an object is illuminated via an illumination device having a first group of optical elements and imaging of the object on the imaging device is performed using a second group of optical elements. It is generated by a projection device that has The method according to the invention for supporting an optical element unit is used in particular in lighting devices and/or projection devices during imaging. The variants and advantages described above in the context of the optical device according to the invention can thereby also be realized to the same extent, and reference is therefore made to the above description in this connection.

Finally, the invention relates to a method for designing an optical device for use in an optical imaging device, in particular for microlithography, comprising an optical element unit and a detection device and/or an actuation device, wherein the optical element unit comprises at least Contains one optical element. In this method, the detection device is configured to determine in each case in a plurality of M degrees of freedom a detection value expressing the relative position or orientation of the element reference of the optical element with respect to the first reference of the detection device in each degree of freedom. In this case, the detection device comprises a plurality of N detection units, each of which is configured to output a detection signal representing the distance and/or displacement of the detection unit with respect to the optical element and a secondary reference assigned to each detection unit. It is composed. The optical element unit and the detection device define a detection transformation matrix representing the transformation of N detection signals into M detection values. Additionally or alternatively, the actuating device sets, in each case in a plurality of R degrees of freedom, a context value expressing the relative position or orientation of the elemental reference of the optical element with respect to the first reference of the actuating device in each degree of freedom. It is configured to do so. In this case, the actuating device comprises a plurality of S actuating units, each of which is configured to generate an actuating state at the interface of the actuating unit with respect to the optical element unit. The optical element unit and the actuation device define an actuation transformation matrix expressing the transformation of S actuation states into R context values. Here, the condition number of the transformation matrix is defined as the ratio of the maximum singular value of the transformation matrix to the minimum singular value of the transformation matrix. The detection device and/or the optical element unit is configured in such a way that the condition number of the detection transformation matrix is 5 to 30, in particular 5 to 20, more preferably 8 to 15, and preferably, in the first configuration step, the detection device and the optical element unit is constructed, and in a subsequent second construction step, the support structure of the detection device and/or the support structure of the optical element unit is constructed according to the results of the first construction step. Additionally or alternatively, the actuating device and/or optical element unit is configured in such a way that the condition number of the actuating transformation matrix is between 5 and 30, in particular between 5 and 20, more preferably between 8 and 15, preferably: In a first construction step, the actuating device and the optical element unit are constructed, and in a subsequent second construction step, the support structure of the actuating device and/or the support structure of the optical element unit is constructed according to the results of the first construction step. The variants and advantages described above in the context of the optical device according to the invention can thereby also be realized to the same extent, and reference is therefore made to the above description in this connection.

Other aspects and exemplary embodiments of the invention are apparent from the following description of preferred exemplary embodiments taken in conjunction with the dependent claims and the accompanying drawings. All combinations of the disclosed features are within the scope of the invention, regardless of whether they are the subject matter of a claim.

Figure 1 is a schematic diagram of a preferred embodiment of a projection exposure apparatus according to the invention, which includes a preferred embodiment of an optical device according to the invention and is capable of implementing preferred embodiments of the method according to the invention.
Fig. 2 is a schematic front view of a modification of the optical device according to the invention from Fig. 1;
Figure 3 is a schematic side view of the optical device from Figure 2 seen from direction III from Figure 2;
Figure 4 is a schematic side view of the optical device from Figure 2, seen from direction IV from Figure 2;

A first preferred exemplary embodiment of a projection exposure apparatus 101 according to the invention comprising a preferred exemplary embodiment of an optical module according to the invention is described below with reference to FIGS. 1 to 3 . To simplify the following description, x, y, z coordinate systems are indicated in the drawings, with the z direction corresponding to the direction of gravity. It goes without saying that it is possible to select any other desired orientation of the x, y, z coordinate systems in other configurations.

1 is a very schematic, non-actual scale drawing of a projection exposure apparatus 101 that may be used in a microlithography process for producing semiconductor components. The projection exposure apparatus 101 includes an illumination device 102 and a projection device 103. The projection device 103 is designed to transfer, in an exposure process, an image of the structure of the mask 104.1 arranged in the mask unit 104 onto the substrate 105.1 arranged in the substrate unit 105. For this purpose, the illumination device 102 illuminates the mask 104.1 (more specifically via a beam directing device not shown in detail). The optical projection device 103 receives light from the mask 104.1 and projects an image of the mask structure of the mask 104.1 onto a substrate 105.1, for example a wafer.

The lighting device 102 comprises a group of optical elements 106 with an optical module 106.1. The projection device 103 comprises a group of optical elements 107 with an optical device according to the invention in the form of an optical module 107.1. The optical modules 106.1, 107.1 of the optical element groups 106, 107 are arranged along the folded optical beam path 101.1 of the projection exposure apparatus 101. Each optical element group 106, 107 may include a number of optical modules 106.1, 107.1.

In this exemplary embodiment, the projection exposure apparatus 101 operates with light in the EUV range (extreme UV range) with a wavelength of 5 nm to 20 nm, particularly with a wavelength of approximately 13 nm. Accordingly, the optical modules 106.1, 107.1 of the lighting device 102 and the projection device 103 are in this example entirely reflective optical elements. In other configurations of the invention, it is of course also possible to use any type of optical element (refractive, reflective, diffractive) alone or in any desired combination (particularly depending on the wavelength of the illumination light). In particular, the lighting device 102 and/or the projection device 103 of one or more (if appropriate even all) of the optical modules may comprise a device according to the invention similar to the module 107.1. In another variant of the invention, the imaging device 101 (with corresponding adaptations to the components and apparatus thereof) can be used for inspection purposes, for example wafer inspection.

Figure 2 shows details of an exemplary embodiment of an optical module 107.1 according to the invention. As can be seen from FIG. 2 , optical module 107.1 includes an optical element unit 108 and a support structure 109 of projection device 103 . The optical element unit 108 includes an optical element 108.1 having an optical surface 108.2 that is at least partially optically used during operation.

The optical element 108.1 is connected to the support structure 109 via an actuation device in the form of an actuator device 110 . The actuation device 110 in this case supports the optical element 108.1 in a statically determined manner on the support structure 109 . In order to make it possible to actively adjust the optical element unit 108 with the optical element 108.1 during the operation of the imaging device 101, the actuating device 110 of the present example is configured to control all the elements in space under the control of the control device 111. It is configured to set or adjust the position and/or orientation of the optical element unit 108 and thus the optical element 108.1 respectively in six degrees of freedom (DOF). It goes without saying that in another variant, the actuating device 110 can also move the optical element 108.1 in just less than six degrees of freedom (DOF) in space. In particular, actuation movements may be limited to only two actuation degrees of freedom (DOF).

In a particular variant, a gravity compensation device (not shown), if appropriate, may be provided kinematically parallel to the actuator device 110 , wherein the gravity compensation device acts on the optical element unit 108 During operation, the actuator device 110 only needs to apply an acceleration force for actuation movement on the optical element unit 108, taking at least substantially the force of gravity.

The optical module 107.1 expresses the relative position or orientation of the element reference (ER) of the optical element 108.1 with respect to the primary reference (PRE) of the detection device 112 in each case in the respective degree of freedom (DOF). It further includes a detection device 112 configured to determine the detection value EW _i (i = 1...M) in a plurality of M degrees of freedom (DOF).

For this purpose, the detection device 112 comprises a plurality of N detection units 112.1 supported by the support structure 113 of the imaging device 101, typically the so-called metrology frame. Each detection unit 112.1 is configured to output a detection signal ES _j (j = 1...N) to the control device 111 (in FIG. 2 for clarity only one of the detection units 112.1 as shown). The detection value EW _i is then controlled by a control device ( 111). As a result, the control loop RK comprising the actuating device 110, the control device 111 and the detection device 112 is thus realized.

In this case, each detection signal ES _j (j = 1...N) is transmitted to the detection unit 112.1 with respect to the optical element 108.1 and to the secondary reference 112.2 assigned to each detection unit 112.1. Expresses the distance and/or displacement of

For the detection unit 112.1 it is in principle possible to use any suitable operating principle with which the desired detection signal ES _j or the desired detection value EW _i can be achieved with sufficient precision. The same applies to the assigned corresponding secondary criterion (112.2). In the present example, all detection units 112.1 each comprise an interferometer, since high-precision measurements can thereby be performed in a particularly simple manner. Accordingly, every secondary reference 112.2 comprises a reflective element (eg an interferometric mirror) connected to the optical element unit 108.

However, it goes without saying that in other variants it is possible to use any other measuring principle that allows sufficiently precise measurements. For example, each or all detection units 112.1 may also comprise an encoder, and the secondary reference 112.2 then preferably comprises a (one-dimensional or two-dimensional) reflection grating.

In this case, the optical element unit 108 and the detection device 112 define a detection transformation matrix (ETM) representing the transformation of N detection signals (ES _j ) into M detection values (EW _i ). As a result, the following relationship follows the vector of the detection value (EW _i ) ( ) and the vector of the detection signal (ES _j ) ( ) holds true for

(3)

The detection device 112 and the optical element unit 108 are configured in this example in such a way that the condition number CN _ETM of the detection transformation matrix ETM has the value CN _ETM = 11 (described in more detail below) As), the condition number is determined according to equations (1) and (2) above. In another variant, it may be provided that the condition number (CN _ETM ) of the detection transformation matrix (ETM) is 5 to 30, especially 5 to 20, more preferably 8 to 15.

Here, the condition number (CN _ETM ) of the detection transformation matrix (ETM) is a measure of the transcription system conditioning between the input value (i.e., detection signal (ES _j )) and the output value (i.e., detection value (EW _i )). The transfer system is typically better conditioned, and the deviation between singular points in the transformation matrix (TM) becomes smaller. As a result, it follows that the conditioning of the control system is therefore much better, with the result that, for example, the noise gain of the control loop is thus much lower and the condition number CN is smaller. Typically, the value of the condition number CN = 1 is obtained accordingly.

However, the present invention, for the case of application to the imaging device 101, as a result of an intentional or targeted deviation of the condition number CN _ETM from the condition number with the value CN = 1, typically obtained for the control system, It was realized that an improved system with increased imaging quality could be achieved. This essentially allows the optical module 107.1 with the condition number (CN _ETM ) as defined above to be significantly more compact and thus have improved dynamic properties which influence the quality of control or feasible minimization of imaging errors. is due to the fact that

In addition, in this example, the actuating device 110 determines in each case the relative position of the element reference (ER) of the optical element 108.1 with respect to the primary reference (PRS) of the actuating device 110 in each degree of freedom. Alternatively, the context value (LW _p ) (p = 1...R) expressing the orientation is configured to be set to a plurality of R degrees of freedom (DOF). For this purpose, the actuating device 110 comprises a plurality of S actuating units 110.1, each of which is under the control of the control device 111 and has an interface of the actuating unit 110.1 to the optical element unit 108 ( 110.2) (as shown in FIG. 2 for only one of the operating units 110.1 for clarity) to generate an operating state AS _q (q = 1...S).

The optical element unit 108 and the actuation device 110 then define an actuation transformation matrix (STM) representing the transformation of the S actuation states AS _q into R context values LW _p . As a result, the _following relationship follows: ) and the vector of the operating state (AS _q ) ( ) holds true for

(4)

The actuating device 110 and the optical element unit 108 are configured in this example in such a way that the condition number CN _STM of the actuating transformation matrix STM has the value CN _STM = 15 (described in more detail below) As), the condition number is determined according to equations (1) and (2) above. However, in another variant, it can also be provided that the condition number (CN _STM ) is 5 to 30, especially 5 to 20, more preferably 8 to 15.

The invention also provides for the case of application to the imaging device 101, as a result of an intentional or targeted deviation of the condition number CN _STM from the condition number with the value CN = 1, typically obtained for the control system, an increase It was recognized that an improved system with improved imaging quality could be achieved. This essentially means that the optical module 107.1, which also has one of the condition numbers CN _STM described above, can be significantly more compact and thus have improved dynamic properties, which affects the quality of control or feasible minimization of imaging errors. It is due to fact. The above description of condition numbers for detection device 112 is also similarly applicable to actuation device 110 .

For the operating unit 110.1 as well, it is in principle possible to apply any suitable operating principle that satisfies the precision requirements imposed on the imaging device 101. A particularly simple configuration can be obtained if at least one actuating unit 110.1, in particular (in the present example) each actuating unit 110.1 comprises at least one actuator. This is a force actuator in this example. However, it is also possible to use any other actuators, in particular displacement actuators, in one or more actuating units 110.1.

In principle, both the detection device 112 or actuating device 110 and the optical element unit 108 can be respectively configured or adapted to achieve the desired condition number (CN _ETM or CN _STM ). It should be mentioned again here. In this case, only the optical boundary conditions of optical element 108.1, which are ultimately defined by their use in imaging device 101, are invariant. In particular, it is possible to modify or correspondingly adapt the components of the optical element unit 108 outside the respective optically used area of the optical surface 108.2.

In this example, during the design of the optical module 107.1, firstly, the first step is to use the optical element unit 108 and the detection device 112 to achieve the desired condition numbers (CN _ETM , CN _STM respectively) in each case. and/or configuring the operating device 110 . Only then will each of the corresponding support structures 109, 113 of the optical imaging device 101 and, if appropriate, other adjacent components (e.g. cooling devices, etc.), be moved to the second stage with boundary conditions resulting from the first stage. formed in stages. Thereby, it is possible to obtain, in a relatively simple manner, an imaging device 101 that is optimized with respect to imaging errors.

As already described above, if appropriate, in another variant, only the optical element units 108 are used to obtain the desired condition number (CN _ETM or CN _STM respectively), or the corresponding detection transformation matrix (ETM) or operation transformation matrix (STM). ) or only the detection device 112 or the actuation device 110 is also possible. However, preferably, as in the present example, all configuration possibilities for each pairing (comprising optical element unit 108 and detection device 112 or comprising optical element unit 108 and actuation device 110 ) is used. It is particularly advantageous if all these components 108, 110, 112 are jointly adapted.

As already mentioned, in principle as many degrees of freedom as desired (up to six degrees of freedom in space) can be considered in each transformation matrix (ETM or STM). Preferably, the degrees of freedom (DOF) considered in each transformation matrix (ETM or STM) for each optical module 107.1 are, with respect to the movement in the optical module 107.1, the degree of freedom (DOF) of the imaging device 101. These degrees of freedom (DOF) have a significant impact on imaging quality. As a result, these degrees of freedom are therefore preferably such that errors during detection by the detection device 112 and/or errors during setup by the actuation device 110 constitute a significant proportion of the total error budget of the imaging device 101. (DOF).

In this example, both detection and setup are affected in each case at all six degrees of freedom in space. Accordingly, the plurality of degrees of freedom (DOF) is initially M = 6 for detection via detection device 112 and R = 6 for setting via actuation device 110 . In this case a plurality of N = 6 detection units 112.1 and an associated secondary reference 112.2 are used. Likewise, a plurality of S = 6 actuating units are used, which in the present example are arranged with parallel kinematics in the form of a hexapod.

However, as already mentioned above, in another variant it may also be provided that the plurality of M degrees of freedom (DOF) for detection have values of 2 to 6, preferably 4 to 6, more preferably 6. You can. Likewise, the plurality of N detection units 112.1 may have a value of 2 to 6, preferably 4 to 6, more preferably 6. In principle, a different number of M associated degrees of freedom (DOF) and N detection units 112.1 can be provided. However, if, as in this example, the plurality of N is at least equal to the plurality of M, a particularly desirable configuration with relatively simple allocation results. Moreover, as mentioned, the following relationship: N > M can also hold.

Likewise, the plurality of R degrees of freedom (DOF) for setting may have a value of 2 to 6, preferably 4 to 6, and more preferably 6. Here too, the plurality of S actuating units 110.1 may have values 2 to 6, preferably 4 to 6, more preferably 6. Here too, in principle, a different number of R relevant degrees of freedom (DOF) and S actuating units 110.1 can be provided. However, if, as in this example, the plurality of S is at least equal to the plurality of R, a particularly desirable configuration with relatively simple allocation once again arises.

The focus on the degrees of freedom (DOF) associated with the imaging error - already described - is realized in a particularly advantageous variant. In this case, the optical imaging device 101 has a predefinable maximum allowable imaging error (IE _max ) during operation. Moreover, the imaging device 101 is configured to use the M detection values EW _i (assigned to the M degrees of freedom (DOF)) to control the imaging device 101 by the control device 111, At least one detection value error (FEW _i ) among the M detection values (EW _i ) then makes a contribution (BEW _i ) to the maximum allowable imaging error (IE _max ).

In this case, the detection value error (FEW _i ) of the at least one detection value (EW _i ) is at least 0.05% to 1.0% of the maximum allowable imaging error (IE _max ), preferably the maximum allowable imaging error (IE _max ). makes the contribution BEW _i to the maximum allowable imaging error (IE _max ) of at least 0.1% to 0.8%, more preferably at least 0.1% to 0.4% of the maximum allowable imaging error (IE _max ). Degrees of freedom (DOF) or detection values (EW _i ) whose expected contribution (BEW _i ) to its maximum allowable imaging error (IE _max ) is below this threshold can be ignored, and consequently the detection transformation matrix ( ETM) may not be reached. As a result, the error insensitive degree of freedom (DOF) or detection value (EW _i ) may therefore be excluded from consideration or not taken into account in the adaptation of the condition number (CN _ETM ).

Moreover, in a particular variant, the sum of the detection value errors (FEW _i ) of the M detection values (EW _i ) (SFEW _i ) is at least 0.5% to 10% of the maximum allowable imaging error (IE _max ), preferably A contribution to the maximum tolerable imaging error (IE _max ) of at least 1% to 8% of the maximum tolerable imaging error (IE _max ), more preferably of at least 1% to 4% of the maximum tolerable imaging error (IE _max ). It can be provided to make (SBEW _i ). This ensures that degrees of freedom (DOF) whose contribution to the total imaging error (IE _max ) is not negligible are taken into account in any case.

In certain variations, the same procedure may also be adopted for actuating device 110 . In these cases, the imaging device 101 is configured to set R context values LW _p (assigned to R degrees of freedom) during control of the imaging device 101 by the control device 111. At least one context value error (FLW _p ) among the R context values (LW _p ) makes a contribution (BLW _p ) to the maximum allowable imaging error (IE _max ), wherein at least one context value (LW _p ) The context value error (FLW _p ) is at least 0.05% to 1.0% of the maximum allowable imaging error (IE _max ), preferably at least 0.1% to 0.8% of the maximum allowable imaging error (IE _max ), more preferably Make the contribution (BLW _p ) to the maximum allowable imaging error (IE _max ) of at least 0.1% to 0.4% of the maximum allowable imaging error (IE _max ). Even by this means, degrees of freedom (DOF) or context values (LW _{p ) whose expected contribution (BLW p )} to the maximum allowable imaging error (IE _max ) is below this threshold can be ignored, resulting in Therefore, the operational transformation matrix (STM) may not be reached. As a result, error-insensitive degrees of freedom (DOF) or context values (LW _p ) may therefore be excluded from consideration or not taken into account in the adaptation of the condition number (CN).

Moreover, in a particular variant, the sum of the context value errors (FLW _p ) of the R context values (LW _p ) (SFLW _p ) is at least 0.5% to 10% of the maximum allowable imaging error (IE _max ), preferably A contribution to the maximum tolerable imaging error (IE _max ) of at least 1% to 8% of the maximum tolerable imaging error (IE _max ), more preferably of at least 1% to 4% of the maximum tolerable imaging error (IE _max ). Creating (SBLW _p ) can once again be provided. This once again ensures that degrees of freedom (DOF) whose contribution (BLW _p ) to the total imaging error (IE _max ) is not negligible are taken into account in any case.

It goes without saying that in principle it is possible to fully take into account the transformation matrix (ETM or STM) and the assigned degrees of freedom (DOF) so that all detection units 112.1 and/or actuation units 110.1 are taken into account. . In this example, in addition, transformation matrices for one or more pairs of detection unit 112.1 and/or operation unit 110.1 are taken into account. This may be particularly advantageous, for example, if the pair is associated with a particularly sensitive degree of freedom (DOF), i.e. a degree of freedom (DOF) whose errors therefore constitute a particularly high proportion of the imaging error of the imaging device 101 .

In this variant, then preferably, at least two of the N detection units 112.1 form a detection unit pair 112.3, wherein the detection unit pair with its assigned secondary reference 112.2 ( Each detection unit 112.1 of 112.3 defines a detection direction EDIR, which in each case is indicated in FIGS. 2 to 4 by the dashed line 112.4 of the beam of the interferometer 112.1. In this example, in each case two adjacent detection units 112.1 form a detection unit pair 112.4, resulting in a total of three detection unit pairs 112.4.

In this example, the detection directions EDIR of the two detection units 112.1 of the detection unit pair 112.3 lie substantially in the common detection unit pair plane EEPE. In this case, the detection unit pairs 112.3 are optical elements in at least two detection pair degrees of freedom (EPDOF), in this example three detection pair degrees of freedom (EPDOF), in each case in the detection unit pair plane (EEPE). (108.1), and is configured to determine a detection pair detection value (EPEW _i ) (i = 1...3), which represents the relative position or orientation of the detection pair element reference (EPER) of (108.1), wherein the detection pair element reference is The detection pair degrees of freedom (EPDOF) are assigned to pairs of detection units with respect to the first criterion (PRE).

The optical element unit 108 and the detection unit pair 112.3 then generate a detection pair transformation matrix (EPETM) that represents the transformation of the detection signal (EPES _j ) of the detection unit pair 112.3 into a detection pair detection value (EPEW _i ). Define. As a result, the following relationship follows the vector of the detection value (EPEW _i ) ( ) and the vector of the detection signal (EPES _j ) ( ) holds true for

(5)

In this example, the detection device 112 and the optical element unit 108 are configured in such a way that the condition number CN _EPETM of the detection pair transformation matrix EPETM has the value CN _EPETM = 10, wherein the condition number is It is determined according to equations (1) and (2). In another variant, it can be provided that the condition number (CN _EPETM ) of the detection pair transformation matrix (EPETM) is 5 to 30, especially 5 to 20, more preferably 8 to 15. As a result, by this means it is thus possible to achieve the desired conditioning for a single detection unit pair 112.3 or for a plurality of such detection unit pairs 112.3.

In this example, the detection pair degrees of freedom (EPDOF) are naturally two translational and rotational degrees of freedom in the detection unit pair plane (EEPE). However, in another variant, it is also possible to consider only two detection pair degrees of freedom (EPDOF), which have a significant impact on imaging error.

In these variants, the element reference ER can in principle be arranged in any suitable place with respect to the detection unit pair 112.3, in particular the detection unit pair plane EEPE. In principle, it is particularly advantageous if the element reference ER of the optical element 108.1 is arranged at least substantially within the detection unit pair plane EEPE. Additionally or alternatively, the element reference (ER) of optical element 108.1 may at least substantially match the detection pair element reference (EPER) of optical element 108.1. In these cases, conditioning of the detection pair transformation matrix (EPETM) is usually particularly important. However, in the present example, one of the two secondary criteria 112.2 of the detection unit pair 112.3 constitutes the detection pair element criterion EPER, since this makes it possible to obtain a particularly simple construction.

In this example, a particularly preferred conditioning of the system is such that the detection direction angle ERW _i (i = 1...3) between the detection directions EDIR of the pair of detection units 112.3 is less than 120°, preferably 60°. to 110°, more preferably 75° to 95°. In this case, this leads to a particularly favorable ratio between the noise gain and the dynamic advantage of the optical module 107.1 that arises as a result of the deviation from the ideal condition number (CN = 1), which is mentioned in the introduction. The advantages then more than compensate for the disadvantages arising from targeted deviations from these ideal conditioning values.

In this variant with three detection unit pairs 112.3, the detection direction angle ERW _i between the detection directions EDIR of each detection unit pair 112.3 is from 10° to less than 40°, preferably 5. It is further provided that they deviate from each other by between ° and less than 25°, more preferably between 2° and less than 15°.

Particularly favorable results are achieved in this case because the two secondary references 112.2 of the detection units 112.1 of every detection unit pair 112.3 are arranged adjacent to each other. In this case, it is particularly advantageous if the secondary references 112.2 of the detection unit 112.1 are arranged immediately adjacent to each other.

Moreover, in this example, the detection unit pair plane EEPE of the first and third detection unit pairs 112.3 (see left and right detection unit pairs 112.3 with ERW ₁ and ERW ₃ in Figure 2) is 5°. They are inclined with respect to each other by from to less than 30°, preferably from 3° to less than 15°, more preferably from 1° to less than 10°. In particular, if the detection units 112.1 of the two detection unit pairs 112.3 cover the same degree of freedom (DOF) in a pairwise manner, as in the present case, a particularly advantageous configuration can be achieved as a result.

As will be explained in greater detail below, it is thereby possible, in particular, to obtain a configuration that is insensitive (or “blind”) to vibrations of the support structure 113; As a result, the errors introduced into the control system as a result of the vibration of the support structure 113 are therefore small, especially if the direction of movement of the vibration support structure 113 extends substantially perpendicular to the detection unit pair plane EEPE. It can be maintained.

Moreover, in this example, the detection unit pair plane (EEPE) of the first and third detection unit pairs 112.3 is each between 5° and less than 30°, preferably between 3° and less than 15°, more preferably 1°. It is inclined with respect to the direction of gravity (z-axis) by an inclination angle (ENW ₁ , ENW ₃ ) of less than 10°. This results in a particularly desirable conditioning with respect to the error in degrees of freedom (DOF) along the direction of gravity (z axis). Moreover, the inclination angles ENW ₁ , ENW ₃ differ from each other by 5° to less than 30°, preferably by 3° to less than 15°, more preferably by 1° to less than 10°. This is also particularly advantageous with regard to good conditioning of the optical module 107.1 and thus the entire imaging device 101. In particular, this holds true with regard to errors in degrees of freedom perpendicular to the direction of gravity (for example translation along the x axis and tilt or rotation around the y axis in FIG. 2 ), especially in the case of the above-described vibrations of the support structure.

The above-described configuration of the detection device 112 as symmetrical as possible is particularly advantageous for the quality of control achievable with the control device 111 . It is particularly advantageous if, as in the present example, symmetry is chosen with respect to the plane of symmetry of optical element 108.1 (yz-plane in this example).

The advantages of pairing described above are also realized in the present example in connection with the actuating device 110 . Accordingly, in the present example, at least two of the S actuating units 110.1, more precisely in each case two of the S actuating units 110.1, form a pair of actuating units 110.3, with the result that as a whole Once again three operational units are formed in pairs 110.3. Each actuating unit 110.1 of the actuating unit pair 110.3 defines an actuating direction SDIR corresponding to the longitudinal axis 110.4 of the respective actuating unit 110.1. In the present example, the operating directions SDIR of the two operating units 110.1 of the operating unit pair 110.3 lie at least substantially in the common operating unit pair plane SEPE.

Each pair of actuating units 110.3 furthermore enables the actuation of the optical element 108.1 in at least two, in the present case three, degrees of freedom (SPDOF) of the pair of actuating units in the actuating unit pair plane SEPE in each case. It is configured to set a pair situation value (SPLW _p ) (p = 1...3) expressing the relative position or orientation of a pair element criterion (SPER), wherein the operational pair element criterion is a function of each operational pair degree of freedom (SPDOF). ), with respect to the primary reference (PRS), is assigned to the operational unit pair 110.3.

The optical element unit 108 and the operational unit pair 110.3 then produce an operational pair transformation matrix (SPSTM) representing the transformation of the operational state (SPAS _q ) of the operational unit pair 110.3 into the pair context value (SPLW _p ). define. As a result, _the following relationship follows: ) and the vector of the operating state (SPAS _q ) ( ) holds true for

(6)

The actuating unit pair 110.3 and/or the optical element unit 108 are once again configured in this way so that the condition number CN _SPSTM of the actuating pair transformation matrix SPSTM has the value CN _SPSTM = 8, wherein the condition number is It is determined according to equations (1) and (2) above. However, in another variant, it can also be provided that the condition number (CN _SPSTM ) of the working pair transformation matrix (SPSTM) is between 5 and 30, in particular between 5 and 20, more preferably between 8 and 15.

Here too, it is naturally provided that two of the actuating pair degrees of freedom (SPDOF) are translational degrees of freedom in the actuating unit pair plane (SEPE), while the third actuating pair degree of freedom is a rotational degree of freedom in the actuating unit pair plane (SEPE). However, here too, in another variant, it is of course also possible that only two of the above degrees of freedom are taken into account.

In this example, the operating direction angle SDIRW _i (i = 1...3) between the operating directions SDIR of each pair of operating units 110.3 is less than 120°, preferably between 60° and 110°, More preferably, it is 75° to 95°. This is also advantageous in that a desirable noise behavior of the control system is possible. The above explanation is also applicable with respect to the location of element criteria (SPER). In particular, it is preferably provided that the element reference ER of the optical element 108.1 is arranged at least substantially in the actuating unit pair plane SEPE. Additionally or alternatively, the element reference (ER) of optical element 108.1 may at least substantially match the operational pair element reference (SPER) of optical element 108.1. However, in the present example, one of the two interface devices 110.2 of the operative element pair 110.3 constitutes the operative pair element reference SPER, since a particularly simple configuration can thereby be obtained.

Moreover, the operating direction angle SDIRW _i between the operating directions of each pair of operating units 110.3 is between 10° and less than 40°, preferably between 5° and less than 25°, more preferably between 2° and less than 15°. as much as they escape from each other. Moreover, the two interface devices 110.2 of the operating units 110.1 of every operating unit pair 110.3 are arranged adjacent to each other. Here again it is advantageous if the relevant interface units 110.2 are arranged immediately adjacent to each other.

Moreover, in the present example, the actuating unit pair planes of the first and third actuating unit pairs 110.3 (cf. left and right detection unit pairs 112.3 with SDIRW ₁ and SDIRW ₃ in FIG. 2 ) are advantageously angled by 5°. They are inclined with respect to each other by from to less than 30°, preferably from 3° to less than 15°, more preferably from 1° to less than 10°. Furthermore, the actuating unit pair planes of the two actuating unit pairs each have an inclination angle (SNW ₁ , SNW ₃ ) of from 5° to less than 30°, preferably from 3° to less than 15°, more preferably from 1° to less than 10°. It is inclined with respect to the direction of gravity. Likewise, the inclination angles SNW ₁ , SNW ₃ differ from each other by 5° to less than 30°, preferably by 3° to less than 15°, more preferably by 1° to less than 10°. With all these variants, the corresponding advantages described above for the detection unit pair 110.3 can also be achieved for the actuating device 110 as well.

The detection unit 112.1 of the detection device 112 can in principle be supported in any suitable way by one or more individual support structures 113 . In this case, the support is preferably carried out in such a way that the natural frequency and the resulting natural shape of the support structure 113 are taken into account. Accordingly, in the present example, the support structure 113 is configured to generate at least one eigenform (EEFORM) assigned to a natural frequency and in particular to have at least one vibration node (EVN) for vibration excitation at at least one natural frequency (EEFREQ). Forms a support structure for the detection device having underneath.

In this example, at least one of the detection units 112.1 is a detection unit at at least one natural frequency (EEFREQ), at least one vibrational degree of freedom (VDOF), in particular in a plurality of vibrational degrees of freedom up to six vibrational degrees of freedom. The maximum change in the position and/or orientation of (112.1) is between 5% and less than 10%, preferably between 2% and less than 6%, more preferably between 1% and 1% of the detection value (EW _i ) of detection unit 112.1. It is arranged in the vicinity of at least one vibration node EVN in such a way that it produces a change in the detection value EW _i of the detection unit relative to the resting state of less than 4%. As a result, what can be achieved by this is that the errors introduced into the control system as a result of vibrations of the support structure 113 can be kept small.

Moreover, at least one of the detection units 112.1 at at least one natural frequency (EEFREQ) has a maximum change in position and/or orientation in at least one vibrational degree of freedom (VDOF), wherein the relevant detection unit 112.1 The detection direction (EDIR) then has a maximum change in position and/or orientation by at most 5° to 30°, preferably by at most 3° to 15°, more preferably by at most 1° to 10° and a vibration degree of freedom (VDOF). The slopes are arranged in this way with respect to the plane perpendicular to ) (indicated by the double arrow in Figure 2). As a result, what can advantageously be achieved is that the detection unit 112.1 or the detection signal ES _j supplied by it is insensitive (or “blind”) to the vibrations of the support structure 113 ; As a result, here too the errors introduced into the control system as a result of vibrations of the support structure 113 can thus be kept small.

The support structure 113 can in principle be formed in any desired way. In particular, a closed frame or ring-shaped structure may be included. In this example, a particularly compact configuration that is well adapted to the beam path 101.1 of the imaging device 101 (i.e. does not block the beam path 101.1 of the imaging device 101) provides the detection unit 112.1. This is achieved by the support structure 113 comprising a substantially U-shaped structure for support. In connection with these open structures, the above variants are particularly advantageous since these open structures usually have a relatively pronounced EFORM. The mentioned advantage is that, as in the case of the present example for the left detection unit 112.1 in Figure 3 and for the right detection unit 112.1 in Figure 4, at least one of the N detection units is located in the area of the free end of the U-shaped structure. This becomes particularly well apparent when arranged in .

The advantages and variants just outlined in relation to the support of the detection device 112 can in principle be realized in the same way for the actuating device 110 as well. In this example, the support structure 109 has at least one SEFORM assigned to a natural frequency SEFREQ and in particular has at least one vibration node SVN. Forms a support structure for the device to operate under excitation.

In a similar way to the above description, here likewise at least one of the actuating units 110.1 has at least one natural frequency (SEFREQ), at least one vibrational degree of freedom (VDOF), in particular a plurality of vibrational degrees of freedom up to all six. The maximum change in the degree of freedom of vibration of the position and/or orientation of the at least one actuating unit 110.1 is from 5% to less than 10%, preferably from 2% to less than 6% of the operating state AS _q of the actuating unit 110.1. , more preferably in the vicinity of at least one oscillation node, in such a way as to produce a change in the operating state AS _q of the operating unit 110.1 relative to the resting state of less than 1% to 4%. Even by this means, what can be achieved is that the errors introduced into the control system as a result of vibrations of the support structure 109 can be kept small.

Moreover, at least one actuating unit 110.1 at at least one natural frequency (SEFEQ) can have a maximum change in position and/or orientation in at least one vibrational degree of freedom (VDOF), The direction of operation (SDIF) has a maximum change in position and/or orientation by at most 5° to 30°, preferably by at most 3° to 15°, more preferably by at most 1° to 10° and a vibration degree of freedom (VDOF). The slope with respect to the plane perpendicular to can be arranged in this way. As a result, what can advantageously be achieved is that the operating unit 110.1 or the operating state AS _q generated by it is then as insensitive (or “blind”) as possible to the vibrations of the support structure 109 ; As a result, here too the errors introduced into the control system as a result of vibrations of the support structure 109 can thus be kept small.

Here too, for a space-saving variant that presents little obstruction, it can be provided that the support structure 109 comprises a substantially U-shaped structure 109 for supporting the actuating unit 110.1, as in the present example. . Once again, the advantage is that, as in the case of the present example for the left actuating unit 110.1 in FIG. 3 and for the right actuating unit 110.1 in FIG. 4, one of the actuating units 110.1 is of the U-shaped structure 109. This becomes particularly advantageous when arranged in the area of the free end.

In principle, any suitable point or section of optical element 108.1 is suitable for the element reference (ER) of optical element 108.1. A particularly advantageous configuration occurs if the element reference (ER) of the optical element is the area center of the optical surface 108.2 of the optical element 108.1. Alternatively, the element reference (ER) of optical element 108.1 may be the center of mass of optical element 108.1. Likewise, the element reference (ER) of optical element 108.1 may be the volume center of optical element 108.1.

In this example, the element reference ER of optical element 108.1 is the point of incidence of the central ray of the used light beam of imaging device 101, which is directed by optical beam path 101.1.

It goes without saying that by means of this example of the imaging device 101 it is possible to carry out the above-described method according to the invention for supporting the optical element 108 and the above-described imaging method.

The invention has been described above based on examples from the field of microlithography. However, it goes without saying that the present invention can also be used in connection with any other desired optical application, especially in connection with imaging methods at other wavelengths.

Moreover, the invention can be used in connection with the inspection of objects, for example in the so-called mask inspection, in which masks used for microlithography are inspected for their integrity, etc. In Figure 1, a sensor unit, for example detecting (for further processing) an imaging of the projection pattern of the mask 104.1, then takes the place of the substrate 105.1. This mask inspection can then all be performed at substantially the same wavelength as used in the subsequent microlithography process. However, it is equally possible to use any desired wavelength outside of it for inspection.

Finally, the invention has been described above on the basis of specific exemplary embodiments representing specific combinations of features defined in the claims below. At this point, it should be clearly pointed out that the subject matter of the present invention is not limited to the combination of these features, but rather all other combinations of features as are evident from the following patent claims also fall within the subject matter of the present invention.

Claims (18)

An optical device for use in an optical imaging device,
- optical element unit and
- comprising at least one of a detection device (112) and an actuation device (110),
- the optical element unit 108 comprises at least one optical element 108.1,
The following configurations:
- the detection device 112 provides in each case a detection value representing the relative position or orientation of the element reference of the optical element 108.1 with respect to the first reference of the detection device 112 in each degree of freedom, in a plurality of M degrees of freedom. It is configured to decide in,
- The detection device 112 comprises a plurality of N detection units 112.1, each of which has a detection unit ( 112.1) configured to output a detection signal representing at least one of distance and displacement,
- the optical element unit 108 and the detection device 112 define a detection transformation matrix representing the transformation of the N detection signals into M detection values;
and
- the actuating device 110 is configured to set, in each case in a plurality of R degrees of freedom, a situation value expressing the relative position or orientation of the element reference of the optical element with respect to the primary reference of the actuating device 110 in each degree of freedom. composed,
- the actuating device 110 comprises a plurality of S actuating units 110.1, each of which is configured to generate an actuating state at the interface of the actuating unit 110.1 with respect to the optical element unit 108,
- the optical element unit 108 and the actuation device 110 define an actuation transformation matrix representing the transformation of S actuation states into R situation values;
It has at least one of the following,
- In an optical device, the condition number of the transformation matrix is defined as the ratio of the maximum singular value of the transformation matrix to the minimum singular value of the transformation matrix,
- at least one of the detection device 112 and the optical element unit 108 is configured in such a way that the condition number of the detection transformation matrix is 5 to 30,
and
- at least one of the actuation device 110 and the optical element unit 108 is configured in such a way that the condition number of the actuation transformation matrix is 5 to 30,
An optical device comprising at least one of the following: According to paragraph 1,
- a plurality of M having values 2 to 6;
- the plurality of N has values 2 to 6;
- The plurality of N pieces is at least the same as the plurality of M pieces;
- a plurality of R having values 2 to 6;
- a plurality of S having values 2 to 6; and
- A plurality of S items are at least the same as a plurality of R items;
An optical device comprising at least one of: According to claim 1 or 2,
- the optical imaging device has a predefinable maximum allowable imaging error during operation,
The following configurations:
- the imaging device is configured to use M detection values to control the imaging device, wherein an error in at least one of the M detection values makes a contribution to the maximum allowable imaging error,
- the detection value error of at least one detection value makes a contribution to the maximum allowable imaging error of at least 0.05% to 1.0% of the maximum allowable imaging error,
and
- the sum of the detection value errors of the M detection values makes a contribution to the maximum allowable imaging error of at least 0.5% to 10% of the maximum allowable imaging error,
Having at least one of;
and
- the imaging device is configured to set R context values during control of the imaging device, and an error in at least one context value among the R context values makes a contribution to the maximum allowable imaging error,
- the context value error of at least one context value makes a contribution to the maximum allowable imaging error of at least 0.05% to 1.0% of the maximum allowable imaging error,
and
- the sum of the context value errors of the R context values makes a contribution to the maximum allowable imaging error of at least 0.5% to 10% of the maximum allowable imaging error,
Having at least one of;
An optical device comprising at least one of: According to claim 1 or 2,
- at least two of the N detection units 112.1 form a detection unit pair 112.3,
- each detection unit 112.1 of the detection unit pair with its assigned secondary reference defines a detection direction,
- the detection directions of the two detection units 112.1 of the detection unit pair lie in the common detection unit pair plane,
- the detection unit pair 112.3 has at least two detection pair degrees of freedom in the detection unit pair plane, in each case a detection pair element reference of the optical element with respect to a first order reference in each detection pair degree of freedom - the detection unit pair 112.3 Assigned to - configured to determine a detection pair detection value representing the relative position or orientation of,
- the optical element unit 108 and the detection unit pair 112.3 define a detection pair transformation matrix representing the transformation of the detection signal of the detection unit pair 112.3 into detection pair detection values,
- Optical device, wherein at least one of the detection unit pair 112.3 and the optical element unit 108 is configured in such a way that the condition number of the detection pair transformation matrix is 5 to 30. According to paragraph 4,
- at least one of the detection pair degrees of freedom is a translational degree of freedom and one of the detection pair degrees of freedom is a rotational degree of freedom;
- the element criteria of the optical elements are arranged in the plane of the pair of detection units;
- the element criterion of the optical element coincides with the detection pair element criterion of the optical element;
- the detection direction angle between the detection directions of the pair of detection units 112.3 is less than 120°;
- a plurality of detection unit pairs are provided, and the detection direction angle between the detection directions of each detection unit pair 112.3 deviates from each other by less than 10° and 40°;
- a plurality of detection unit pairs are provided, the detection unit pair planes of two detection unit pairs being inclined relative to each other by less than 5° to 30°;
- a plurality of detection unit pairs are provided, the detection unit pair planes of two detection unit pairs being inclined with respect to the direction of gravity by an inclination angle of 5° to less than 30°; and
- a plurality of detection unit pairs are provided, the detection unit pair planes of two detection unit pairs are inclined with respect to the direction of gravity by an inclination angle, and the inclination angles differ from each other by less than 5° to 30°;
An optical device comprising at least one of: According to claim 1 or 2,
- at least two of the S actuating units (110.1) form a pair of actuating units (110.3),
- each actuating unit 110.1 of the actuating unit pair 110.3 defines an actuating direction,
- the operating directions of the two operating units (110.1) of the operating unit pair (110.3) lie in the common operating unit pair plane,
- the actuating unit pair 110.3 has at least two actuating pair degrees of freedom in the actuating unit pair plane, in each case the actuating pair element reference of the optical element with respect to the first order reference in each actuating pair degree of freedom - the actuating unit pair 110.3 Assigned to - is configured to set a pair context value expressing the relative position or orientation of,
- the optical element unit 108 and the actuating unit pair 110.3 define an actuating pair transformation matrix representing the transformation of the actuating states of the actuating unit pair 110.3 into pair context values,
- Optical device, wherein at least one of the actuating unit pair 110.3 and the optical element unit 108 is configured in such a way that the condition number of the actuating pair transformation matrix is 5 to 30. According to clause 6,
- at least one of the operational pair degrees of freedom is a translational degree of freedom and one of the operational pair degrees of freedom is a rotational degree of freedom;
- the element criteria of the optical elements are arranged in the plane of the pair of actuating units;
- the element criterion of the optical element coincides with the element criterion of the operating pair of the optical element;
- the operating direction angle between the operating directions of the operating unit pair (110.3) is less than 120°;
- a plurality of pairs of operating units are provided, and the operating direction angle between the operating directions of each pair of operating units (110.3) deviates from each other by less than 10° and 40°;
- a plurality of actuating unit pairs are provided, the actuating unit pair planes of two actuating unit pairs being inclined relative to each other by less than 5° and less than 30°;
- a plurality of actuating unit pairs are provided, wherein the actuating unit pair planes of two actuating unit pairs are inclined with respect to the direction of gravity by an inclination angle of 5° to less than 30°; and
- a plurality of actuating unit pairs are provided, the actuating unit pair planes of two actuating unit pairs being inclined with respect to the direction of gravity by an inclination angle, the inclination angles differing from each other by 5° to less than 30°;
An optical device comprising at least one of: According to claim 1 or 2,
- at least one of the N detection units 112.1 is supported by the detection device support structure of the detection device 112,
- the detection device support structure under vibrational excitation at at least one natural frequency has at least one natural type assigned to the natural frequency,
The following configurations:
- the at least one detection unit 112.1 is configured such that at least one natural frequency, in at least one vibrational degree of freedom, the maximum change in at least one of the position and orientation of the at least one detection unit 112.1 is that of the detection unit 112.1. arranged in such a way as to produce a change in the detection value of the detection unit 112.1 relative to the resting state of less than 5% to 10% of the detection value;
- at least one detection unit 112.1 with an assigned secondary reference defines a detection direction, and at least one detection unit 112.1 at at least one natural frequency defines at least one of position and orientation in at least one vibrational degree of freedom. and the at least one detection unit 112.1 is arranged in such a way that the detection direction is inclined with respect to a plane perpendicular to the vibrational degree of freedom with a maximum change of at least one of position and orientation by at most 5° to 30°. becoming; and
- the detection device support structure comprises a U-shaped structure for supporting at least one of the N detection units 112.1;
An optical device comprising at least one of: According to claim 1 or 2,
- at least one of the R actuating units 110.1 is supported by an actuating device support structure of the actuating device 110,
- the operating device support structure under vibrational excitation at at least one natural frequency has at least one natural type assigned to the natural frequency,
The following configurations:
- the at least one actuating unit 110.1 is such that, at least one natural frequency, in at least one vibrational degree of freedom, a maximum change in at least one of the position and orientation of the at least one actuating unit 110.1 occurs. arranged in such a way as to produce a change in the operating state of the operating unit 110.1 for a resting state of 5% to less than 10% of the operating state;
- at least one actuating unit 110.1 defines an actuating direction, at least one actuating unit 110.1 at at least one natural frequency having a maximum change of at least one of position and orientation in at least one vibrational degree of freedom, at least One actuating unit 110.1 is arranged in such a way that its actuating direction is inclined with respect to a plane perpendicular to the vibrational degree of freedom with a maximum change in position and orientation by at most 5° to 30°;
and
- the actuating device support structure comprises a U-shaped structure for supporting at least one of the R actuating units 110.1;
An optical device comprising at least one of: According to claim 1 or 2,
- the element reference of the optical element is the area center of the optical surface of the optical element,
or
- The element reference of the optical element is the center of mass of the optical element,
or
- The element reference of the optical element is the volume center of the optical element,
or
- an optical element (108.1) is provided for use in an imaging device, wherein the element reference of the optical element is the point of incidence of the central ray of the used light beam of the imaging device,
- the optical element 108.1 is a reflective optical element 108.1; and
- the optical element 108.1 is configured for use with UV light;
An optical device comprising at least one of: According to claim 1 or 2,
- at least one detection unit comprises an interferometer;
- at least one detection unit comprises an encoder; and
- at least one actuating unit comprising at least one actuator;
An optical device comprising at least one of: It is an optical imaging device,
- lighting device 102 with a first group of optical elements 106,
- an object device 104 for receiving an object 104.1,
- a projection device (103) with a second group of optical elements (107), and
- comprising an image device 105,
- the lighting device 102 is configured to illuminate the object 104.1,
- an optical imaging device, wherein the projection device (103) is configured to project an image of an object (104.1) onto the imaging device (105),
- an optical imaging device, characterized in that at least one of the lighting device (102) and the projection device (103) comprises at least one optical device according to claim 1 or 2. A method for supporting an optical element unit (108) having an optical element (108.1) within an optical imaging device,
The following configurations:
- detection in which a detection device 112 having a plurality of N detection units in a plurality of M degrees of freedom expresses the relative position or orientation of the element reference of the optical element with respect to the primary reference of the detection device 112 in each degree of freedom. Determine the value in each case,
- each detection unit 112.1 outputs a detection signal representing at least one of the distance and the displacement of the detection unit 112.1 with respect to the optical element 108.1 and a secondary reference assigned to each detection unit 112.1, ,
- the optical element unit 108 and the detection device 112 define a detection transformation matrix representing the transformation of the N detection signals into M detection values;
and
- the actuating device 110 having a plurality of S actuating units 110.1 in a plurality of R degrees of freedom determines the relative position or orientation of the element reference of the optical element with respect to the first reference of the actuating device 110 in each degree of freedom. Set the expressed situation value in each case,
- each operating unit 110.1 generates an operating state at the interface of the operating unit 110.1 for the optical element unit 108,
- the optical element unit 108 and the actuation device 110 define an actuation transformation matrix representing the transformation of S actuation states into R situation values;
It has at least one of the following,
- In the method, the condition number of the transformation matrix is defined as the ratio of the maximum singular value of the transformation matrix to the minimum singular value of the transformation matrix,
- The condition number of the detection transformation matrix is 5 to 30; and
- the condition number of the operational transformation matrix is 5 to 30;
A method characterized by comprising at least one of the following. According to clause 13,
- the optical imaging device has a predefinable maximum allowable imaging error during operation,
The following configurations:
- the imaging device uses M detection values to control the imaging device, and an error in at least one of the M detection values makes a contribution to the maximum allowable imaging error,
- the detection value error of at least one detection value makes a contribution to the maximum allowable imaging error of at least 0.05% to 1.0% of the maximum allowable imaging error, and
- the sum of the detection value errors of the M detection values makes a contribution to the maximum allowable imaging error of at least 0.5% to 10% of the maximum allowable imaging error,
Having at least one of;
and
- The imaging device sets R context values during control of the imaging device, and an error in at least one context value among the R context values makes a contribution to the maximum allowable imaging error,
- the context value error of at least one context value makes a contribution to the maximum allowable imaging error of at least 0.05% to 1.0% of the maximum allowable imaging error, and
- the sum of the context value errors of the R context values makes a contribution to the maximum allowable imaging error of at least 0.5% to 10% of the maximum allowable imaging error,
Having at least one of;
Having at least one of the methods. According to claim 13 or 14,
- at least two of the N detection units 112.1 form a detection unit pair 112.3,
- each detection unit 112.1 of the detection unit pair 112.3 with its assigned secondary reference defines a detection direction,
- the detection directions of the two detection units 112.1 of the detection unit pair 112.3 lie in the common detection unit pair plane,
- the detection unit pair 112.3 has at least two detection pair degrees of freedom in the detection unit pair plane, in each case a detection pair element reference of the optical element with respect to a first order reference in each detection pair degree of freedom - the detection unit pair 112.3 Assigned to - determines the detection pair detection values representing the relative positions or orientations of,
- the optical element unit 108 and the detection unit pair 112.3 define a detection pair transformation matrix representing the transformation of the detection signal of the operating unit 110.1 into detection pair detection values,
- A method in which the condition number of the detection pair transformation matrix is 5 to 30. According to clause 13,
- at least two of the S actuating units 110.3 form a pair of actuating units 110.3,
- each actuating unit 110.1 of the actuating unit pair 110.3 defines an actuating direction,
- the operating directions of the two operating units (110.1) of the operating unit pair (110.3) lie in the common operating unit pair plane,
- the actuating unit pair 110.3 has at least two actuating pair degrees of freedom in the actuating unit pair plane, in each case the actuating pair element reference of the optical element with respect to the first order reference in each actuating pair degree of freedom - the actuating unit pair 110.3 Assigned to - sets a pair context value expressing the relative position or orientation of,
- the optical element unit 108 and the actuating unit pair 110.3 define an actuating pair transformation matrix representing the transformation of the actuating states of the actuating unit pair 110.3 into pair context values,
- A method in which the condition number of the operation pair transformation matrix is 5 to 30. It is an optical imaging method,
- the object 104.1 is illuminated via an illumination device 102 with a first group of optical elements 106,
- an optical imaging method, wherein imaging of an object (104.1) on an imaging device (105) is produced by a projection device (103) with a second group of optical elements (107),
- An optical imaging method, characterized in that the method according to claim 13 or 14 is used in at least one of the illumination device (102) and the projection device (103). A method for designing an optical device for use in an optical imaging device, comprising an optical element unit (108) and at least one of a detection device (112) and an actuation device (110), wherein the optical element unit (108) comprises at least Contains one optical element (108.1),
The following configurations:
- the detection device 112 determines in each case in a plurality of M degrees of freedom a detection value expressing the relative position or orientation of the element reference of the optical element with respect to the first reference of the detection device 112 in each degree of freedom. composed,
- The detection device 112 comprises a plurality of N detection units 112.1, each of which determines the optical element 108.1 and a secondary reference assigned to each detection unit 112.1. configured to output a detection signal representing at least one of distance and displacement,
- the optical element unit 108 and the detection device 112 define a detection transformation matrix representing the transformation of the N detection signals into M detection values;
and
- the actuating device 110 is configured to set, in each case in a plurality of R degrees of freedom, a situation value expressing the relative position or orientation of the element reference of the optical element with respect to the primary reference of the actuating device 110 in each degree of freedom. composed,
- the actuating device 110 comprises a plurality of S actuating units 110.1, each of which is configured to generate an actuating state at the interface of the actuating unit 110.1 with respect to the optical element unit 108,
- the optical element unit 108 and the actuation device 110 define an actuation transformation matrix representing the transformation of S actuation states into R situation values;
It has at least one of the following,
- In the method, the condition number of the transformation matrix is defined as the ratio of the maximum singular value of the transformation matrix to the minimum singular value of the transformation matrix,
- at least one of the detection device 112 and the optical element unit 108 is configured in such a way that the condition number of the detection transformation matrix is 5 to 30;
and
- at least one of the actuating device 110 and the optical element unit 108 is configured in such a way that the condition number of the actuating transformation matrix is from 5 to 30;
A method characterized by comprising at least one of the following.

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